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1. 发明授权

US4328304A Desensitizing solution for lithographic printing plate 失效
标题翻译：平版印刷版脱敏解决方案
公开(公告)号：US4328304A
公开(公告)日：1982-05-04
申请号：US078267
申请日：1979-09-24
申请人： Hiromichi Tachikawa , Yohonosuke Takahashi , Kazuo Ishii , Tomoaki Ikeda , Fumiaki Shinozaki
发明人： Hiromichi Tachikawa , Yohonosuke Takahashi , Kazuo Ishii , Tomoaki Ikeda , Fumiaki Shinozaki
IPC分类号： B41N3/08 , G03F7/40 , G03F7/02
CPC分类号： B41N3/08 , G03F7/40 , Y10S430/162
摘要： A novel desensitizing solution is disclosed which is applied to the surface of a lithographic printing plate coated with a photosensitive layer of a photopolymerizable composition, the desensitizing solution contains a hydrophilic colloid, a free radical polymerization inhibitor and water.
摘要翻译：公开了一种新颖的脱敏溶液，其应用于涂覆有可光聚合组合物的感光层的平版印刷版的表面，脱敏溶液含有亲水胶体，自由基聚合抑制剂和水。

2. 发明授权

US4370404A Desensitizing solution for lithographic printing plate 失效
公开(公告)号：US4370404A
公开(公告)日：1983-01-25
申请号：US318495
申请日：1981-11-05
申请人： Hiromichi Tachikawa , Yohonosuke Takahashi , Kazuo Ishii , Tomoaki Ikeda , Fumiaki Shinozaki
发明人： Hiromichi Tachikawa , Yohonosuke Takahashi , Kazuo Ishii , Tomoaki Ikeda , Fumiaki Shinozaki
IPC分类号： B41N3/08 , G03F7/40 , G03F7/02
CPC分类号： B41N3/08 , G03F7/40 , Y10S430/162
摘要： A novel desensitizing solution is disclosed which is applied to the surface of a lithographic printing plate coated with a photosensitive layer of a photopolymerizable composition, the desensitizing solution contains a hydrophilic colloid, a free radical polymerization inhibitor and water.

3. 发明授权

US4356254A Image-forming method using o-quinone diazide and basic carbonium dye 失效
标题翻译：使用邻醌二氮化物和碱性碳鎓染料的成像方法
公开(公告)号：US4356254A
公开(公告)日：1982-10-26
申请号：US166517
申请日：1980-07-07
申请人： Yohnosuke Takahashi , Hiromichi Tachikawa , Fumiaki Shinozaki , Tomoaki Ikeda
发明人： Yohnosuke Takahashi , Hiromichi Tachikawa , Fumiaki Shinozaki , Tomoaki Ikeda
IPC分类号： G03C1/72 , G03F7/004 , G03F7/022 , G03F7/105 , G03F7/26 , G03F7/30 , G03F7/08 , G03C5/00
CPC分类号： G03F7/0226 , G03F7/105 , Y10S430/146
摘要： An image-forming method is described using a light-sensitive material comprising a support and a light-sensitive layer on the support, said light-sensitive layer containing an o-quinonediazide compound as a first component and a basic carbonium dye as a second component; according to this method images can be obtained both by positive working and negative working techniques. Furthermore, images which are free from yellow light fogging can be obtained by use of a laser beam.
摘要翻译：使用在载体上包含载体和感光层的感光材料描述成像方法，所述感光层含有邻醌二叠氮化合物作为第一组分，碱性碳鎓染料作为第二组分 ; 根据这种方法，可以通过正面工作和负面工作技术获得图像。此外，可以通过使用激光束来获得没有黄色光雾化的图像。

4. 发明授权

US4356255A Photosensitive members and a process for forming patterns using the same 失效
标题翻译：感光构件和使用其形成图案的工艺
公开(公告)号：US4356255A
公开(公告)日：1982-10-26
申请号：US164399
申请日：1980-06-30
申请人： Hiromichi Tachikawa , Yohnosuke Takahashi , Fumiaki Shinozaki , Tomoaki Ikeda
发明人： Hiromichi Tachikawa , Yohnosuke Takahashi , Fumiaki Shinozaki , Tomoaki Ikeda
IPC分类号： G03C1/72 , G03F7/004 , G03F7/022 , G03F7/26 , H01L21/027 , G03C5/00 , G03C1/495 , G03C1/60 , G03C5/18 , G03C7/08
CPC分类号： G03F7/0226
摘要： A photosensitive member comprising a photosensitive layer containing an o-quinonediazide compound as a photosensitive agent and an additive, characterized in that the additive is selected from a group consisting of quinone compounds and aromatic ketone compounds, and a method for forming an image using the same.
摘要翻译：包含含有邻醌二叠氮化合物作为感光剂的感光层和添加剂的感光构件，其特征在于所述添加剂选自醌化合物和芳族酮化合物，以及使用其形成图像的方法。

5. 发明授权

US4431725A Light-sensitive material and image forming processes using the same 失效
标题翻译：感光材料和使用其的成像方法
公开(公告)号：US4431725A
公开(公告)日：1984-02-14
申请号：US399583
申请日：1982-07-19
申请人： Hiromichi Tachikawa , Yohnosuke Takahashi , Fumiaki Shinozaki , Tomoaki Ikeda
发明人： Hiromichi Tachikawa , Yohnosuke Takahashi , Fumiaki Shinozaki , Tomoaki Ikeda
IPC分类号： G03C1/72 , G03F7/004 , G03F7/022 , G03F7/26 , G03C1/58
CPC分类号： G03F7/0226
摘要： A light-sensitive material having on a support a light-sensitive layer containing an o-quinonediazide compound as a main component and, additionally, a particular compound represented by the following general formula (I): ##STR1## wherein Z represents the nonmetallic atoms forming a 5-membered ring; X represents S, O, ##STR2## or .dbd.N--R.sub.c (where R.sub.a, R.sub.b and R.sub.c are each a hydrogen atom or an organic group other than a carboxylic acid group); and Y is a hydrogen atom or an organic group other than a carboxylic acid group, is disclosed. This material can provide both positive and negative working images having high resolution and good adhesiveness to the support. A process for producing positive working images includes the steps of imagewise exposure and development processing, while a process for producing negative working images includes the steps of imagewise exposure, heating, uniform (overall) exposure and development processing. The same conditions regarding imagewise exposure and development processing, respectively, can be applied to both processes.
摘要翻译：一种感光材料，其在载体上具有含有邻醌二叠氮化合物作为主要成分的感光层，另外还包含由以下通式（I）表示的特定化合物：其中Z表示形成5元环的非金属原子; X表示S，O，或= N-Rc（其中Ra，Rb和Rc各自为氢原子或除羧酸基团之外的有机基团）; 并且Y是氢原子或除羧酸基以外的有机基团。该材料可以提供具有高分辨率和对支持体的良好粘附性的正和负工作图像。用于产生正面工作图像的方法包括成像曝光和显影处理的步骤，而用于产生负面工作图像的处理包括成像曝光，加热，均匀（总体）曝光和显影处理的步骤。分别对成像曝光和显影处理的相同条件可以应用于两个处理。

6. 发明授权

US4544627A Negative image forming process in o-quinone diazide layer utilizing laser beam 失效
标题翻译：利用激光束在邻醌二叠层中的负成像过程
公开(公告)号：US4544627A
公开(公告)日：1985-10-01
申请号：US548132
申请日：1983-11-03
申请人： Yonosuke Takahashi , Hiromichi Tachikawa , Fumiaki Shinozaki , Tomoaki Ikeda
发明人： Yonosuke Takahashi , Hiromichi Tachikawa , Fumiaki Shinozaki , Tomoaki Ikeda
IPC分类号： G03C1/72 , G03C5/00 , G03C5/16 , G03C5/56 , G03F7/022 , G03F7/20 , H01L21/027 , G03F7/26
CPC分类号： G03F7/0226 , Y10S430/146
摘要： A negative-working image forming process which comprises uniformly exposing a photosensitive material comprising a support having thereon a sensitive layer comprising (i) an o-quinonediazide compound and (ii) a second compound, to actinic radiation which is able to convert the o-quinonediazide compound to the corresponding indenecarboxylic acid compound, and subsequent to said uniformly exposing imagewise exposing said exposed photosensitive material to a laser beam to thereby render the indenecarboxylic acid compound of the imagewise exposed areas convert to the corresponding indene compound and developing with an alkaline developing solution to dissolve out the unexposed area to the laser beam, wherein said second compound reduces the rate of dissolution of the laser exposed areas in the developing solution by converting the indenecarboxylic acid to the corresponding indene compound, whereby said image results.
摘要翻译：一种负性图像形成方法，其包括将包含其上包含（i）邻醌二叠氮化合物和（ii）第二化合物）的敏感层的载体均匀曝光于能够将o- 醌二叠氮化合物与相应的茚羧酸化合物反应，然后在所述曝光的感光材料成像曝光的同时使曝光区域的茚羧酸化合物转化为相应的茚化合物并用碱性显影液显影，以将未曝光区域溶解到激光束，其中所述第二化合物通过将茚羧酸转化为相应的茚化合物而降低了显影溶液中的激光曝光区域的溶解速率，从而产生所述图像。

7. 发明授权

US4396700A Process for forming an image 失效
标题翻译：形成图像的过程
公开(公告)号：US4396700A
公开(公告)日：1983-08-02
申请号：US331742
申请日：1981-12-17
申请人： Masao Kitajima , Hiromichi Tachikawa , Fumiaki Shinozaki , Tomoaki Ikeda
发明人： Masao Kitajima , Hiromichi Tachikawa , Fumiaki Shinozaki , Tomoaki Ikeda
IPC分类号： G03F7/26 , G03F7/00 , G03F7/004 , G03F7/34 , G03C1/54 , G03C1/71 , G03C5/18 , G03C11/12
CPC分类号： G03F7/346
摘要： A process for forming an image is disclosed wherein a photosensitive image-forming material comprising a diazonium compound or an azide compound is exposed and developed by a peeling development method wherein a development carrier sheet having thereon a layer of an adhesive composition is adhered to the image-forming material, before or after exposure, and, after exposure, peeled from the image-forming material whereby the exposed areas of the photosensitive layer are adhered to the carrier sheet thereby forming a relief image, and the unexposed areas remaining adhered to the support also forming a relief image.
摘要翻译：公开了一种用于形成图像的方法，其中包含重氮化合物或叠氮化合物的感光成像材料通过剥离显影方法曝光和显影，其中其上具有粘合剂组合物层的显影载体片材粘附到图像上在曝光之前或之后，曝光后，从图像形成材料剥离，由此感光层的曝光区域粘附到载体片上，从而形成浮雕图像，并且未曝光区域保持粘附到支撑体也形成浮雕形象。

8. 发明授权

US4334006A Peel-apart process for forming relief images 失效
标题翻译：用于形成浮雕图像的剥离过程
公开(公告)号：US4334006A
公开(公告)日：1982-06-08
申请号：US139623
申请日：1980-04-14
申请人： Masao Kitajima , Hiromichi Tachikawa , Fumiaki Shinozaki , Tomoaki Ikeda
发明人： Masao Kitajima , Hiromichi Tachikawa , Fumiaki Shinozaki , Tomoaki Ikeda
IPC分类号： G03F7/039 , G03C1/00 , G03C5/00 , G03F7/00 , G03F7/004 , G03F7/34 , G03G5/00 , G03C11/12 , G03C5/18
CPC分类号： G03F7/346
摘要： A process for forming an image is disclosed wherein a photo-sensitive material composed of a support and a layer of a photo-sensitive composition containing a diazonium compound, an o-quinonediazide compound or an aromatic azide is exposed and developed by heating in intimate contact with a peeling development carrier sheet, and subsequently, peeling the carrier sheet from the photo-sensitive material.
摘要翻译：公开了一种用于形成图像的方法，其中由载体和含有重氮化合物，邻醌二叠氮化合物或芳族叠氮化物的光敏组合物层组成的感光材料通过加热密切接触而曝光和显影用剥离显影载体片，然后从感光材料剥离载体片。

9. 发明授权

US4210711A Process for forming an image 失效
标题翻译：形成图像的过程
公开(公告)号：US4210711A
公开(公告)日：1980-07-01
申请号：US966996
申请日：1978-12-06
申请人： Masao Kitajima , Hiromichi Tachikawa , Fumiaki Shinozaki , Tomoaki Ikeda
发明人： Masao Kitajima , Hiromichi Tachikawa , Fumiaki Shinozaki , Tomoaki Ikeda
IPC分类号： B41C1/06 , B41C1/10 , G03C1/498 , G03C1/72 , G03C5/18 , G03F7/029 , G03F7/26 , G03F7/34 , G03C11/12 , G03C5/00
CPC分类号： G03F7/0295 , G03C1/49881 , G03C5/18 , G03F7/346
摘要： A process for forming an image is disclosed wherein a photo-sensitive image-forming material composed of a support and a layer of a thermoplastic photo-sensitive composition which is not adhesive at ordinary temperatures, is exposed and developed by heating in intimate contact with a peeling development carrier sheet at least one surface of which is composed of a thermoplastic material not adhesive at ordinary temperatures, and, subsequently, peeling the development carrier sheet from the photo-sensitive image-forming material.
摘要翻译：公开了一种用于形成图像的方法，其中由常规温度下不粘合的载体和热塑性感光组合物组成的感光成像材料通过与剥离显影载体片材，其至少一个表面由在常温下不粘合的热塑性材料组成，并且随后从感光成像材料剥离显影载体片材。

10. 发明授权

US4388399A Light-sensitive image-forming material 失效
标题翻译：感光成像材料
公开(公告)号：US4388399A
公开(公告)日：1983-06-14
申请号：US347620
申请日：1982-02-10
申请人： Fumiaki Shinozaki , Tomizo Namiki , Tomoaki Ikeda
发明人： Fumiaki Shinozaki , Tomizo Namiki , Tomoaki Ikeda
IPC分类号： G03F1/56 , G03C1/76
CPC分类号： G03F1/56
摘要： A light-sensitive image-forming material which comprises a support having provided thereon a first layer comprising at least one alcohol-soluble polyamide resin and, on said first layer, a second layer comprising a light-sensitive photoresist composition, said layer containing said alcohol-soluble polyamide resin containing one or more polymers having one or more of a free carboxy group(s), one or more of a phenolic hydroxy group(s) or a maleic anhydride group in a proportion of about 0.1:9.9 to 6:4 by weight to said polyamide resin.
摘要翻译：一种感光成像材料，其包括其上设置有包含至少一种醇可溶性聚酰胺树脂的第一层的载体，并且在所述第一层上包含含有光敏光致抗蚀剂组合物的第二层，所述含有所述醇的层含有一种或多种具有一个或多个游离羧基，一个或多个酚羟基或马来酸酐基团的聚合物的可溶性聚酰胺树脂，其比例为约0.1:9.9至6:4 （重量）。

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