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    • 1. 发明授权
    • Gallium nitride compound semiconductor device and manufacturing method
    • 氮化镓化合物半导体器件及其制造方法
    • US07372066B2
    • 2008-05-13
    • US10516703
    • 2003-06-04
    • Hisao SatoTomoya SugaharaShinji KitazawaYoshihiko MuramotoShiro Sakai
    • Hisao SatoTomoya SugaharaShinji KitazawaYoshihiko MuramotoShiro Sakai
    • H01L29/06
    • H01L33/32B82Y20/00H01L33/04H01L33/06
    • A light-emitting element using GaN. On a substrate (10), formed are an SiN buffer layer (12), a GaN buffer layer (14), an undoped GaN layer (16), an Si-doped n-GaN layer (18), an SLS layer (20), an undoped GaN layer (22), an MQW light-emitting layer (24), an SLS layer (26), and a p-GaN layer (28), forming a p electrode (30) and an n electrode (32). The MQW light-emitting layer (24) has a structure in which InGaN well layers and AlGaN barrier layers are alternated. The Al content ratios of the SLS layers (20, and 26) are more than 5% and less than 24%. The In content ratio of the well layer in the MQW light-emitting layer (24) is more than 3% and less than 20%. The Al content ratio of the barrier layer is more than 1% and less than 30%. By adjusting the content ratio and film thickness of each layer to a desired value, the light luminous efficiency for wavelength of less than 400 nm is improved.
    • 使用GaN的发光元件。 在形成的衬底(10)上形成SiN缓冲层(12),GaN缓冲层(14),未掺杂的GaN层(16),Si掺杂的n-GaN层(18),SLS层(20 ),形成p型电极(30)和n电极(32)的未掺杂GaN层(22),MQW发光层(24),SLS层(26)和p-GaN层(28) 。 MQW发光层(24)具有其中InGaN阱层和AlGaN势垒层交替的结构。 SLS层(20和26)的Al含量比大于5%且小于24%。 MQW发光层(24)中的阱层的In含量比大于3%且小于20%。 阻挡层的Al含量比大于1%且小于30%。 通过将各层的含有率和膜厚度调整为所需值,波长小于400nm的光发光效率提高。
    • 2. 发明申请
    • Gallium nitride compound semiconductor device and manufacturing method
    • 氮化镓化合物半导体器件及其制造方法
    • US20060175600A1
    • 2006-08-10
    • US10516703
    • 2003-06-04
    • Hisao SatoTomoya SugaharaShinji KitazawaYoshihiko MuramotoShiro Sakai
    • Hisao SatoTomoya SugaharaShinji KitazawaYoshihiko MuramotoShiro Sakai
    • H01L31/109H01L21/00
    • H01L33/32B82Y20/00H01L33/04H01L33/06
    • A light-emitting element using GaN. On a substrate (10), formed are an SiN buffer layer (12), a GaN buffer layer (14), an undoped GaN layer (16), an Si-doped n-GaN layer (18), an SLS layer (20), an undoped GaN layer (22), an MQW light-emitting layer (24), an SLS layer (26), and a p-GaN layer (28), forming a p electrode (30) and an n electrode (32). The MQW light-emitting layer (24) has a structure in which InGaN well layers and AlGaN barrier layers are alternated. The Al content ratios of the SLS layers (20, and 26) are more than 5% and less than 24%. The In content ratio of the well layer in the MQW light-emitting layer (24) is more than 3% and less than 20%. The Al content ratio of the barrier layer is more than 1% and less than 30%. By adjusting the content ratio and film thickness of each layer to a desired value, the light luminous efficiency for wavelength of less than 400 nm is improved.
    • 使用GaN的发光元件。 在形成的衬底(10)上形成SiN缓冲层(12),GaN缓冲层(14),未掺杂的GaN层(16),Si掺杂的n-GaN层(18),SLS层(20 ),形成p型电极(30)和n电极(32)的未掺杂GaN层(22),MQW发光层(24),SLS层(26)和p-GaN层(28) 。 MQW发光层(24)具有其中InGaN阱层和AlGaN势垒层交替的结构。 SLS层(20和26)的Al含量比大于5%且小于24%。 MQW发光层(24)中的阱层的In含量比大于3%且小于20%。 阻挡层的Al含量比大于1%且小于30%。 通过将各层的含有率和膜厚度调整为所需值,波长小于400nm的光发光效率提高。
    • 4. 发明申请
    • STORAGE CONTAINER
    • 储物容器
    • US20140054287A1
    • 2014-02-27
    • US13980915
    • 2012-02-08
    • Shinji Kitazawa
    • Shinji Kitazawa
    • B65D21/02
    • B65D21/02B65D83/0481B65D83/06B65D2203/12B65D2583/0404B65D2583/0468
    • A storage container in which the status of an opening is easily viewable includes: an inner container (10) with an opening (130); an outer container (20) being slidably attached to the inner container (10); a plurality of through holes (30) arranged in a matrix pattern on the first cover part (21); a first display (40) provided on one surface (12) and located at the position where the first display (40) is visible in a first state (S1) via the plurality of through holes (30); and a second display (50) provided on the one surface (12) and located at the position where the second display (50) is visible in a second state (S2) via the plurality of through holes (30).
    • 容易看到开口状态的储存容器包括:具有开口(130)的内​​容器(10); 外容器(20)可滑动地附接到所述内容器(10); 在所述第一覆盖部分(21)上以矩阵图案布置的多个通孔(30); 经由多个通孔(30)设置在一个表面(12)上并位于第一显示器(40)处于第一状态(S1)的位置的第一显示器(40); 以及第二显示器(50),其经由所述多个通孔(30)设置在所述一个表面(12)上并且位于所述第二显示器(50)处于第二状态(S2)中可见的位置。