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1. 发明申请

US20050145119A1 Apparatus for fluid pressure imprint lithography 有权
标题翻译：液体压印光刻设备
公开(公告)号：US20050145119A1
公开(公告)日：2005-07-07
申请号：US10926376
申请日：2004-08-25
申请人： Hua Tan , Linshu Kong , Mingtao Li , Stephen Chou
发明人： Hua Tan , Linshu Kong , Mingtao Li , Stephen Chou
IPC分类号： B31F1/07
CPC分类号： G03F7/0002 , B82Y10/00 , Y10S438/945
摘要： Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by sealing the mold against the film and disposing the resulting assembly in a pressurized chamber. The result of this fluid pressing is enhanced resolution and high uniformity over an enlarged area.
摘要翻译：用于压印光刻的改进的设备涉及使用直接流体压力将模具压入基板支撑的膜中。有利地，模具和/或基底具有足够的柔性以在流体压力下提供广泛的面积接触。流体压制可以通过将模具密封在膜上并将所得的组件设置在加压室中来实现。这种流体压制的结果是在扩大的区域上增强了分辨率和高均匀性。

2. 发明授权

US07322287B2 Apparatus for fluid pressure imprint lithography 有权
标题翻译：液体压印光刻设备
公开(公告)号：US07322287B2
公开(公告)日：2008-01-29
申请号：US10926376
申请日：2004-08-25
申请人： Hua Tan , Linshu Kong , Mingtao Li , Stephen Y. Chou
发明人： Hua Tan , Linshu Kong , Mingtao Li , Stephen Y. Chou
IPC分类号： H01L21/302
CPC分类号： G03F7/0002 , B82Y10/00 , Y10S438/945
摘要： Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by sealing the mold against the film and disposing the resulting assembly in a pressurized chamber. The result of this fluid pressing is enhanced resolution and high uniformity over an enlarged area.
摘要翻译：用于压印光刻的改进的设备涉及使用直接流体压力将模具压入基板支撑的膜中。有利地，模具和/或基底具有足够的柔性以在流体压力下提供广泛的面积接触。流体压制可以通过将模具密封在膜上并将所得的组件设置在加压室中来实现。这种流体压制的结果是在扩大的区域上增强了分辨率和高均匀性。

3. 发明申请

US20050146078A1 Apparatus for double-sided imprint lithography 有权
标题翻译：双面压印光刻设备
公开(公告)号：US20050146078A1
公开(公告)日：2005-07-07
申请号：US10918564
申请日：2004-08-13
申请人： Stephen Chou , Linshu Kong , Colby Steere , Mingtao (Gary) Li , Hua Tan , Lin Hu
发明人： Stephen Chou , Linshu Kong , Colby Steere , Mingtao (Gary) Li , Hua Tan , Lin Hu
IPC分类号： B29C59/00
CPC分类号： G11B7/263 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S425/81
摘要： Apparatus for double-sided imprint lithography of an apertured substrate comprises a pair of correspondingly apertured molds, a support for an assembly of the substrate and molds, and an alignment mechanism with radially movable elements for aligning the apertures of the molds and the substrate. The movable elements can be at least partially disposed in a spindle and can be removed radially outward by a conically tapered drive rod. Opposing surfaces of the substrate can then be imprinted in registration at the same time, preferably by fluid pressure imprint lithography.
摘要翻译：用于多孔基材的双面压印光刻的设备包括一对相应的有孔模具，用于基板和模具的组件的支撑件以及具有用于对准模具和基板的孔的径向可移动元件的对准机构。可移动元件可以至少部分地设置在主轴中，并且可以通过锥形的驱动杆径向向外移除。然后可以优选通过流体压力压印光刻，同时将基板的相对表面同时印刷成对准。

4. 发明授权

US07717696B2 Apparatus for double-sided imprint lithography 有权
标题翻译：双面压印光刻设备
公开(公告)号：US07717696B2
公开(公告)日：2010-05-18
申请号：US10918564
申请日：2004-08-13
申请人： Stephen Chou , Linshu Kong , Colby Steere , Mingtao (Gary) Li , Hua Tan , Lin Hu
发明人： Stephen Chou , Linshu Kong , Colby Steere , Mingtao (Gary) Li , Hua Tan , Lin Hu
IPC分类号： B29C59/00
CPC分类号： G11B7/263 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S425/81
摘要： Apparatus for double-sided imprint lithography of an apertured substrate comprises a pair of correspondingly apertured molds, a support for an assembly of the substrate and molds, and an alignment mechanism with radially movable elements for aligning the apertures of the molds and the substrate. The movable elements can be at least partially disposed in a spindle and can be removed radially outward by a conically tapered drive rod. Opposing surfaces of the substrate can then be imprinted in registration at the same time, preferably by fluid pressure imprint lithography.
摘要翻译：用于多孔基材的双面压印光刻的设备包括一对相应的有孔模具，用于基板和模具的组件的支撑件以及具有用于对准模具和基板的孔的径向可移动元件的对准机构。可移动元件可以至少部分地设置在主轴中，并且可以通过锥形的驱动杆径向向外移除。然后可以优选通过流体压力压印光刻，同时将基板的相对表面同时印刷成对准。

5. 发明申请

US20080213418A1 ALIGN-TRANSFER-IMPRINT SYSTEM FOR IMPRINT LITHOGRPHY 审中-公开
标题翻译：用于绘制光刻的对准传输印刷系统
公开(公告)号：US20080213418A1
公开(公告)日：2008-09-04
申请号：US11931280
申请日：2007-10-31
申请人： Hua Tan , Wei Zhang , He Gao , Linshu Kong , Lin Hu , Colby Steere , Stephen Y. Chou
发明人： Hua Tan , Wei Zhang , He Gao , Linshu Kong , Lin Hu , Colby Steere , Stephen Y. Chou
IPC分类号： H01L21/304
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
摘要： An imprint system for imprint lithography comprises an alignment subsystem and an imprint subsystem. The mask (mold) and the wafer for imprinting (substrate) are align on the alignment subsystem and contacted to each other to form a mask/wafer set. The mask/wafer set is then transferred onto the imprint subsystem while alignment is maintained. The mask/wafer set is then imprinted on the imprint subsystem. During transfer, the mask/wafer set can be held in alignment by surface. The surface adhesion can be enhanced by local pressing, local heating, or both. Alternatively, the mask/wafer set can be held in alignment by clamping. Advantageously, the imprinting is effected by fluid pressure imprinting.
摘要翻译：用于压印光刻的压印系统包括对准子系统和压印子系统。掩模（模具）和用于压印的晶片（衬底）在对准子系统上对准并且彼此接触以形成掩模/晶片组。然后将掩模/晶片组转移到压印子系统上，同时保持对准。然后将掩模/晶片组印在压印子系统上。在传送期间，掩模/晶片组可以通过表面保持对准。表面粘合可通过局部加压，局部加热或两者增强。或者，掩模/晶片组可以通过夹持保持对准。有利地，压印通过流体压力印迹来实现。

6. 发明申请

US20080131623A1 METHOD AND APPARATUS TO APPLY SURFACE RELEASE COATING FOR IMPRINT MOLD 有权
标题翻译：应用表面释放涂料进行印模的方法和装置
公开(公告)号：US20080131623A1
公开(公告)日：2008-06-05
申请号：US11945470
申请日：2007-11-27
申请人： Wei Zhang , Lin Hu , Hua Tan , He Gao , Linshu Kong , Stephen Y. Chou
发明人： Wei Zhang , Lin Hu , Hua Tan , He Gao , Linshu Kong , Stephen Y. Chou
IPC分类号： C23C16/00 , B28B7/38 , H05H1/24
CPC分类号： H01J37/32431 , B82Y10/00 , B82Y40/00 , C23C14/12 , G03F7/0002 , H01J2237/3355
摘要： In imprint lithography, the mold is coated with a surface release layer for a non-sticking separation. Bonding strength of the release layer to the mold depends on the cleanness of the surface and the process of release layer deposition. In accordance with the invention, the mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay. The chamber encloses a support chuck for the mold or substrate, a surface cleaner unit adjacent the support, a heating source adjacent the support, and advantageously, sensors of measuring chamber pressure, vapor partial pressure and moisture concentration. A vapor source connected to the chamber supplies release surfactant vapor. The mold is cleaned, and the cleaning is followed by vapor phase deposition of the surfactant. The mold is advantageously heated. Typical ways of cleaning include exposure to ozone or plasma ion etch. Surfactant vapor may be generated by liquid surface vaporization, liquid injection or spray vaporization. A surface adhesion promoter can be coated on the substrate by a similar method with the same apparatus.
摘要翻译：在压印光刻中，模具涂有用于不粘分离的表面剥离层。脱模层与模具的粘合强度取决于表面的清洁度和剥离层沉积过程。根据本发明，模具设置在可抽空的室中，被清洁以除去表面有机污染物并且涂覆在室中的表面释放层，全部不需要重新定位或不期望的时间延迟。腔室包围用于模具或基底的支撑卡盘，与支撑件相邻的表面清洁器单元，邻近支撑件的加热源，有利地是测量室压力，蒸气分压和水分浓度的传感器。连接到室的蒸气源提供表面活性剂蒸气。模具被清洁，清洁之后是表面活性剂的气相沉积。有利地加热模具。典型的清洁方法包括暴露于臭氧或等离子体离子蚀刻。表面活性剂蒸气可以通过液体表面蒸发，液体注入或喷雾蒸发来产生。表面粘合促进剂可以通过类似的方法用相同的装置涂覆在基材上。

7. 发明授权

US08337959B2 Method and apparatus to apply surface release coating for imprint mold 有权
标题翻译：表面剥离涂层用于压印模具的方法和装置
公开(公告)号：US08337959B2
公开(公告)日：2012-12-25
申请号：US11945470
申请日：2007-11-27
申请人： Wei Zhang , Lin Hu , Hua Tan , He Gao , Linshu Kong , Stephen Y. Chou
发明人： Wei Zhang , Lin Hu , Hua Tan , He Gao , Linshu Kong , Stephen Y. Chou
IPC分类号： H05H1/24 , C23C16/00 , B05D3/00 , B05D3/02
CPC分类号： H01J37/32431 , B82Y10/00 , B82Y40/00 , C23C14/12 , G03F7/0002 , H01J2237/3355
摘要： In imprint lithography, the mold is coated with a surface release layer for a non-sticking separation. Bonding strength of the release layer to the mold depends on the cleanness of the surface and the process of release layer deposition. In accordance with the invention, the mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay. The chamber encloses a support chuck for the mold or substrate, a surface cleaner unit adjacent the support, a heating source adjacent the support, and advantageously, sensors of measuring chamber pressure, vapor partial pressure and moisture concentration. A vapor source connected to the chamber supplies release surfactant vapor. The mold is cleaned, and the cleaning is followed by vapor phase deposition of the surfactant. The mold is advantageously heated. Typical ways of cleaning include exposure to ozone or plasma ion etch. Surfactant vapor may be generated by liquid surface vaporization, liquid injection or spray vaporization. A surface adhesion promoter can be coated on the substrate by a similar method with the same apparatus.
摘要翻译：在压印光刻中，模具涂有用于不粘分离的表面剥离层。脱模层与模具的粘合强度取决于表面的清洁度和剥离层沉积过程。根据本发明，模具设置在可抽空的室中，被清洁以除去表面有机污染物并且涂覆在室中的表面释放层，全部不需要重新定位或不期望的时间延迟。腔室包围用于模具或基底的支撑卡盘，与支撑件相邻的表面清洁器单元，邻近支撑件的加热源，有利地是测量室压力，蒸气分压和水分浓度的传感器。连接到室的蒸气源提供表面活性剂蒸气。模具被清洁，清洁之后是表面活性剂的气相沉积。有利地加热模具。典型的清洁方法包括暴露于臭氧或等离子体离子蚀刻。表面活性剂蒸气可以通过液体表面蒸发，液体注入或喷雾蒸发来产生。表面粘合促进剂可以通过类似的方法用相同的装置涂覆在基材上。

8. 发明申请

US20110155060A1 Method And Apparatus To Apply Surface Release Coating For Imprint Mold 审中-公开
标题翻译：用于印刷模具的表面剥离涂层的方法和装置
公开(公告)号：US20110155060A1
公开(公告)日：2011-06-30
申请号：US13027530
申请日：2011-02-15
申请人： Wei Zhang , Lin Hu , Hua Tan , Linshu Kong , Stephen Y. Chou
发明人： Wei Zhang , Lin Hu , Hua Tan , Linshu Kong , Stephen Y. Chou
IPC分类号： C23C16/513
CPC分类号： H01J37/32431 , B82Y10/00 , B82Y40/00 , C23C14/12 , G03F7/0002 , H01J2237/3355
摘要： A surface coating apparatus for preparing a work piece having a working surface for imprint lithography, wherein the work piece comprises either a mold or a substrate. The apparatus includes a vacuum chamber and a generator to produce chemical reaction radicals for cleaning the working surface. The generator may be located inside said vacuum chamber and connected to an inner surface of said vacuum chamber or external to the vacuum chamber and connected thereto via suitable couplings. A fixture within the vacuum chamber is configured to hold the work piece with the working surface accessible by the chemical reaction radicals, and a means is provided for depositing a molecular layer of surfactant on the working surface inside the vacuum chamber.
摘要翻译：一种用于制备具有用于压印光刻的工作表面的工件的表面涂覆装置，其中所述工件包括模具或基板。该装置包括一个真空室和发生器，以产生用于清洁工作表面的化学反应基团。发生器可以位于所述真空室内并且连接到所述真空室的内表面或者在真空室的外部，并通过适当的联接与其连接。真空室内的固定装置构造成保持工件与化学反应基团可接近的工作表面，并提供一种用于在真空室内的工作表面上沉积表面活性剂分子的装置。

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