会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明申请
    • Non-volatile phase-change memory and manufacturing method thereof
    • 非易失性相变存储器及其制造方法
    • US20080006851A1
    • 2008-01-10
    • US11825401
    • 2007-07-06
    • Hiroshi MoriyaTomio Iwasaki
    • Hiroshi MoriyaTomio Iwasaki
    • G11C11/00
    • G11C13/0004H01L27/2436H01L45/06H01L45/1233H01L45/144H01L45/1675
    • In a non-volatile phase-change memory comprising: an interlayer dielectric film and a plug formed on one main surface side of a silicon substrate; a phase-change film which can take a different electric resistivity depending on a phase change and is provided on surfaces of the interlayer dielectric film and the plug; and an upper electrode film formed on an upper surface of the phase-change film, a relation between a film thickness of the phase-change film and an amount of protrusion of the upper electrode film from the plug is set to 0.3≦L/T≦1. Thus, a density of current flowing through the phase-change film near the outer periphery of the plug is reduced, thereby suppressing migration and enabling rewriting with low energy. Accordingly, a reliable non-volatile phase-change memory can be achieved.
    • 一种非易失性相变存储器,包括:层间电介质膜和形成在硅衬底的一个主表面侧上的插塞; 可以根据相变取得不同的电阻率并设置在层间绝缘膜和插头的表面上的相变膜; 以及形成在相变膜的上表面上的上电极膜,相变膜的膜厚与上电极膜与插塞的突出量之间的关系设定为0.3 <= L / T <= 1。 因此,流过插塞外周附近的相变膜的电流密度降低,从而抑制迁移并能够以低能量进行重写。 因此,可以实现可靠的非易失性相变存储器。