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1. 发明申请

US20090161202A1 APPARATUS FOR OPTICAL PARAMETRIC CHIRPED PULSE AMPLIFICATION (OPCPA) USING INVERSE CHIRPING AND IDLER 审中-公开
标题翻译：光学参考激光脉冲放大装置（OPCPA）使用反向引导和IDLER
公开(公告)号：US20090161202A1
公开(公告)日：2009-06-25
申请号：US12302760
申请日：2007-01-29
申请人： Hong Jin Kong , Dong Won Lee , Jin Choi , Du Hyun Beak , Jin Woo Yoon , Tae Hyung Kim
发明人： Hong Jin Kong , Dong Won Lee , Jin Choi , Du Hyun Beak , Jin Woo Yoon , Tae Hyung Kim
IPC分类号： H01S3/00
CPC分类号： G02F1/39 , G02F2001/392
摘要： An OPCPA apparatus of the present invention includes an optical pulse stretcher (100) for temporally stretching laser light, and applying short-wavelength preceding-type chirping. Pump lasers (210, 220) emit pump laser light. A first OPA unit (310) receives the pump laser light, and a signal having passed through the optical pulse stretcher, amplifies the signal, and generates a first idler. A first optical signal separation unit (410) separates output light of the first OPA unit into the first idler and remaining light (pump and signal). A second OPA unit (320) receives the first idler and another pump laser light, amplifies the first idler, and generates a second idler. A second optical signal separation unit (420) separates output light of the second optical parametric amplification unit into an amplified first idler and remaining light (pump and second idler). An optical pulse compressor (600) temporally compresses the amplified first idler.
摘要翻译：本发明的OPCPA装置包括用于时间拉伸激光的光脉冲展宽器（100），并且应用短波长的前级线性调频。泵浦激光器（210,220）发射泵浦激光。第一OPA单元（310）接收泵激光，并且已经通过光脉冲展宽器的信号放大信号，并产生第一惰轮。第一光信号分离单元（410）将第一OPA单元的输出光分离成第一空转器和剩余的光（泵和信号）。第二OPA单元（320）接收第一惰轮和另一泵激光，放大第一惰轮并产生第二惰轮。第二光信号分离单元（420）将第二光参量放大单元的输出光分离成放大的第一空转器和剩余的光（泵和第二惰轮）。光脉冲压缩机（600）在时间上压缩放大的第一惰轮。

2. 发明授权

US07466229B2 Device for generating plane beam/conical shape beam and security device using generated plane beam/cone beam 有权
标题翻译：用于生成平面梁/圆锥形梁的装置和使用产生的平面梁/锥形梁的安全装置
公开(公告)号：US07466229B2
公开(公告)日：2008-12-16
申请号：US10554212
申请日：2004-04-23
申请人： Hong Jin Kong , Jin Choi
发明人： Hong Jin Kong , Jin Choi
IPC分类号： G08B13/18 , G06M7/00 , G02B3/06 , G02B5/10 , G02B6/00
CPC分类号： G02B27/0927 , G02B5/00 , G02B27/0966 , G02B27/0983 , H01S3/08 , H01S3/08059 , H01S3/0813
摘要： Disclosed are an apparatus of converting a laser beam traveling straight to a beam propagated in all directions and a security system using the laser beam propagated in all directions. The laser beam traveling straight is incident on a cylindrical prism and repeatedly reflected and transmitted to be converted to the laser beam propagated in all directions. The laser beam is converted to a plane beam or a conical beam by controlling an incident angle of the laser beam incident on the cylindrical prism. The security system is constructed using the apparatus of generating the plane, beam or conical beam.
摘要翻译：公开了将直线行进的激光束转换成在所有方向上传播的光束的装置，以及使用在所有方向上传播的激光束的安全系统。直线行进的激光束入射在圆柱形棱镜上并反复反射和透射，以转换成在所有方向上传播的激光束。通过控制入射在圆柱形棱镜上的激光束的入射角，将激光束转换成平面光束或锥形光束。使用生成平面，梁或锥形梁的装置构造安全系统。

3. 发明申请

US20060208883A1 Device for generating plane beam/conical shape beam and security device using generated plane beam/cone beam 有权
标题翻译：用于生成平面梁/圆锥形梁的装置和使用产生的平面梁/锥形梁的安全装置
公开(公告)号：US20060208883A1
公开(公告)日：2006-09-21
申请号：US10554212
申请日：2004-04-23
申请人： Hong Jin Kong , Jin Choi
发明人： Hong Jin Kong , Jin Choi
IPC分类号： G08B13/18
CPC分类号： G02B27/0927 , G02B5/00 , G02B27/0966 , G02B27/0983 , H01S3/08 , H01S3/08059 , H01S3/0813
摘要： Disclosed are an apparatus of converting a laser beam traveling straight to a beam propagated in all directions and a security system using the laser beam propagated in all directions. The laser beam traveling straight is incident on a cylindrical prism and repeatedly reflected and transmitted to be converted to the laser beam propagated in all directions. The laser beam is converted to a plane beam or a conical beam by controlling an incident angle of the laser beam incident on the cylindrical prism. The security system is constructed using the apparatus of generating the plane, beam or conical beam.
摘要翻译：公开了将直线行进的激光束转换成在所有方向上传播的光束的装置，以及使用在所有方向上传播的激光束的安全系统。直线行进的激光束入射在圆柱形棱镜上并反复反射和透射，以转换成在所有方向上传播的激光束。通过控制入射在圆柱形棱镜上的激光束的入射角，将激光束转换成平面光束或锥形光束。使用生成平面，梁或锥形梁的装置构造安全系统。

4. 发明授权

US09671686B2 Exposure methods using e-beams and methods of manufacturing masks and semiconductor devices therefrom 有权
公开(公告)号：US09671686B2
公开(公告)日：2017-06-06
申请号：US14693429
申请日：2015-04-22
申请人： Jin Choi , In-kyun Shin , Byoung-sup Ahn , Sang-hee Lee
发明人： Jin Choi , In-kyun Shin , Byoung-sup Ahn , Sang-hee Lee
IPC分类号： G03F1/78 , G03F1/36
CPC分类号： G03F1/78 , G03F1/36
摘要： Disclosed are an exposure method and a method of manufacturing a mask and a semiconductor device using the same, which minimize time taken by mask data preparation (MDP) to optimize a total exposure process and enhance a quality of a pattern by using an inverse solution concept, based on a multi-beam mask writer. The exposure method includes receiving mask tape output (MTO) design data obtained through optical proximity correction (OPC), preparing mask data, including a job deck, for the MTO design data without a data format conversion, performing complex correction, including proximity effect correction (PEC) of an error caused by an e-beam proximity effect and mask process correction (MPC) of an error caused by an exposure process, on the mask data, generating pixel data, based on data for which the complex correction is performed, and performing e-beam writing on a substrate for a mask, based on the pixel data.

5. 发明授权

US08817234B2 Optical device and exposure apparatus including the same 有权
标题翻译：光学装置和包括其的曝光装置
公开(公告)号：US08817234B2
公开(公告)日：2014-08-26
申请号：US13180776
申请日：2011-07-12
申请人： Jin Choi , Byung-gook Kim
发明人： Jin Choi , Byung-gook Kim
IPC分类号： G03B27/54 , G03F7/20 , G02B27/42 , G02B27/09 , G02B3/00
CPC分类号： G02B3/0062 , G02B3/0056 , G02B5/1885 , G02B27/0905 , G02B27/0944 , G02B27/425 , G02B27/4277 , G02B27/50 , G02F1/29 , G02F1/31 , G03F7/70208 , G03F7/70275
摘要： An optical device for splitting a single beam to a plurality of beams and an exposure apparatus including the optical device are disclosed. The optical device includes a first DOE lens array including a plurality of first diffractive optical element (DOE) lenses that are two-dimensionally arranged on a first plane and a second lens array including a plurality of second DOE lenses arranged on a second plane parallel to the first plane so as to respectively correspond to the plurality of first DOE lenses. The first DOE lens array splits a first parallel beam into a plurality of second beams by condensing the first parallel beam and the second DOE lens array modifies the plurality of second beams into a plurality of third beams.
摘要翻译：公开了一种用于将单个光束分割成多个光束的光学装置和包括该光学装置的曝光装置。光学装置包括第一DOE透镜阵列，其包括二维地布置在第一平面上的多个第一衍射光学元件（DOE）透镜和第二透镜阵列，所述第二透镜阵列包括布置在平行于第二平面的第二平面上的多个第二DOE透镜第一平面，以分别对应于多个第一DOE透镜。第一DOE透镜阵列通过聚焦第一平行光束将第一平行光束分成多个第二光束，并且第二DOE透镜阵列将多个第二光束修改成多个第三光束。

6. 发明申请

US20140083926A1 Filter Medium For Manufacturing Filters 有权
标题翻译：过滤介质用于制造过滤器
公开(公告)号：US20140083926A1
公开(公告)日：2014-03-27
申请号：US13627471
申请日：2012-09-26
申请人： Eric Winters , John Lewis , Brian Fields , Jin Choi
发明人： Eric Winters , John Lewis , Brian Fields , Jin Choi
IPC分类号： B01D39/08
CPC分类号： B01D39/083 , B01D39/08 , B01D39/1623 , B01D39/2017 , B01D2239/065 , B01D2239/0681 , B01D2239/0686 , B01D2239/1216
摘要： The above objective are accomplished by providing a filter medium for use in manufacturing of hydraulic fluid and air filters comprising: an upstream layer comprised of nonwoven fiber having a denier between about 5.0 and 7.0 and a weight of between about 3.0 and 5.0 ounces a scrim and a cap layer comprising a fiber having a denier between about 0.1 and 5.0 denier and a weight between about 2.0 and 4.0 ounces carried by said upstream layer and disposed downstream from said upstream layer. The upstream layer, scrim and cap layer can have a weight of about 4.0 ounces, 2.0 ounces and 3.0 ounces respectively. A downstream layer can be disposed between said upstream layer and said cap layer.
摘要翻译：上述目的通过提供用于制造液压流体和空气过滤器的过滤介质来实现，该过滤介质包括：由非织造纤维构成的上游层，其旦尼尔为约5.0至7.0，重量为约3.0至5.0盎司为稀松布，帽层，其包含旦尼尔在约0.1至5.0旦尼尔之间的纤维和由所述上游层承载并设置在所述上游层的下游的约2.0至4.0盎司的重量。上游层，稀松布和覆盖层的重量可以分别为约4.0盎司，2.0盎司和3.0盎司。下游层可以设置在所述上游层和所述覆盖层之间。

7. 外观设计

USD698948S1 Utility pylon 有权
标题翻译：实用塔
公开(公告)号：USD698948S1
公开(公告)日：2014-02-04
申请号：US29388977
申请日：2011-04-05
申请人： Jin Choi , Thomas Adam Shine
设计人： Jin Choi , Thomas Adam Shine

8. 发明授权

US08458624B2 Method for manufacturing semiconductor device by correcting overlapping shots based on a radiation influenced pattern 有权
标题翻译：通过基于辐射影响图案校正重叠拍摄来制造半导体器件的方法
公开(公告)号：US08458624B2
公开(公告)日：2013-06-04
申请号：US13192124
申请日：2011-07-27
申请人： Jin Choi , Sang-hee Lee , Seong-june Min
发明人： Jin Choi , Sang-hee Lee , Seong-june Min
IPC分类号： G06F17/50
CPC分类号： G03F1/78 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J37/3174 , H01J2237/31764 , H01J2237/31771 , H01J2237/31776
摘要： A method of manufacturing semiconductor devices is disclosed. The method includes determining fractured shots that do not overlap each other based on a final pattern; determining overlapping shots that are shots that overlap each other based on the final pattern; generating area difference data by comparing the areas of the overlapping shots and the fractured shots with each other; calculating a radiation influenced pattern based on the area difference data; and correcting the overlapping shots based on the radiation influenced pattern.
摘要翻译：公开了制造半导体器件的方法。该方法包括基于最终模式确定彼此不重叠的断裂射击; 确定基于最终模式重叠的重叠拍摄; 通过比较重叠射击和断裂射击的面积来产生区域差异数据; 基于面积差异数据计算辐射影响模式; 并基于辐射影响模式校正重叠拍摄。

9. 发明申请

US20130015559A1 SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US20130015559A1
公开(公告)日：2013-01-17
申请号：US13546415
申请日：2012-07-11
申请人： Sung-Ho LEE , Jin Choi , Yong-Ho Yoo , Jong-Hyuk Kang , Hyun-Joo Cha , Hee-Dong Park , Tae-Jung Park
发明人： Sung-Ho LEE , Jin Choi , Yong-Ho Yoo , Jong-Hyuk Kang , Hyun-Joo Cha , Hee-Dong Park , Tae-Jung Park
IPC分类号： H01L27/08 , H01L21/82
CPC分类号： H01L28/91 , H01L27/10817 , H01L27/10852 , H01L28/60
摘要： A semiconductor device includes a plurality of lower electrodes on a substrate, with each of the lower electrodes extending in a height direction from the substrate and including sidewalls, the lower electrodes being spaced apart from each other in a first direction and in a second direction, a plurality of first supporting layer patterns contacting the sidewalls of the lower electrodes, the first supporting layer patterns extending in the first direction between ones of the lower electrodes adjacent in the second direction, a plurality of second supporting layer patterns contacting the sidewalls of the lower electrodes, the second supporting layer pattern extending in the second direction between ones of the lower electrodes adjacent in the first direction, the plurality of second supporting layer patterns being spaced apart from the plurality of first supporting layer patterns in the height direction.
摘要翻译：半导体器件包括在基片上的多个下电极，其中每个下电极从衬底沿高度方向延伸并且包括侧壁，下电极在第一方向和第二方向彼此间隔开，与下电极的侧壁接触的多个第一支撑层图案，第一支撑层图案沿着第一方向在第二方向上相邻的下电极之间延伸;多个第二支撑层图案，其与下部电极的侧壁接触; 电极，所述第二支撑层图案沿着所述第二方向在与所述第一方向相邻的所述下电极中的所述第二方向延伸，所述多个第二支撑层图案在所述高度方向上与所述多个第一支撑层图案间隔开。

10. 发明申请

US20120288787A1 Beam Exposure Systems and Methods of Forming a Reticle Using the Same 有权
标题翻译：光束曝光系统及其使用方法
公开(公告)号：US20120288787A1
公开(公告)日：2012-11-15
申请号：US13443440
申请日：2012-04-10
申请人： Jin Choi , Jin-Ha Jeong , Urazaev Vladimir , Hea-Yun Lee
发明人： Jin Choi , Jin-Ha Jeong , Urazaev Vladimir , Hea-Yun Lee
IPC分类号： G03F1/78 , G21K5/04
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/78 , G03F1/80 , H01J37/3026 , H01J2237/0455 , H01J2237/31764 , H01J2237/31776
摘要： In a method of forming a reticle and electron beam exposure system, first electron beams are irradiated onto a first region of a blank reticle having a light shielding layer and a photosensitive layer, to form first shot patterns. Second electron beams having a cross-sectional area larger than the first electron beams are irradiated onto a second region of the blank reticle. The photosensitive layer is developed to form first and second mask patterns at the first and second regions, respectively. The light shielding layer is etched off using the first and second mask patterns as an etching mask, thereby forming the mother pattern including a first pattern in the first region and a second pattern in the second region. Accordingly, the enlargement of the second electron beams reduces the scan time for the blank reticle, thereby reducing the process time.
摘要翻译：在形成掩模版和电子束曝光系统的方法中，将第一电子束照射到具有遮光层和感光层的坯料掩模版的第一区域上，以形成第一射出图案。具有大于第一电子束的横截面面积的第二电子束被照射到坯料掩模版的第二区域上。感光层被显影以分别在第一和第二区域形成第一和第二掩模图案。使用第一和第二掩模图案作为蚀刻掩模蚀刻掉遮光层，从而形成包括第一区域中的第一图案和第二区域中的第二图案的母体图案。因此，第二电子束的放大减少了空白掩模版的扫描时间，从而缩短了处理时间。

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