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    • 8. 发明授权
    • Opto-electronic integrated circuit
    • 光电集成电路
    • US5489798A
    • 1996-02-06
    • US267439
    • 1994-06-29
    • Kentaro DoguchiGoro SasakiHiroshi YanoSosaku Sawada
    • Kentaro DoguchiGoro SasakiHiroshi YanoSosaku Sawada
    • H01L27/144H01L31/0224H01L29/06H01L29/78
    • H01L27/1443H01L31/022416
    • In an opto-electronic integrated circuit of the present invention, in a first surface region of a semiconductor substrate, a pin-type photodiode is constituted on the basis of a photodiode layer formed on a first transistor layer. In a second surface region of the semiconductor substrate, a heterojunction bipolar transistor is constituted on the basis of only a second transistor layer separated form the first transistor layer. Since a plurality of heterojunction bipolar transistors are normally integrated for one pin-type photodiode, the thickness of the heterojunction bipolar transistors larger in number than the pin-type photodiode is set regardless of the thickness of the pin-type photodiode. The thickness of a high-resistance layer in the pin-type photodiode is set with an increased degree of freedom. When the first surface region of the semiconductor substrate is the inner region of a recessed step portion, and the second surface region of the semiconductor substrate is the outer region of the recessed step portion, a difference in thickness between the heterojunction bipolar transistor and the pin-type photodiode is absorbed by the depth of the recessed step portion. For this reason, the pin-type photodiode and the heterojunction bipolar transistor are formed to have almost the same surface level.
    • 在本发明的光电集成电路中,在半导体衬底的第一表面区域中,基于形成在第一晶体管层上的光电二极管层构成针型光电二极管。 在半导体衬底的第二表面区域中,基于仅从第一晶体管层分离的第二晶体管层构成异质结双极晶体管。 由于多个异质结双极晶体管通常集成在一个pin型光电二极管中,所以与pin型光电二极管的厚度无关地设定比pin型光电二极管数量大的异质结双极型晶体管的厚度。 针型光电二极管中的高电阻层的厚度设定为增加的自由度。 当半导体衬底的第一表面区域是凹入阶梯部分的内部区域,并且半导体衬底的第二表面区域是凹陷步骤部分的外部区域时,异质结双极晶体管和引脚之间的厚度差 型光电二极管被凹陷台阶部分的深度吸收。 为此,pin型光电二极管和异质结双极晶体管形成为具有几乎相同的表面水平。
    • 9. 发明授权
    • Photographic film processing apparatus
    • 摄影胶片处理装置
    • US5426480A
    • 1995-06-20
    • US241576
    • 1994-05-12
    • Ryosaku SawadaKensaku SawadaKosaku SawadaSosaku SawadaMikio Matsui
    • Ryosaku SawadaKensaku SawadaKosaku SawadaSosaku SawadaMikio Matsui
    • G03D3/13G03D3/08G03D13/02
    • G03D3/132
    • A photographic film processing apparatus comprises a water tank for containing a constant quantity of fresh water, and one or a plurality of processing units each comprising a pair of feed rollers disposed with their circumferences in close contact with each other, a pair of delivery rollers spaced apart from the pair of feed rollers and disposed with their circumferences in close contact with each other, a pair of sealing rollers disposed with the circumference of one of them in close contact with the circumferences of the top feed roller and the top delivery roller and with the circumference of the other in close contact with the circumferences of the bottom feed roller and the bottom delivery roller, and a pair of support plates disposed respectively on the opposite sides of the rollers so as to support the rollers for rotation and to define a liquid-tight processing chamber by the circumferences of the rollers and the inner surfaces thereof. The processing unit or units are immersed completely in fresh water contained in the water tank, and a processing liquid is circulated through each processing chamber, at a high velocity across the direction of travel of a film in the processing chamber.
    • 照相胶片处理装置包括一个用于容纳恒定量的淡水的水箱,以及一个或多个处理单元,每个处理单元包括彼此紧密接触地布置的一对进给辊,一对输送辊间隔开 除了一对进给辊之外,它们的周长彼此紧密接触,一对密封辊设置成其一个的周边与顶部进料辊和顶部输送辊的周边紧密接触,并且与 另一个的圆周与底部进料辊和底部输送辊的周边紧密接触,以及分别设置在辊的相对侧上的一对支撑板,以便支撑辊以旋转并限定液体 该处理室由辊的周向及其内表面组成。 处理单元完全浸没在水箱中的淡水中,并且处理液体以高速跨过处理室中的膜的行进方向循环通过每个处理室。