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    • 1. 发明授权
    • Transport device, in particular for transporting sheet-like substrates through a coating installation
    • 运输装置,特别是用于通过涂布装置输送片状基材
    • US08277890B2
    • 2012-10-02
    • US11918009
    • 2006-04-07
    • Hubertus Von Der WaydbrinkGeorg LaimerSiegfried ScheibeRicky C. PowellJames Ernest HinkleJames B. Foote
    • Hubertus Von Der WaydbrinkGeorg LaimerSiegfried ScheibeRicky C. PowellJames Ernest HinkleJames B. Foote
    • C23C16/00B05C13/00
    • H01L21/67706C23C14/56C23C16/54H01L21/6776
    • The transporting device according to the invention, in particular for transporting sheet-like substrates through a coating installation, comprises transporting rollers which are rotatably mounted on both sides and horizontally arranged transversely in relation to the transporting direction, the uppermost surface lines of the transporting rollers defining the transporting plane, and is characterized in that the end parts of the transporting rollers have a smaller diameter than the middle part of the transporting rollers and in that baffles which are mounted displaceably in the axial direction of the transporting rollers between a first position and a second position are arranged between the end parts of the transporting rollers and the transporting plane. The fact that the baffles are mounted in an axially displaceable manner has the effect of considerably extending the cleaning intervals of the transporting device. At first the baffles are arranged in a first position, in which the end of the baffle lies underneath the substrate and, in the horizontal direction, as close as possible to the middle of the transporting roller Vapor-depositing material that gets beyond the edge of the substrate hits the baffle. During operation of the transporting device, the baffles are continuously displaced from the middle part to the ends of the transporting rollers. As a result, the increase in thickness of the layer produced on the baffles is limited, since the vapor keeps hitting new portions of the baffle.
    • 根据本发明的传送装置,特别是用于通过涂布装置传送片状基片的传送装置包括:输送辊,其可旋转地安装在两侧并相对于输送方向横向布置,输送辊的最上表面线 限定输送平面,其特征在于,输送辊的端部具有比输送辊的中间部分更小的直径,并且其中挡板在输送辊的轴向方向上可移动地位于第一位置和 在输送辊的端部和输送平面之间设置有第二位置。 挡板以可轴向移位的方式安装的事实具有显着延长输送装置的清洁间隔的效果。 首先,挡板被布置在第一位置,其中挡板的端部位于基板的下方,并且在水平方向上尽可能靠近输送辊的中部。气相沉积材料超出边缘的边缘 衬底撞击挡板。 在输送装置的运行过程中,挡板从传送辊的中间部分到端部连续地移位。 结果,在挡板上产生的层的厚度的增加是有限的,因为蒸汽持续击打挡板的新部分。
    • 4. 发明申请
    • Transport Device, In Particular for Transporting Sheet-Like Substrates Through a Coating Installation
    • 运输装置,特别是通过涂层安装运输片状基板
    • US20090214784A1
    • 2009-08-27
    • US11918009
    • 2006-04-07
    • Hubertus Von Der WaydbrinkGeorg LaimerSiegfried ScheibeRicky C. PowellJames Ernest HinkleJames B. Foote
    • Hubertus Von Der WaydbrinkGeorg LaimerSiegfried ScheibeRicky C. PowellJames Ernest HinkleJames B. Foote
    • B05D1/00B05C13/00
    • H01L21/67706C23C14/56C23C16/54H01L21/6776
    • The transporting device according to the invention, in particular for transporting sheet-like substrates through a coating installation, comprises transporting rollers which are rotatably mounted on both sides and horizontally arranged transversely in relation to the transporting direction, the uppermost surface lines of the transporting rollers defining the transporting plane, and is characterized in that the end parts of the transporting rollers have a smaller diameter than the middle part of the transporting rollers and in that baffles which are mounted displaceably in the axial direction of the transporting rollers between a first position and a second position are arranged between the end parts of the transporting rollers and the transporting plane. The fact that the baffles are mounted in an axially displaceable manner has the effect of considerably extending the cleaning intervals of the transporting device. At first the baffles are arranged in a first position, in which the end of the baffle lies underneath the substrate and, in the horizontal direction, as close as possible to the middle of the transporting roller Vapour-depositing material that gets beyond the edge of the substrate hits the baffle. During operation of the transporting device, the baffles are continuously displaced from the middle part to the ends of the transporting rollers. As a result, the increase in thickness of the layer produced on the baffles is limited, since the vapour keeps hitting new portions of the baffle.
    • 根据本发明的传送装置,特别是用于通过涂布装置传送片状基片的传送装置包括:输送辊,其可旋转地安装在两侧并相对于输送方向横向布置,输送辊的最上表面线 限定输送平面,其特征在于,输送辊的端部具有比输送辊的中间部分更小的直径,并且其中挡板在输送辊的轴向方向上可移动地位于第一位置和 在输送辊的端部和输送平面之间设置有第二位置。 挡板以可轴向移位的方式安装的事实具有显着延长输送装置的清洁间隔的效果。 首先,挡板被布置在第一位置,其中挡板的端部位于基板的下方,并且在水平方向上尽可能靠近输送辊的中部。气相沉积材料超出边缘的边缘 衬底撞击挡板。 在输送装置的运行过程中,挡板从传送辊的中间部分到端部连续地移位。 结果,在挡板上产生的层的厚度的增加是有限的,因为蒸汽持续击打挡板的新部分。
    • 5. 发明授权
    • Process for making photovoltaic devices and resultant product
    • 制造光伏器件和产品的工艺
    • US5248349A
    • 1993-09-28
    • US881683
    • 1992-05-12
    • James B. FooteSteven A. F. KaakePeter V. MeyersJames F. Nolan
    • James B. FooteSteven A. F. KaakePeter V. MeyersJames F. Nolan
    • H01L31/04H01L31/073H01L31/18
    • H01L31/1836B23K26/364B23K26/40B23K2203/172Y02E10/543Y02P70/521Y10S438/907
    • A process and apparatus (70) for making a large area photovoltaic device (22) that is capable of generating low cost electrical power. The apparatus (70) for performing the process includes an enclosure (126) providing a controlled environment in which an oven (156) is located. At least one and preferably a plurality of deposition stations (74,76,78) provide heated vapors of semiconductor material within the oven (156) for continuous elevated temperature deposition of semiconductor material on a sheet substrate (24) including a glass sheet (26) conveyed within the oven. The sheet substrate (24) is conveyed on a roller conveyor (184) within the oven (156) and the semiconductor material whose main layer (82) is cadmium telluride is deposited on an upwardly facing surface (28) of the substrate by each deposition station from a location within the oven above the roller conveyor. A cooling station (86) rapidly cools the substrate (24) after deposition of the semiconductor material thereon to strengthen the glass sheet of the substrate.
    • 一种用于制造能够产生低成本电力的大面积光伏器件(22)的工艺和设备(70)。 用于执行该过程的设备(70)包括提供烘箱(156)所在的受控环境的外壳(126)。 至少一个并且优选多个沉积站(74,76,78)在烘箱(156)内提供加热的半导体材料的蒸气,用于将半导体材料连续升高温度沉积在包括玻璃板(26)的薄板基材(24)上 )在烤箱内传送。 片材基板(24)在烘箱(156)内的辊式输送机(184)上输送,并且其主层(82)是碲化镉的半导体材料通过每次沉积沉积在基板的面向上的表面(28)上 车站位于烘箱上方位于滚筒输送机上方。 冷却站(86)在沉积半导体材料之后快速冷却基板(24),以加强基板的玻璃板。
    • 7. 发明授权
    • Process for making photovoltaic devices and resultant product
    • 制造光伏器件和产品的工艺
    • US5470397A
    • 1995-11-28
    • US300406
    • 1994-09-02
    • James B. FooteSteven A. F. KaakePeter V. MeyersJames F. Nolan
    • James B. FooteSteven A. F. KaakePeter V. MeyersJames F. Nolan
    • H01L31/04H01L31/073H01L31/18H01L31/06H01L31/072H01L31/078
    • H01L31/1836B23K26/364B23K26/40B23K2203/172Y02E10/543Y02P70/521Y10S438/907
    • A process and apparatus (70) for making a large area photovoltaic device (22) that is capable of generating low cost electrical power. The apparatus (70) for performing the process includes an enclosure (126) providing a controlled environment in which an oven (156) is located. At least one and preferably a plurality of deposition stations (74,76,78) provide heated vapors of semiconductor material within the oven (156) for continuous elevated temperature deposition of semiconductor material on a sheet substrate (24) including a glass sheet (26) conveyed within the oven. The sheet substrate (24) is conveyed on a roller conveyor (184) within the oven (156) and the semiconductor material whose main layer (82) is cadmium telluride is deposited on an upwardly facing surface (28) of the substrate by each deposition station from a location within the oven above the roller conveyor. A cooling station (86) rapidly cools the substrate (24) after deposition of the semiconductor material thereon to strengthen the glass sheet of the substrate.
    • 一种用于制造能够产生低成本电力的大面积光伏器件(22)的工艺和设备(70)。 用于执行该过程的设备(70)包括提供烘箱(156)所在的受控环境的外壳(126)。 至少一个并且优选多个沉积站(74,76,78)在烘箱(156)内提供加热的半导体材料的蒸气,用于将半导体材料连续升高温度沉积在包括玻璃板(26)的薄板基材(24)上 )在烤箱内传送。 片材基板(24)在烘箱(156)内的辊式输送机(184)上输送,并且其主层(82)是碲化镉的半导体材料通过每次沉积沉积在基板的面向上的表面(28)上 车站位于烘箱上方位于滚筒输送机上方。 冷却站(86)在沉积半导体材料之后快速冷却基板(24),以加强基板的玻璃板。