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    • 1. 发明申请
    • PROCESS FOR OPTIMIZATION OF ISLAND TO TRENCH RATIO IN PATTERNED MEDIA
    • 优化岛屿以优化媒体比例的方法
    • US20100237042A1
    • 2010-09-23
    • US12730147
    • 2010-03-23
    • Houng T. NguyenRen XuMichael S. Barnes
    • Houng T. NguyenRen XuMichael S. Barnes
    • G11B5/84
    • G11B5/855
    • A sequence of process steps having balanced process times are implemented in sequence of etch chambers coupled linearly and isolated one from the other, resulting in the optimization of island to trench ratio for a patterned media. A biased chemical etching using active etching gas is used to descum and trim the resist patterns. An inert gas sputter etch is performed on the magnetic layers, resulting in the patterned magnetic layer on the disk. A final step of stripping is then performed to remove the residual capping resist and carbon hard mask on top of un-etched magnetic islands. The effective magnetic material remaining on the disk surface can be optimized by adjusting the conditions of chemical etch and sputter etch conditions. Relevant process conditions that may be adjusted include: pressure, bias, time, and the type of gas in each step.
    • 具有平衡处理时间的一系列工艺步骤以蚀刻室的顺序实现,该蚀刻室线性地并且彼此隔离,导致图案化介质的岛与沟槽比的优化。 使用有源蚀刻气体的偏压化学蚀刻来除去和修整抗蚀剂图案。 对磁性层进行惰性气体溅射蚀刻,得到盘上图案化的磁性层。 然后进行剥离的最后一步,以除去未蚀刻的磁岛顶部上的残余覆盖抗蚀剂和碳硬掩模。 可以通过调整化学蚀刻和溅射蚀刻条件的条件来优化残留在盘表面上的有效磁性材料。 可能调整的相关工艺条件包括:压力,偏压,时间和每一步中的气体类型。
    • 2. 发明授权
    • Process for optimization of island to trench ratio in patterned media
    • 在图案化介质中优化岛对沟比的方法
    • US08715515B2
    • 2014-05-06
    • US12730147
    • 2010-03-23
    • Houng T. NguyenRen XuMichael S. Barnes
    • Houng T. NguyenRen XuMichael S. Barnes
    • B44C1/22
    • G11B5/855
    • A sequence of process steps having balanced process times are implemented in sequence of etch chambers coupled linearly and isolated one from the other, resulting in the optimization of island to trench ratio for a patterned media. A biased chemical etching using active etching gas is used to descum and trim the resist patterns. An inert gas sputter etch is performed on the magnetic layers, resulting in the patterned magnetic layer on the disk. A final step of stripping is then performed to remove the residual capping resist and carbon hard mask on top of un-etched magnetic islands. The effective magnetic material remaining on the disk surface can be optimized by adjusting the conditions of chemical etch and sputter etch conditions. Relevant process conditions that may be adjusted include: pressure, bias, time, and the type of gas in each step.
    • 具有平衡处理时间的一系列工艺步骤以蚀刻室的顺序实现,该蚀刻室线性地并且彼此隔离,导致图案化介质的岛与沟槽比的优化。 使用有源蚀刻气体的偏压化学蚀刻来除去和修整抗蚀剂图案。 对磁性层进行惰性气体溅射蚀刻,得到盘上图案化的磁性层。 然后进行剥离的最后一步,以除去未蚀刻的磁岛顶部上的残余覆盖抗蚀剂和碳硬掩模。 可以通过调整化学蚀刻和溅射蚀刻条件的条件来优化残留在盘表面上的有效磁性材料。 可能调整的相关工艺条件包括:压力,偏压,时间和每一步中的气体类型。
    • 4. 发明申请
    • METHOD AND SYSTEM FOR VAPOR PHASE APPLICATION OF LUBRICANT IN DISK MEDIA MANUFACTURING PROCESS
    • 润滑剂在液体介质制造过程中的蒸汽相应用方法和系统
    • US20090047417A1
    • 2009-02-19
    • US12060174
    • 2008-03-31
    • Michael S. BarnesCharles LiuRen Xu
    • Michael S. BarnesCharles LiuRen Xu
    • C23C14/54B05C11/10B05D5/12
    • G11B5/8408F16N29/02
    • Lubricant coatings are applied as vapor to magnetic disks. The method and apparatus include applying vaporizing heat to a pre-determined amount of liquid to form a vapor. Precision delivery of lubricant vapor allows close-loop lube thickness control. The flow of the liquid to the heater is controlled such that only a pre-determined amount from the reservoir flows to the heater at a time, the pre-determined amount is vaporized. According to an aspect, the pre-determined amount of liquid is transferred from the reservoir for the application of vaporizing heat; isolating the reservoir from the vacuum of the vacuum chamber. The method enables multiple types of lubricants to be applied to the disk. Another heater is included for applying vaporizing heat to a second liquid to form a second vapor to supply to the disk. According to an aspect, pulsed lubricant vapor delivery is provided, conserving lubricant and minimizing thermal decomposition.
    • 润滑剂涂层作为蒸汽施加到磁盘上。 该方法和装置包括将蒸发热量施加到预定量的液体以形成蒸气。 润滑剂蒸汽的精确输送允许闭环润滑剂厚度控制。 控制液体到加热器的流动,使得只有来自储存器的预定量一次才流入加热器,预定量被蒸发。 根据一个方面,预定量的液体从储存器转移以用于蒸发热; 将储存器与真空室的真空隔离。 该方法可以将多种润滑剂应用于磁盘。 包括另一个加热器,用于将蒸发热量施加到第二液体以形成第二蒸气以供应到盘。 根据一个方面,提供脉冲润滑剂蒸汽输送,保护润滑剂并使热分解最小化。
    • 6. 发明授权
    • System and method for commercial fabrication of patterned media
    • 用于商业制作图案化介质的系统和方法
    • US08349196B2
    • 2013-01-08
    • US12329462
    • 2008-12-05
    • Kevin P. FairbairnMichael S. BarnesTerry BluckRen XuCharles LiuRalph Kerns
    • Kevin P. FairbairnMichael S. BarnesTerry BluckRen XuCharles LiuRalph Kerns
    • B44C1/22
    • G11B5/84G11B5/855H01J37/3438
    • A system is provided for etching patterned media disks for hard drive. The modular system may be tailored to perform specific processes sequences so that a patterned media disk is fabricated without removing the disk from vacuum environment. In some sequence the magnetic stack is etched while in other the etch is performed prior to forming the magnetic stack. In a further sequence ion implantation is used without etching steps. For etching a movable non-contact electrode is utilized to perform sputter etch. The cathode moves to near contact distance to, but not contacting, the substrate so as to couple RF energy to the disk. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched.
    • 提供了用于蚀刻用于硬盘驱动器的图案化介质盘的系统。 模块化系统可以被定制以执行特定的处理顺序,使得图案化的介质盘被制造而不从真空环境中移除盘。 在一些顺序中,磁性堆叠被蚀刻,而另一些蚀刻则在形成磁性堆叠之前进行。 在另外的序列中,使用离子注入而没有蚀刻步骤。 为了蚀刻可移动的非接触电极用于进行溅射蚀刻。 阴极移动到与衬底接近但不接触的接近距离,以将RF能量耦合到盘。 衬底垂直地保持在载体中,并且两侧被连续蚀刻。 也就是说,在一个室中蚀刻一面,然后在下一个室中蚀刻第二面。