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1. 发明申请

US20110163247A1 EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光紫外线光源设备
公开(公告)号：US20110163247A1
公开(公告)日：2011-07-07
申请号：US13047131
申请日：2011-03-14
申请人： Georg SOUMAGNE , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
发明人： Georg SOUMAGNE , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.
摘要翻译：在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。极紫外光源装置包括产生极紫外光的室，用于将目标材料供应到室内的预定位置的目标供应单元，用于将激光束施加到由用于产生等离子体的目标供应单元，用于收集从等离子体辐射的极端紫外光以输出极紫外光的集光镜;用于在等离子体的产生位置形成非对称磁场的磁场形成单元，其通过使用线圈和带电粒子收集机构，设置在腔室的两个表面中的至少一个上，线圈产生的磁力线延伸到该表面。

2. 发明授权

US08586953B2 Extreme ultra violet light source device 有权
标题翻译：极紫外光源装置
公开(公告)号：US08586953B2
公开(公告)日：2013-11-19
申请号：US13370074
申请日：2012-02-09
申请人： Hiroshi Komori , Yoshifumi Ueno , Georg Soumagne
发明人： Hiroshi Komori , Yoshifumi Ueno , Georg Soumagne
IPC分类号： G21G4/00
CPC分类号： G21K5/00 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
摘要翻译：激光产生等离子体的极紫外光源装置，其中可以有效地喷射从等离子体发射的离子等带电粒子。极紫外光源装置包括：提供目标材料的目标喷嘴; 激光振荡器，其将激光束施加到从所述目标喷嘴供给的目标材料以产生等离子体; 收集从等离子体辐射的极紫外光的收集器光学元件; 以及在将激光束施加到目标材料的位置形成非对称磁场的磁场形成单元。

3. 发明申请

US20100176312A1 EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS 审中-公开
标题翻译：极光紫外线光源设备
公开(公告)号：US20100176312A1
公开(公告)日：2010-07-15
申请号：US12352694
申请日：2009-01-13
申请人： Hiroshi Komori , Yoshifumi Ueno , Georg Soumagne
发明人： Hiroshi Komori , Yoshifumi Ueno , Georg Soumagne
IPC分类号： G01J3/10
CPC分类号： G03F7/70916 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： In a laser produced plasma type extreme ultra violet light source apparatus, charged particles such as ions emitted from plasma can be efficiently ejected by the action of a magnetic field and secondary production of contaminants can be suppressed. The extreme ultra violet light source apparatus includes: a target nozzle for supplying a target material; a laser oscillator for applying a laser beam to the target material supplied by the target nozzle to generate plasma; an EUV collector mirror for collecting extreme ultra violet light radiated from the plasma; and an electromagnet for forming a magnetic field in a position where the laser beam is applied to the target material, wherein an aperture of the electromagnet is formed according to a shape of lines of magnetic flux of the magnetic field.
摘要翻译：在激光产生的等离子体型极紫外光源装置中，可以通过磁场的作用有效地喷射从等离子体发射的离子等带电粒子，能够抑制二次生成污染物。极紫外光源装置包括：用于供给目标材料的目标喷嘴; 激光振荡器，用于将激光束施加到由目标喷嘴供应的目标材料以产生等离子体; 用于收集从等离子体辐射的极紫外光的EUV收集镜; 以及用于在将激光束施加到目标材料的位置形成磁场的电磁体，其中根据磁场的磁通线的形状形成电磁体的孔。

4. 发明申请

US20070228298A1 Extreme ultra violet light source device 有权
标题翻译：极紫外光源装置
公开(公告)号：US20070228298A1
公开(公告)日：2007-10-04
申请号：US11730139
申请日：2007-03-29
申请人： Hiroshi Komori , Yoshifumi Ueno , Georg Soumagne
发明人： Hiroshi Komori , Yoshifumi Ueno , Georg Soumagne
IPC分类号： G21G4/00
CPC分类号： G21K5/00 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
摘要翻译：激光产生等离子体的极紫外光源装置，其中可以有效地喷射从等离子体发射的离子等带电粒子。极紫外光源装置包括：提供目标材料的目标喷嘴; 激光振荡器，其将激光束施加到从所述目标喷嘴供给的目标材料以产生等离子体; 收集从等离子体辐射的极紫外光的收集器光学元件; 以及在将激光束施加到目标材料的位置形成非对称磁场的磁场形成单元。

5. 发明授权

US08143606B2 Extreme ultra violet light source device 有权
标题翻译：极紫外光源装置
公开(公告)号：US08143606B2
公开(公告)日：2012-03-27
申请号：US11730139
申请日：2007-03-29
申请人： Hiroshi Komori , Yoshifumi Ueno , Georg Soumagne
发明人： Hiroshi Komori , Yoshifumi Ueno , Georg Soumagne
IPC分类号： H05G2/00
CPC分类号： G21K5/00 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
摘要翻译：激光产生等离子体的极紫外光源装置，其中可以有效地喷射从等离子体发射的离子等带电粒子。极紫外光源装置包括：提供目标材料的目标喷嘴; 激光振荡器，其将激光束施加到从所述目标喷嘴供给的目标材料以产生等离子体; 收集从等离子体辐射的极紫外光的收集器光学元件; 以及在将激光束施加到目标材料的位置形成非对称磁场的磁场形成单元。

6. 发明申请

US20090261277A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US20090261277A1
公开(公告)日：2009-10-22
申请号：US12385569
申请日：2009-04-13
申请人： Georg Soumagne , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
发明人： Georg Soumagne , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.
摘要翻译：在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。极紫外光源装置包括产生极紫外光的室，用于将目标材料供应到室内的预定位置的目标供应单元，用于将激光束施加到由用于产生等离子体的目标供应单元，用于收集从等离子体辐射的极端紫外光以输出极紫外光的集光镜;用于在等离子体的产生位置形成非对称磁场的磁场形成单元，其通过使用线圈和带电粒子收集机构，设置在腔室的两个表面中的至少一个上，线圈产生的磁力线延伸到该表面。

7. 发明授权

US08354657B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08354657B2
公开(公告)日：2013-01-15
申请号：US13047131
申请日：2011-03-14
申请人： Georg Soumagne , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
发明人： Georg Soumagne , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
IPC分类号： A61N5/06 , G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The apparatus includes a chamber, a target supply unit for supplying a target material into the chamber, a collector mirror for collecting extreme ultra violet light radiated from plasma generated by irradiating the target material with a laser beam to output the extreme ultra violet light, an electromagnet arranged outside of the chamber, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the electromagnet extend.
摘要翻译：在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。该装置包括：室，用于将目标材料供应到室中的目标供应单元，用于收集由用激光束照射目标材料而产生的等离子体辐射的极紫外光以输出极紫外光的集光镜; 设置在室外的电磁体，以及设置在室的两个表面中的至少一个表面上的电荷粒子收集机构，由电磁体产生的磁力线延伸。

8. 发明授权

US07928418B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07928418B2
公开(公告)日：2011-04-19
申请号：US12385569
申请日：2009-04-13
申请人： Georg Soumagne , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
发明人： Georg Soumagne , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.
摘要翻译：在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。极紫外光源装置包括产生极紫外光的室，用于将目标材料供应到室内的预定位置的目标供应单元，用于将激光束施加到由用于产生等离子体的目标供应单元，用于收集从等离子体辐射的极端紫外光以输出极紫外光的集光镜;用于在等离子体的产生位置形成非对称磁场的磁场形成单元，其通过使用线圈和带电粒子收集机构，设置在腔室的两个表面中的至少一个上，线圈产生的磁力线延伸到该表面。

9. 发明授权

US08513630B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08513630B2
公开(公告)日：2013-08-20
申请号：US13274991
申请日：2011-10-17
申请人： Yoshifumi Ueno , Georg Soumagne , Shinji Nagai , Akira Endo , Tatsuya Yanagida
发明人： Yoshifumi Ueno , Georg Soumagne , Shinji Nagai , Akira Endo , Tatsuya Yanagida
IPC分类号： H05G2/00 , G01J3/10
CPC分类号： H05G2/003 , H05G2/008
摘要： In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.
摘要翻译：在极紫外光源装置中，通过用激光照射作为熔融Sn的液滴D而产生的等离子体产生极紫外光，并且控制在产生极紫外光时产生的离子的流动方向通过磁场或电场照射光，离子收集筒20被布置成用于收集离子，离子收集筒20的离子碰撞表面Sa和Sb设置有或涂覆有Si，溅射速率相对于离子小于一个原子/离子。

10. 发明授权

US08288743B2 Apparatus for and method of withdrawing ions in EUV light production apparatus 有权
标题翻译： EUV光产生装置中离子离子的设备和方法
公开(公告)号：US08288743B2
公开(公告)日：2012-10-16
申请号：US12406388
申请日：2009-03-18
申请人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
发明人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
IPC分类号： B01D59/44
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , G21K1/093 , G21K2201/00 , H05G2/005 , H05G2/008
摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
摘要翻译：一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子，其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

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