会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Particle beam system
    • 粒子束系统
    • US08368019B2
    • 2013-02-05
    • US13247979
    • 2011-09-28
    • Hubert MantzRainer ArnoldMichael Albiez
    • Hubert MantzRainer ArnoldMichael Albiez
    • H01J37/26H01J37/244H01J37/10
    • H01J37/28H01J37/05H01J37/222H01J37/244H01J37/256
    • A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.
    • 粒子束系统包括用于产生一次粒子束13的粒子束源5,用于将一次粒子束13聚焦在物平面23中的物镜19; 粒子检测器17; 以及布置在物镜和物平面之间的X射线检测器47。 X射线检测器包括多个半导体检测器,每个半导体检测器具有朝向物体平面的检测表面51。 膜位于物体平面和半导体检测器的检测表面之间,其中不同的半导体检测器具有位于前面的不同的膜,不同的膜相对于二次电子透射率不同。
    • 5. 发明申请
    • Particle Beam System
    • 粒子束系统
    • US20120025077A1
    • 2012-02-02
    • US13247979
    • 2011-09-28
    • Hubert MantzRainer ArnoldMichael Albiez
    • Hubert MantzRainer ArnoldMichael Albiez
    • H01J37/26
    • H01J37/28H01J37/05H01J37/222H01J37/244H01J37/256
    • A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.
    • 粒子束系统包括用于产生一次粒子束13的粒子束源5,用于将一次粒子束13聚焦在物平面23中的物镜19; 粒子检测器17; 以及布置在物镜和物平面之间的X射线检测器47。 X射线检测器包括多个半导体检测器,每个半导体检测器具有朝向物体平面的检测表面51。 膜位于物体平面和半导体检测器的检测表面之间,其中不同的半导体检测器具有位于前面的不同的膜,不同的膜相对于二次电子透射率不同。
    • 8. 发明授权
    • Particle beam microscope and method for operating the particle beam microscope
    • 粒子束显微镜及其操作方法
    • US08487252B2
    • 2013-07-16
    • US13249006
    • 2011-09-29
    • Simon DiemerHubert MantzJaroslaw Paluszynski
    • Simon DiemerHubert MantzJaroslaw Paluszynski
    • H01J37/26H01J37/10G01N23/00
    • H01J37/222H01J37/226H01J37/28
    • A method for operating a particle beam microscope comprising detecting light rays or particles which emanate from a structure, wherein the structure comprises at least one of: at least a portion of a surface of an object and at least a portion of a surface of an object holder of the particle beam microscope; generating a surface model of the structure depending on the at least one of the detected light rays and the particles; determining a position and an orientation of the surface model of the structure relative to the object region; determining a measurement location relative to the surface model of the structure; and positioning the object depending on the generated surface model of the structure, depending on the determined position and orientation of the surface model of the structure, and depending on the determined measurement location.
    • 一种用于操作粒子束显微镜的方法,包括检测从结构发出的光线或颗粒,其中所述结构包括以下至少一个:物体的表面的至少一部分和物体的表面的至少一部分 粒子束显微镜的夹持器; 根据检测到的光线和颗粒中的至少一个产生结构的表面模型; 确定所述结构的表面模型相对于所述对象区域的位置和取向; 确定相对于所述结构的表面模型的测量位置; 并且取决于结构的表面模型的确定的位置和取向,并且取决于所确定的测量位置,根据所生成的结构的表面模型来定位对象。
    • 9. 发明授权
    • Method of operating a scanning electron microscope
    • 扫描电子显微镜的操作方法
    • US08227752B1
    • 2012-07-24
    • US13029998
    • 2011-02-17
    • Hubert MantzJaroslaw Paluszynski
    • Hubert MantzJaroslaw Paluszynski
    • H01J37/28H01J37/256
    • H01J37/28H01J2237/226H01J2237/2611
    • A method of inspecting an object using a scanning particle beam microscope, the method comprising: operating the microscope in a high-resolution mode by laterally scanning a particle beam of the high-resolution mode; operating the microscope in a 3D-mode for acquiring a three-dimensional representation of the object by laterally scanning a particle beam of the 3D-mode; wherein the particle beam of the high-resolution mode and the particle beam of the 3D-mode have a same beam energy and a same focus distance; and wherein an aperture angle of the particle beam of the 3D-mode is at least 2 times greater, or at least 5 times greater, or at least 10 times greater, or at least 100 times greater than an aperture angle of the particle beam of the high-resolution mode.
    • 一种使用扫描粒子束显微镜检查物体的方法,所述方法包括:通过横向扫描高分辨率模式的粒子束以高分辨率模式操作显微镜; 以3D模式操作显微镜,用于通过横向扫描3D模式的粒子束来获取对象的三维表示; 其中高分辨率模式的粒子束和3D模式的粒子束具有相同的光束能量和相同的焦距; 并且其中所述3D模式的所述粒子束的孔径角比所述三维模式的所述粒子束的孔径角大至少为所述三维模式的所述粒子束的孔径角的2倍,或至少大于或等于5倍,或者至少大于10倍, 高分辨率模式。