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    • 2. 发明授权
    • Method and apparatus for removing organic films
    • 去除有机膜的方法和装置
    • US06696228B2
    • 2004-02-24
    • US10274153
    • 2002-10-21
    • Hisashi MuraokaRieko MuraokaAsuka SatoMitsuru Endo
    • Hisashi MuraokaRieko MuraokaAsuka SatoMitsuru Endo
    • G03F742
    • G03F7/422B08B3/02B08B3/04B08B2203/005C09D9/005C11D7/266C11D11/0047G03F7/423
    • A method and an apparatus for removing an organic film such as a resist film from a substrate surface are provided. These are very safe even at high temperatures, and use a treatment liquid which can be recycled and reused. A treatment liquid typically formed from liquid ethylene carbonate, propylene carbonate, or a liquid mixture of these two compounds, and in particular such a treatment liquid containing dissolved ozone, is contacted with a substrate with an organic film, and the organic film is removed. Furthermore, an apparatus of the present invention (A) a treatment liquid delivery device for transporting the treatment liquid to a treatment area, (B) a film contact device for bringing the treatment liquid into contacting with the organic film surface of the substrate within the treatment area, (C) a liquid circulation device for recycling treatment liquid discharged from the treatment area and returning the recycled liquid to the treatment area via one or more temporary storage devices, and (D) an ozone dissolution device for bringing ozone containing gas into contact with the treatment liquid either within the treatment area and/or within the temporary storage devices.
    • 提供了从基板表面去除诸如抗蚀剂膜的有机膜的方法和装置。 即使在高温下,这些也是非常安全的,并且使用可被回收和重复使用的处理液。 通常由液体碳酸亚乙酯,碳酸亚丙酯或这两种化合物的液体混合物形成的处理液体,特别是含有溶解臭氧的这种处理液体与有机膜与基材接触,并除去有机膜。 此外,本发明的装置(A)是将处理液输送到处理区域的处理液输送装置,(B)将处理液与基板的有机膜表面接触的膜接触装置, 处理区域,(C)用于再循环处理区域排出的处理液体的液体循环装置,并且经由一个或多个临时存储装置将再循环液体返回到处理区域,以及(D)将含臭氧气体的臭氧溶解装置 在处理区域内和/或临时存储装置内与处理液体接触。