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    • 10. 发明申请
    • DISPLAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME
    • 显示基板,其制造方法
    • US20110147740A1
    • 2011-06-23
    • US12977853
    • 2010-12-23
    • Ki-Hun JEONGDo-Hyun KIMDong-Hoon LEEKap-Soo YOONJae-Ho CHOISung-Hoon YANGPil-Sang YUNSeung-Mi SEO
    • Ki-Hun JEONGDo-Hyun KIMDong-Hoon LEEKap-Soo YOONJae-Ho CHOISung-Hoon YANGPil-Sang YUNSeung-Mi SEO
    • H01L29/786H01L21/336
    • H01L29/7869H01L29/78606H01L29/78633
    • The present invention discloses a thin film transistor (TFT), a method for manufacturing the TFT, and a display substrate using the TFT that may prevent degradation of the characteristics of an oxide semiconductor contained in the TFT by blocking external light from entering a channel region of the oxide semiconductor. The TFT comprises an oxide semiconductor layer; a protective layer disposed on the oxide semiconductor layer and overlapping a channel region of the oxide semiconductor layer; an opaque layer disposed between the oxide semiconductor layer and the protective layer; a source electrode contacting a first side of the oxide semiconductor layer; a drain electrode contacting a second side of the oxide semiconductor layer and facing the source electrode with the channel region disposed between the drain electrode and the source electrode; a gate electrode to apply an electric field to the oxide semiconductor layer; and a gate insulating layer disposed between the gate electrode and the oxide semiconductor layer.
    • 本发明公开了一种薄膜晶体管(TFT),TFT的制造方法以及使用该TFT的显示基板,其可以防止外部光阻挡进入沟道区域而使TFT中包含的氧化物半导体的特性劣化 的氧化物半导体。 TFT包括氧化物半导体层; 保护层,设置在所述氧化物半导体层上并与所述氧化物半导体层的沟道区域重叠; 设置在所述氧化物半导体层和所述保护层之间的不透明层; 与氧化物半导体层的第一面接触的源电极; 与所述氧化物半导体层的第二面接触且与所述源电极相对的漏电极,所述沟道区域设置在所述漏电极和所述源电极之间; 用于向氧化物半导体层施加电场的栅电极; 以及设置在栅电极和氧化物半导体层之间的栅极绝缘层。