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1. 发明授权

US07065898B2 Module for transferring a substrate 失效
标题翻译：用于转移衬底的模块
公开(公告)号：US07065898B2
公开(公告)日：2006-06-27
申请号：US10763203
申请日：2004-01-26
申请人： Hyun-Joon Kim , Yo-Han Ahn , Dong-Seok Ham , Jae-Bong Kim
发明人： Hyun-Joon Kim , Yo-Han Ahn , Dong-Seok Ham , Jae-Bong Kim
IPC分类号： F26B21/06
CPC分类号： H01L21/67017 , H01L21/67772
摘要： A module for transferring a substrate includes a load port for supporting a container to receive a plurality of substrates, a substrate transfer chamber disposed between the load port and a substrate process module, a substrate transfer robot disposed in the substrate transfer chamber for transferring the substrates between the container and the substrate process module, a gas supply unit connected to the substrate transfer chamber for supplying a purge gas into the substrate transfer chamber to purge an interior of the substrate transfer chamber, and a contamination control unit connected to the substrate transfer chamber for circulating the purge gas supplied into the substrate transfer chamber, resupplying the circulated purge gas into the substrate transfer chamber and removing particles and airborne molecular contaminants from the purge gas being circulated. Contamination of a substrate may be prevented and a necessary amount of purge gas may be reduced.
摘要翻译：用于转印衬底的模块包括用于支撑容器以容纳多个衬底的负载端口，设置在负载端口和衬底处理模块之间的衬底传送室，设置在衬底传送室中用于传送衬底的衬底传送机器人在所述容器和所述基板处理模块之间，连接到所述基板传送室的气体供应单元，用于将净化气体供应到所述基板传送室中以净化所述基板传送室的内部;以及污染控制单元，连接到所述基板传送室用于循环供给到基板传送室中的吹扫气体，将循环的净化气体再供给到基板传送室中，并从正在循环的吹扫气体中除去颗粒和空气传播的分子污染物。可以防止基材的污染，并且可以减少必需量的吹扫气体。

2. 发明申请

US20060225299A1 Method of transferring a substrate 审中-公开
标题翻译：转移基材的方法
公开(公告)号：US20060225299A1
公开(公告)日：2006-10-12
申请号：US11451315
申请日：2006-06-13
申请人： Hyun-Joo Kim , Yo-Han Ahn , Dong-Seok Ham , Jae-Bong Kim
发明人： Hyun-Joo Kim , Yo-Han Ahn , Dong-Seok Ham , Jae-Bong Kim
IPC分类号： F26B21/06
CPC分类号： H01L21/67017 , H01L21/67772
摘要： A method of controlling contamination in a substrate transfer chamber that is disposed between a load port for supporting a container to receive a plurality of substrates and a substrate process module for processing the substrates includes supplying a purge gas into the substrate transfer chamber to purge an interior of the substrate transfer chamber, circulating the purge gas supplied into the substrate transfer chamber through a gas circular pipe, removing particles and airborne molecular contaminants from the purge gas being circulated, and resupplying the circulated purge gas into the substrate transfer chamber.
摘要翻译：一种控制衬底传送室中的污染物的方法，该衬底传送室设置在用于支撑容器以容纳多个衬底的负载端口和用于处理衬底的衬底处理模块之间，包括将清洗气体供应到衬底传送室中以净化内部的衬底传送室，通过气体环形管循环供给到衬底传送室的吹扫气体，从循环的吹扫气体中除去颗粒和空气传播的分子污染物，并将循环的净化气体再供给到衬底传送室中。

3. 发明授权

US07914594B2 Air filtering device and cleaning system of semiconductor manufacturing apparatus with the same 失效
标题翻译：具有相同的半导体制造装置的空气过滤装置和清洗系统
公开(公告)号：US07914594B2
公开(公告)日：2011-03-29
申请号：US12180289
申请日：2008-07-25
申请人： Chang-Min Cho , Joo-Young Kim , Ji-Young Kim , Ju-A Ryu , Yo-Han Ahn , Hyung-Seok Choi , Dong-Seok Ham
发明人： Chang-Min Cho , Joo-Young Kim , Ji-Young Kim , Ju-A Ryu , Yo-Han Ahn , Hyung-Seok Choi , Dong-Seok Ham
IPC分类号： B01D46/00
CPC分类号： B01D46/0058 , B01D46/002 , B01D46/24 , B01D46/4272 , Y10S55/31
摘要： An air filtering device and an air cleaning system of a semiconductor manufacturing apparatus to reduce cost and increase manufacturing productivity. The air filtering device may include a frame having an open aperture coupled to an air supply line. A buffer frame configured to be inserted into the frame may include a plurality of slot parts, each slot part having a plurality of air in/out apertures through which air may flow in or out from the buffer frame. A plurality of filters may be releasably fastened to the plurality of slot parts to filter pollution material contained in air flowing through the air in/out apertures. An air interrupter for interrupting air flowing through the air in/out apertures may be used when replacing the plurality of filters, thereby providing purified air to the semiconductor manufacturing apparatus during the replacement.
摘要翻译：一种半导体制造装置的空气过滤装置和空气净化系统，以降低成本并提高制造生产率。空气过滤装置可以包括具有联接到空气供应管线的开口孔的框架。被构造成插入到框架中的缓冲框架可以包括多个狭槽部分，每个狭槽部分具有多个空气进/出孔，空气可以通过空气进入或离开缓冲器框架。多个过滤器可以可释放地紧固到多个槽部分，以过滤包含在流过空气进/出孔的空气中的污染物质。当更换多个过滤器时，可以使用用于中断通过空气入口/出口的空气的空气断路器，从而在更换期间向半导体制造装置提供净化的空气。

4. 发明申请

US20070039470A1 Apparatus and method for collecting contaminants from an air flow for manufacturing semiconductor devices and system using the same 审中-公开
标题翻译：用于从用于制造半导体器件的气流中收集污染物的装置和方法以及使用该污染物的系统
公开(公告)号：US20070039470A1
公开(公告)日：2007-02-22
申请号：US11329913
申请日：2006-01-10
申请人： Ha-Na Kim , Dong-Seok Ham , Yo-Han Ahn , Chang-Min Cho , Kwang-Min Choi
发明人： Ha-Na Kim , Dong-Seok Ham , Yo-Han Ahn , Chang-Min Cho , Kwang-Min Choi
IPC分类号： B01D47/00
CPC分类号： B01D47/14 , B01D53/18
摘要： Water discharged at a top region of an eliminator flows, e.g., by gravity into, along, and between the portions of the eliminator while an air flow also travels therein, e.g., horizontally and transverse to the water flow. As the air flow encounters the water, e.g., strikes portions of the eliminator having water flowing downward therealong or encounters water falling between portions of the eliminator, contaminants pass from the air flow to the water flow. The air flow, relieved of certain contaminants, continues onward and the water flow collects at the bottom of the eliminator for filtration and re-circulation through the eliminator.
摘要翻译：在消除器的顶部区域排出的水例如通过重力流入消除器的部分之间，并且在消除器的部分之间流动，同时气流也在其中行进，例如水平和横向于水流。当空气流遇到水时，例如撞击具有向下流动的水的消除器的部分或遇到在消除器的部分之间落下的水，污染物从空气流传递到水流。释放某些污染物的空气流继续向前，水流收集在消除器的底部，以过滤并通过消除器再循环。

5. 发明授权

US06522385B2 Air shower head of photolithography equipment for directing air towards a wafer stage 失效
标题翻译：用于将空气引向晶片台的光刻设备的空气喷头
公开(公告)号：US06522385B2
公开(公告)日：2003-02-18
申请号：US09848284
申请日：2001-05-04
申请人： Yo-Han Ahn , Byung-Moo Lee , Hyun-Joon Kim , Jai-Heung Choi
发明人： Yo-Han Ahn , Byung-Moo Lee , Hyun-Joon Kim , Jai-Heung Choi
IPC分类号： G03B2752
CPC分类号： G03F7/70908 , G03F7/70866 , G03F7/70933
摘要： An air shower head of an exposure device of photolithography equipment is free of chemical substances that could otherwise contaminate a photoresist layer on a semiconductor wafer and degrade the profile of the photoresist pattern. The air shower head is interposed between a lens system of the exposure device and a wafer stage, and has a hole in the middle thereof through which exposure light can pass to a wafer supported on the stage. The air shower head includes an upper frame defining a cavity open at the bottom thereof, and a porous bottom member covering the bottom of the upper frame. The porous member is mechanically secured to bottom ends of both the inner and outer side walls of the upper frame, i.e., without the use of chemical binders, to reduce the ability of the air shower head to serve as a source of contamination.
摘要翻译：光刻设备的曝光装置的空气喷头不含化学物质，否则会污染半导体晶片上的光致抗蚀剂层并降低光致抗蚀剂图案的轮廓。空气喷头插入在曝光装置的透镜系统和晶片台之间，并且在其中间具有曝光光可以通过其到支撑在平台上的晶片的孔。空气喷头包括限定在其底部开口的空腔的上框架和覆盖上框架的底部的多孔底部构件。多孔构件机械地固定到上框架的内侧壁和外侧壁的底端，即不使用化学粘合剂，以降低空气淋浴头作为污染源的能力。

6. 发明授权

US07326284B2 Contamination control system and air-conditioning system of a substrate processing apparatus using the same 失效
标题翻译：使用其的基板处理装置的污染控制系统和空调系统
公开(公告)号：US07326284B2
公开(公告)日：2008-02-05
申请号：US10883584
申请日：2004-07-01
申请人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
发明人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
IPC分类号： B01D47/00
CPC分类号： F24F3/161 , B01D53/14 , B01D53/78 , B01D2255/802 , B01D2257/106 , B01D2257/302 , B01D2257/404 , B01D2257/406 , B01D2257/70 , F24F2003/1617 , F24F2006/006 , Y02A50/21
摘要： An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.
摘要翻译：基板处理装置的空调系统包括用于向洁净室提供空气的进气管线。用于除去空气中的污染物的污染控制装置连接到进气管线。控制器控制空气的温度和湿度，没有污染物。空气出口管路将具有受控温度和湿度的空气提供给设置在洁净室中的基板处理室。污染控制装置包括具有喷射水的至少一个喷嘴的喷射单元。至少一个消除器捕获水以捕获空气中的污染物并将被捕获的水滴入罐中。水循环单元提供包括用于控制喷雾单元的水的pH的添加剂的水。

7. 发明申请

US20050000243A1 Contamination control system and air-conditioning system of a substrate processing apparatus using the same 失效
标题翻译：使用其的基板处理装置的污染控制系统和空调系统
公开(公告)号：US20050000243A1
公开(公告)日：2005-01-06
申请号：US10883584
申请日：2004-07-01
申请人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
发明人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
IPC分类号： H01L21/02 , B01D53/14 , B01D53/78 , F24F3/16 , C10K1/08 , F22D1/28 , B01D47/00 , F02M23/14 , F02M31/00 , F25D17/04
CPC分类号： F24F3/161 , B01D53/14 , B01D53/78 , B01D2255/802 , B01D2257/106 , B01D2257/302 , B01D2257/404 , B01D2257/406 , B01D2257/70 , F24F2003/1617 , F24F2006/006 , Y02A50/21
摘要： An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.
摘要翻译：基板处理装置的空调系统包括用于向洁净室提供空气的进气管线。用于除去空气中的污染物的污染控制装置连接到进气管线。控制器控制空气的温度和湿度，没有污染物。空气出口管路将具有受控温度和湿度的空气提供给设置在洁净室中的基板处理室。污染控制装置包括具有喷射水的至少一个喷嘴的喷射单元。至少一个消除器捕获水以捕获空气中的污染物并将被捕获的水滴入罐中。水循环单元提供包括用于控制喷雾单元的水的pH的添加剂的水。

8. 发明授权

US08027017B2 Substrate treating apparatus and exposing apparatus for cleaning a chuck cleaning tool with treating bath 失效
标题翻译：基板处理装置和用于用处理槽清洁卡盘清洁工具的曝光装置
公开(公告)号：US08027017B2
公开(公告)日：2011-09-27
申请号：US12321102
申请日：2009-01-15
申请人： Ju-A Ryu , Jeong-Heung Kong , Yang-Koo Lee , Hun-Hwan Ha , Yo-Han Ahn , Hweon Jin , Myung-Ki Lee
发明人： Ju-A Ryu , Jeong-Heung Kong , Yang-Koo Lee , Hun-Hwan Ha , Yo-Han Ahn , Hweon Jin , Myung-Ki Lee
IPC分类号： G03B27/52
CPC分类号： B08B1/007 , B08B1/04 , B08B3/12 , H01L21/67028 , H01L21/67057
摘要： The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.
摘要翻译：本发明构思提供了一种基板处理装置和曝光装置，其中，卡盘构件，包括清除卡盘构件的基板装载表面上的异物的清洁工具的清洁构件和清洁清洁工具的工具清洁构件在处理室内彼此相邻。本发明构思还提供了一种使用工具清洁构件清洁清洁工具的方法。根据上述装置和方法，可以防止由清洁工具污染卡盘构件，并且可以使在曝光过程中由卡盘构件上的颗粒引起的散焦现象最小化。

9. 发明授权

US06996453B2 Substrate processing apparatus and method of processing substrate while controlling for contamination in substrate transfer module 失效
标题翻译：基板处理装置和处理基板的方法，同时控制基板传送模块中的污染
公开(公告)号：US06996453B2
公开(公告)日：2006-02-07
申请号：US10684436
申请日：2003-10-15
申请人： Yo-Han Ahn , Ki-Doo Kim , Soo-Woong Lee , Jung-Sung Hwang , Hyeog-Ki Kim
发明人： Yo-Han Ahn , Ki-Doo Kim , Soo-Woong Lee , Jung-Sung Hwang , Hyeog-Ki Kim
IPC分类号： G06F7/00
CPC分类号： H01L21/00 , H01L21/67017 , Y10S414/139
摘要： A substrate processing apparatus for processing substrates prevents the substrates from contaminating as they are transferred. The apparatus includes a container, like a FOUP, for containing substrates, at least one processing chamber where the substrates are processed, a substrate transferring module including a substrate transfer chamber and at least one load port for supporting a container, and a contamination controlling system for the substrate transfer chamber. The contamination controlling system includes a purge gas supply inlet connected to the substrate transfer chamber, and a gas circulating tube for recycling the purging gas to circulate through the chamber. The substrate transfer chamber is purged using the purging gas to remove moisture and contaminating materials from the substrate transfer chamber. The formation of particles on the substrate otherwise caused by a reaction between the moisture and contaminating materials while the substrate is standing by in the container can be prevented.
摘要翻译：用于处理基板的基板处理装置防止基板在被转印时被污染。该装置包括用于容纳衬底的容器，如FOUP，用于处理衬底的至少一个处理室，包括衬底传送室的衬底传送模块和用于支撑容器的至少一个负载端口，以及污染控制系统用于衬底传送室。污染控制系统包括连接到基板传送室的吹扫气体供给入口和用于使净化气体循环通过室的气体循环管。使用净化气体清洗基板传送室，以从基板传送室去除水分和污染材料。可以防止在衬底上的颗粒在容器中待机时由水分和污染物质之间的反应引起的颗粒的形成。

10. 发明授权

US07850449B2 Heat treatment equipment 有权
标题翻译：热处理设备
公开(公告)号：US07850449B2
公开(公告)日：2010-12-14
申请号：US11775640
申请日：2007-07-10
申请人： Jae-Hyun Yang , Yo-Han Ahn , Kun-Hyung Lee , Gui-Young Cho , Hong-Hee Jeong , Mi-Ae Kim
发明人： Jae-Hyun Yang , Yo-Han Ahn , Kun-Hyung Lee , Gui-Young Cho , Hong-Hee Jeong , Mi-Ae Kim
IPC分类号： F27B5/00 , F27B5/10
CPC分类号： F27B17/0025 , H01L21/67109 , H01L21/67253
摘要： In an embodiment, heat treatment equipment comprises a process tube, an exhaust duct connected to the process tube, and, during operation, exhausting gases present within the process tube. The heat treatment equipment also comprises a hollow pressure control member interposed between the process tube and the exhaust duct, the pressure control member being operatively connected to the process tube and the exhaust duct respectively, and including one or a number of openings. Negative pressure is avoided in the process tube during heat treatment processes so that unwanted gas and impurities cannot enter the process tube from outside.
摘要翻译：在一个实施例中，热处理设备包括处理管，连接到处理管的排气管道，以及在操作期间排出存在于处理管内的气体。热处理设备还包括插入处理管和排气管之间的中空压力控制构件，压力控制构件分别可操作地连接到处理管和排气管，并且包括一个或多个开口。在热处理过程中，在处理管中避免负压，使得不需要的气体和杂质不能从外部进入工艺管。

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