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1. 发明申请

US20140141342A1 ELECTROLYTE FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY INCLUDING SAME 审中-公开
标题翻译：用于锂二次电池的电解液和包括其的锂二次电池
公开(公告)号：US20140141342A1
公开(公告)日：2014-05-22
申请号：US14232374
申请日：2012-07-12
申请人： Hyeong Kyu Lim , Hong Hie Lee , Eun Gi Shim , Jong Su Kim , Chang Sin Lee , Kyung Il Park , Hahn Mok Song
发明人： Hyeong Kyu Lim , Hong Hie Lee , Eun Gi Shim , Jong Su Kim , Chang Sin Lee , Kyung Il Park , Hahn Mok Song
IPC分类号： H01M10/0567 , H01M10/0525
CPC分类号： H01M10/0525 , H01M10/052 , H01M10/0567
摘要： The present invention relates to an electrolyte for a lithium secondary battery and a lithium secondary battery including the same, wherein the electrolyte comprises an organic solvent and an electrolyte additive, represented by chemical formula 1 and mixed lithium salts in the organic solvent so that room and high temperature life-time properties of the battery can be improved. Said chemical 1 is defined in the specification.
摘要翻译：本发明涉及一种锂二次电池用电解液及包含该锂二次电池的锂二次电池，其中，所述电解质包含由化学式1表示的有机溶剂和电解质添加剂以及所述有机溶剂中的混合锂盐，可以提高电池的高温寿命特性。所述化学品1在说明书中定义。

2. 发明授权

US06750073B2 Method for forming a mask pattern 失效
公开(公告)号：US06750073B2
公开(公告)日：2004-06-15
申请号：US10261708
申请日：2002-09-30
申请人： Hong Hie Lee , Youn Sang Kim , Tae Wan Kim , Pil Jin Yoo
发明人： Hong Hie Lee , Youn Sang Kim , Tae Wan Kim , Pil Jin Yoo
IPC分类号： H01L2100
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0273
摘要： A mask pattern is formed on a substrate by using a solvent absorbent mold having a pattern structure with a relief and an intaglio portion. A mask layer dissolved in a solvent to obtain fluidity is prepared on the substrate. The mold is pressed onto the mask layer with a predetermined pressure, and a portion of the mask layer that contacts with the relief portion of the mold is introduced into the intaglio portion thereof. Then, the mold absorbs the solvent contained in the mask layer to thereby solidify the mask layer. Next, the mold is separated from the substrate and the portion of the mask layer that contacts with the relief portion of the mold is removed, thus finally obtaining the desired minute mask pattern.

3. 发明授权

US06818139B1 Method for forming a micro-pattern on a substrate 失效
标题翻译：在基板上形成微图案的方法
公开(公告)号：US06818139B1
公开(公告)日：2004-11-16
申请号：US09959057
申请日：2001-10-15
申请人： Hong Hie Lee , Dahl Young Khang
发明人： Hong Hie Lee , Dahl Young Khang
IPC分类号： B44C122
CPC分类号： B29C43/021 , B29C43/003 , B29C43/04 , B29C43/14 , B29C2043/025 , B29C2043/142 , B29C2043/144 , B29C2043/3634 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/168 , H01L21/0271
摘要： In a method for forming a micro-pattern on a substrate (200), polymer material having a solvent is coated on the substrate, thereby forming a polymer film on the substrate. Then, a mold (204) having a predetermined shape is compressed into the polymer film (202) on the substrate by employing a predetermined compression technique to entail a plastic deformation of the polymer film, thereby patterning the polymer film. This compression procedure is performed at a room temperature, e.g., of about 10 to about 30° C. In the present invention, before the mold (204) is pressed into the polymer film (202), a free volume in the polymer film is previously increased so that a pressure applied on the polymer material needed to plastically deform the polymer film is reduced. Thereafter, etching is performed on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate.
摘要翻译：在基板（200）上形成微图案的方法中，在基板上涂布具有溶剂的聚合物材料，从而在基板上形成聚合物膜。然后，通过使用预定的压缩技术将具有预定形状的模具（204）压缩到基板上的聚合物膜（202）中，以引起聚合物膜的塑性变形，从而对聚合物膜进行图案化。该压缩过程在室温下进行，例如约10至约30℃。在本发明中，在将模具（204）压入聚合物膜（202）之前，聚合物膜中的自由体积为预先增加，使得施加在聚合物材料上的压力需要塑性变形聚合物膜。此后，通过使用图案化的聚合物膜作为蚀刻掩模在衬底上进行蚀刻，从而在衬底上形成微图案。

4. 发明授权

US09086529B2 Optical film with partially coated structure array and manufacturing method thereof 有权
标题翻译：具有部分涂层结构阵列的光学膜及其制造方法
公开(公告)号：US09086529B2
公开(公告)日：2015-07-21
申请号：US13979874
申请日：2012-01-17
申请人： Kookheon Char , Hyunsik Yoon , Hong Hie Lee , Eun-Kyeong Bae
发明人： Kookheon Char , Hyunsik Yoon , Hong Hie Lee , Kahp-Yang Suh
IPC分类号： G02B27/10 , G02F1/03 , G02F1/133 , G09G3/34 , G03G13/00 , G02B5/04 , G02B5/18 , G02B27/22
CPC分类号： G02B5/045 , G02B5/1828 , G02B27/2242
摘要： The present invention relates to an optical film comprising a substrate on which an array of structures is formed, wherein a material having a different refractive index, absorbancy or reflectivity from that of a surface of the structures is partially coated on the surface of the structures, and a manufacturing method thereof. Specifically, the optical film according to one embodiment of the present invention may have a different transparency depending on the direction or can transmit light asymmetrically. Further, the optical film may be applicable to image devices, which need to change brightness or images depending on the angle of view or to display three-dimensional images.
摘要翻译：本发明涉及一种光学膜，其包括其上形成有结构阵列的基底，其中具有不同折射率，与该结构表面的吸收或反射率不同的材料部分地涂覆在结构的表面上，及其制造方法。具体而言，根据本发明的一个实施方式的光学膜可以根据方向具有不同的透明度，或者可以不对称地透射光。此外，光学膜可以应用于需要根据视角改变亮度或图像的图像装置或显示三维图像。

5. 发明授权

US07588710B2 Mold made of amorphous fluorine resin and fabrication method thereof 失效
标题翻译：由非晶氟树脂制成的模具及其制造方法
公开(公告)号：US07588710B2
公开(公告)日：2009-09-15
申请号：US11568596
申请日：2004-05-04
申请人： Hong Hie Lee , Dahl Young Khang
发明人： Hong Hie Lee , Dahl Young Khang
IPC分类号： B29C33/38 , B29C33/40
CPC分类号： B29C33/405 , B29C33/3857 , B29C43/021 , B29C2043/023 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H05K3/0014 , H05K3/107 , H05K2201/0133 , H05K2201/015 , H05K2203/0108
摘要： A mold for use in forming a target patterning on a substrate by using a pattern formed at one side of the mold is made of amorphous fluorine resin. The mold is fabricated through a compression molding technique by using a master mold (104) with a pattern structure thereon facing the pattern.
摘要翻译：通过使用在模具的一侧形成的图案在基板上形成目标图案形成用的模具由无定形氟树脂制成。通过使用其上具有图案的图案结构的母模（104）通过压缩成型技术来制造模具。

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