专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07973646B2 Method and apparatus for inspecting radio frequency identification tags 有权
标题翻译：用于检查射频识别标签的方法和装置
公开(公告)号：US07973646B2
公开(公告)日：2011-07-05
申请号：US11944596
申请日：2007-11-23
申请人： Hui-Ta Chen , Guo-Shing Huang , Ching-Chih Lin , Chun-Hao Chang , Chuan-Sheng Zhuang , Ming-Hsien Ko , Chih-Hung Kao
发明人： Hui-Ta Chen , Guo-Shing Huang , Ching-Chih Lin , Chun-Hao Chang , Chuan-Sheng Zhuang , Ming-Hsien Ko , Chih-Hung Kao
IPC分类号： H04Q5/22
CPC分类号： G06K7/0008 , G01R31/2822 , G06K7/10079 , G06K7/10435
摘要： A method and an apparatus for inspecting radio frequency identification (RFID) tags which utilize a way of shielding for inspecting whether RFID tags function properly or not. The method of the present invention comprises steps of: reading a plurality of RFID tags in a readable zone; and determining whether there is any malfunctional RFID tag in the plurality of RFID tags. If all the plurality of RFID tags function properly, the method will check a next plurality of RFID tags. If there is at least one unreadable RFID tag, the at least one malfunctional RFID tag will be found by shielding one or the plurality of RFID tags. By means of the disclosure in the present invention, the present method and apparatus are capable of improving the efficiency during inspection and simplifying the design of a readable zone.
摘要翻译：一种用于检查射频识别（RFID）标签的方法和装置，其利用屏蔽方式来检查RFID标签是否正常工作。本发明的方法包括以下步骤：读取可读区域中的多个RFID标签; 以及确定所述多个RFID标签中是否存在任何故障的RFID标签。如果所有多个RFID标签正常工作，则该方法将检查下一个RFID标签。如果存在至少一个不可读RFID标签，则通过屏蔽一个或多个RFID标签来找到至少一个故障的RFID标签。通过本发明的公开内容，本发明的方法和装置能够提高检查期间的效率并简化可读区域的设计。

2. 发明申请

US20080174407A1 METHOD AND APPARATUS FOR INSPECTING RADIO FREQUENCY IDENTIFICATION TAGS 有权
标题翻译：检测无线电频率识别标签的方法和装置
公开(公告)号：US20080174407A1
公开(公告)日：2008-07-24
申请号：US11944596
申请日：2007-11-23
申请人： Hui-Ta Chen , Guo-Shing Huang , Ching-Chih Lin , Chun-Hao Chang , Chuan-Sheng Zhuang , Ming-Hsien Ko , Chih-Hung Kao
发明人： Hui-Ta Chen , Guo-Shing Huang , Ching-Chih Lin , Chun-Hao Chang , Chuan-Sheng Zhuang , Ming-Hsien Ko , Chih-Hung Kao
IPC分类号： H04Q5/22
CPC分类号： G06K7/0008 , G01R31/2822 , G06K7/10079 , G06K7/10435
摘要： A method and an apparatus for inspecting radio frequency identification (RFID) tags which utilize a way of shielding for inspecting whether RFID tags function properly or not. The method of the present invention comprises steps of: reading a plurality of RFID tags in a readable zone; and determining whether there is any malfunctional RFID tag in the plurality of RFID tags. If all the plurality of RFID tags function properly, the method will check a next plurality of RFID tags. If there is at least one unreadable RFID tag, the at least one malfunctional RFID tag will be found by shielding one or the plurality of RFID tags. By means of the disclosure in the present invention, the present method and apparatus are capable of improving the efficiency during inspection and simplifying the design of a readable zone.
摘要翻译：一种用于检查射频识别（RFID）标签的方法和装置，其利用屏蔽方式来检查RFID标签是否正常工作。本发明的方法包括以下步骤：读取可读区域中的多个RFID标签; 以及确定所述多个RFID标签中是否存在任何故障的RFID标签。如果所有多个RFID标签正常工作，则该方法将检查下一个RFID标签。如果存在至少一个不可读RFID标签，则通过屏蔽一个或多个RFID标签来找到至少一个故障的RFID标签。通过本发明的公开内容，本发明的方法和装置能够提高检查期间的效率并简化可读区域的设计。

3. 发明申请

US20100207729A1 METHOD AND SYSTEM FOR TESTING RFID TAGS 审中-公开
标题翻译：用于测试RFID标签的方法和系统
公开(公告)号：US20100207729A1
公开(公告)日：2010-08-19
申请号：US12575077
申请日：2009-10-07
申请人： Ming-Hsien Ko , Hui-Ta Chen , Chuan-Sheng Zhuang , Ching-Chih Lin , Chun-Hao Chang , Chih-Hung Kao
发明人： Ming-Hsien Ko , Hui-Ta Chen , Chuan-Sheng Zhuang , Ching-Chih Lin , Chun-Hao Chang , Chih-Hung Kao
IPC分类号： H04Q5/22 , B65G43/08
CPC分类号： G06K7/0008 , G06K7/10435 , H04Q2213/13003 , H04Q2213/13095
摘要： The present invention provides a method and a system for testing RFID tags, which utilizes a way of adjusting the distance between the RFID tags and interrogator or adjusting the power of the interrogator accompanied with a shielding procedure for testing and classifying the RFID tags. By means of the method and the system of the present invention, it is capable of judging the efficacy and good and bad of the RFID tags, while the interrogatable distance of the RFID tags is capable of being tested effectively.
摘要翻译：本发明提供一种用于测试RFID标签的方法和系统，其利用调整RFID标签和询问器之间的距离或调整询问器的功率的方式，伴随着用于测试和分类RFID标签的屏蔽程序。借助于本发明的方法和系统，能够对RFID标签的有效性和良好性能进行判断，能够有效地对RFID标签的可询问距离进行测试。

4. 发明申请

US20070148911A1 Wafer bonding method 有权
标题翻译：晶圆接合法
公开(公告)号：US20070148911A1
公开(公告)日：2007-06-28
申请号：US11432632
申请日：2006-05-12
申请人： Chun-Hao Chang , Shih-Chieh Liao , Guo-Shing Huang , Wei-Yu Chen , Chuan-Sheng Zhuang
发明人： Chun-Hao Chang , Shih-Chieh Liao , Guo-Shing Huang , Wei-Yu Chen , Chuan-Sheng Zhuang
IPC分类号： H01L21/30
CPC分类号： H01L21/187 , H01L33/0079
摘要： A wafer bonding method, comprising steps of: coating a medium layer respectively on the surfaces of two wafers; removing impurities formed on the surface of each medium layer; laminating the two wafers while enabling the surface coated with the medium layer of one of the two wafers to face the surface coated with the medium layer of another wafer; and applying an ultra-sonic oscillation and a bonding pressure upon the laminated wafers for bonding the two wafers.
摘要翻译：一种晶片接合方法，包括以下步骤：分别在两个晶片的表面上涂覆介质层; 去除形成在每个介质层表面上的杂质; 层压两个晶片同时使得涂覆有两个晶片之一的介质层的表面面对涂覆有另一晶片的介质层的表面; 以及在层叠的晶片上施加超声波振荡和接合压力以接合两个晶片。

5. 发明授权

US07371661B2 Wafer bonding method 有权
标题翻译：晶圆接合法
公开(公告)号：US07371661B2
公开(公告)日：2008-05-13
申请号：US11432632
申请日：2006-05-12
申请人： Chun-Hao Chang , Shih-Chieh Liao , Guo-Shing Huang , Wei-Yu Chen , Chuan-Sheng Zhuang
发明人： Chun-Hao Chang , Shih-Chieh Liao , Guo-Shing Huang , Wei-Yu Chen , Chuan-Sheng Zhuang
IPC分类号： H01L21/30
CPC分类号： H01L21/187 , H01L33/0079
摘要： A wafer bonding method, comprising steps of: coating a medium layer respectively on the surfaces of two wafers; removing impurities formed on the surface of each medium layer; laminating the two wafers while enabling the surface coated with the medium layer of one of the two wafers to face the surface coated with the medium layer of another wafer; and applying an ultra-sonic oscillation and a bonding pressure upon the laminated wafers for bonding the two wafers.
摘要翻译：一种晶片接合方法，包括以下步骤：分别在两个晶片的表面上涂覆介质层; 去除形成在每个介质层表面上的杂质; 层压两个晶片同时使得涂覆有两个晶片之一的介质层的表面面对涂覆有另一晶片的介质层的表面; 以及在层叠的晶片上施加超声波振荡和接合压力以接合两个晶片。

6. 发明授权

US08604696B2 Plasma excitation module 有权
标题翻译：等离子激发模块
公开(公告)号：US08604696B2
公开(公告)日：2013-12-10
申请号：US12456438
申请日：2009-06-16
申请人： Tung-Ying Lin , Ming-Hsien Ko , Hui-Ta Chen , Chun-Hao Chang
发明人： Tung-Ying Lin , Ming-Hsien Ko , Hui-Ta Chen , Chun-Hao Chang
IPC分类号： H01J7/24
CPC分类号： H05H1/46 , H01J37/321 , H01J2237/3325
摘要： A plasma excitation module including a chamber, a plurality of coils and a multi-duct gas intake system is provided. The chamber has a dielectric layer. The coils are disposed at an outer side of the dielectric layer, and the coils are separated from each other by an interval and in parallel connection. The multi-duct gas intake system surrounds the dielectric layer and is communicated with the chamber.
摘要翻译：提供了包括室，多个线圈和多管道气体进气系统的等离子体激励模块。该腔室具有介电层。线圈设置在电介质层的外侧，并且线圈以间隔和并联的方式彼此分离。多管道气体进气系统围绕电介质层并与腔室连通。

7. 发明申请

US20120145325A1 PLASMA APPARATUS 审中-公开
标题翻译：等离子体设备
公开(公告)号：US20120145325A1
公开(公告)日：2012-06-14
申请号：US13044570
申请日：2011-03-10
申请人： Hui-Ta Chen , Chun-Hao Chang , Tung-Ying Lin , Ming-Hsien Ko
发明人： Hui-Ta Chen , Chun-Hao Chang , Tung-Ying Lin , Ming-Hsien Ko
IPC分类号： C23F1/08 , H05H1/24
CPC分类号： H01J37/32532 , H01J37/32449
摘要： A plasma apparatus including a chamber, an electrode set and a gas supplying tube set is provided. The chamber has a supporting table for supporting a substrate. The gas supplying tube set is disposed in the chamber and has a plurality of gas apertures. The gas supplying tube set is located between the supporting table and the electrode set.
摘要翻译：提供了包括室，电极组和供气管组的等离子体装置。该腔室具有用于支撑衬底的支撑台。气体供给管组设置在室中并具有多个气体孔。供气管组位于支撑台和电极组之间。

8. 发明申请

US20100156300A1 Plasma excitation module 有权
标题翻译：等离子激发模块
公开(公告)号：US20100156300A1
公开(公告)日：2010-06-24
申请号：US12456438
申请日：2009-06-16
申请人： Tung-Ying Lin , Ming-Hsien Ko , Hui-Ta Chen , Chun-Hao Chang
发明人： Tung-Ying Lin , Ming-Hsien Ko , Hui-Ta Chen , Chun-Hao Chang
IPC分类号： H05H1/24
CPC分类号： H05H1/46 , H01J37/321 , H01J2237/3325
摘要： A plasma excitation module including a chamber, a plurality of coils and a multi-duct gas intake system is provided. The chamber has a dielectric layer. The coils are disposed at an outer side of the dielectric layer, and the coils are separated from each other by an interval and in parallel connection. The multi-duct gas intake system surrounds the dielectric layer and is communicated with the chamber.
摘要翻译：提供了包括室，多个线圈和多管道气体进气系统的等离子体激励模块。该腔室具有介电层。线圈设置在电介质层的外侧，并且线圈以间隔和并联的方式彼此分离。多管道气体进气系统围绕电介质层并与腔室连通。

9. 发明申请

US20110151121A1 CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR FORMING PARYLENE FILM 有权
标题翻译：化学蒸气沉积装置和形成片状薄膜的方法
公开(公告)号：US20110151121A1
公开(公告)日：2011-06-23
申请号：US12876226
申请日：2010-09-06
申请人： Chun-Hao Chang , Chuan-Sheng Zhuang
发明人： Chun-Hao Chang , Chuan-Sheng Zhuang
IPC分类号： C23C16/44 , C23C16/448 , C23C16/00
CPC分类号： C23C16/54 , B05D1/60 , C23C16/4485 , C23C16/452 , C23C16/45561
摘要： A chemical vapor deposition apparatus and a method for forming a parylene film are provided. The chemical vapor deposition apparatus includes a buffer chamber, a deposition chamber, a pyrolysis chamber and an evaporator. The buffer chamber has a first valve and a second valve. The evaporator is connected with the second valve. The pyrolysis chamber is connected with the evaporator through a first pipe, wherein the first pipe has a third valve. The deposition chamber is connected with the pyrolysis chamber.
摘要翻译：提供化学气相沉积设备和形成聚对二甲苯膜的方法。化学气相沉积装置包括缓冲室，沉积室，热解室和蒸发器。缓冲室具有第一阀和第二阀。蒸发器与第二阀连接。热解室通过第一管与蒸发器连接，其中第一管具有第三阀。沉积室与热解室连接。

10. 发明授权

US08889224B2 Method of forming parylene film 有权
标题翻译：形成聚对二甲苯膜的方法
公开(公告)号：US08889224B2
公开(公告)日：2014-11-18
申请号：US12876226
申请日：2010-09-06
申请人： Chun-Hao Chang , Chuan-Sheng Zhuang
发明人： Chun-Hao Chang , Chuan-Sheng Zhuang
IPC分类号： C23C16/26 , C23C16/44 , C23C16/452 , B05D1/00
CPC分类号： C23C16/54 , B05D1/60 , C23C16/4485 , C23C16/452 , C23C16/45561
摘要： A method for forming a parylene film is provided, which includes following steps. Providing a chemical vapor deposition apparatus including a buffer chamber having first and second valves and a rotative carrying apparatus, an evaporator connected with the second valve, a pyrolysis chamber connected with the evaporator, and a deposition chamber connected with the pyrolysis chamber. Placing a parylene material in the rotative carrying apparatus of the buffer chamber through the first valve. Turning off the first and second valves and balancing a pressure in the buffer chamber and a pressure in the evaporator. Turning on the second valve and delivering the parylene material into the evaporator. Evaporating the parylene material in the evaporator to form a parylene gas. Pyrolyzing the parylene gas in the pyrolysis chamber to form a parylene monomer. Delivering the parylene monomer to the deposition chamber for deposition so as to form a parylene film.
摘要翻译：提供了形成聚对二甲苯膜的方法，其包括以下步骤。提供一种化学气相沉积设备，包括具有第一和第二阀的缓冲室和旋转运载装置，与第二阀连接的蒸发器，与蒸发器连接的热解室以及与热解室连接的沉积室。通过第一阀将缓冲室的旋转输送装置中的聚对二甲苯材料放置。关闭第一和第二阀并平衡缓冲室中的压力和蒸发器中的压力。打开第二个阀门并将聚对二甲苯材料输送到蒸发器中。在蒸发器中蒸发聚对二甲苯材料以形成对二甲苯气体。在热解室中热解聚对二甲苯以形成聚对二甲苯单体。将聚对二甲苯单体输送到沉积室以进行沉积以形成聚对二甲苯膜。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式