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1. 发明授权

US5744017A Vacuum arc deposition apparatus 失效
标题翻译：真空电弧沉积设备
公开(公告)号：US5744017A
公开(公告)日：1998-04-28
申请号：US357752
申请日：1994-12-16
申请人： Hiroshi Tamagaki , Hiroshi Kawaguchi , Hirofumi Fujii , Katsuhiko Shimojima , Takeshi Suzuki , Koji Hanaguri
发明人： Hiroshi Tamagaki , Hiroshi Kawaguchi , Hirofumi Fujii , Katsuhiko Shimojima , Takeshi Suzuki , Koji Hanaguri
IPC分类号： C23C14/32 , H01J37/32 , C23C14/22
CPC分类号： H01J37/32055 , C23C14/325 , H01J37/32623 , H01J37/3266
摘要： A vacuum arc deposition apparatus includes arc power sources having cathodes connected to both ends of an evaporation source; exciting coils disposed at positions axially outwardly far from both the ends of the evaporation source so as to be coaxial with the evaporation source; and coil power sources independently connected to the exciting coils. In this apparatus, each of the coil power sources is capable of controlling the exciting current in such a manner that the film thickness and the consumption of the evaporation source are suitably distributed. Moreover, an arc containment device of the vacuum arc deposition apparatus includes an arc containment body having a diameter substantially the same as that of a cylindrical evaporation source, which is disposed at one end portion of the evaporation source.
摘要翻译：真空电弧沉积设备包括具有连接到蒸发源的两端的阴极的电弧光源; 励磁线圈设置在轴向向外远离蒸发源的两端的位置处，以与蒸发源同轴; 以及独立地连接到励磁线圈的线圈电源。在该装置中，每个线圈电源能够以这样的方式控制励磁电流，使得膜厚度和蒸发源的消耗被适当地分布。此外，真空电弧沉积设备的电弧容纳装置包括一个电弧容纳体，其具有与蒸发源的一个端部处的圆柱形蒸发源的直径基本相同的直径。

2. 发明授权

US5730847A Arc ion plating device and arc ion plating system 失效
标题翻译：电弧离子镀装置及电弧离子镀系统
公开(公告)号：US5730847A
公开(公告)日：1998-03-24
申请号：US325438
申请日：1994-12-23
申请人： Koji Hanaguri , Kunihiko Tsuji , Homare Nomura , Hiroshi Tamagaki , Hiroshi Kawaguchi , Katsuhiko Shimojima , Hirofumi Fujii , Toshiya Kido , Takeshi Suzuki , Yoichi Inoue
发明人： Koji Hanaguri , Kunihiko Tsuji , Homare Nomura , Hiroshi Tamagaki , Hiroshi Kawaguchi , Katsuhiko Shimojima , Hirofumi Fujii , Toshiya Kido , Takeshi Suzuki , Yoichi Inoue
IPC分类号： C23C14/32 , H01J37/32 , H01L21/00 , C23C14/24
CPC分类号： H01L21/67213 , C23C14/325 , H01J37/32055 , H01L21/6723
摘要： The present invention relates to an arc ion plating device utilizing a vacuum arc discharge to be utilized for the surface process of works and to an arc ion plating system provided with the above-mentioned device, and the present invention offers the device and the system which are able to realize extremely high productivity by an efficient handling of works. The device according to the present invention comprises a rod-shaped evaporation source and works to be coated with a film being disposed so as to surround the rod-shaped evaporation source, The device is so constituted that the works can be moved relative to the rod-shaped evaporation source in the axial direction of the rod-shaped evaporation source.
摘要翻译： PCT No.PCT / JP94 / 00410 Sec。 371日期1994年12月23日第 102（e）日期1994年12月23日PCT 1994年3月15日PCT公布。公开号WO94 / 21839 日期1994年9月29日本发明涉及一种利用真空电弧放电用于工程表面处理的电弧离子镀装置以及具有上述装置的电弧离子镀系统，本发明提供了装置和系统，通过有效的处理工作能够实现极高的生产率。根据本发明的装置包括一个棒状蒸发源，其工作原理是涂覆有围绕杆状蒸发源的薄膜。该装置的构造使得工件可以相对于杆移动形状的蒸发源在杆状蒸发源的轴向上。

3. 发明申请

US20110067631A1 ARC ION PLATING APPARATUS 有权
标题翻译： ARC离子镀设备
公开(公告)号：US20110067631A1
公开(公告)日：2011-03-24
申请号：US12953926
申请日：2010-11-24
申请人： Hiroshi Tamagaki , Hirofumi Fujii , Tadao Okimoto , Ryoji Miyamoto
发明人： Hiroshi Tamagaki , Hirofumi Fujii , Tadao Okimoto , Ryoji Miyamoto
IPC分类号： C23C14/48
CPC分类号： C23C14/325 , H01J37/32055 , H01J37/3266 , H01J37/32761 , H01J2237/0206
摘要： An arc ion plating apparatus comprises a vacuum chamber, a rotary table for moving a substrate within the vacuum chamber vertically relative to its height direction, an arc evaporation source for bombardment for cleaning the surface of the substrate with metal ions, and an arc evaporation source for deposition group for depositing metal ions on the surface of the substrate. The arc evaporation source for deposition group is composed of a plurality of evaporation sources arranged so as to be opposite to the substrate set on the rotary table, and the arc evaporation source for bombardment is arranged so as to be opposite to the substrate, and formed so that its length in the height direction of the vacuum chamber is equal to the length between the upper and lower ends of the arc evaporation source for deposition group. According to such a structure, over temperature rise or abnormal discharge is hardly caused in the substrate at the time of bombardment, and process controllability is consequently enhanced.
摘要翻译：电弧离子镀装置包括真空室，用于使真空室内的基板相对于其高度方向垂直移动的旋转台，用于用金属离子清洗基板的表面的电弧蒸发源，以及电弧蒸发源用于在基底表面上沉积金属离子的沉积组。用于沉积组的电弧蒸发源由多个蒸发源构成，多个蒸发源被布置为与设置在旋转台上的基板相对，并且用于轰击的电弧蒸发源被布置成与基板相对，并形成使得其在真空室的高度方向上的长度等于用于沉积组的电弧蒸发源的上端和下端之间的长度。根据这样的结构，在轰击时在基板上几乎不发生过度升温或异常放电，从而提高了工艺控制性。

4. 发明申请

US20070240982A1 ARC ION PLATING APPARATUS 审中-公开
标题翻译： ARC离子镀设备
公开(公告)号：US20070240982A1
公开(公告)日：2007-10-18
申请号：US11532778
申请日：2006-09-18
申请人： Hiroshi Tamagaki , Hirofumi Fujii , Tadao Okimoto , Ryoji Miyamoto
发明人： Hiroshi Tamagaki , Hirofumi Fujii , Tadao Okimoto , Ryoji Miyamoto
IPC分类号： C23C14/00
CPC分类号： C23C14/325 , H01J37/32055 , H01J37/3266 , H01J37/32761 , H01J2237/0206
摘要： An arc ion plating apparatus comprises a vacuum chamber, a rotary table for moving a substrate within the vacuum chamber vertically relative to its height direction, an arc evaporation source for bombardment for cleaning the surface of the substrate with metal ions, and an arc evaporation source for deposition group for depositing metal ions on the surface of the substrate. The arc evaporation source for deposition group is composed of a plurality of evaporation sources arranged so as to be opposite to the substrate set on the rotary table, and the arc evaporation source for bombardment is arranged so as to be opposite to the substrate, and formed so that its length in the height direction of the vacuum chamber is equal to the length between the upper and lower ends of the arc evaporation source for deposition group. According to such a structure, over temperature rise or abnormal discharge is hardly caused in the substrate at the time of bombardment, and process controllability is consequently enhanced.
摘要翻译：电弧离子镀装置包括真空室，用于使真空室内的基板相对于其高度方向垂直移动的旋转台，用于用金属离子清洗基板的表面的电弧蒸发源，以及电弧蒸发源用于在基底表面上沉积金属离子的沉积组。用于沉积组的电弧蒸发源由多个蒸发源构成，多个蒸发源被布置为与设置在旋转台上的基板相对，并且用于轰击的电弧蒸发源被布置成与基板相对，并形成使得其在真空室的高度方向上的长度等于用于沉积组的电弧蒸发源的上端和下端之间的长度。根据这样的结构，在轰击时在基板上几乎不发生过度升温或异常放电，从而提高了工艺控制性。

5. 发明授权

US08261693B2 Arc ion plating apparatus 有权
标题翻译：电弧离子镀设备
公开(公告)号：US08261693B2
公开(公告)日：2012-09-11
申请号：US12953926
申请日：2010-11-24
申请人： Hiroshi Tamagaki , Hirofumi Fujii , Tadao Okimoto , Ryoji Miyamoto
发明人： Hiroshi Tamagaki , Hirofumi Fujii , Tadao Okimoto , Ryoji Miyamoto
IPC分类号： C23C14/48
CPC分类号： C23C14/325 , H01J37/32055 , H01J37/3266 , H01J37/32761 , H01J2237/0206
摘要： An arc ion plating apparatus comprises a vacuum chamber, a rotary table for moving a substrate within the vacuum chamber vertically relative to its height direction, an arc evaporation source for bombardment for cleaning the surface of the substrate with metal ions, and an arc evaporation source for deposition group for depositing metal ions on the surface of the substrate. The arc evaporation source for deposition group is composed of a plurality of evaporation sources arranged so as to be opposite to the substrate set on the rotary table, and the arc evaporation source for bombardment is arranged so as to be opposite to the substrate, and formed so that its length in the height direction of the vacuum chamber is equal to the length between the upper and lower ends of the arc evaporation source for deposition group. According to such a structure, over temperature rise or abnormal discharge is hardly caused in the substrate at the time of bombardment, and process controllability is consequently enhanced.
摘要翻译：电弧离子镀装置包括真空室，用于使真空室内的基板相对于其高度方向垂直移动的旋转台，用于用金属离子清洗基板的表面的电弧蒸发源，以及电弧蒸发源用于在基底表面上沉积金属离子的沉积组。用于沉积组的电弧蒸发源由多个蒸发源构成，多个蒸发源被布置为与设置在旋转台上的基板相对，并且用于轰击的电弧蒸发源被布置成与基板相对，并形成使得其在真空室的高度方向上的长度等于用于沉积组的电弧蒸发源的上端和下端之间的长度。根据这样的结构，在轰击时在基板上几乎不发生过度升温或异常放电，从而提高了工艺控制性。

6. 发明授权

US07131392B2 Vacuum evaporator 有权
标题翻译：真空蒸发器
公开(公告)号：US07131392B2
公开(公告)日：2006-11-07
申请号：US10879584
申请日：2004-06-30
申请人： Katuhiko Shimojima , Hirofumi Fujii , Hiroshi Kawaguchi
发明人： Katuhiko Shimojima , Hirofumi Fujii , Hiroshi Kawaguchi
IPC分类号： C23C14/32 , C23C14/24 , C23C14/56
CPC分类号： H01J37/32055 , C23C14/505 , C23C14/56 , H01J37/32458
摘要： A vacuum evaporator according to the present invention comprises a vacuum chamber, a rod-like evaporation source provided to be liftable into and out of the vacuum chamber, and a work support means for supporting, relative to the evaporation source lowered into the vacuum chamber, works W arranged to surround the evaporation source. The vacuum chamber is formed of a fixed chamber part and a movable chamber part provided connectably to and disconnectably from the fixed chamber part and mounted with the work support means. Either one movable chamber part is horizontally moved and connected to the fixed chamber part in the state where the evaporation source is raised and retreated out of the vacuum chamber to perform vacuum evaporation treatment. According to such a structure, the maintenance of the vacuum evaporator can be performed without raising or lowering the lower plate or taking out the work support means from the vacuum chamber.
摘要翻译：根据本发明的真空蒸发器包括真空室，设置成能够进出真空室的棒状蒸发源，以及用于相对于下降到真空室中的蒸发源支撑的工件支撑装置，工作W布置成围绕蒸发源。真空室由固定室部分和与固定室部分可连接并可断开地设置并安装在工件支承装置上的活动室部分构成。在蒸发源升高并退出真空室的状态下，任一个活动室部分水平移动并连接到固定室部分，以进行真空蒸发处理。根据这样的结构，可以在不升降下板的情况下进行真空蒸发器的维护，或从真空室取出工作支承机构。

7. 发明申请

US20050005860A1 Vacuum evaporator 有权
标题翻译：真空蒸发器
公开(公告)号：US20050005860A1
公开(公告)日：2005-01-13
申请号：US10879584
申请日：2004-06-30
申请人： Katuhiko Shimojima , Hirofumi Fujii , Hiroshi Kawaguchi
发明人： Katuhiko Shimojima , Hirofumi Fujii , Hiroshi Kawaguchi
IPC分类号： C23C14/24 , C23C14/50 , C23C14/56 , H01J37/32 , C23C16/00
CPC分类号： H01J37/32055 , C23C14/505 , C23C14/56 , H01J37/32458
摘要： A vacuum evaporator according to the present invention comprises a vacuum chamber, a rod-like evaporation source provided to be liftable into and out of the vacuum chamber, and a work support means for supporting, relative to the evaporation source lowered into the vacuum chamber, works W arranged to surround the evaporation source. The vacuum chamber is formed of a fixed chamber part and a movable chamber part provided connectably to and disconnectably from the fixed chamber part and mounted with the work support means. Either one movable chamber part is horizontally moved and connected to the fixed chamber part in the state where the evaporation source is raised and retreated out of the vacuum chamber to perform vacuum evaporation treatment. According to such a structure, the maintenance of the vacuum evaporator can be performed without raising or lowering the lower plate or taking out the work support means from the vacuum chamber.
摘要翻译：根据本发明的真空蒸发器包括真空室，设置成能够进出真空室的棒状蒸发源，以及用于相对于下降到真空室中的蒸发源支撑的工件支撑装置，工作W布置成围绕蒸发源。真空室由固定室部分和与固定室部分可连接并可断开地设置并安装在工件支承装置上的活动室部分构成。在蒸发源升高并退出真空室的状态下，任一个活动室部分水平移动并连接到固定室部分，以进行真空蒸发处理。根据这样的结构，可以在不升降下板的情况下进行真空蒸发器的维护，或从真空室取出工作支承机构。

8. 发明授权

US08728705B2 Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method 有权
标题翻译：负型感光材料，使用负型感光材料的感光板和负型图案形成方法
公开(公告)号：US08728705B2
公开(公告)日：2014-05-20
申请号：US12788837
申请日：2010-05-27
申请人： Katsutoshi Hirashima , Hirofumi Fujii , Yasushi Tamura , Ryouji Suezaki
发明人： Katsutoshi Hirashima , Hirofumi Fujii , Yasushi Tamura , Ryouji Suezaki
IPC分类号： G03F7/038 , G03F7/38
CPC分类号： G03F7/0387 , G03F7/0045 , G03F7/38 , H05K1/056 , H05K3/0023 , H05K3/0082 , H05K3/287 , H05K3/4092 , H05K2201/0154 , H05K2201/0394 , H05K2201/09036 , H05K2201/0969 , H05K2203/056 , H05K2203/1476 , Y10S430/107
摘要： A negative photosensitive material is provided which has a lower linear expansion coefficient and a lower hygroscopic expansion coefficient and is excellent in gradational patternability and PI etchability in patterning. The negative photosensitive material comprises: (A) a polyimide precursor having a structural unit represented by the following general formula (1) and a structural unit represented by the following general formula (2), the structural unit represented by the general formula (2) being present in the polyimide precursor in a proportion of less than 30 mol % based on the overall amount of the polyimide precursor; and (B) at least one of a pyridine derivative represented by the following general formula (3) and a pyridine derivative represented by the following general formula (4): wherein R1, R2, R3, R4 and R5, which may be the same or different, are each a C1 to C4 alkyl group, and Ar is an aryl group having a nitro group at its ortho position, wherein R1, R2, R4 and R5, which may be the same or different, are each a C1 to C4 alkyl group, and Ar is an aryl group having a nitro group at its ortho position.
摘要翻译：提供具有较低线性膨胀系数和较低吸湿膨胀系数的负型感光材料，并且在图案化中具有优异的梯度图案性和PI可蚀刻性。负型感光材料包括：（A）具有由以下通式（1）表示的结构单元和由以下通式（2）表示的结构单元的聚酰亚胺前体，由通式（2）表示的结构单元，以聚酰亚胺前体的总量小于30mol％的比例存在于聚酰亚胺前体中; 和（B）由以下通式（3）表示的吡啶衍生物和由以下通式（4）表示的吡啶衍生物中的至少一种：其中R1，R2，R3，R4和R5可以相同或不同的，各自为C1〜C4烷基，Ar为其邻位具有硝基的芳基，其中R1，R2，R4和R5可以相同或不同，分别为C1〜C4 烷基，Ar是在其邻位具有硝基的芳基。

9. 发明授权

US08639045B2 Image processing device and image processing method 有权
标题翻译：图像处理装置及图像处理方法
公开(公告)号：US08639045B2
公开(公告)日：2014-01-28
申请号：US13393983
申请日：2010-03-02
申请人： Sumio Yokomitsu , Hirofumi Fujii , Takeshi Fujimatsu , Takeshi Watanabe , Yuichi Matsumoto , Michio Miwa , Masataka Sugiura , Mikio Morioka
发明人： Sumio Yokomitsu , Hirofumi Fujii , Takeshi Fujimatsu , Takeshi Watanabe , Yuichi Matsumoto , Michio Miwa , Masataka Sugiura , Mikio Morioka
IPC分类号： G06K9/36 , G06K9/46
CPC分类号： H04N1/415 , H04N1/4172 , H04N5/23238 , H04N19/115 , H04N19/124 , H04N19/17
摘要： An image processing device comprises a region dividing unit which divides a captured image obtained by a camera unit into a plurality of regions, and an image compressing unit which compresses each of region images obtained by the division by the region dividing unit while changing the compression rate according to the distance from a predetermined point in the captured image to each of the region images and the distance from the camera unit to a target included in each of the regions. For example, the image compressing unit compresses the region image having a larger angle from the optical axis at a larger compression rate, thereby achieving compression in which the amount of data in low-quality regions is greatly reduced and the quality of high-quality regions is maintained.
摘要翻译：一种图像处理装置，包括：区域分割单元，其将由相机单元获得的拍摄图像分割成多个区域;以及图像压缩单元，其压缩通过区域划分单元进行的划分而获得的每个区域图像，同时改变压缩率根据从拍摄图像中的预定点到每个区域图像的距离以及从相机单元到包括在每个区域中的目标的距离。例如，图像压缩单元以较大的压缩率从光轴压缩具有较大角度的区域图像，从而实现低质量区域中的数据量大大降低的压缩，并且高质量区域的质量被维护。

10. 发明申请

US20130057546A1 PANORAMIC EXPANSION IMAGE DISPLAY DEVICE AND METHOD OF DISPLAYING PANORAMIC EXPANSION IMAGE 有权
标题翻译：全景展示图像显示装置和显示全景展开图像的方法
公开(公告)号：US20130057546A1
公开(公告)日：2013-03-07
申请号：US13697635
申请日：2011-05-16
申请人： Takeshi Watanabe , Sumio Yokomitsu , Hirofumi Fujii , Takeshi Fujimatsu , Yuichi Matsumoto , Michio Miwa , Masataka Sugiura , Mikio Morioka
发明人： Takeshi Watanabe , Sumio Yokomitsu , Hirofumi Fujii , Takeshi Fujimatsu , Yuichi Matsumoto , Michio Miwa , Masataka Sugiura , Mikio Morioka
IPC分类号： G06T15/00 , G09G5/00
CPC分类号： H04N5/23238 , G03B15/10 , G06T3/4038
摘要： A panoramic image display device divides a panoramic expansion image into at least two panoramic images and displays the panoramic images. The panoramic expansion image display device including: a clipping reference position setting unit that sets a clipping reference position for the panoramic expansion image; an object detection unit that detects an object as a display target from the panoramic expansion image; a clipping position determination unit that determines a clipping position of the panoramic image according to a relationship between a detected object position and the clipping reference position; and a display image generation unit that displays the panoramic image clipped from the panoramic expansion image at the clipping position.
摘要翻译：全景图像显示装置将全景扩展图像划分为至少两个全景图像并显示全景图像。全景展开图像显示装置包括：剪切基准位置设定单元，设定全景展开图像的限幅基准位置; 物体检测单元，其从全景展开图像检测作为显示目标的物体; 剪辑位置确定单元，根据检测到的对象位置和剪辑基准位置之间的关系确定全景图像的剪切位置; 以及显示图像生成单元，其显示在所述剪辑位置从全景展开图像剪切的全景图像。

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