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1. 发明授权

US07079677B2 Automatic intelligent yield improving and process parameter multivariate system and the analysis method thereof 失效
标题翻译：自动智能产量提高和过程参数多变量系统及其分析方法
公开(公告)号：US07079677B2
公开(公告)日：2006-07-18
申请号：US10249148
申请日：2003-03-19
申请人： Hung-En Tai , Sheng-Jen Wang
发明人： Hung-En Tai , Sheng-Jen Wang
IPC分类号： G06K9/00 , G06K9/36
CPC分类号： G06Q10/04 , G05B2219/32191 , G05B2219/45031 , H01L21/67276 , Y02P90/22
摘要： An automatic intelligent yield improving and process parameter multivariate analysis system and the analysis method thereof. The system is applied to a computer to set up analysis procedures for analyzing process parameters obtained from each measuring machine in semiconductor testing process by utilizing data mining technology. The system includes a plurality of semiconductor processing nodes having different functions. The system links each of the semiconductor processing node to another semiconductor processing node by a logic means so that the computer can process the semiconductor processing nodes sequentially. The system also links the semiconductor processing nodes by a data connection means to allow microprocessors to load necessary parameter data or wafer lot numbers from corresponding semiconductor processing nodes by a data connection means.
摘要翻译：一种自动智能产量提高和过程参数多变量分析系统及其分析方法。该系统应用于计算机，通过利用数据挖掘技术，在半导体测试过程中设置分析从每台测量机获得的工艺参数的分析程序。该系统包括具有不同功能的多个半导体处理节点。该系统通过逻辑装置将每个半导体处理节点连接到另一个半导体处理节点，使得计算机可以顺序地处理半导体处理节点。该系统还通过数据连接装置连接半导体处理节点，以允许微处理器通过数据连接装置从相应的半导体处理节点加载必要的参数数据或晶片批号。

2. 发明申请

US20050203858A1 METHOD AND RELATED SYSTEM FOR SEMICONDUCTOR EQUIPMENT PREVENTION MAINTENANCE MANAGEMENT 有权
标题翻译：半导体设备预防维护管理方法与相关系统
公开(公告)号：US20050203858A1
公开(公告)日：2005-09-15
申请号：US10708572
申请日：2004-03-11
申请人： Hung-En Tai , Chien-Chung Chen , Sheng-Jen Wang
发明人： Hung-En Tai , Chien-Chung Chen , Sheng-Jen Wang
IPC分类号： G06F19/00 , G21C17/00
CPC分类号： H01L22/20 , G05B19/41875 , G06Q30/0283 , Y02P90/22
摘要： A method and related system for semiconductor equipment prevention maintenance management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording time and cost of prevention maintenance after each piece of equipment runs prevention maintenance, evaluating the quality of semiconductor products, and analyzing a relationship between the corresponding process parameter, the corresponding equipment parameters, prevention maintenance cost, and semiconductor products of each piece of equipment.
摘要翻译：一种半导体设备预防维护管理方法及相关系统。该方法包括记录每件设备的工艺参数，每台设备的加工记录设备参数，每台设备运行后的预防维护的评估和记录时间和成本预防维护，半导体产品的质量评估和分析相应的过程参数，相应的设备参数，预防维护成本以及每件设备的半导体产品之间的关系。

3. 发明授权

US07412090B2 Method of managing wafer defects 有权
标题翻译：晶圆缺陷管理方法
公开(公告)号：US07412090B2
公开(公告)日：2008-08-12
申请号：US10711310
申请日：2004-09-09
申请人： Hung-En Tai , Chia-Yun Chen , Sheng-Jen Wang
发明人： Hung-En Tai , Chia-Yun Chen , Sheng-Jen Wang
IPC分类号： G06K9/00
CPC分类号： G01N21/9501
摘要： A method of managing wafer defects includes inspecting each chip in a wafer to generate a unit of wafer defect raw data, using a server to integrate the unit of wafer defect raw data to generate a unit of wafer defect distribution data for recording positions, types, and sizes of defects, using the server to generate a corresponding drawing file according to the unit wafer defect distribution data to show all kinds of defect distributions, and transmitting the drawing file to a terminal such that terminal users can view the defect distributions without receiving the unit of wafer defect raw data.
摘要翻译：管理晶片缺陷的方法包括检查晶片中的每个芯片以产生晶片缺陷原始数据的单元，使用服务器来整合晶片缺陷原始数据的单元以产生用于记录位置，类型的晶片缺陷分布数据的单元，和尺寸的缺陷，使用服务器根据单位晶片缺陷分布数据生成相应的图形文件以显示各种缺陷分布，并将绘图文件发送到终端，使得终端用户可以在不接收到缺陷分布的情况下查看缺陷分布晶圆缺陷原始数据单位。

4. 发明申请

US20050187648A1 SEMICONDUCTOR PROCESS AND YIELD ANALYSIS INTEGRATED REAL-TIME MANAGEMENT METHOD 失效
标题翻译：半导体工艺和分析实时管理方法
公开(公告)号：US20050187648A1
公开(公告)日：2005-08-25
申请号：US10708277
申请日：2004-02-20
申请人： Hung-En Tai , Chien-Chung Chen , Sheng-Jen Wang
发明人： Hung-En Tai , Chien-Chung Chen , Sheng-Jen Wang
IPC分类号： G05B19/418 , G05B23/02 , H01L21/02 , G06F19/00
CPC分类号： H01L22/20 , G05B2219/32191 , Y02P90/22
摘要： A semiconductor process and yield analysis integrated real-time management method comprises inspecting a plurality of semiconductor products with a plurality of items to generate and record a plurality of inspecting results during semiconductor process, classifying the semiconductor products as a plurality of groups with a default rule to generate and record an initial data in a database, indexing a plurality of semiconductor product groups and the corresponding initial data from the database by a default product rule and parameter to calculate a corresponding analysis result, and displaying the analysis result according to the indexed semiconductor product groups and the initial data.
摘要翻译：集成实时管理方法的半导体工艺和成品率分析包括在半导体处理期间检查多个半导体产品以产生并记录多个检查结果，并将半导体产品作为具有默认规则的多个组进行分类在数据库中生成和记录初始数据，通过默认产品规则和参数从数据库索引多个半导体产品组和相应的初始数据，以计算相应的分析结果，并根据索引的半导体显示分析结果产品组和初始数据。

5. 发明申请

US20060050950A1 Method of Managing Wafer Defects 有权
标题翻译：晶圆缺陷管理方法
公开(公告)号：US20060050950A1
公开(公告)日：2006-03-09
申请号：US10711310
申请日：2004-09-09
申请人： Hung-En Tai , Chia-Yun Chen , Sheng-Jen Wang
发明人： Hung-En Tai , Chia-Yun Chen , Sheng-Jen Wang
IPC分类号： G06K9/00
CPC分类号： G01N21/9501
摘要： A method of managing wafer defects includes inspecting each chip in a wafer to generate a unit of wafer defect raw data, using a server to integrate the unit of wafer defect raw data to generate a unit of wafer defect distribution data for recording positions, types, and sizes of defects, using the server to generate a corresponding drawing file according to the unit wafer defect distribution data to show all kinds of defect distributions, and transmitting the drawing file to a terminal such that terminal users can view the defect distributions without receiving the unit of wafer defect raw data.
摘要翻译：管理晶片缺陷的方法包括检查晶片中的每个芯片以产生晶片缺陷原始数据的单元，使用服务器来整合晶片缺陷原始数据的单元以产生用于记录位置，类型的晶片缺陷分布数据的单元，和尺寸的缺陷，使用服务器根据单位晶片缺陷分布数据生成相应的图形文件以显示各种缺陷分布，并将绘图文件发送到终端，使得终端用户可以在不接收到缺陷分布的情况下查看缺陷分布晶圆缺陷原始数据单位。

6. 发明授权

US07099729B2 Semiconductor process and yield analysis integrated real-time management method 失效
标题翻译：半导体工艺和产量分析集成实时管理方法
公开(公告)号：US07099729B2
公开(公告)日：2006-08-29
申请号：US10708277
申请日：2004-02-20
申请人： Hung-En Tai , Chien-Chung Chen , Sheng-Jen Wang
发明人： Hung-En Tai , Chien-Chung Chen , Sheng-Jen Wang
IPC分类号： G06F19/00
CPC分类号： H01L22/20 , G05B2219/32191 , Y02P90/22
摘要： A semiconductor process and yield analysis integrated real-time management method comprises inspecting a plurality of semiconductor products with a plurality of items to generate and record a plurality of inspecting results during semiconductor process, classifying the semiconductor products as a plurality of groups with a default rule to generate and record an initial data in a database, indexing a plurality of semiconductor product groups and the corresponding initial data from the database by a default product rule and parameter to calculate a corresponding analysis result, and displaying the analysis result according to the indexed semiconductor product groups and the initial data.
摘要翻译：集成实时管理方法的半导体工艺和成品率分析包括在半导体处理期间检查多个半导体产品以产生并记录多个检查结果，并将半导体产品作为具有默认规则的多个组进行分类在数据库中生成和记录初始数据，通过默认产品规则和参数从数据库索引多个半导体产品组和相应的初始数据，以计算相应的分析结果，并根据索引的半导体显示分析结果产品组和初始数据。

7. 发明授权

US06999897B2 Method and related system for semiconductor equipment early warning management 失效
标题翻译：半导体设备预警管理方法及相关系统
公开(公告)号：US06999897B2
公开(公告)日：2006-02-14
申请号：US10708573
申请日：2004-03-11
申请人： Hung-En Tai , Chien-Chung Chen , Haw-Jyue Luo , Sheng-Jen Wang
发明人： Hung-En Tai , Chien-Chung Chen , Haw-Jyue Luo , Sheng-Jen Wang
IPC分类号： G11C7/00
CPC分类号： G05B19/41875 , Y02P90/22
摘要： A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.
摘要翻译：一种半导体设备预警管理方法及相关系统。该方法包括记录每件设备的处理参数，每台设备处理时记录设备参数，评估和记录半导体产品的质量和相应的测试参数，分析相应工艺参数，相应设备参数之间的关系，以及每件设备的半导体产品的质量。

8. 发明授权

US06950783B1 Method and related system for semiconductor equipment prevention maintenance management 有权
标题翻译：半导体设备预防维护管理方法及相关系统
公开(公告)号：US06950783B1
公开(公告)日：2005-09-27
申请号：US10708572
申请日：2004-03-11
申请人： Hung-En Tai , Chien-Chung Chen , Sheng-Jen Wang
发明人： Hung-En Tai , Chien-Chung Chen , Sheng-Jen Wang
IPC分类号： G06F19/00 , G21C17/00
CPC分类号： H01L22/20 , G05B19/41875 , G06Q30/0283 , Y02P90/22
摘要： A method and related system for semiconductor equipment prevention maintenance management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording time and cost of prevention maintenance after each piece of equipment runs prevention maintenance, evaluating the quality of semiconductor products, and analyzing a relationship between the corresponding process parameter, the corresponding equipment parameters, prevention maintenance cost, and semiconductor products of each piece of equipment.
摘要翻译：一种半导体设备预防维护管理方法及相关系统。该方法包括记录每件设备的工艺参数，每台设备的加工记录设备参数，每台设备运行后的预防维护的评估和记录时间和成本预防维护，半导体产品的质量评估和分析相应的过程参数，相应的设备参数，预防维护成本以及每件设备的半导体产品之间的关系。

9. 发明申请

US20050203715A1 METHOD AND RELATED SYSTEM FOR SEMICONDUCTOR EQUIPMENT EARLY WARNING MANAGEMENT 失效
标题翻译：用于半导体设备的方法和相关系统早期警告管理
公开(公告)号：US20050203715A1
公开(公告)日：2005-09-15
申请号：US10708573
申请日：2004-03-11
申请人： Hung-En Tai , Chien-Chung Chen , Haw-Jyue Luo , Sheng-Jen Wang
发明人： Hung-En Tai , Chien-Chung Chen , Haw-Jyue Luo , Sheng-Jen Wang
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , Y02P90/22
摘要： A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.
摘要翻译：一种半导体设备预警管理方法及相关系统。该方法包括记录每件设备的处理参数，每台设备处理时记录设备参数，评估和记录半导体产品的质量和相应的测试参数，分析相应工艺参数，相应设备参数之间的关系，以及每件设备的半导体产品的质量。

10. 发明申请

US20120185620A1 BUFFERING APPARATUS FOR BUFFERING MULTI-PARTITION VIDEO/IMAGE BITSTREAM AND RELATED METHOD THEREOF 有权
标题翻译：用于缓冲多分辨率视频/图像比特的缓冲设备及其相关方法
公开(公告)号：US20120185620A1
公开(公告)日：2012-07-19
申请号：US13304372
申请日：2011-11-24
申请人： Chia-Yun Cheng , Sheng-Jen Wang , Yun-Feng Tseng , Jun Cui
发明人： Chia-Yun Cheng , Sheng-Jen Wang , Yun-Feng Tseng , Jun Cui
IPC分类号： G06F13/14
CPC分类号： H04N19/129 , G06F5/10 , G06F13/385 , H04L49/90 , H04N19/174 , H04N19/176 , H04N19/423 , H04N19/436 , H04N19/44
摘要： An exemplary buffering apparatus for buffering a multi-partition video/image bitstream which transmits a plurality of compressed frames each having a plurality of partitions includes a first bitstream buffer and a second bitstream buffer. The first bitstream buffer is arranged to buffer data of a first partition of the partitions of a specific compressed frame. The second bitstream buffer is arranged to buffer data of a second partition of the partitions of the specific compressed frame.
摘要翻译：用于缓冲发送多个具有多个分区的多个压缩帧的多分区视频/图像比特流的示例性缓冲装置包括第一比特流缓冲器和第二比特流缓冲器。第一比特流缓冲器被布置为缓冲特定压缩帧的分区的第一分区的数据。第二比特流缓冲器被布置为缓冲特定压缩帧的分区的第二分区的数据。

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