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1. 发明授权

US06214104B1 Coating solution for forming silica coating and method of forming silica coating 失效
标题翻译：用于形成二氧化硅涂层的涂层溶液和形成二氧化硅涂层的方法
公开(公告)号：US06214104B1
公开(公告)日：2001-04-10
申请号：US08692005
申请日：1996-08-02
申请人： Hiroyuki Iida , Hiroki Endo , Hideya Kobari , Yoshio Hagiwara , Toshimasa Nakayama
发明人： Hiroyuki Iida , Hiroki Endo , Hideya Kobari , Yoshio Hagiwara , Toshimasa Nakayama
IPC分类号： B05D712
CPC分类号： C09D4/00 , C08G77/04
摘要： A substrate onto which a coating solution is dropped is rotated at a low speed in a first rotational mode and then after an interval of time at a high speed in a second rotational mode. At the end of the first rotational mode, the coating solution is coated to a thickness larger than a given thickness on irregularities on the substrate such as twin patterns and a global pattern, with the coating solution being coated to a thickness smaller than the given thickness between the twin patterns. Subsequently, at the start of the second rotational mode, the coating solution coated on the twin patterns and the global pattern flows into spaces between these patterns. At the end of the second rotational mode, the thickness of the coating solution on the twin patterns is almost nil, and the thickness of the coating solution on the global pattern is small in its entirety though it is somewhat large in the central area of the global pattern.
摘要翻译：在第一旋转模式中以低速旋转涂布溶液滴落到其上的基板，然后在第二旋转模式中以高速度在一段时间之后旋转。在第一旋转模式结束时，将涂布溶液涂覆到基板上的不规则部分上的厚度大于给定厚度，例如双图案和全局图案，涂布溶液的涂布厚度小于给定厚度在双胞胎之间。随后，在第二旋转模式开始时，涂覆在双模式上的涂布溶液和全局图案流入这些图案之间的空间。在第二旋转模式结束时，两个图案上的涂布溶液的厚度几乎为零，并且全局图案上的涂布溶液的厚度整体上小，但是其中心区域全球格局。

2. 发明授权

US5614271A Method for the formation of a silica-based coating film 失效
标题翻译：形成二氧化硅基涂膜的方法
公开(公告)号：US5614271A
公开(公告)日：1997-03-25
申请号：US692187
申请日：1996-08-05
申请人： Tatsuhiko Shibuya , Susumu Okano , Hideya Kobari , Yoshio Hagiwara , Toshimasa Nakayama
发明人： Tatsuhiko Shibuya , Susumu Okano , Hideya Kobari , Yoshio Hagiwara , Toshimasa Nakayama
IPC分类号： B05D3/06 , B05D7/00 , B05D7/24 , C04B41/50 , C09D183/00 , C09D183/16 , C23C18/12 , C23C18/14 , H01L21/316 , B29C71/02
CPC分类号： H01L21/316 , C04B41/5035 , C09D183/16 , C23C18/1212 , C23C18/122 , C23C18/1279 , C23C18/1283 , C23C18/1295 , C23C18/14 , C04B2111/00844
摘要： Proposed is an improved method for the formation of a silica-based coating film on the surface of a substrate such as a silicon wafer in the manufacture of semiconductor devices by coating the substrate surface with a polysilazane-containing coating solution followed by conversion of the coating layer of polysilazane into a silica-based coating film. The method comprises drying the coating layer of the polysilazane according to a heating schedule at a specified heating rate with continuous or stepwise increase of the temperature up to 240.degree. to 350.degree. C. followed by an irradiation treatment with far ultraviolet light at a temperature of 240.degree. to 350.degree. C. and then by a baking treatment at 350.degree. to 800.degree. C.
摘要翻译：提出了在半导体器件的制造中在硅晶片等基板的表面上形成二氧化硅类涂膜的改进方法，其中通过用含聚硅氮烷的涂布溶液涂布基板表面，随后将涂层转化聚硅氮烷层形成二氧化硅基涂膜。该方法包括以规定的加热速度按照加热方案干燥聚硅氮烷的涂层，连续或逐步升高温度至240℃至350℃，然后在远紫外光的温度下进行辐射处理 240℃至350℃，然后在350℃至800℃下进行烘烤处理。

3. 发明授权

US5762697A Coating solution for silica-based coating film and method for the preparation thereof 失效
标题翻译：二氧化硅系涂膜用涂布液及其制备方法
公开(公告)号：US5762697A
公开(公告)日：1998-06-09
申请号：US749845
申请日：1996-11-15
申请人： Yoshinori Sakamoto , Yoshio Hagiwara , Toshimasa Nakayama
发明人： Yoshinori Sakamoto , Yoshio Hagiwara , Toshimasa Nakayama
IPC分类号： C08G77/06 , C08J3/09 , C09D183/04 , H01L21/316 , C09D183/06
CPC分类号： C08J3/095 , C08G77/06 , C09D183/04 , C08J2383/04
摘要： Proposed is a coating solution for the formation of a silica-based coating film on the surface of a substrate used in the manufacturing process of semiconductor devices as well as a method for the coating solution, which exhibits excellent storage stability without gelation and is capable of forming a silica-based coating film free from the troubles due to evolution of gases such as crack formation even when the coating film has a relatively large thickness. The coating solution is prepared by the hydrolysis reaction of a trialkoxy silane such as triethoxy silane dissolved in propyleneglycol dimethyl ether in a specified concentration with addition of a specified amount of water followed by removal of the alcohol formed by the hydrolysis reaction of the trialkoxy silane by distillation to such an extent that the content of the alcohol in the coating solution does not exceed 10% by weight or, preferably, 3% by weight.
摘要翻译：提出了用于在半导体器件的制造工艺中使用的基板表面上形成二氧化硅基涂膜的涂布溶液以及涂布溶液的方法，其表现出优异的储存稳定性而没有凝胶化，并且能够形成即使当涂膜具有相对较大的厚度时也由于诸如裂纹形成等气体的析出而无法解决的二氧化硅系涂膜。通过加入特定量的水，然后除去由三烷氧基硅烷的水解反应形成的醇，通过溶解在规定浓度的丙二醇二甲醚中的三烷氧基硅烷如三乙氧基硅烷等水解反应制备涂布溶液，蒸馏到使涂布溶液中的醇的含量不超过10重量％，优选3重量％的程度。

4. 发明授权

US5795378A Coating solution for silica-based coating film and method for the preparation thereof 失效
公开(公告)号：US5795378A
公开(公告)日：1998-08-18
申请号：US935510
申请日：1997-09-23
申请人： Yoshinori Sakamoto , Yoshio Hagiwara , Toshimasa Nakayama
发明人： Yoshinori Sakamoto , Yoshio Hagiwara , Toshimasa Nakayama
IPC分类号： C08G77/06 , C08J3/09 , C09D183/04 , H01L21/316 , C09D183/06
CPC分类号： C08J3/095 , C08G77/06 , C09D183/04 , C08J2383/04
摘要： Proposed is a coating solution for the formation of a silica-based coating film on the surface of a substrate used in the manufacturing process of semiconductor devices as well as a method for the coating solution, which exhibits excellent storage stability without gelation and is capable of forming a silica-based coating film free from the troubles due to evolution of gases such as crack formation even when the coating film has a relatively large thickness. The coating solution is prepared by the hydrolysis reaction of a trialkoxy silane such as triethoxy silane dissolved in propyleneglycol dimethyl ether in a specified concentration with addition of a specified amount of water followed by removal of the alcohol formed by the hydrolysis reaction of the trialkoxy silane by distillation to such an extent that the content of the alcohol in the coating solution does not exceed 10% by weight or, preferably, 3% by weight.

5. 发明授权

US5614251A Method and liquid coating composition for the formation of silica-based coating film on substrate surface 失效
标题翻译：用于在基材表面形成二氧化硅基涂膜的方法和液体涂料组合物
公开(公告)号：US5614251A
公开(公告)日：1997-03-25
申请号：US564710
申请日：1995-11-29
申请人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
发明人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
IPC分类号： C08G77/18 , C03C1/00 , C08G77/06 , C09D183/02 , C09D183/04 , C09D183/05 , B05D3/02
CPC分类号： C03C1/008 , C09D183/02 , C09D183/04
摘要： Proposed is a liquid coating composition for the formation of a siliceous coating film having good storage stability against gelation for the protection, levelling or electric insulation of various substrate surfaces. The composition is a uniform solution comprising:(A) a partial cohydrolysis-cocondensation product of(a) a first hydrolyzable silane compound represented by the general formulaHSi(OR).sub.3, in which each R is, independently from the others, an alkyl group having 1 to 4 carbon atoms or a phenyl group, and(b) a second hydrolyzable silane compound represented by the general formulaSi(OR).sub.4, in which each R has the same meaning as defined above,in a molar ratio of (a):(b) in the range from 1:9 to 9:1; and (B) an organic solvent to dissolve the component (A). The storage stability of the coating composition can be improved by removing the alcohol contained therein as the hydrolysis product of the silane compounds to such a content as not to exceed 15% by weight.
摘要翻译：提出了一种液体涂料组合物，用于形成具有良好保存稳定性的硅质涂膜，用于各种基材表面的保护，调平或电绝缘。该组合物是一种均匀溶液，其包含：（A）（a）由通式为H（OR）3表示的第一可水解硅烷化合物的部分共水解 - 缩聚产物，其中每个R独立地为烷基具有1至4个碳原子或苯基，和（b）由通式Si（OR）4表示的第二可水解硅烷化合物，其中每个R具有与上述相同的含义，摩尔比为（a）：（b）在1：9至9：1的范围内; 和（B）有机溶剂以溶解组分（A）。通过将其中含有的醇作为硅烷化合物的水解产物除去不超过15重量％的含量，可以提高涂料组合物的保存稳定性。

6. 发明授权

US5496402A Method and liquid coating composition for the formation of silica-based coating film on substrate surface 失效
标题翻译：用于在基材表面形成二氧化硅基涂膜的方法和液体涂料组合物
公开(公告)号：US5496402A
公开(公告)日：1996-03-05
申请号：US307063
申请日：1994-09-16
申请人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
发明人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
IPC分类号： C08G77/18 , C03C1/00 , C08G77/06 , C09D183/02 , C09D183/04 , C09D183/05 , C09D183/06 , C03C3/06
CPC分类号： C03C1/008 , C09D183/02 , C09D183/04
摘要： Proposed is a liquid coating composition for the formation of a siliceous coating film having good storage stability against gelation for the protection, levelling or electric insulation of various substrate surfaces. The composition is a uniform solution comprising:(A) a partial cohydrolysis-cocondensation product of(a) a first hydrolyzable silane compound represented by the general formulaHSi(OR).sub.3, in which each R is, independently from the others, an alkyl group having 1 to 4 carbon atoms or a phenyl group, and(b) a second hydrolyzable silane compound represented by the general formulaSi(OR).sub.4, in which each R has the same meaning as defined above, in a molar ratio of (a):(b) in the range from 1:9 to 9:1; and (B) an organic solvent to dissolve the component (A). The storage stability of the coating composition can be improved by removing the alcohol contained therein as the hydrolysis product of the silane compounds to such a content as not to exceed 15% by weight.
摘要翻译：提出了一种液体涂料组合物，用于形成具有良好保存稳定性的硅质涂膜，用于各种基材表面的保护，调平或电绝缘。该组合物是均匀的溶液，其包含：（A）（a）由通式HSi（OR）3表示的第一可水解硅烷化合物的部分共水解 - 缩聚产物，其中每个R独立地为烷基具有1至4个碳原子的基团或苯基，和（b）由通式Si（OR）4表示的第二可水解硅烷化合物，其中每个R具有与上述相同的含义，摩尔比为 a）:( b）在1:9至9:1的范围内; 和（B）有机溶剂以溶解组分（A）。通过将其中含有的醇作为硅烷化合物的水解产物除去不超过15重量％的含量，可以提高涂料组合物的保存稳定性。

7. 发明授权

US5457153A Liquid coating composition 失效
标题翻译：液体涂料组合物
公开(公告)号：US5457153A
公开(公告)日：1995-10-10
申请号：US289032
申请日：1994-08-11
申请人： Yoshio Hagiwara , Isao Satoh , Hatsuyuki Tanaka , Toshimasa Nakayama
发明人： Yoshio Hagiwara , Isao Satoh , Hatsuyuki Tanaka , Toshimasa Nakayama
IPC分类号： G02B5/20 , C08K5/20 , C08K5/435 , G03F7/004 , G03F7/11 , H01L21/027 , H05K3/28 , C08K5/02 , C08L27/14
CPC分类号： C08K5/20 , C08K5/435
摘要： Proposed is an aqueous coating composition based on a polyvinyl alcohol suitable for use to provide a protective film on various electronic materials. The composition comprises, as dissolved in water, a partially saponified polyvinyl alcohol having a specified average degree of polymerization and a specified degree of saponification, a fluorine-containing surface active agent and, optionally, a quaternary ammonium hydroxide. The liquid coating composition is preferably freed from sodium ions as an impurity by an ion-exchange treatment.
摘要翻译：提出了一种基于适用于在各种电子材料上提供保护膜的聚乙烯醇的水性涂料组合物。该组合物包含溶解在水中的具有指定平均聚合度和特定皂化度的部分皂化的聚乙烯醇，含氟表面活性剂和任选的季铵氢氧化物。液体涂料组合物优选通过离子交换处理除去作为杂质的钠离子。

8. 发明授权

US06620978B2 Positive photoresist composition and process for synthesizing polyphenol compound 失效
标题翻译：正光致抗蚀剂组合物和合成多酚化合物的方法
公开(公告)号：US06620978B2
公开(公告)日：2003-09-16
申请号：US10207840
申请日：2002-07-31
申请人： Satoshi Shimatani , Ken Miyagi , Satoshi Niikura , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Satoshi Shimatani , Ken Miyagi , Satoshi Niikura , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： C07C3912
CPC分类号： G03F7/022
摘要： The present invention provides a positive photoresist composition including (A) an alkali-soluble resin and (B) a photosensitizer, and the ingredient (B) is a quinonediazide ester of, for example, 2,6-bis[4-hydroxy-3-(2-hydroxy-3,5-dimethylbenzyl)-2,5-dimethylbenzyl]-4-methylphenol, where the average degree of esterification of 20% to 80%.
摘要翻译：本发明提供了包含（A）碱溶性树脂和（B）光敏剂的正性光致抗蚀剂组合物，成分（B）是例如2,6-双[4-羟基-3 - （2-羟基-3,5-二甲基苄基）-2,5-二甲基苄基] -4-甲基苯酚，其中平均酯化度为20％至80％。

9. 发明授权

US06379859B2 Positive photoresist composition and process for forming resist pattern using same 失效
公开(公告)号：US06379859B2
公开(公告)日：2002-04-30
申请号：US09322978
申请日：1999-06-01
申请人： Takako Suzuki , Sachiko Tamura , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Takako Suzuki , Sachiko Tamura , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7023
CPC分类号： G03F7/0226 , G03F7/022
摘要： Disclosed are a positive photoresist composition including (A) an alkali-soluble resin, (B) a photosensitizer containing a quinonediazide ester of, e.g., bis[2,5-dimethyl-3-(2-hydroxy-5-methylbenzyl)-4-hydroxyphenyl]methane and (C) e.g., 2,6-bis(2,5-dimethyl-4-hydroxybenzyl)-4-methylphenol; and a process including the steps of coating the composition onto a 8 to 12-inch substrate, drying, exposing and developing the same. The composition which can form a pattern having a good shape whose dimensional changes are minimized in a wide range over surface of the substrate, particularly in processes using a large-diameter substrate, and the process for forming a resist pattern using the composition are provided.

10. 发明授权

US06268108B1 Composition for forming antireflective coating film and method for forming resist pattern using same 失效
标题翻译：用于形成抗反射涂膜的组合物和使用其形成抗蚀剂图案的方法
公开(公告)号：US06268108B1
公开(公告)日：2001-07-31
申请号：US09116460
申请日：1998-07-16
申请人： Etsuko Iguchi , Masakazu Kobayashi , Hiroshi Komano , Toshimasa Nakayama
发明人： Etsuko Iguchi , Masakazu Kobayashi , Hiroshi Komano , Toshimasa Nakayama
IPC分类号： G03F7004
CPC分类号： G03F7/091
摘要： The present invention provides a composition for forming an antireflective coating film which is not liable to intermixing between the resist composition layer and the antireflective coating layer and a method for forming a resist pattern having an excellent dimensional accuracy and section shape. The composition consists of (A) a compound which produces an acid upon irradiation with actinic rays, (B) a compound which undergoes crosslinking reaction in the presence of an acid, (C) a dye and (D) an organic solvent. The method for forming a resist pattern comprises applying the composition for forming an antireflective coating film to a semiconductor substrate, drying the composition coated, irradiating the entire surface of the coated material with actinic rays so that it undergoes crosslinking reaction to form an antireflective coating film thereon, applying a resist composition to the antireflective coating film, drying the coated material, and then subjecting the coated material to lithographic processing to form a resist pattern thereon.
摘要翻译：本发明提供了一种用于形成不易于在抗蚀剂组合物层和抗反射涂层之间混合的抗反射涂膜的组合物和形成具有优异的尺寸精度和截面形状的抗蚀剂图案的方法。组合物由（A）在光化射线照射时产生酸的化合物，（B）在酸存在下进行交联反应的化合物，（C）染料和（D）有机溶剂。形成抗蚀剂图案的方法包括将用于形成抗反射涂膜的组合物施加到半导体衬底上，干燥涂覆的组合物，用光化射线照射涂覆材料的整个表面，使其经历交联反应以形成抗反射涂膜在其上涂布抗蚀剂组合物到抗反射涂膜上，干燥涂覆的材料，然后对涂覆材料进行光刻处理以在其上形成抗蚀剂图案。

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