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    • 2. 发明申请
    • LIGHT-EMITTING DEVICE
    • 发光装置
    • US20110101404A1
    • 2011-05-05
    • US13005075
    • 2011-01-12
    • Huang Chien FuShih-I ChenYi Ming ChenTzu Chieh HsuJhih-Sian Wang
    • Huang Chien FuShih-I ChenYi Ming ChenTzu Chieh HsuJhih-Sian Wang
    • H01L33/10H01L33/00
    • H01L33/22H01L33/0079H01L33/38H01L33/405H01L33/42
    • This disclosure discloses a light-emitting device. The light-emitting device comprises: a substrate; and a first light-emitting unit comprising a plurality of light-emitting diodes electrically connected to each other on the substrate. A first light-emitting diode in the first light-emitting unit comprises a first semiconductor layer with a first conductivity-type, a second semiconductor layer with a second conductivity-type, and a light-emitting stack formed between the first and second semiconductor layers. The first light-emitting diode in the first light-emitting unit further comprises a first connecting layer on the first semiconductor layer for electrically connecting to a second light-emitting diode in the first light-emitting unit; a second connecting layer, separated from the first connecting layer, formed on the first semiconductor layer; and a third connecting layer on the second semiconductor layer for electrically connecting to a third light-emitting diode in the first light-emitting unit.
    • 本公开公开了一种发光装置。 发光装置包括:基板; 以及包括在所述基板上彼此电连接的多个发光二极管的第一发光单元。 第一发光单元中的第一发光二极管包括具有第一导电类型的第一半导体层,具有第二导电类型的第二半导体层和形成在第一和第二半导体层之间的发光叠层 。 第一发光单元中的第一发光二极管还包括在第一半导体层上的第一连接层,用于电连接到第一发光单元中的第二发光二极管; 与所述第一连接层分离的形成在所述第一半导体层上的第二连接层; 以及在第二半导体层上的第三连接层,用于电连接到第一发光单元中的第三发光二极管。
    • 4. 发明申请
    • OPTOELECTRONIC DEVICE AND THE MANUFACTURING METHOD THEREOF
    • 光电器件及其制造方法
    • US20120256164A1
    • 2012-10-11
    • US13528059
    • 2012-06-20
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • H01L33/06
    • H01L33/46H01L33/22H01L33/42H01L33/44
    • An optoelectronic device has a substrate and a first window layer on the substrate with a first sheet resistance, a first thickness, and a first impurity concentration. A second window layer has a second sheet resistance, a second thickness, and a second impurity concentration. A semiconductor system is between the first window layer and the second window layer. The second window layer has a semiconductor material different from the semiconductor system, and the second sheet resistance is greater than the first sheet resistance. A method for manufacturing is provided, having the steps of providing a substrate, forming a semiconductor system on the substrate, and forming a window layer on the semiconductor system. The window layer has a semiconductor material different from the semiconductor system. Selectively removing the window layer forms a width difference greater than 1 micron between the window layer and semiconductor system.
    • 光电器件具有衬底和衬底上的第一窗口层,具有第一薄层电阻,第一厚度和第一杂质浓度。 第二窗口层具有第二薄层电阻,第二厚度和第二杂质浓度。 半导体系统在第一窗口层和第二窗口层之间。 第二窗口层具有与半导体系统不同的半导体材料,第二薄层电阻大于第一薄层电阻。 提供一种制造方法,其具有以下步骤:提供衬底,在衬底上形成半导体系统,并在半导体系统上形成窗口层。 窗口层具有与半导体系统不同的半导体材料。 选择性地去除窗口层在窗口层和半导体系统之间形成大于1微米的宽度差。
    • 5. 发明授权
    • Optoelectronic device and the manufacturing method thereof
    • 光电子器件及其制造方法
    • US08207550B2
    • 2012-06-26
    • US13021307
    • 2011-02-04
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • H01L33/58H01L33/60
    • H01L33/46H01L33/22H01L33/42H01L33/44
    • One aspect of the present disclosure provides an optoelectronic device comprising a substrate; a first window layer on the substrate, having a first sheet resistance, a first thickness, and a first impurity concentration; a second window layer having a second sheet resistance, a second thickness, and a second impurity concentration; and a semiconductor system between the first window layer and the second window layer; wherein the second window layer comprises a semiconductor material different from the semiconductor system, and the second sheet resistance is greater than the first sheet resistance.One aspect of the present disclosure provides a method for manufacturing an optoelectronic device in accordance with the present disclosure. The method comprises the steps of providing a substrate; forming a semiconductor system on the substrate; forming a window layer on the semiconductor system, wherein the window layer comprises a semiconductor material different from the semiconductor system; selectively removing the window layer thereby forming a width difference between the window layer and the semiconductor system, and the width difference is greater than 1 micron.
    • 本公开的一个方面提供了一种包括衬底的光电器件; 在所述基板上的第一窗口层,具有第一薄层电阻,第一厚度和第一杂质浓度; 具有第二薄层电阻,第二厚度和第二杂质浓度的第二窗口层; 以及在所述第一窗口层和所述第二窗口层之间的半导体系统; 其中所述第二窗口层包括不同于所述半导体系统的半导体材料,并且所述第二薄层电阻大于所述第一薄层电阻。 本公开的一个方面提供了根据本公开的用于制造光电子器件的方法。 该方法包括提供基板的步骤; 在所述基板上形成半导体系统; 在所述半导体系统上形成窗口层,其中所述窗口层包括不同于所述半导体系统的半导体材料; 选择性地去除窗口层,从而形成窗口层和半导体系统之间的宽度差,并且宽度差异大于1微米。
    • 8. 发明授权
    • Optoelectronic device and the manufacturing method thereof
    • 光电子器件及其制造方法
    • US08474233B2
    • 2013-07-02
    • US13528059
    • 2012-06-20
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • H01L33/06
    • H01L33/46H01L33/22H01L33/42H01L33/44
    • An optoelectronic device has a substrate and a first window layer on the substrate with a first sheet resistance, a first thickness, and a first impurity concentration. A second window layer has a second sheet resistance, a second thickness, and a second impurity concentration. A semiconductor system is between the first window layer and the second window layer. The second window layer has a semiconductor material different from the semiconductor system, and the second sheet resistance is greater than the first sheet resistance. A method for manufacturing is provided, having the steps of providing a substrate, forming a semiconductor system on the substrate, and forming a window layer on the semiconductor system. The window layer has a semiconductor material different from the semiconductor system. Selectively removing the window layer forms a width difference greater than 1 micron between the window layer and semiconductor system.
    • 光电器件具有衬底和衬底上的第一窗口层,具有第一薄层电阻,第一厚度和第一杂质浓度。 第二窗口层具有第二薄层电阻,第二厚度和第二杂质浓度。 半导体系统在第一窗口层和第二窗口层之间。 第二窗口层具有与半导体系统不同的半导体材料,第二薄层电阻大于第一薄层电阻。 提供一种制造方法,其具有以下步骤:提供衬底,在衬底上形成半导体系统,并在半导体系统上形成窗口层。 窗口层具有与半导体系统不同的半导体材料。 选择性地去除窗口层在窗口层和半导体系统之间形成大于1微米的宽度差。