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    • 5. 发明授权
    • Photovoltaic device
    • 光伏装置
    • US4776894A
    • 1988-10-11
    • US84947
    • 1987-08-13
    • Kaneo WatanabeYukio Nakashima
    • Kaneo WatanabeYukio Nakashima
    • H01L31/076H01L31/20H01L31/06
    • H01L31/076H01L31/20H01L31/204Y02E10/548Y02P70/521
    • A first photovoltaic device according to the present invention comprises a plurality of unit photovoltaic cells layered in optical series, each unit photovoltaic cell including an optically active layer made of amorphous silicon and two impurity doped layers of opposite conductivity types arranged at opposite sides of the optically active layer; wherein a first impurity doped layer of a first unit photovoltaic cell located at the contact interface with a second unit photovoltaic cell is made of a first amorphous silicon alloy of first conductivity type, having an optically forbidden band width wider than that of amorphous silicon, and a second impurity doped layer of said second photovoltaic cell located at said contact interface is made of a second amorphous silicon alloy, different from said first amorphous silicon alloy, of opposite conductivity type from said first conductivity type, having an optically forbidden band width wider than that of the amorphous silicon.A second photovoltaic device according to the present invention further comprises an additional impurity doper layer of either of the two conductivity types and made of non-monocrystalline ailicon, interposed between said first and second impurity layers.
    • 根据本发明的第一光伏器件包括以光学系列分层的多个单元光伏电池,每个单位光伏电池包括由非晶硅制成的光学有源层和布置在光学相对侧的相反导电类型的两个杂质掺杂层 活性层 其中位于与第二单位光伏电池的接触界面处的第一单位光伏电池的第一杂质掺杂层由第一导电类型的第一非晶硅合金制成,具有宽于无定形硅的光学禁止带宽,以及 位于所述接触界面处的所述第二光伏电池的第二杂质掺杂层由不同于所述第一非晶硅合金的与所述第一导电类型相反的导电类型的第二非晶硅合金制成,具有宽于 非晶硅的。 根据本发明的第二光伏器件还包括介于所述第一和第二杂质层之间的两种导电类型中的任一种并由非单晶硅制成的附加杂质层。