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1. 发明授权

US4611765A Roller mill 失效
标题翻译：辊磨机
公开(公告)号：US4611765A
公开(公告)日：1986-09-16
申请号：US709030
申请日：1985-02-28
申请人： Katsuhiko Shimojima , Masaki Hamaguchi , Hiroshi Obana , Takemi Aizawa , Hiroyuki Ninomiya
发明人： Katsuhiko Shimojima , Masaki Hamaguchi , Hiroshi Obana , Takemi Aizawa , Hiroyuki Ninomiya
IPC分类号： B02C15/00 , B02C15/04
CPC分类号： B02C15/04 , B02C15/003 , B02C15/004
摘要： A roller mill in which raw material fed between the upper surface of a pulverizing table and a pulverizing roller is pulverized by compression therebetween, wherein at least one annular recess coaxial with a roller shaft being formed on the pulverizing roller, thereby attaining reduction of self-excited vibrations of the roller mill and improvement of the pulverization efficiency. Further, in order to enhance these effects, the depth of the recess is set larger than the average grain size of the raw material. Moreover, the gap between the pulverizing table and the pulverizing roller has a wedge-like sectional shape which becomes narrower toward the outside of the pulverizing table, whereby the raw material which has been pulverized by compression between the table and the roller is prevented from escaping in the axial direction of the roller shaft, thereby attaining reduction of the self-excited vibration and improvement of the pulverization efficiency.
摘要翻译： PCT No.PCT / JP84 / 00334 Sec。 371日期1985年2月28日第 102（e）1985年2月28日PCT PCT。1984年6月28日PCT公布。公开号WO85 / 00302 日本1985年1月31日。一种辊磨机，其中在粉碎台的上表面和粉碎辊之间供给的原料通过压缩粉碎，其中与粉碎辊上形成的至少一个与辊轴同轴的环形凹部从而能够减小辊磨机的自激振动，提高粉碎效率。此外，为了提高这些效果，凹部的深度被设定为大于原料的平均粒径。此外，粉碎台与粉碎辊之间的间隙具有楔形截面形状，其朝向粉碎台的外侧变窄，从而防止在工作台和辊之间被压缩而粉碎的原料逸出在辊轴的轴向上，能够实现自激振动的降低和粉碎效率的提高。

2. 发明授权

US5744017A Vacuum arc deposition apparatus 失效
标题翻译：真空电弧沉积设备
公开(公告)号：US5744017A
公开(公告)日：1998-04-28
申请号：US357752
申请日：1994-12-16
申请人： Hiroshi Tamagaki , Hiroshi Kawaguchi , Hirofumi Fujii , Katsuhiko Shimojima , Takeshi Suzuki , Koji Hanaguri
发明人： Hiroshi Tamagaki , Hiroshi Kawaguchi , Hirofumi Fujii , Katsuhiko Shimojima , Takeshi Suzuki , Koji Hanaguri
IPC分类号： C23C14/32 , H01J37/32 , C23C14/22
CPC分类号： H01J37/32055 , C23C14/325 , H01J37/32623 , H01J37/3266
摘要： A vacuum arc deposition apparatus includes arc power sources having cathodes connected to both ends of an evaporation source; exciting coils disposed at positions axially outwardly far from both the ends of the evaporation source so as to be coaxial with the evaporation source; and coil power sources independently connected to the exciting coils. In this apparatus, each of the coil power sources is capable of controlling the exciting current in such a manner that the film thickness and the consumption of the evaporation source are suitably distributed. Moreover, an arc containment device of the vacuum arc deposition apparatus includes an arc containment body having a diameter substantially the same as that of a cylindrical evaporation source, which is disposed at one end portion of the evaporation source.
摘要翻译：真空电弧沉积设备包括具有连接到蒸发源的两端的阴极的电弧光源; 励磁线圈设置在轴向向外远离蒸发源的两端的位置处，以与蒸发源同轴; 以及独立地连接到励磁线圈的线圈电源。在该装置中，每个线圈电源能够以这样的方式控制励磁电流，使得膜厚度和蒸发源的消耗被适当地分布。此外，真空电弧沉积设备的电弧容纳装置包括一个电弧容纳体，其具有与蒸发源的一个端部处的圆柱形蒸发源的直径基本相同的直径。

3. 发明授权

US5730847A Arc ion plating device and arc ion plating system 失效
标题翻译：电弧离子镀装置及电弧离子镀系统
公开(公告)号：US5730847A
公开(公告)日：1998-03-24
申请号：US325438
申请日：1994-12-23
申请人： Koji Hanaguri , Kunihiko Tsuji , Homare Nomura , Hiroshi Tamagaki , Hiroshi Kawaguchi , Katsuhiko Shimojima , Hirofumi Fujii , Toshiya Kido , Takeshi Suzuki , Yoichi Inoue
发明人： Koji Hanaguri , Kunihiko Tsuji , Homare Nomura , Hiroshi Tamagaki , Hiroshi Kawaguchi , Katsuhiko Shimojima , Hirofumi Fujii , Toshiya Kido , Takeshi Suzuki , Yoichi Inoue
IPC分类号： C23C14/32 , H01J37/32 , H01L21/00 , C23C14/24
CPC分类号： H01L21/67213 , C23C14/325 , H01J37/32055 , H01L21/6723
摘要： The present invention relates to an arc ion plating device utilizing a vacuum arc discharge to be utilized for the surface process of works and to an arc ion plating system provided with the above-mentioned device, and the present invention offers the device and the system which are able to realize extremely high productivity by an efficient handling of works. The device according to the present invention comprises a rod-shaped evaporation source and works to be coated with a film being disposed so as to surround the rod-shaped evaporation source, The device is so constituted that the works can be moved relative to the rod-shaped evaporation source in the axial direction of the rod-shaped evaporation source.
摘要翻译： PCT No.PCT / JP94 / 00410 Sec。 371日期1994年12月23日第 102（e）日期1994年12月23日PCT 1994年3月15日PCT公布。公开号WO94 / 21839 日期1994年9月29日本发明涉及一种利用真空电弧放电用于工程表面处理的电弧离子镀装置以及具有上述装置的电弧离子镀系统，本发明提供了装置和系统，通过有效的处理工作能够实现极高的生产率。根据本发明的装置包括一个棒状蒸发源，其工作原理是涂覆有围绕杆状蒸发源的薄膜。该装置的构造使得工件可以相对于杆移动形状的蒸发源在杆状蒸发源的轴向上。

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