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    • 4. 发明授权
    • Process for forming a quantum-dot particle layer on a substrate
    • 在基板上形成量子点粒子层的工艺
    • US07935388B2
    • 2011-05-03
    • US12494706
    • 2009-06-30
    • Hsueh-Shih ChenDai-Luon LoGwo-Yang ChangChien-Ming Chen
    • Hsueh-Shih ChenDai-Luon LoGwo-Yang ChangChien-Ming Chen
    • H01L21/00
    • H01L29/0665B82Y10/00H01L29/0673H01L33/08
    • A method for manufacturing a quantum-dot element utilizes a reaction chamber for evaporating or sputtering at least one electrode layer or at least one buffer layer on a substrate. A substrate-supporting base is located inside the reaction chamber for fixing the substrate. An atomizer has a gas inlet and a sample inlet. More specifically, the gas inlet and the sample inlet feed the atomizer respectively with a gas and a precursor solution having a plurality of functionalized quantum dots, and thereby form a quantum-dot layer on the substrate. The method for manufacturing a quantum-dot element forms a quantum dot layer with uniformly distributed quantum dots and integrates the processes for forming the quantum-dot layer, the buffer layer, and the electrode layer together in the same chamber.
    • 用于制造量子点元件的方法利用反应室来蒸发或溅射基板上的至少一个电极层或至少一个缓冲层。 基板支撑基座位于反应室内部,用于固定基板。 雾化器具有气体入口和样品入口。 更具体地,气体入口和样品入口分别向雾化器供给具有多个官能化量子点的气体和前体溶液,从而在衬底上形成量子点层。 量子点元件的制造方法形成了具有均匀分布的量子点的量子点层,并且将同时形成量子点层,缓冲层和电极层的工序集成在一起。
    • 5. 发明授权
    • Method of manufacturing a quantum-dot element
    • 量子点元件的制造方法
    • US07303937B2
    • 2007-12-04
    • US11187829
    • 2005-07-25
    • Hsueh-Shih ChenDai-Luon LoGwo-Yang ChangChien-Ming Chen
    • Hsueh-Shih ChenDai-Luon LoGwo-Yang ChangChien-Ming Chen
    • H01L21/00
    • H01L29/0665B82Y10/00H01L29/0673H01L33/08
    • A method for manufacturing a quantum-dot element is disclosed. The method includes the following steps. First, a deposition chamber having at least one atomizer and a substrate-supporting base is provided. The atomizer is connected to a gas inlet and a sample inlet. Afterwards, a sample solution is prepared composed of a plurality of functionalized quantum dots dispersed in a solvent. Simultaneously, a substrate is placed on the substrate-supporting base in the deposition chamber. Finally, the sample solution and a gas are transferred into the atomizer through the sample inlet and the gas inlet respectively for generating quantum-dot droplets, which subsequently deposit on the substrate in the deposition chamber. The quantum-dot element manufactured by the present invention has a uniform distribution of quantum dots that have a small size and, therefore, the quality of the quantum-dot element can be substantially improved.
    • 公开了一种制造量子点元件的方法。 该方法包括以下步骤。 首先,提供具有至少一个雾化器和基板支撑基底的沉积室。 雾化器连接到气体入口和样品入口。 然后,制备由分散在溶剂中的多个官能化量子点构成的样品溶液。 同时,将基板放置在沉积室中的基板支撑基底上。 最后,样品溶液和气体分别通过样品入口和气体入口转移到雾化器中,用于产生量子点液滴,其随后沉积在沉积室中的基底上。 由本发明制造的量子点元件具有尺寸小的量子点的均匀分布,因此量子点元件的质量可以显着提高。
    • 6. 发明申请
    • APPARATUS FOR MANUFACTURING A QUANTUM-DOT ELEMENT
    • 用于制造量子元件的装置
    • US20090263580A1
    • 2009-10-22
    • US12494706
    • 2009-06-30
    • Hsueh-Shih CHENDai-Luon LoGwo-Yang ChangChien-Ming Chen
    • Hsueh-Shih CHENDai-Luon LoGwo-Yang ChangChien-Ming Chen
    • C23C16/44B82B1/00B82B3/00H01L21/20
    • H01L29/0665B82Y10/00H01L29/0673H01L33/08
    • An apparatus for manufacturing a quantum-dot element is disclosed. The apparatus includes a reaction chamber for evaporating or sputtering at least one electrode layer or at least one buffer layer on the substrate. The substrate-supporting base is located inside the reaction chamber for fixing the substrate. The atomizer has a gas inlet and a sample inlet. More specifically, the gas inlet and the sample inlet feed the atomizer respectively with a gas and a precursor solution having a plurality of functionalized quantum dots, and thereby form a quantum-dot layer on the substrate. The apparatus of the present invention can form a quantum dot layer with uniformly distributed quantum dots and integrate the processes for forming a quantum-dot layer, a buffer layer, and an electrode layer together at the same chamber. Therefore, the quality of produced element can be substantially improved.
    • 公开了一种用于制造量子点元件的装置。 该装置包括用于在衬底上蒸发或溅射至少一个电极层或至少一个缓冲层的反应室。 基板支撑基座位于反应室内部,用于固定基板。 雾化器具有气体入口和样品入口。 更具体地,气体入口和样品入口分别向雾化器供给具有多个官能化量子点的气体和前体溶液,从而在衬底上形成量子点层。 本发明的装置可以形成具有均匀分布的量子点的量子点层,并将在量子点层,缓冲层和电极层的形成过程集成在一起。 因此,可以显着提高生产元件的质量。
    • 7. 发明申请
    • Method for manufacturing a quantum-dot element
    • 量子点元件制造方法
    • US20060046330A1
    • 2006-03-02
    • US11187829
    • 2005-07-25
    • Hsueh-Shih ChenDai-Luon LoGwo-Yang ChangChien-Ming Chen
    • Hsueh-Shih ChenDai-Luon LoGwo-Yang ChangChien-Ming Chen
    • H01L21/00
    • H01L29/0665B82Y10/00H01L29/0673H01L33/08
    • A method for manufacturing a quantum-dot element is disclosed. The method includes the following steps. First, a deposition chamber having at least one atomizer and a substrate-supporting base is provided. The atomizer is connected to a gas inlet and a sample inlet. Afterwards, a sample solution is prepared composed of a plurality of functionalized quantum dots dispersed in a solvent. Simultaneously, a substrate is placed on the substrate-supporting base in the deposition chamber. Finally, the sample solution and a gas are transferred into the atomizer through the sample inlet and the gas inlet respectively for generating quantum-dot droplets, which subsequently deposit on the substrate in the deposition chamber. The quantum-dot element manufactured by the present invention has a uniform distribution of quantum dots that have a small size and, therefore, the quality of the quantum-dot element can be substantially improved.
    • 公开了一种制造量子点元件的方法。 该方法包括以下步骤。 首先,提供具有至少一个雾化器和基板支撑基底的沉积室。 雾化器连接到气体入口和样品入口。 然后,制备由分散在溶剂中的多个官能化量子点构成的样品溶液。 同时,将基板放置在沉积室中的基板支撑基底上。 最后,样品溶液和气体分别通过样品入口和气体入口转移到雾化器中,用于产生量子点液滴,随后沉积在沉积室中的基底上。 由本发明制造的量子点元件具有尺寸小的量子点的均匀分布,因此量子点元件的质量可以显着提高。