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1. 发明申请

US20200239995A1 METHOD FOR TREATING INNER WALL SURFACE OF TREATMENT OBJECT 审中-公开
公开(公告)号：US20200239995A1
公开(公告)日：2020-07-30
申请号：US16652982
申请日：2018-07-27
申请人： IWATANI CORPORATION
发明人： Koichi IZUMI , Masahiro FURUTANI , Tsuyoshi YAMAMOTO
IPC分类号： C23C8/14
摘要： A method for treating an inner wall surface of a treatment object uses a treatment object that is at least one of a container housing an ozone gas, a treatment container housing an object to be subjected to a surface treatment using an ozone gas and a pipe configured to supply an ozone gas. The method for treating an inner wall surface of a treatment object includes the steps of: determining whether an abnormal part is present in the inner wall surface of the treatment object or not; and distributing an ozone gas having a concentration of 10% by volume or more and 30% by volume or less and a temperature of 60° C. or less such that the ozone gas contacts the inner wall surface of the treatment object before the step of determining whether an abnormal part is present or not.

2. 发明申请

US20210107041A1 Gas Cluster Processing Device and Gas Cluster Processing Method 有权
公开(公告)号：US20210107041A1
公开(公告)日：2021-04-15
申请号：US16496714
申请日：2018-02-09
申请人： TOKYO ELECTRON LIMITED , IWATANI CORPORATION
发明人： Kazuya DOBASHI , Takehiko ORII , Yukimasa SAITO , Kunihiko KOIKE , Takehiko SENOO , Koichi IZUMI , Yu YOSHINO , Tadashi SHOJO , Keita KANEHIRA
IPC分类号： B08B5/02 , H01L21/67 , B08B7/00
摘要： There is provided a gas cluster processing device for performing a predetermined process on a workpiece by irradiating the workpiece with a gas cluster, including: a processing container in which the workpiece is disposed; a gas supply part configured to supply a gas for generating the gas cluster; a flow rate controller configured to control a flow rate of the gas supplied from the gas supply part; a cluster nozzle configured to receive the gas for generating the gas cluster at a predetermined supply pressure, spray the gas into the processing container maintained in a vacuum state, and convert the gas into the gas cluster through an adiabatic expansion; and a pressure control part provided in a pipe between the flow rate controller and the cluster nozzle and including a back pressure controller configured to control a supply pressure of the gas for generating the gas cluster.

3. 发明申请

US20190126191A1 METHOD FOR CONCENTRATING OZONE GAS AND APPARATUS FOR CONCENTRATING OZONE GAS 审中-公开
公开(公告)号：US20190126191A1
公开(公告)日：2019-05-02
申请号：US16092220
申请日：2017-03-03
申请人： IWATANI CORPORATION
发明人： Sadaki NAKAMURA , Koichi IZUMI , Naohisa MAKIHIRA
IPC分类号： B01D53/053 , C01B13/10
摘要： Provided is a method for concentrating ozone gas, including the steps of: allowing ozone gas to be adsorbed onto an adsorbent in a first adsorption vessel; reducing pressure in a concentration vessel in a state where the concentration vessel does not communicate with the first adsorption vessel; discharging part of gas in the first adsorption vessel; introducing first concentrated mixed gas in the concentration vessel by desorbing ozone gas in the first concentrated mixed gas and delivering the desorbed ozone gas into the concentration vessel; allowing ozone gas to be adsorbed onto an adsorbent in a second adsorption vessel; and introducing second concentrated mixed gas into the concentration vessel in a state where the concentration vessel into which the first concentrated mixed gas is introduced and the second adsorption vessel that houses an adsorbent. Also provided is an apparatus for concentrating ozone gas for implementing the method.

4. 发明申请

US20220143655A1 GAS CLUSTER PROCESSING DEVICE AND GAS CLUSTER PROCESSING METHOD 有权
公开(公告)号：US20220143655A1
公开(公告)日：2022-05-12
申请号：US17585274
申请日：2022-01-26
申请人： TOKYO ELECTRON LIMITED , IWATANI CORPORATION
发明人： Kazuya DOBASHI , Takehiko ORII , Yukimasa SAITO , Kunihiko KOIKE , Takehiko SENOO , Koichi IZUMI , Yu YOSHINO , Tadashi SHOJO , Keita KANEHIRA
IPC分类号： B08B5/02 , B08B7/00 , H01L21/67
摘要： There is provided a gas cluster processing device for performing a predetermined process on a workpiece by irradiating the workpiece with a gas cluster, including: a processing container in which the workpiece is disposed; a gas supply part configured to supply a gas for generating the gas cluster; a flow rate controller configured to control a flow rate of the gas supplied from the gas supply part; a cluster nozzle configured to receive the gas for generating the gas cluster at a predetermined supply pressure, spray the gas into the processing container maintained in a vacuum state, and convert the gas into the gas cluster through an adiabatic expansion; and a pressure control part provided in a pipe between the flow rate controller and the cluster nozzle and including a back pressure controller configured to control a supply pressure of the gas for generating the gas cluster.

5. 发明申请

US20150318170A1 FILM FORMING METHOD 有权
标题翻译：电影制作方法
公开(公告)号：US20150318170A1
公开(公告)日：2015-11-05
申请号：US14698273
申请日：2015-04-28
申请人： TOKYO ELECTRON LIMITED , IWATANI CORPORATION
发明人： Kazuo YABE , Akira SHIMIZU , Koichi IZUMI , Masahiro FURUTANI
IPC分类号： H01L21/02
CPC分类号： H01L21/67017 , C23C16/402 , C23C16/45534 , H01L21/02164 , H01L21/022 , H01L21/02219 , H01L21/02236 , H01L21/0228
摘要： A film forming method for obtaining a thin film by laminating molecular layers of oxide on a surface of a substrate in a vacuum atmosphere includes performing a cycle a plurality of times. The cycle includes: supplying a source gas containing a source to the substrate in a vacuum vessel to adsorb the source onto the substrate; forming an ozone atmosphere containing ozone having a concentration not less than that where a chain decomposition reaction is caused in the vacuum vessel; and forcibly decomposing the ozone by supplying energy to the ozone atmosphere to generate active species of oxygen, and oxidizing the source adsorbed onto the surface of the substrate by the active species to obtain the oxide.
摘要翻译：通过在真空气氛中层叠基板的表面上的氧化物的分子层来获得薄膜的成膜方法包括进行多次循环。该循环包括：在真空容器中将含有源的源气体供应到衬底以将源吸附到衬底上; 形成含有浓度不低于在真空容器中引起链分解反应的臭氧的臭氧的臭氧气氛; 通过向臭氧气氛供给能量而强制分解臭氧，生成活性物质的氧，并且通过活性种氧化吸附在基材表面上的源，得到氧化物。

6. 发明申请

US20190111379A1 METHOD FOR CONCENTRATING OZONE GAS AND APPARATUS FOR CONCENTRATING OZONE GAS 审中-公开
公开(公告)号：US20190111379A1
公开(公告)日：2019-04-18
申请号：US16092016
申请日：2017-03-03
申请人： IWATANI CORPORATION
发明人： Sadaki NAKAMURA , Koichi IZUMI , Naohisa MAKIHIRA
IPC分类号： B01D53/053 , C01B13/10 , B01D53/04
摘要： Provided is method for concentrating ozone gas the method including the steps of: allowing ozone gas to be adsorbed onto the adsorbent by introducing ozone gas-containing raw material mixed gas into an adsorption vessel (20) that houses an adsorbent for adsorbing ozone gas; reducing a pressure in a concentration vessel (30) in a state where the concentration vessel (30) does not communicate with the adsorption vessel (20), the concentration vessel (30) being configured to be connected to the adsorption vessel (20) so as to be interswitchable between a state where the concentration vessel (30) communicates with the adsorption vessel (20) and a state where the concentration vessel does not communicate with the adsorption vessel (20); and introducing concentrated mixed gas including ozone gas with a higher ozone gas concentration than the ozone gas concentration in the raw material mixed gas into the concentration vessel (30) by desorbing the ozone gas adsorbed onto the adsorbent using a pressure difference between the internal pressure of the concentration vessel (30) and an internal pressure of the adsorption vessel (20) in a state where the concentration vessel (30) having a reduced internal pressure communicates with the adsorption vessel (20) that houses the adsorbent onto which the ozone gas is adsorbed, and delivering the desorbed ozone gas into the concentration vessel (30). Also provided is an apparatus (1) for concentrating ozone gas for implementing the method.

7. 发明申请

US20180257934A1 METHOD FOR SUPPLYING OZONE GAS AND SYSTEM FOR SUPPLYING OZONE GAS 审中-公开
公开(公告)号：US20180257934A1
公开(公告)日：2018-09-13
申请号：US15761040
申请日：2016-06-29
申请人： IWATANI CORPORATION
发明人： Naohisa MAKIHIRA , Koichi IZUMI , Masahiro FURUTANI
IPC分类号： C01B13/11 , B01D53/04
CPC分类号： C01B13/11 , B01D53/04 , B01D53/0407 , B01D53/0446 , B01D53/0454 , B01D2253/106 , B01D2256/14 , B01D2257/404 , B01D2259/40086 , B01D2259/40088
摘要： A method for supplying an ozone gas includes the steps of: supplying an ozone gas from an ozone gas source through a second channel; and switching the ozone gas to a state where the ozone gas is supplied through a first channel and supplying the ozone gas having a reduced concentration of nitrogen oxide. The step of supplying the ozone gas through the second channel includes the step of introducing a part of the ozone gas to a first vessel so that ozone adsorbability of a first adsorbent is reduced. In the step of supplying the ozone gas to the object through the first channel, the ozone gas passes through the first vessel holding the first adsorbent having reduced ozone adsorbability.

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