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    • 7. 发明授权
    • Optoelectronic device and the manufacturing method thereof
    • 光电子器件及其制造方法
    • US08207550B2
    • 2012-06-26
    • US13021307
    • 2011-02-04
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • H01L33/58H01L33/60
    • H01L33/46H01L33/22H01L33/42H01L33/44
    • One aspect of the present disclosure provides an optoelectronic device comprising a substrate; a first window layer on the substrate, having a first sheet resistance, a first thickness, and a first impurity concentration; a second window layer having a second sheet resistance, a second thickness, and a second impurity concentration; and a semiconductor system between the first window layer and the second window layer; wherein the second window layer comprises a semiconductor material different from the semiconductor system, and the second sheet resistance is greater than the first sheet resistance.One aspect of the present disclosure provides a method for manufacturing an optoelectronic device in accordance with the present disclosure. The method comprises the steps of providing a substrate; forming a semiconductor system on the substrate; forming a window layer on the semiconductor system, wherein the window layer comprises a semiconductor material different from the semiconductor system; selectively removing the window layer thereby forming a width difference between the window layer and the semiconductor system, and the width difference is greater than 1 micron.
    • 本公开的一个方面提供了一种包括衬底的光电器件; 在所述基板上的第一窗口层,具有第一薄层电阻,第一厚度和第一杂质浓度; 具有第二薄层电阻,第二厚度和第二杂质浓度的第二窗口层; 以及在所述第一窗口层和所述第二窗口层之间的半导体系统; 其中所述第二窗口层包括不同于所述半导体系统的半导体材料,并且所述第二薄层电阻大于所述第一薄层电阻。 本公开的一个方面提供了根据本公开的用于制造光电子器件的方法。 该方法包括提供基板的步骤; 在所述基板上形成半导体系统; 在所述半导体系统上形成窗口层,其中所述窗口层包括不同于所述半导体系统的半导体材料; 选择性地去除窗口层,从而形成窗口层和半导体系统之间的宽度差,并且宽度差异大于1微米。
    • 8. 发明申请
    • OPTOELECTRONIC DEVICE AND THE MANUFACTURING METHOD THEREOF
    • 光电器件及其制造方法
    • US20120256164A1
    • 2012-10-11
    • US13528059
    • 2012-06-20
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • H01L33/06
    • H01L33/46H01L33/22H01L33/42H01L33/44
    • An optoelectronic device has a substrate and a first window layer on the substrate with a first sheet resistance, a first thickness, and a first impurity concentration. A second window layer has a second sheet resistance, a second thickness, and a second impurity concentration. A semiconductor system is between the first window layer and the second window layer. The second window layer has a semiconductor material different from the semiconductor system, and the second sheet resistance is greater than the first sheet resistance. A method for manufacturing is provided, having the steps of providing a substrate, forming a semiconductor system on the substrate, and forming a window layer on the semiconductor system. The window layer has a semiconductor material different from the semiconductor system. Selectively removing the window layer forms a width difference greater than 1 micron between the window layer and semiconductor system.
    • 光电器件具有衬底和衬底上的第一窗口层,具有第一薄层电阻,第一厚度和第一杂质浓度。 第二窗口层具有第二薄层电阻,第二厚度和第二杂质浓度。 半导体系统在第一窗口层和第二窗口层之间。 第二窗口层具有与半导体系统不同的半导体材料,第二薄层电阻大于第一薄层电阻。 提供一种制造方法,其具有以下步骤:提供衬底,在衬底上形成半导体系统,并在半导体系统上形成窗口层。 窗口层具有与半导体系统不同的半导体材料。 选择性地去除窗口层在窗口层和半导体系统之间形成大于1微米的宽度差。
    • 9. 发明授权
    • Optoelectronic device and the manufacturing method thereof
    • 光电子器件及其制造方法
    • US08474233B2
    • 2013-07-02
    • US13528059
    • 2012-06-20
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • Shih-I ChenChia-Liang HsuTzu-Chieh HsuChun-Yi WuChien-Fu Huang
    • H01L33/06
    • H01L33/46H01L33/22H01L33/42H01L33/44
    • An optoelectronic device has a substrate and a first window layer on the substrate with a first sheet resistance, a first thickness, and a first impurity concentration. A second window layer has a second sheet resistance, a second thickness, and a second impurity concentration. A semiconductor system is between the first window layer and the second window layer. The second window layer has a semiconductor material different from the semiconductor system, and the second sheet resistance is greater than the first sheet resistance. A method for manufacturing is provided, having the steps of providing a substrate, forming a semiconductor system on the substrate, and forming a window layer on the semiconductor system. The window layer has a semiconductor material different from the semiconductor system. Selectively removing the window layer forms a width difference greater than 1 micron between the window layer and semiconductor system.
    • 光电器件具有衬底和衬底上的第一窗口层,具有第一薄层电阻,第一厚度和第一杂质浓度。 第二窗口层具有第二薄层电阻,第二厚度和第二杂质浓度。 半导体系统在第一窗口层和第二窗口层之间。 第二窗口层具有与半导体系统不同的半导体材料,第二薄层电阻大于第一薄层电阻。 提供一种制造方法,其具有以下步骤:提供衬底,在衬底上形成半导体系统,并在半导体系统上形成窗口层。 窗口层具有与半导体系统不同的半导体材料。 选择性地去除窗口层在窗口层和半导体系统之间形成大于1微米的宽度差。