专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120306961A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LIQUID DISCHARGE HEAD 有权
标题翻译：负性光敏树脂组合物，图案形成方法和液体排出头
公开(公告)号：US20120306961A1
公开(公告)日：2012-12-06
申请号：US13576906
申请日：2011-01-27
申请人： Hyo Takahashi , Ken Ikegame , Masako Shimomura
发明人： Hyo Takahashi , Ken Ikegame , Masako Shimomura
IPC分类号： B41J2/015 , G03F7/027 , G03F7/20 , G03F7/004
CPC分类号： B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1634 , B41J2/1635 , B41J2/1639 , B41J2/1645 , G03F7/0045 , G03F7/0046 , G03F7/038
摘要： A photosensitive resin composition includes a cationically polymerizable compound, a photoacid generating agent having an anion portion and a cation portion, and a salt having a cation portion having either one of a quaternary ammonium structure and a quaternary phosphonium structure and an anion portion, wherein the anion portion of the salt is exchanged with the anion portion of a first acid derived from the anion portion of the photoacid generating agent to form a second acid having acid strength that is lower than acid strength of the first acid.
摘要翻译：感光性树脂组合物包括阳离子聚合性化合物，具有阴离子部分的光酸产生剂和阳离子部分，以及具有季铵结构和季鏻结构和阴离子部分中的任一种的阳离子部分的盐，其中，盐的阴离子部分与衍生自光致酸产生剂的阴离子部分的第一种酸的阴离子部分交换，形成酸强度低于第一种酸的酸强度的第二种酸。

2. 发明授权

US08980968B2 Photosensitive resin composition, method for producing structure, and liquid discharge head 有权
标题翻译：感光树脂组合物，结构方法和排液头
公开(公告)号：US08980968B2
公开(公告)日：2015-03-17
申请号：US13576895
申请日：2011-02-01
申请人： Hyo Takahashi , Ken Ikegame , Masako Shimomura
发明人： Hyo Takahashi , Ken Ikegame , Masako Shimomura
IPC分类号： C08G59/68 , C08F2/50 , C09D11/102 , C09D11/101 , B41J2/16 , G03F7/004 , G03F7/038 , G03F7/40
CPC分类号： B41J2/1603 , B41J2/1639 , C09B69/004 , C09B69/109 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/40
摘要： A photosensitive resin composition includes (a) a compound polymerizable in the presence of an acid, and (b) a photoacid generating agent including an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below, wherein the component (b) absorbs 50% or more of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition,
摘要翻译：光敏树脂组合物包括（a）在酸存在下可聚合的化合物和（b）包含具有由下式（b1）表示的阳离子部分结构的鎓盐的阳离子产生剂和由式（b2），其中，成分（b）吸收感光性树脂组合物吸收的365nm波长的光的50％以上，

3. 发明申请

US20120292412A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING STRUCTURE, AND LIQUID DISCHARGE HEAD 有权
标题翻译：感光树脂组合物，生产结构的方法和液体排出头
公开(公告)号：US20120292412A1
公开(公告)日：2012-11-22
申请号：US13576895
申请日：2011-02-01
申请人： Hyo Takahashi , Ken Ikegame , Masako Shimomura
发明人： Hyo Takahashi , Ken Ikegame , Masako Shimomura
IPC分类号： G03F7/027 , B05B1/00 , G03F7/20
CPC分类号： B41J2/1603 , B41J2/1639 , C09B69/004 , C09B69/109 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/40
摘要： A photosensitive resin composition includes (a) a compound polymerizable in the presence of an acid, and (b) a photoacid generating agent including an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below, wherein the component (b) absorbs 50% or more of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition,
摘要翻译：光敏树脂组合物包括（a）在酸存在下可聚合的化合物和（b）包含具有由下式（b1）表示的阳离子部分结构的鎓盐的阳离子产生剂和由式（b2），其中，成分（b）吸收感光性树脂组合物吸收的365nm波长的光的50％以上，

4. 发明授权

US09061499B2 Negative photosensitive resin composition, pattern formation method, and liquid discharge head 有权
标题翻译：负型感光性树脂组合物，图案形成方法和排液头
公开(公告)号：US09061499B2
公开(公告)日：2015-06-23
申请号：US13576906
申请日：2011-01-27
申请人： Hyo Takahashi , Ken Ikegame , Masako Shimomura
发明人： Hyo Takahashi , Ken Ikegame , Masako Shimomura
IPC分类号： G03C1/00 , G03F7/00 , G03F1/00 , G01D11/00 , B41J2/16 , G03F7/004 , G03F7/038
CPC分类号： B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1634 , B41J2/1635 , B41J2/1639 , B41J2/1645 , G03F7/0045 , G03F7/0046 , G03F7/038
摘要： A photosensitive resin composition includes a cationically polymerizable compound, a photoacid generating agent having an anion portion and a cation portion, and a salt having a cation portion having either one of a quaternary ammonium structure and a quaternary phosphonium structure and an anion portion, wherein the anion portion of the salt is exchanged with the anion portion of a first acid derived from the anion portion of the photoacid generating agent to form a second acid having acid strength that is lower than acid strength of the first acid.
摘要翻译：感光性树脂组合物包括阳离子聚合性化合物，具有阴离子部分的光酸产生剂和阳离子部分，以及具有季铵结构和季鏻结构和阴离子部分中的任一种的阳离子部分的盐，其中，盐的阴离子部分与衍生自光致酸产生剂的阴离子部分的第一种酸的阴离子部分交换，形成酸强度低于第一种酸的酸强度的第二种酸。

5. 发明授权

US08944580B2 Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head 有权
标题翻译：感光树脂组合物，结构体制造方法和排液头
公开(公告)号：US08944580B2
公开(公告)日：2015-02-03
申请号：US13510609
申请日：2011-01-31
申请人： Ken Ikegame , Masako Shimomura , Hyo Takahashi
发明人： Ken Ikegame , Masako Shimomura , Hyo Takahashi
IPC分类号： C09D11/00 , G03F7/004 , C08G59/68 , C08G65/10 , C08G65/18 , G03F7/038 , C08L31/06
CPC分类号： G03F7/0045 , C08G59/68 , C08G65/105 , C08G65/18 , C08L31/06 , G03F7/0046 , G03F7/038
摘要： A photosensitive resin composition includes: a cation polymerizable compound; a photoacid generator having an anion portion represented by the chemical formula 1 and a cation portion, wherein R represents a hydrocarbon group which may be substituted with a fluorine atom and has a total carbon number of 1 to 30; X is selected from the group consisting of a carbon atom and a phosphorous atom; Y is selected from the group consisting of —S(═O)2—, —O—CF2—, —C(═O)—CF2—, —O—C(═O)—CF2—, —C(═O)—O—CF2—, and a single bond; R has at least one fluorine atom when Y is —S(═O)2— or the single bond; m and n are integers selected from the group consisting of m+n=3 and n=0, 1, and 2 when X is the carbon atom; m and n are integers selected from the group consisting of m+n=6 and n=0 to 5 when X is the phosphorous atom; and R and Y may be different from each other when m is equal to or greater than 2; and a salt of an anion portion and a cation portion, wherein an acid strength of an acid derived from the anion portion is equal to or greater than that of hexafluorophosphoric acid and equal to or less than that of hexafluoroantimonic acid.
摘要翻译：光敏树脂组合物包括：阳离子聚合性化合物; 具有由化学式1表示的阴离子部分和阳离子部分的光致酸产生剂，其中，R表示可被氟原子取代的碳原子数为1〜30的烃基， X选自碳原子和磷原子; Y选自-S（= O）2 - ， - O-CF 2 - ， - C（= O）-CF 2 - ， - O-C（= O）-CF 2 - ， - ）-O-CF 2 - 和单键; 当Y是-S（= O）2 - 或单键时，R至少有一个氟原子; m和n是当X是碳原子时，选自m + n = 3和n = 0,1和2的整数; m和n是选自m + n = 6和n = 0至5的整数，当X是磷原子时; 当m等于或大于2时，R和Y可以彼此不同; 阴离子部分和阳离子部分的盐，其中，来自阴离子部分的酸的酸强度等于或大于六氟磷酸的酸强度，并且等于或小于六氟锑酸的酸强度。

6. 发明申请

US20120229556A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING STRUCTURAL BODY, AND LIQUID DISCHARGE HEAD 有权
标题翻译：感光树脂组合物，制造结构体的方法和液体排出头
公开(公告)号：US20120229556A1
公开(公告)日：2012-09-13
申请号：US13510609
申请日：2011-01-31
申请人： Ken Ikegame , Masako Shimomura , Hyo Takahashi
发明人： Ken Ikegame , Masako Shimomura , Hyo Takahashi
IPC分类号： B41J2/015 , G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , C08G59/68 , C08G65/105 , C08G65/18 , C08L31/06 , G03F7/0046 , G03F7/038
摘要： A photosensitive resin composition includes: a cation polymerizable compound; a photoacid generator having an anion portion represented by the formula 1 and a cation portion, wherein R represents a hydrocarbon group which may be substituted with a fluorine atom and has a total carbon number of 1 to 30; X is selected from the group consisting of a carbon atom and a phosphorous atom; Y is selected from the group consisting of —S(═O)2—, —O—CF2—, —C(═O)—CF2—, —O—C(═O)—CF2—, —C(═O)—O—CF2—, and a single bond; R has at least one fluorine atom when Y is —S(═O)2— or the single bond; m and n are integers selected from the group consisting of m+n=3 and n=0, 1, and 2 when X is the carbon atom; m and n are integers selected from the group consisting of m+n=6 and n=0 to 5 when X is the phosphorous atom; and R and Y may be different from each other when m is equal to or greater than 2; and a salt of an anion portion and a cation portion, wherein an acid strength of an acid derived from the anion portion is equal to or greater than that of hexafluorophosphoric acid and equal to or less than that of hexafluoroantimonic acid.
摘要翻译：光敏树脂组合物包括：阳离子聚合性化合物; 具有由式1表示的阴离子部分和阳离子部分的光致酸产生剂，其中R表示可被氟原子取代的碳原子数为1〜30的烃基， X选自碳原子和磷原子; Y选自-S（= O）2 - ， - O-CF 2 - ， - C（= O）-CF 2 - ， - O-C（= O）-CF 2 - ， - ）-O-CF 2 - 和单键; 当Y是-S（= O）2 - 或单键时，R至少有一个氟原子; m和n是当X是碳原子时，选自m + n = 3和n = 0,1和2的整数; m和n是选自m + n = 6和n = 0至5的整数，当X是磷原子时; 当m等于或大于2时，R和Y可以彼此不同; 阴离子部分和阳离子部分的盐，其中，来自阴离子部分的酸的酸强度等于或大于六氟磷酸的酸强度，并且等于或小于六氟锑酸的酸强度。

7. 发明授权

US08975003B2 Photosensitive negative resin composition 有权
标题翻译：感光负性树脂组合物
公开(公告)号：US08975003B2
公开(公告)日：2015-03-10
申请号：US13989449
申请日：2011-12-02
申请人： Hyou Takahashi , Masako Shimomura , Ken Ikegame
发明人： Hyou Takahashi , Masako Shimomura , Ken Ikegame
IPC分类号： G03F7/004 , G03F7/038 , B41J2/16
CPC分类号： G03F7/004 , B41J2/1623 , B41J2/1628 , B41J2/1631 , G03F7/0045 , G03F7/0046 , G03F7/038
摘要： The invention provides a photosensitive negative resin composition containing (a) an epoxy-group-containing compound, (b) a first onium salt containing a cation portion structure represented by (b1) and an anion portion structure represented by (b2), and (c) a second onium salt containing a cation portion structure represented by (c1) and an anion portion structure represented by (c2).
摘要翻译：本发明提供一种含有（a）含环氧基化合物的感光性负性树脂组合物，（b）含有由（b1）表示的阳离子部分结构的第一鎓盐和由（b2）表示的阴离子部分结构和 c）含有由（c1）表示的阳离子部分结构和由（c2）表示的阴离子部分结构的第二鎓盐。

8. 发明申请

US20130235119A1 PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION 有权
标题翻译：感光性负面树脂组合物
公开(公告)号：US20130235119A1
公开(公告)日：2013-09-12
申请号：US13989449
申请日：2011-12-02
申请人： Hyou Takahashi , Masako Shimomura , Ken Ikegame
发明人： Hyou Takahashi , Masako Shimomura , Ken Ikegame
IPC分类号： G03F7/004
CPC分类号： G03F7/004 , B41J2/1623 , B41J2/1628 , B41J2/1631 , G03F7/0045 , G03F7/0046 , G03F7/038
摘要： The invention provides a photosensitive negative resin composition containing (a) an epoxy-group-containing compound, (b) a first onium salt containing a cation portion structure represented by (b1) and an anion portion structure represented by (b2), and (c) a second onium salt containing a cation portion structure represented by (c1) and an anion portion structure represented by (c2).
摘要翻译：本发明提供一种含有（a）含环氧基化合物的感光性负性树脂组合物，（b）含有由（b1）表示的阳离子部分结构的第一鎓盐和由（b2）表示的阴离子部分结构和 c）含有由（c1）表示的阳离子部分结构和由（c2）表示的阴离子部分结构的第二鎓盐。

9. 发明授权

US08827422B2 Liquid ejection head and method of production thereof 有权
标题翻译：液体喷射头及其制造方法
公开(公告)号：US08827422B2
公开(公告)日：2014-09-09
申请号：US13480637
申请日：2012-05-25
申请人： Takuma Kodoi , Yasunori Takei , Kenji Yabe , Isamu Horiuchi , Hyo Takahashi , Ken Ikegame
发明人： Takuma Kodoi , Yasunori Takei , Kenji Yabe , Isamu Horiuchi , Hyo Takahashi , Ken Ikegame
IPC分类号： B41J2/05
CPC分类号： B41J2/1603 , B41J2/162 , B41J2/1631 , B41J2/1635 , B41J2/1645 , B41J2002/14475
摘要： Without being dependent on design changes, a liquid ejection head and a method of production thereof are provided in which when time-division driving, liquid drop landing deviance in the direction of printing is capable of being corrected. In order to achieve this, before performing an exposure in order to form an ejection port, after forming a cavity that is shifted with respect to the location at which the ejection port is formed, exposure is performed.
摘要翻译：在不依赖于设计变化的情况下，提供液体喷射头及其制造方法，其中当分时驱动时，能够校正打印方向上的液滴着落偏差。为了实现这一点，在进行曝光以形成喷射口之前，在形成相对于形成喷射口的位置移动的腔体之后，进行曝光。

10. 发明申请

US20120306969A1 LIQUID EJECTION HEAD AND METHOD OF PRODUCTION THEREOF 有权
标题翻译：液体喷射头及其生产方法
公开(公告)号：US20120306969A1
公开(公告)日：2012-12-06
申请号：US13480637
申请日：2012-05-25
申请人： Takuma Kodoi , Yasunori Takei , Kenji Yabe , Isamu Horiuchi , Hyo Takahashi , Ken Ikegame
发明人： Takuma Kodoi , Yasunori Takei , Kenji Yabe , Isamu Horiuchi , Hyo Takahashi , Ken Ikegame
IPC分类号： B41J2/15 , B21D53/76
CPC分类号： B41J2/1603 , B41J2/162 , B41J2/1631 , B41J2/1635 , B41J2/1645 , B41J2002/14475
摘要： Without being dependent on design changes, a liquid ejection head and a method of production thereof are provided in which when time-division driving, liquid drop landing deviance in the direction of printing is capable of being corrected. In order to achieve this, before performing an exposure in order to form an ejection port, after forming a cavity that is shifted with respect to the location at which the ejection port is formed, exposure is performed.
摘要翻译：在不依赖于设计变化的情况下，提供液体喷射头及其制造方法，其中当分时驱动时，能够校正打印方向上的液滴着落偏差。为了实现这一点，在进行曝光以形成喷射口之前，在形成相对于形成喷射口的位置移动的腔体之后，进行曝光。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式