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1. 发明公开

US20230144260A1 LIQUID SUPPLY METHOD 审中-公开
公开(公告)号：US20230144260A1
公开(公告)日：2023-05-11
申请号：US17971670
申请日：2022-10-24
申请人： Hitachi, Ltd.
发明人： Itaru YANAGI , Takeshi ISHIDA
IPC分类号： B01L3/00 , C08L75/04 , C08L7/00 , C08L27/12 , C08L43/04 , C08L23/02 , C08L91/08
CPC分类号： B01L3/561 , C08L75/04 , C08L7/00 , C08L27/12 , C08L43/04 , C08L23/025 , C08L91/08
摘要： The method includes preparing a liquid supply pipe in which the solution to be inspected, air, and oil are disposed in this order, and installing the liquid supply pipe above the substrate at an angle such that the solution to be inspected is positioned on a lowermost side and the solution to be inspected, the air, and the oil flow onto a front surface of the substrate by gravity. A cross-sectional area of the liquid supply pipe is designed such that the air continues to be present between the solution to be inspected and the oil while the solution to be inspected, the air, and the oil are flowing through the liquid supply pipe, and after the solution to be inspected is supplied to the spot, the solution to be inspected present on the front surface of the substrate is replaced with the air, and then the liquid supply progresses.

2. 发明申请

US20180252696A1 SOLUTION TANK DEVICE 审中-公开
公开(公告)号：US20180252696A1
公开(公告)日：2018-09-06
申请号：US15755389
申请日：2016-02-12
申请人： HITACHI, LTD
发明人： Kazuma MATSUI , Itaru YANAGI
IPC分类号： G01N33/487 , C12Q1/6869 , B01L3/00
摘要： A solution tank device comprises: an insulating thin film, which is configured to allow an object to be measured to pass therethrough, and has a thickness of 1 micrometer or less; a first solution tank, which is configured to support one surface of both surfaces of the insulating thin film; and a first conductive structure, which has a sheet resistance of 1013 ohms or less in a portion in which contact friction occurs between the first solution tank and an object outside of the first solution tank.

3. 发明申请

US20220381762A1 NANOPORE FORMING METHOD AND NANOPORE MEASURING METHOD 有权
公开(公告)号：US20220381762A1
公开(公告)日：2022-12-01
申请号：US17750100
申请日：2022-05-20
申请人： Hitachi, Ltd.
发明人： Sayaka TEZUKA , Itaru YANAGI
IPC分类号： G01N33/487 , G01N27/447
摘要： A nanopore forming method of the present disclosure includes: disposing a membrane between a first electrolyte solution and a second electrolyte solution; bringing a first electrode into contact with the first electrolyte solution and a second electrode into contact with the second electrolyte solution; and applying a first voltage between the first electrode and the second electrode to form a nanopore in the membrane. At least one of the first electrolyte solution or the second electrolyte solution contains a first substance that is an organic substance physically adsorbed or chemically adsorbed to the membrane to form a molecular layer.

4. 发明申请

US20200332434A1 HOLE FORMING METHOD, MEASURING APPARATUS AND CHIP SET 审中-公开
公开(公告)号：US20200332434A1
公开(公告)日：2020-10-22
申请号：US16905035
申请日：2020-06-18
申请人： HITACHI, LTD.
发明人： Itaru YANAGI , Rena AKAHORI , Kenichi TAKEDA
IPC分类号： C25F3/14 , G01N33/487 , C12Q1/6869 , G01N27/447
摘要： A pore forming method in which a pore is formed in such a way that a first voltage is applied between electrodes that are disposed with a film in an electrolytic solution therebetween; a second voltage, which is lower than the first voltage, is applied between the electrodes; a current that flows between the electrodes owing to the application of the second voltage is measured; it is judged whether a value of a current is equal to or larger than a predefined threshold; and if the value of the current is smaller than the threshold, the above sequence is repeated until a pore is formed. In this case, the second voltage is a voltage that makes the value (IPF) of the current flowing through the film practically 0. With the use of the above method, a nanopore is formed in the film simply, easily, and accurately.

5. 发明申请

US20190094180A1 Membrane Device, Measurement Device, and Method for Producing Membrane Device 审中-公开
公开(公告)号：US20190094180A1
公开(公告)日：2019-03-28
申请号：US16082431
申请日：2016-04-28
申请人： Hitachi, Ltd.
发明人： Itaru YANAGI
IPC分类号： G01N27/447 , G01N21/64 , G01N33/487 , H01L21/02
摘要： The present invention provides a membrane device having a configuration capable of reducing the frequency of clogging of a sample in a nanopore when the sample passes through the nanopore. In the membrane device according to the present invention, a membrane and a semiconductor layer are stacked on a Si substrate, and an insulating film is formed on a side wall of a through hole included in the semiconductor layer.

6. 发明申请

US20190293625A1 LIQUID TANK FORMATION METHOD, MEASUREMENT DEVICE, AND ANALYSIS DEVICE 审中-公开
公开(公告)号：US20190293625A1
公开(公告)日：2019-09-26
申请号：US16464835
申请日：2017-10-12
申请人： HITACHI, LTD.
发明人： Mayu AOKI , Itaru YANAGI , Kunio HARADA , Kenichi TAKEDA
IPC分类号： G01N33/487 , G01N27/447
摘要： A method includes a step of introducing a solution between a substrate with a membrane in which the membrane is provided so as to close an opening and a substrate provided with an independent electrode in which the independent electrode is provided, a step of pressure bonding the substrate with the membrane and the substrate with the independent electrode through a partition wall, and a step of forming a sealed liquid tank surrounded by at least the membrane and the partition wall by the pressure bonding, and arraying of a solid-state type nanopore sequencer is simply performed.

7. 发明申请

US20190004030A1 METHOD OF MANUFACTURING MEMBRANE DEVICE, MEMBRANE DEVICE, AND NANOPORE DEVICE 审中-公开
公开(公告)号：US20190004030A1
公开(公告)日：2019-01-03
申请号：US16063982
申请日：2016-03-18
申请人： Hitachi, Ltd.
发明人： Itaru YANAGI , Kenichi TAKEDA
IPC分类号： G01N33/487 , B81C1/00
CPC分类号： G01N33/48721 , B81B2203/0353 , B81C1/00087 , B81C1/00158 , C12Q1/6869 , C12Q2565/631
摘要： A method of manufacturing a membrane device comprises: a first step of forming a pillar structure on a part of a Si substrate by etching; a second step of forming a first insulation layer on the Si substrate so as to expose a Si surface of an upper part of the pillar structure; a third step of forming a second insulation layer on the pillar structure and the first insulation layer; and a fourth step of etching the Si substrate from an opposite side of the second insulation layer and etching the pillar structure with the first insulation layer being a mask, to thereby form a membrane, which is a region free of the pillar structure in the second insulation layer.

8. 发明申请

US20180003673A1 MEMBRANE DEVICE AND METHOD FOR MANUFACTURING SAME 审中-公开
公开(公告)号：US20180003673A1
公开(公告)日：2018-01-04
申请号：US15545431
申请日：2015-02-13
申请人： Hitachi, Ltd.
发明人： Itaru YANAGI , Kenichi TAKEDA
IPC分类号： G01N27/447 , C23C16/24
CPC分类号： G01N27/44791 , C23C16/24 , C23C16/345 , G01N27/447 , G01N33/48721
摘要： A method for producing a membrane device includes: forming an insulating film as a first film on a Si substrate; forming a Si film as a second film on the entire surface or a part of the first film; forming an insulating film as a third film on the second film; forming an aperture so as to pass through a part of the third film positioned on the second film and not to pass through the second film; etching a part of the substrate on one side of the first film with a solution that does not etch the first film; and etching a part or all of the second film on the other side of the first film with a gas or a solution that does not etch the first film and has an etching rate for the third film lower than an etching rate for the second film.

9. 发明申请

US20160327513A1 HOLE FORMING METHOD, MEASURING APPARATUS AND CHIP SET 审中-公开
标题翻译：孔形成方法，测量装置和芯片组
公开(公告)号：US20160327513A1
公开(公告)日：2016-11-10
申请号：US15104325
申请日：2013-12-25
申请人： HITACHI, LTD.
发明人： Itaru YANAGI , Rena AKAHORI , Kenichi TAKEDA
IPC分类号： G01N27/447 , C12Q1/68 , G01N33/487
摘要： A pore forming method in which a pore is formed in such a way that a first voltage is applied between electrodes that are disposed with a film in an electrolytic solution therebetween; a second voltage, which is lower than the first voltage, is applied between the electrodes; a current that flows between the electrodes owing to the application of the second voltage is measured; it is judged whether a value of a current is equal to or larger than a predefined threshold; and if the value of the current is smaller than the threshold, the above sequence is repeated until a pore is formed. In this case, the second voltage is a voltage that makes the value (IPF) of the current flowing through the film practically 0. With the use of the above method, a nanopore is formed in the film simply, easily, and accurately.
摘要翻译：一种孔形成方法，其中以这样的方式形成孔，即在其间的电解液中设置有薄膜的电极之间施加第一电压; 在电极之间施加低于第一电压的第二电压; 测量由于施加第二电压而在电极之间流动的电流; 判断电流值是否等于或大于预定阈值; 并且如果电流值小于阈值，则重复上述顺序，直到形成孔。在这种情况下，第二电压是使流过膜的电流的值（IPF）实际上为0的电压。通过使用上述方法，简单，容易且准确地在膜中形成纳米孔。

10. 发明申请

US20210189467A1 PROBE, PROBE SET, AND METHOD FOR IDENTIFYING DESIRED DNA SEQUENCE IN SOLUTION 有权
公开(公告)号：US20210189467A1
公开(公告)日：2021-06-24
申请号：US17109493
申请日：2020-12-02
申请人： HITACHI, LTD.
发明人： Itaru YANAGI , Takahide YOKOI
IPC分类号： C12Q1/6816 , G01N33/487 , G01N27/447
摘要： The present disclosure proposes a probe including a sequence recognition portion that is capable of specifically binding to a desired DNA sequence, and a first probe portion that includes a plurality of 3-dimensional structures arranged downstream from an end of the sequence recognition portion, in which the plurality of 3-dimensional structures are arranged in an order so that the order corresponds one-to-one with the DNA sequence.

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