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1. 发明授权

US07880392B2 Plasma producing method and apparatus as well as plasma processing apparatus 有权
标题翻译：等离子体制造方法和装置以及等离子体处理装置
公开(公告)号：US07880392B2
公开(公告)日：2011-02-01
申请号：US11586583
申请日：2006-10-26
申请人： Kenji Kato , Hiroshige Deguchi , Hitoshi Yoneda , Kiyoshi Kubota , Akinori Ebe , Yuichi Setsuhara
发明人： Kenji Kato , Hiroshige Deguchi , Hitoshi Yoneda , Kiyoshi Kubota , Akinori Ebe , Yuichi Setsuhara
IPC分类号： C23C16/00
CPC分类号： H01J37/32954 , H01J37/321 , H01J37/32174
摘要： Plasma producing method and apparatus wherein a plurality of high-frequency antennas are arranged in a plasma producing chamber, and a high-frequency power supplied from a high-frequency power supply device (including a power source, a phase controller and the like) is applied to a gas in the chamber from the antennas to produce inductively coupled plasma. At least some of the plurality of high-frequency antennas are arranged in a fashion of such parallel arrangement that the antennas successively neighbor to each other and each of the antennas is opposed to the neighboring antenna. The high-frequency power supply device controls a phase of a high-frequency voltage applied to each antenna, and thereby controls an electron temperature of the inductively coupled plasma.
摘要翻译：等离子体制造方法和装置，其中多个高频天线布置在等离子体产生室中，并且从高频电源装置（包括电源，相位控制器等）提供的高频电力是从天线施加到腔室中的气体以产生电感耦合等离子体。多个高频天线中的至少一些以这样的并行布置的方式布置，使得天线彼此相邻并且每个天线与相邻天线相对。高频电源装置控制施加到每个天线的高频电压的相位，从而控制感应耦合等离子体的电子温度。

2. 发明申请

US20100189921A1 PLASMA GENERATING METHOD, PLASMA GENERATING APPARATUS, AND PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：等离子体发生方法，等离子体发生装置和等离子体处理装置
公开(公告)号：US20100189921A1
公开(公告)日：2010-07-29
申请号：US12753379
申请日：2010-04-02
申请人： Hiroshige DEGUCHI , Hitoshi Yoneda , Kenji Kato , Akinori Ebe , Yuichi Setsuhara
发明人： Hiroshige DEGUCHI , Hitoshi Yoneda , Kenji Kato , Akinori Ebe , Yuichi Setsuhara
IPC分类号： B01J19/08
CPC分类号： C23C16/509 , H01J37/32192 , H01J37/3222
摘要： A plasma generating method and apparatus which use plural high-frequency antennas 2 to generate inductively coupled plasma, and a plasma processing apparatus using the apparatus. The antennas 2 are identical to one another. Application of a high-frequency electric power to the antennas 2 is performed from a high-frequency power source 4 which is disposed commonly to the antennas 2, through one matching circuit 5 and one busbar 3. The busbar 3 is partitioned into sections the number of which is equal to that of the antennas, while setting a portion which is connected to the matching circuit 5, as a reference. One-end portions of the antennas are connected to corresponding sections 31, 32, 33 through power supplying lines 311, 321, 331. The other end portions of the antennas are grounded. The impedances of the sections of the busbar, and those of the power supplying lines are adjusted so that same currents flow through the antennas, and a same voltage is applied to the antennas. Therefore, the inductively coupled plasma is generated while uniformalizing high-frequency electric powers supplied to the antennas 2.
摘要翻译：使用多个高频天线2生成电感耦合等离子体的等离子体产生方法和装置以及使用该装置的等离子体处理装置。天线2彼此相同。通过一个匹配电路5和一个母线3，从天线2共同配置的高频电源4向天线2施加高频电力。母线3被分割为数字在设置连接到匹配电路5的部分作为参考时，其等于天线的天线。天线的一端部分通过供电线311,321,331连接到对应部分31,32,33。天线的另一端接地。调节母线段和供电线的部分的阻抗，使得相同的电流流过天线，并且向天线施加相同的电压。因此，在对提供给天线2的高频电力进行均匀化的同时产生电感耦合等离子体。

3. 发明申请

US20070193512A1 Plasma generating method, plasma generating apparatus, and plasma processing apparatus 审中-公开
标题翻译：等离子体产生方法，等离子体产生装置和等离子体处理装置
公开(公告)号：US20070193512A1
公开(公告)日：2007-08-23
申请号：US11707862
申请日：2007-02-20
申请人： Hiroshige Deguchi , Hitoshi Yoneda , Kenji Kato , Akinori Ebe , Yuichi Setsuhara
发明人： Hiroshige Deguchi , Hitoshi Yoneda , Kenji Kato , Akinori Ebe , Yuichi Setsuhara
IPC分类号： C23C16/00
CPC分类号： C23C16/509 , H01J37/32192 , H01J37/3222
摘要： One or more high-frequency antennas is allocated to and disposed in one cubic space C having a side of 0.4 [m] in a plasma generating chamber 1 or in each of plural cubic spaces C, each having a side of 0.4 [m], adjacent ones of the plural cubic spaces being continuous to each other without forming a gap therebetween. The total length L [m] of the high-frequency antennas in each of the cubic spaces C is set in a range which satisfies relationships of (0.2/P)
摘要翻译：在等离子体发生室1中或在具有0.4 [m]侧的多个立方体空间C中的每一个中分配一个或多个高频天线并将其布置在具有0.4 [m]侧的一个立方体C中，多个立体空间中的相邻的空间彼此连续，而不形成间隙。每个立方体空间C中的高频天线的总长度L [m]被设定为满足关于电感耦合等离子体产生（0.2 / P）

4. 发明申请

US20070144672A1 Plasma producing method and apparatus as well as plasma processing apparatus 审中-公开
标题翻译：等离子体制造方法和装置以及等离子体处理装置
公开(公告)号：US20070144672A1
公开(公告)日：2007-06-28
申请号：US11586508
申请日：2006-10-26
申请人： Kenji Kato , Hiroshige Deguchi , Hitoshi Yoneda , Kiyoshi Kubota , Akinori Ebe , Yuichi Setsuhara
发明人： Kenji Kato , Hiroshige Deguchi , Hitoshi Yoneda , Kiyoshi Kubota , Akinori Ebe , Yuichi Setsuhara
IPC分类号： C23F1/00 , C23C16/00
CPC分类号： C23C16/509 , H01J37/321 , H01J37/32183
摘要： Plasma producing method and apparatus as well as plasma processing apparatus including the plasma producing apparatus wherein one or more high-frequency antennas are arranged in a plasma producing chamber, and a high-frequency power is applied to a gas in the chamber from the antenna(s) to produce inductively coupled plasma. Impedance of the high-frequency antenna is set in a range of 45 Ω or lower.
摘要翻译：等离子体制造方法和装置以及包括等离子体制造装置的等离子体处理装置，其中一个或多个高频天线布置在等离子体产生室中，并且高频电力从天线施加到腔室中的气体 s）以产生电感耦合等离子体。高频天线的阻抗设定在45Ω以下的范围内。

5. 发明申请

US20070193513A1 Plasma generating method, plasma generating apparatus, and plasma processing apparatus 审中-公开
标题翻译：等离子体产生方法，等离子体产生装置和等离子体处理装置
公开(公告)号：US20070193513A1
公开(公告)日：2007-08-23
申请号：US11708058
申请日：2007-02-20
申请人： Hiroshige Deguchi , Hitoshi Yoneda , Kenji Kato , Akinori Ebe , Yuichi Setsuhara
发明人： Hiroshige Deguchi , Hitoshi Yoneda , Kenji Kato , Akinori Ebe , Yuichi Setsuhara
IPC分类号： C23C16/00
CPC分类号： C23C16/509 , H01J37/32192 , H01J37/3222
摘要： A plasma generating method and apparatus which use plural high-frequency antennas 2 to generate inductively coupled plasma, and a plasma processing apparatus using the apparatus. The antennas 2 are identical to one another. Application of a high-frequency electric power to the antennas 2 is performed from a high-frequency power source 4 which is disposed commonly to the antennas 2, through one matching circuit 5 and one busbar 3. The busbar 3 is partitioned into sections the number of which is equal to that of the antennas, while setting a portion which is connected to the matching circuit 5, as a reference. One-end portions of the antennas are connected to corresponding sections 31, 32, 33 through power supplying lines 311, 321, 331. The other end portions of the antennas are grounded. The impedances of the sections of the busbar, and those of the power supplying lines are adjusted so that same currents flow through the antennas, and a same voltage is applied to the antennas. Therefore, the inductively coupled plasma is generated while uniformalizing high-frequency electric powers supplied to the antennas 2.
摘要翻译：使用多个高频天线2生成电感耦合等离子体的等离子体产生方法和装置以及使用该装置的等离子体处理装置。天线2彼此相同。通过一个匹配电路5和一个母线3，从天线2共同配置的高频电源4向天线2施加高频电力。母线3被划分为多个在设置连接到匹配电路5的部分作为参考时，其等于天线的天线。天线的一端部分通过供电线311,321,331连接到对应部分31,32,33。天线的另一端接地。调节母线段和供电线的部分的阻抗，使得相同的电流流过天线，并且向天线施加相同的电压。因此，在对提供给天线2的高频电力进行均匀化的同时产生电感耦合等离子体。

6. 发明申请

US20070095287A1 Plasma producing method and apparatus as well as plasma processing apparatus 有权
标题翻译：等离子体制造方法和装置以及等离子体处理装置
公开(公告)号：US20070095287A1
公开(公告)日：2007-05-03
申请号：US11586583
申请日：2006-10-26
申请人： Kenji Kato , Hiroshige Deguchi , Hitoshi Yoneda , Kiyoshi Kubota , Akinori Ebe , Yuichi Setsuhara
发明人： Kenji Kato , Hiroshige Deguchi , Hitoshi Yoneda , Kiyoshi Kubota , Akinori Ebe , Yuichi Setsuhara
IPC分类号： C23C16/00
CPC分类号： H01J37/32954 , H01J37/321 , H01J37/32174
摘要： Plasma producing method and apparatus wherein a plurality of high-frequency antennas are arranged in a plasma producing chamber, and a high-frequency power supplied from a high-frequency power supply device (including a power source, a phase controller and the like) is applied to a gas in the chamber from the antennas to produce inductively coupled plasma. At least some of the plurality of high-frequency antennas are arranged in a fashion of such parallel arrangement that the antennas successively neighbor to each other and each of the antennas is opposed to the neighboring antenna. The high-frequency power supply device controls a phase of a high-frequency voltage applied to each antenna, and thereby controls an electron temperature of the inductively coupled plasma.
摘要翻译：等离子体制造方法和装置，其中多个高频天线布置在等离子体产生室中，并且从高频电源装置（包括电源，相位控制器等）提供的高频电力是从天线施加到腔室中的气体以产生电感耦合等离子体。多个高频天线中的至少一些以这样的并行布置的方式布置，使得天线彼此相邻并且每个天线与相邻天线相对。高频电源装置控制施加到每个天线的高频电压的相位，从而控制感应耦合等离子体的电子温度。

7. 发明申请

US20070144440A1 Plasma producing method and apparatus as well as plasma processing apparatus 审中-公开
标题翻译：等离子体制造方法和装置以及等离子体处理装置
公开(公告)号：US20070144440A1
公开(公告)日：2007-06-28
申请号：US11586504
申请日：2006-10-26
申请人： Hitoshi Yoneda , Hiroshige Deguchi , Kenji Kato , Yuichi Setsuhara
发明人： Hitoshi Yoneda , Hiroshige Deguchi , Kenji Kato , Yuichi Setsuhara
IPC分类号： C23C16/00
CPC分类号： C23C16/509 , H01J37/321 , H01J37/3211
摘要： Plasma producing method and apparatus as well as plasma processing apparatus utilizing the plasma producing apparatus wherein a plurality of high-frequency antennas are arranged in a plasma producing chamber, and a high-frequency power supplied from a high-frequency power supply device (including a power source, a matching box and the like) is applied to a gas in the chamber from the antennas to produce inductively coupled plasma. At least some of the plurality of high-frequency antennas are arranged in a fashion of such parallel arrangement that the antennas successively neighbor to each other and each of the antennas is opposed to the neighboring antenna. The high-frequency power supply device supplies the high-frequency power to each antenna from terminals of the antennas on the same side.
摘要翻译：等离子体制造方法和装置以及利用等离子体制造装置的等离子体处理装置，其中多个高频天线布置在等离子体产生室中，以及从高频电源装置（包括电源，匹配盒等）从天线施加到腔室中的气体以产生电感耦合等离子体。多个高频天线中的至少一些以这样的并行布置的方式布置，使得天线彼此相邻并且每个天线与相邻天线相对。高频电源装置在同一侧的天线端子向每个天线提供高频电力。

8. 发明授权

US5307426A Image processing apparatus with improved dithering scheme 失效
标题翻译：具有改进抖动方案的图像处理装置
公开(公告)号：US5307426A
公开(公告)日：1994-04-26
申请号：US64791
申请日：1993-05-24
申请人： Hiroki Kanno , Hitoshi Yoneda
发明人： Hiroki Kanno , Hitoshi Yoneda
IPC分类号： H04N1/405 , G06T5/00 , H04N1/40 , H04N1/403 , G06K9/38
CPC分类号： H04N1/4053
摘要： This invention utilizes the fact that a maximum density difference of pixels in a window within a predetermined range including a pixel of interest is large for a character region, and is small for a photograph region. A maximum density difference of an image within the predetermined region is calculated. A quantization error of pixels around the pixel of interest is calculated, and a correction amount is then calculated by proportionally distributing the quantization error in accordance with a feature amount calculated by a feature amount calculator. The correction amount is added to an image signal of the pixel of interest to form a compensation image signal, and the compensation image signal is quantized.
摘要翻译：本发明利用这样的事实：对于字符区域，包括感兴趣像素的预定范围内的窗口中的像素的最大浓度差异大，对于照片区域而言较小。计算预定区域内的图像的最大浓度差。计算感兴趣像素周围的像素的量化误差，然后根据由特征量计算器计算的特征量按比例分配量化误差来计算校正量。校正量被添加到感兴趣像素的图像信号以形成补偿图像信号，并且补偿图像信号被量化。

9. 发明授权

US4827352A Method of and apparatus for changing the pixel density of a binary image using average values calculated from sets of reference pixels selected from the binary image 失效
标题翻译：使用从二值图像中选择的参考像素组计算的平均值来改变二值图像的像素密度的方法和装置
公开(公告)号：US4827352A
公开(公告)日：1989-05-02
申请号：US26572
申请日：1987-03-17
申请人： Hitoshi Yoneda , Tadanobu Kamiyama
发明人： Hitoshi Yoneda , Tadanobu Kamiyama
IPC分类号： H04N1/387 , G06T3/40 , H04N1/393 , H04N1/40 , H04N1/405
CPC分类号： H04N1/40075 , H04N1/40068
摘要： A image processing apparatus includes a dither processor, which converts an electrical signal representing a continuous-tone input image into a binary image singal by a dither method using a dither matrix. The binary image signal is stored in a memory, and supplied to a pixel-density conversion processor, which converts a pixel density of the binary image signal at a predetermined ratio, and generates a converted image with the pixel coordinates as defined by the conversion ratio. A pixel coordinate calculator calculates a coordinate position of each pixel of the converted image in the binary image, and selects a fiducial pixel. A reference pixel selector defines a window area on the binary image containing the fiducial pixel and corresponding in size to the dither matrix size, and extracts reference picture elements in the window area. A calculator calculates an average image-density of the reference picture elements and generates density data, which is binarized by a second dither processor by using a second dither matrix.
摘要翻译：图像处理装置包括抖动处理器，其通过使用抖动矩阵的抖动方法将表示连续色调输入图像的电信号转换成二进制图像。二进制图像信号被存储在存储器中，并被提供给像素密度转换处理器，其以预定比率转换二进制图像信号的像素密度，并且生成具有由转换比定义的像素坐标的转换图像。像素坐标计算器计算二值图像中的转换图像的每个像素的坐标位置，并选择基准像素。参考像素选择器定义包含基准像素的二进制图像上的窗口区域，并且其尺寸对应于抖动矩阵大小，并且提取窗口区域中的参考图像元素。计算器计算参考图像元素的平均图像浓度并生成由第二抖动处理器通过使用第二抖动矩阵二值化的密度数据。

10. 发明授权

US4661843A Color image copying apparatus 失效
标题翻译：彩色图像复印设备
公开(公告)号：US4661843A
公开(公告)日：1987-04-28
申请号：US753260
申请日：1985-07-09
申请人： Hidekazu Sekizawa , Akito Iwamoto , Naofumi Yamamoto , Hitoshi Yoneda
发明人： Hidekazu Sekizawa , Akito Iwamoto , Naofumi Yamamoto , Hitoshi Yoneda
IPC分类号： H04N1/407 , H04N1/60 , H04N1/46
CPC分类号： H04N1/6027 , H04N1/4076 , H04N1/6019
摘要： A color copying apparatus includes a color image sensor, an image information signal processing unit, and a color printer. The apparatus converts the three color component signals from the color image sensor into a luminance signal component and color difference signal components. At least one of the luminance signal component and the color difference signal components is subject to a nonlinear conversion. For density conversion between an input image and an output image, the luminance signal component is subject to a nonlinear conversion in a nonlinear conversion circuit.
摘要翻译：彩色复印设备包括彩色图像传感器，图像信息信号处理单元和彩色打印机。该装置将来自彩色图像传感器的三色分量信号转换为亮度信号分量和色差信号分量。亮度信号分量和色差信号分量中的至少一个进行非线性转换。对于输入图像和输出图像之间的浓度转换，亮度信号分量在非线性转换电路中经受非线性转换。

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