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    • 3. 发明申请
    • EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS
    • 极光紫外线光源设备
    • US20100176312A1
    • 2010-07-15
    • US12352694
    • 2009-01-13
    • Hiroshi KomoriYoshifumi UenoGeorg Soumagne
    • Hiroshi KomoriYoshifumi UenoGeorg Soumagne
    • G01J3/10
    • G03F7/70916G03F7/70033H05G2/003H05G2/008
    • In a laser produced plasma type extreme ultra violet light source apparatus, charged particles such as ions emitted from plasma can be efficiently ejected by the action of a magnetic field and secondary production of contaminants can be suppressed. The extreme ultra violet light source apparatus includes: a target nozzle for supplying a target material; a laser oscillator for applying a laser beam to the target material supplied by the target nozzle to generate plasma; an EUV collector mirror for collecting extreme ultra violet light radiated from the plasma; and an electromagnet for forming a magnetic field in a position where the laser beam is applied to the target material, wherein an aperture of the electromagnet is formed according to a shape of lines of magnetic flux of the magnetic field.
    • 在激光产生的等离子体型极紫外光源装置中,可以通过磁场的作用有效地喷射从等离子体发射的离子等带电粒子,能够抑制二次生成污染物。 极紫外光源装置包括:用于供给目标材料的目标喷嘴; 激光振荡器,用于将激光束施加到由目标喷嘴供应的目标材料以产生等离子体; 用于收集从等离子体辐射的极紫外光的EUV收集镜; 以及用于在将激光束施加到目标材料的位置形成磁场的电磁体,其中根据磁场的磁通线的形状形成电磁体的孔。