会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • MANUFACTURE OF SEMICONDUCTOR DEVICE
    • 半导体器件的制造
    • US20080145987A1
    • 2008-06-19
    • US11943639
    • 2007-11-21
    • Akio Shima
    • Akio Shima
    • H01L21/336
    • H01L21/823814H01L21/26513H01L21/268H01L21/8249H01L27/1052
    • A reflectance-controlling layer whose reflectance to irradiation of laser light becomes lower as a thickness thereof becomes thinner is formed on a semiconductor substrate having a first region and a second region. Thereafter, the reflectance-controlling layer on the first region is etched. Then, a laser light is irradiated to the semiconductor substrate to anneal an n−-type semiconductor region and an n+-type semiconductor region of the first region. In the same manner, after the reflectance-controlling layer is formed on the semiconductor substrate, the reflectance-controlling layer on the second region is etched. Then, a laser light is irradiated to the semiconductor substrate to anneal a p−-type semiconductor region and a p+-type semiconductor region of the second region.
    • 在具有第一区域和第二区域的半导体衬底上形成反射率控制层,其反射率随着其厚度变薄而变低。 此后,蚀刻第一区域上的反射率控制层。 然后,将激光照射到半导体衬底上,以退火第一区域的n + O - 型半导体区域和n + + + / - 半导体区域。 以相同的方式,在半导体衬底上形成反射控制层之后,蚀刻第二区域上的反射控制层。 然后,将激光照射到半导体衬底上,以退火第二区域的p + / - 型半导体区域和p + + + / - 半导体区域。