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1. 发明申请

US20110235408A1 SEMICONDUCTOR MEMORY DEVICE 有权
标题翻译：半导体存储器件
公开(公告)号：US20110235408A1
公开(公告)日：2011-09-29
申请号：US12987109
申请日：2011-01-08
申请人： Hiroyuki MINEMURA , Yumiko Anzai , Takahiro Morikawa , Toshimichi Shintani , Yoshitaka Sasago
发明人： Hiroyuki MINEMURA , Yumiko Anzai , Takahiro Morikawa , Toshimichi Shintani , Yoshitaka Sasago
IPC分类号： G11C11/00 , H01L47/00
CPC分类号： H01L27/2481 , G11C13/0004 , G11C13/0069 , G11C2013/008 , G11C2213/71 , G11C2213/75 , H01L27/2409 , H01L27/2454 , H01L45/06 , H01L45/1233 , H01L45/1286 , H01L45/1293 , H01L45/144
摘要： For decreasing a recording current and suppressing a cross erase simultaneously, a three-dimensional phase-change memory for attaining higher sensitivity and higher reliability by the provision of a chalcogenide type interface layer is provided, in which an electric resistivity, a thermal conductivity, and a melting point of the material of the interface layer are selected appropriately, thereby improving the current concentration to the phase-change material and thermal and material insulation property with Si channel upon writing.
摘要翻译：为了同时降低记录电流和抑制交叉擦除，提供了一种用于通过提供硫族化物型界面层来获得更高灵敏度和更高可靠性的三维相变存储器，其中电阻率，热导率和适当地选择界面层的材料的熔点，从而提高相变材料的电流浓度和写入时Si通道的热和材料绝缘性能。

2. 发明授权

US08735865B2 Semiconductor memory device 有权
标题翻译：半导体存储器件
公开(公告)号：US08735865B2
公开(公告)日：2014-05-27
申请号：US12987109
申请日：2011-01-08
申请人： Hiroyuki Minemura , Yumiko Anzai , Takahiro Morikawa , Toshimichi Shintani , Yoshitaka Sasago
发明人： Hiroyuki Minemura , Yumiko Anzai , Takahiro Morikawa , Toshimichi Shintani , Yoshitaka Sasago
IPC分类号： H01L29/02 , H01L29/06 , G11C11/00
CPC分类号： H01L27/2481 , G11C13/0004 , G11C13/0069 , G11C2013/008 , G11C2213/71 , G11C2213/75 , H01L27/2409 , H01L27/2454 , H01L45/06 , H01L45/1233 , H01L45/1286 , H01L45/1293 , H01L45/144
摘要： For decreasing a recording current and suppressing a cross erase simultaneously, a three-dimensional phase-change memory for attaining higher sensitivity and higher reliability by the provision of a chalcogenide type interface layer is provided, in which an electric resistivity, a thermal conductivity, and a melting point of the material of the interface layer are selected appropriately, thereby improving the current concentration to the phase-change material and thermal and material insulation property with Si channel upon writing.
摘要翻译：为了同时降低记录电流和抑制交叉擦除，提供了一种用于通过提供硫族化物型界面层来获得更高灵敏度和更高可靠性的三维相变存储器，其中电阻率，热导率和适当地选择界面层的材料的熔点，从而提高相变材料的电流浓度和写入时Si通道的热和材料绝缘性能。

3. 发明授权

US08830740B2 Semiconductor storage device 有权
标题翻译：半导体存储设备
公开(公告)号：US08830740B2
公开(公告)日：2014-09-09
申请号：US13814104
申请日：2011-08-26
申请人： Yoshitaka Sasago , Hiroyuki Minemura , Takashi Kobayashi , Toshimichi Shintani , Satoru Hanzawa , Masaharu Kinoshita
发明人： Yoshitaka Sasago , Hiroyuki Minemura , Takashi Kobayashi , Toshimichi Shintani , Satoru Hanzawa , Masaharu Kinoshita
IPC分类号： G11C11/00 , H01L47/00 , G11C13/00
CPC分类号： G11C13/0004 , G11C2213/71 , G11C2213/72 , G11C2213/75 , H01L27/2436 , H01L27/2463 , H01L27/2481 , H01L45/06 , H01L45/1233
摘要： The purpose of the present invention is to improve a rewriting transmission rate and reliability of a phase change memory. To attain the purpose, a plurality of phase change memory cells (SMC or USMC) which are provided in series between a word line (2) and a bit line (3) and have a selection element and a storage element that are parallel connected with each other are entirely set, and after that, a part of the cells corresponding to a data pattern is reset. Alternatively, the reverse of the operation is carried out.
摘要翻译：本发明的目的是提高相变存储器的重写传输速率和可靠性。为了实现该目的，在串行（2）和位线（3）之间串联提供多个相变存储单元（SMC或USMC），并且具有并联连接的选择元件和存储元件彼此完全设置，之后，与数据模式对应的单元的一部分被重置。或者，执行相反的操作。

4. 发明申请

US20130141968A1 SEMICONDUCTOR STORAGE DEVICE 有权
标题翻译：半导体存储设备
公开(公告)号：US20130141968A1
公开(公告)日：2013-06-06
申请号：US13814104
申请日：2011-08-26
申请人： Yoshitaka Sasago , Hiroyuki Minemura , Takashi Kobayashi , Toshimichi Shintani , Satoru Hanzawa , Masaharu Kinoshita
发明人： Yoshitaka Sasago , Hiroyuki Minemura , Takashi Kobayashi , Toshimichi Shintani , Satoru Hanzawa , Masaharu Kinoshita
IPC分类号： G11C13/00
CPC分类号： G11C13/0004 , G11C2213/71 , G11C2213/72 , G11C2213/75 , H01L27/2436 , H01L27/2463 , H01L27/2481 , H01L45/06 , H01L45/1233
摘要： The purpose of the present invention is to improve a rewriting transmission rate and reliability of a phase change memory. To attain the purpose, a plurality of phase change memory cells (SMC or USMC) which are provided in series between a word line (2) and a bit line (3) and have a selection element and a storage element that are parallel connected with each other are entirely set, and after that, a part of the cells corresponding to a data pattern is reset. Alternatively, the reverse of the operation is carried out.
摘要翻译：本发明的目的是提高相变存储器的重写传输速率和可靠性。为了实现该目的，在串行（2）和位线（3）之间串联提供多个相变存储单元（SMC或USMC），并且具有并联连接的选择元件和存储元件彼此完全设置，之后，与数据模式对应的单元的一部分被重置。或者，执行相反的操作。

5. 发明授权

US08642988B2 Non-volatile memory device 有权
标题翻译：非易失性存储器件
公开(公告)号：US08642988B2
公开(公告)日：2014-02-04
申请号：US13588112
申请日：2012-08-17
申请人： Masaharu Kinoshita , Yoshitaka Sasago , Takashi Kobayashi , Hiroyuki Minemura
发明人： Masaharu Kinoshita , Yoshitaka Sasago , Takashi Kobayashi , Hiroyuki Minemura
IPC分类号： H01L29/02
CPC分类号： H01L45/144 , G11C13/0004 , G11C2213/71 , G11C2213/74 , G11C2213/75 , G11C2213/78 , H01L27/2409 , H01L27/2481 , H01L45/06
摘要： A non-volatile memory device includes: a first line extending along a main surface of a substrate; a stack provided above the first line; a second line formed above the stack; a select element provided where the first and second lines intersect, the select element adapted to pass current in a direction perpendicular to the main surface; a second insulator film provided along a side surface of the stack; a channel layer provided along the second insulator film; an adhesion layer provided along the channel layer; and a variable resistance material layer provided along the adhesion layer, wherein the first and second lines are electrically connected via the select element and channel layer, a contact resistance via the adhesion layer between the channel layer and variable resistance material layer is low, and a resistance of the adhesion layer is high with respect to an extending direction of the channel layer.
摘要翻译：非易失性存储器件包括：沿衬底的主表面延伸的第一线; 提供在第一行之上的堆栈; 在堆叠之上形成第二线; 设置在所述第一和第二线相交的选择元件，所述选择元件适于在垂直于所述主表面的方向上传递电流; 沿着所述堆叠的侧表面设置的第二绝缘膜; 沿所述第二绝缘膜设置的沟道层; 沿着沟道层提供的粘合层; 以及沿着粘合层设置的可变电阻材料层，其中第一和第二线经由选择元件和沟道层电连接，通过沟道层和可变电阻材料层之间的粘合层的接触电阻低，并且粘合层的电阻相对于沟道层的延伸方向高。

6. 发明申请

US20130075684A1 NON-VOLATILE MEMORY DEVICE 有权
标题翻译：非易失性存储器件
公开(公告)号：US20130075684A1
公开(公告)日：2013-03-28
申请号：US13588112
申请日：2012-08-17
申请人： Masaharu Kinoshita , Yoshitaka Sasago , Takashi Kobayashi , Hiroyuki Minemura
发明人： Masaharu Kinoshita , Yoshitaka Sasago , Takashi Kobayashi , Hiroyuki Minemura
IPC分类号： H01L45/00 , B82Y99/00
CPC分类号： H01L45/144 , G11C13/0004 , G11C2213/71 , G11C2213/74 , G11C2213/75 , G11C2213/78 , H01L27/2409 , H01L27/2481 , H01L45/06
摘要： A non-volatile memory device includes: a first line extending along a main surface of a substrate; a stack provided above the first line; a second line formed above the stack; a select element provided where the first and second lines intersect, the select element adapted to pass current in a direction perpendicular to the main surface; a second insulator film provided along a side surface of the stack; a channel layer provided along the second insulator film; an adhesion layer provided along the channel layer; and a variable resistance material layer provided along the adhesion layer, wherein the first and second lines are electrically connected via the select element and channel layer, a contact resistance via the adhesion layer between the channel layer and variable resistance material layer is low, and a resistance of the adhesion layer is high with respect to an extending direction of the channel layer.
摘要翻译：非易失性存储器件包括：沿衬底的主表面延伸的第一线; 提供在第一行之上的堆栈; 在堆叠之上形成第二线; 设置在所述第一和第二线相交的选择元件，所述选择元件适于在垂直于所述主表面的方向上传递电流; 沿着所述堆叠的侧表面设置的第二绝缘膜; 沿所述第二绝缘膜设置的沟道层; 沿着沟道层提供的粘合层; 以及沿着粘合层设置的可变电阻材料层，其中第一和第二线经由选择元件和沟道层电连接，通过沟道层和可变电阻材料层之间的粘合层的接触电阻低，并且粘合层的电阻相对于沟道层的延伸方向高。

7. 发明授权

US08427865B2 Semiconductor storage device 有权
标题翻译：半导体存储设备
公开(公告)号：US08427865B2
公开(公告)日：2013-04-23
申请号：US13440225
申请日：2012-04-05
申请人： Akio Shima , Yoshitaka Sasago , Masaharu Kinoshita , Toshiyuki Mine , Norikatsu Takaura , Takahiro Morikawa , Kenzo Kurotsuchi , Satoru Hanzawa
发明人： Akio Shima , Yoshitaka Sasago , Masaharu Kinoshita , Toshiyuki Mine , Norikatsu Takaura , Takahiro Morikawa , Kenzo Kurotsuchi , Satoru Hanzawa
IPC分类号： G11C11/00 , H01L29/80
CPC分类号： H01L27/2481 , G11C13/0004 , G11C13/003 , G11C2213/71 , G11C2213/75 , G11C2213/79 , H01L27/2454 , H01L45/06 , H01L45/1233 , H01L45/144 , H01L45/1625 , H01L45/1683
摘要： There is provided a semiconductor storage device which is capable of further reducing a size of a memory cell, and increasing a storage capacity. Plural memory cells each including a transistor formed on a semiconductor substrate, and a variable resistive device having a resistance value changed by voltage supply and connected between source and drain terminals of the transistor are arranged longitudinally and in an array to configure a three-dimensional memory cell array. A memory cell structure has a double channel structure in which an inside of a switching transistor is filled with a variable resistance element, particularly, a phase change material. The switching transistor is turned off by application of a voltage to increase a channel resistance so that a current flows in the internal phase change material to operate the memory.
摘要翻译：提供了能够进一步减小存储单元的尺寸并增加存储容量的半导体存储装置。每个包括形成在半导体衬底上的晶体管的多个存储单元以及具有由电压供应改变并连接在晶体管的源极和漏极端子之间的电阻值的可变电阻器件被纵向排列成阵列以构成三维存储器单元格阵列。存储单元结构具有双通道结构，其中开关晶体管的内部填充有可变电阻元件，特别是相变材料。通过施加电压来切换开关晶体管，以增加沟道电阻，使得电流在内部相变材料中流动以操作存储器。

8. 发明申请

US20120211718A1 SEMICONDUCTOR STORAGE DEVICE 有权
标题翻译：半导体存储设备
公开(公告)号：US20120211718A1
公开(公告)日：2012-08-23
申请号：US13440225
申请日：2012-04-05
申请人： AKIO SHIMA , Yoshitaka Sasago , Masaharu Kinoshita , Toshiyuki Mine , Norikatsu Takaura , Takahiro Morikawa , Kenzo Kurotsuchi , Satoru Hanzawa
发明人： AKIO SHIMA , Yoshitaka Sasago , Masaharu Kinoshita , Toshiyuki Mine , Norikatsu Takaura , Takahiro Morikawa , Kenzo Kurotsuchi , Satoru Hanzawa
IPC分类号： H01L45/00
CPC分类号： H01L27/2481 , G11C13/0004 , G11C13/003 , G11C2213/71 , G11C2213/75 , G11C2213/79 , H01L27/2454 , H01L45/06 , H01L45/1233 , H01L45/144 , H01L45/1625 , H01L45/1683
摘要： There is provided a semiconductor storage device which is capable of further reducing a size of a memory cell, and increasing a storage capacity. Plural memory cells each including a transistor formed on a semiconductor substrate, and a variable resistive device having a resistance value changed by voltage supply and connected between source and drain terminals of the transistor are arranged longitudinally and in an array to configure a three-dimensional memory cell array. A memory cell structure has a double channel structure in which an inside of a switching transistor is filled with a variable resistance element, particularly, a phase change material. The switching transistor is turned off by application of a voltage to increase a channel resistance so that a current flows in the internal phase change material to operate the memory.
摘要翻译：提供了能够进一步减小存储单元的尺寸并增加存储容量的半导体存储装置。每个包括形成在半导体衬底上的晶体管的多个存储单元以及具有由电压供应改变并连接在晶体管的源极和漏极端子之间的电阻值的可变电阻器件被纵向排列成阵列以配置三维存储器单元格阵列。存储单元结构具有双通道结构，其中开关晶体管的内部填充有可变电阻元件，特别是相变材料。通过施加电压来切换开关晶体管，以增加沟道电阻，使得电流在内部相变材料中流动以操作存储器。

9. 发明授权

US08866123B2 Non-volatile memory device and production method thereof 有权
标题翻译：非易失性存储器件及其制造方法
公开(公告)号：US08866123B2
公开(公告)日：2014-10-21
申请号：US13884331
申请日：2010-11-22
申请人： Yoshitaka Sasago , Masaharu Kinoshita , Takahiro Morikawa , Akio Shima , Takashi Kobayashi
发明人： Yoshitaka Sasago , Masaharu Kinoshita , Takahiro Morikawa , Akio Shima , Takashi Kobayashi
IPC分类号： H01L47/00 , H01L45/00 , H01L29/792 , H01L27/24 , H01L29/66 , H01L27/115
CPC分类号： H01L27/2436 , H01L27/1157 , H01L27/11582 , H01L27/2409 , H01L27/2454 , H01L27/2481 , H01L27/249 , H01L29/66833 , H01L29/7926 , H01L45/06 , H01L45/1226 , H01L45/1233 , H01L45/144 , H01L45/1608 , H01L45/1616 , H01L45/1683
摘要： A vertical chain memory includes two-layer select transistors having first select transistors which are vertical transistors arranged in a matrix, and second select transistors which are vertical transistors formed on the respective first select transistors, and a plurality of memory cells connected in series on the two-layer select transistors. With this configuration, the adjacent select transistors are prevented from being selected by respective shared gates, the plurality of two-layer select transistors can be selected, independently, and a storage capacity of a non-volatile storage device is prevented from being reduced.
摘要翻译：垂直链式存储器包括具有第一选择晶体管的两层选择晶体管，它们是以矩阵形式排列的垂直晶体管，第二选择晶体管是形成在各个第一选择晶体管上的垂直晶体管，以及多个存储单元串联连接双层选择晶体管。利用这种配置，防止相邻的选择晶体管被相应的共享栅极选择，可以独立地选择多个两层选择晶体管，并且防止非易失性存储装置的存储容量减小。

10. 发明申请

US20110049454A1 SEMICONDUCTOR DEVICE 审中-公开
标题翻译：半导体器件
公开(公告)号：US20110049454A1
公开(公告)日：2011-03-03
申请号：US12305890
申请日：2006-06-23
申请人： Motoyasu Terao , Yuichi Matsui , Tsuyoshi Koga , Nozomu Matsuzaki , Norikatsu Takaura , Yoshihisa Fujisaki , Kenzo Kurotsuchi , Takahiro Morikawa , Yoshitaka Sasago , Junko Ushiyama , Akemi Hirotsune
发明人： Motoyasu Terao , Yuichi Matsui , Tsuyoshi Koga , Nozomu Matsuzaki , Norikatsu Takaura , Yoshihisa Fujisaki , Kenzo Kurotsuchi , Takahiro Morikawa , Yoshitaka Sasago , Junko Ushiyama , Akemi Hirotsune
IPC分类号： H01L45/00
CPC分类号： H01L45/1675 , H01L27/2436 , H01L45/06 , H01L45/12 , H01L45/1233 , H01L45/144
摘要： In a phase-change memory, an interface layer is inserted between a chalcogenide material layer and a plug. The interface layer is arranged so as not to cover the entire interface of a plug-like electrode. When the plug is formed at an upper part than the chalcogenide layer, the degree of integration is increased. The interface layer is formed by carrying out sputtering using an oxide target, or, by forming a metal film by carrying out sputtering using a metal target followed by oxidizing the metal film in an oxidation atmosphere such as oxygen radical, oxygen plasma, etc.
摘要翻译：在相变存储器中，界面层插入硫族化物材料层和插塞之间。界面层被布置成不覆盖插塞状电极的整个界面。当塞子形成在比硫族化物层的上部时，积分度增加。通过使用氧化物靶进行溅射而形成界面层，或者通过使用金属靶进行溅射而形成金属膜，然后在氧自由基，氧等离子体等的氧化气氛中氧化金属膜。

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