专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08715901B2 Resin composition for forming fine pattern and method for forming fine pattern 有权
标题翻译：用于形成精细图案的树脂组合物和形成精细图案的方法
公开(公告)号：US08715901B2
公开(公告)日：2014-05-06
申请号：US11597332
申请日：2005-05-24
申请人： Hirokazu Sakakibara , Takayoshi Abe , Takashi Chiba , Toru Kimura
发明人： Hirokazu Sakakibara , Takayoshi Abe , Takashi Chiba , Toru Kimura
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , G03F7/40
CPC分类号： G03F7/40 , H01L21/0274
摘要： A resin composition which, in forming a fine pattern by a heat treatment of a resist pattern formed by using a photoresist, can be applied onto the resist pattern, can cause the resist pattern to smoothly shrink by heat treatment, and can be easily washed away by a treatment with an alkaline aqueous solution, and a method for efficiently forming a fine resist pattern using the resin composition are provided. The resin composition comprises a resin containing a hydroxyl group, a crosslinking component, and an alcohol solvent containing water in an amount of 10 wt % or less for the total solvent, wherein the alcohol in the alcohol solvent is a monovalent alcohol having 1 to 8 carbon atoms.
摘要翻译：通过对通过使用光致抗蚀剂形成的抗蚀剂图案的热处理形成微细图案的树脂组合物可以施加到抗蚀剂图案上，可以使抗蚀剂图案通过热处理而平滑地收缩，并且可以容易地被冲走通过用碱性水溶液处理，以及使用该树脂组合物有效形成精细抗蚀剂图案的方法。树脂组合物包含含有羟基的树脂，交联组分和含有总量为10重量％以下的水的醇溶剂，其中醇溶剂中的醇为1〜8价的一元醇碳原子。

2. 发明申请

US20070259287A1 Resin Composition for Forming Fine Pattern and Method for Forming Fine Pattern 有权
标题翻译：用于形成精细图案的树脂组合物和形成精细图案的方法
公开(公告)号：US20070259287A1
公开(公告)日：2007-11-08
申请号：US11597332
申请日：2005-05-24
申请人： Hirokazu Sakakibara , Takayoshi Abe , Takashi Chiba , Toru Kimura
发明人： Hirokazu Sakakibara , Takayoshi Abe , Takashi Chiba , Toru Kimura
IPC分类号： G03C1/00
CPC分类号： G03F7/40 , H01L21/0274
摘要： A resin composition which, in forming a fine pattern by a heat treatment of a resist pattern formed by using a photoresist, can be applied onto the resist pattern, can cause the resist pattern to smoothly shrink by heat treatment, and can be easily washed away by a treatment with an alkaline aqueous solution, and a method for efficiently forming a fine resist pattern using the resin composition are provided. The resin composition comprises a resin containing a hydroxyl group, a crosslinking component, and an alcohol solvent containing water in an amount of 10 wt % or less for the total solvent, wherein the alcohol in the alcohol solvent is a monovalent alcohol having 1 to 8 carbon atoms.
摘要翻译：通过对通过使用光致抗蚀剂形成的抗蚀剂图案的热处理形成微细图案的树脂组合物可以施加到抗蚀剂图案上，可以使抗蚀剂图案通过热处理而平滑地收缩，并且可以容易地被冲走通过用碱性水溶液处理，以及使用该树脂组合物有效形成精细抗蚀剂图案的方法。树脂组合物包含含有羟基的树脂，交联组分和含有总量为10重量％以下的水的醇溶剂，其中醇溶剂中的醇为1〜8价的一元醇碳原子。

3. 发明申请

US20100266953A1 COPOLYMER AND TOP COATING COMPOSITION 审中-公开
标题翻译：共聚物和顶涂料组合物
公开(公告)号：US20100266953A1
公开(公告)日：2010-10-21
申请号：US12832035
申请日：2010-07-07
申请人： Takashi Chiba , Toru Kimura , Tomohiro Utaka , Hiroki Nakagawa , Hirokazu Sakakibara , Hiroshi Dougauchi
发明人： Takashi Chiba , Toru Kimura , Tomohiro Utaka , Hiroki Nakagawa , Hirokazu Sakakibara , Hiroshi Dougauchi
IPC分类号： G03F7/004
CPC分类号： G03F7/11 , C08F220/18 , C08F220/26 , C08F220/38 , C08F228/00 , G03F7/2041
摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which has a recurring unit (I) having a carboxyl group, a recurring unit (II) having a sulfo group and a recurring unit obtained by copolymerizing fluoroalkyl(meth)acrylates having 1 to 20 carbon atoms in a fluoroalkyl group thereof other than a recurring unit having a side chain that includes an alcoholic hydroxyl group having a fluoroalkyl group at least in an α-position thereof, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.
摘要翻译：用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。树脂是具有羧基的重复单元（I），具有磺基的重复单元（II）和通过在氟代烷基中共聚有碳原子数1〜20的氟代烷基（甲基）丙烯酸酯）而得到的重复单元的共聚物除了具有侧链的重链单元以外，其具有至少在α-位具有氟烷基的醇羟基，所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

4. 发明授权

US07781142B2 Copolymer and top coating composition 有权
标题翻译：共聚物和顶涂组合物
公开(公告)号：US07781142B2
公开(公告)日：2010-08-24
申请号：US11664296
申请日：2005-09-28
申请人： Takashi Chiba , Toru Kimura , Tomohiro Utaka , Hiroki Nakagawa , Hirokazu Sakakibara , Hiroshi Dougauchi
发明人： Takashi Chiba , Toru Kimura , Tomohiro Utaka , Hiroki Nakagawa , Hirokazu Sakakibara , Hiroshi Dougauchi
IPC分类号： G03F7/11 , C08F18/20 , C08F18/22
CPC分类号： G03F7/11 , C08F220/18 , C08F220/26 , C08F220/38 , C08F228/00 , G03F7/2041
摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.
摘要翻译：用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物，和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000，其中R1和R2中的至少一个为具有1至4个碳原子的氟代烷基和式（2）中的R 3表示具有1至20个碳原子的氟烷基。

5. 发明授权

US08580482B2 Copolymer and top coating composition 有权
标题翻译：共聚物和顶涂组合物
公开(公告)号：US08580482B2
公开(公告)日：2013-11-12
申请号：US13338569
申请日：2011-12-28
申请人： Takashi Chiba , Toru Kimura , Tomohiro Utaka , Hiroki Nakagawa , Hirokazu Sakakibara , Hiroshi Dougauchi
发明人： Takashi Chiba , Toru Kimura , Tomohiro Utaka , Hiroki Nakagawa , Hirokazu Sakakibara , Hiroshi Dougauchi
IPC分类号： G03F7/11 , C08F18/20 , C08F18/22 , C08F26/02 , C08F28/02
CPC分类号： G03F7/11 , C08F220/18 , C08F220/26 , C08F220/38 , C08F228/00 , G03F7/2041
摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.
摘要翻译：用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物，和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

6. 发明申请

US20080038661A1 Copolymer and Top Coating Composition 有权
标题翻译：共聚物和顶部涂料组合物
公开(公告)号：US20080038661A1
公开(公告)日：2008-02-14
申请号：US11664296
申请日：2005-09-28
申请人： Takashi Chiba , Toru Kimura , Tomohiro Utaka , Hiroki Nakagawa , Hirokazu Sakakibara , Hiroshi Dougauchi
发明人： Takashi Chiba , Toru Kimura , Tomohiro Utaka , Hiroki Nakagawa , Hirokazu Sakakibara , Hiroshi Dougauchi
IPC分类号： C08F12/30 , G03C1/73
CPC分类号： G03F7/11 , C08F220/18 , C08F220/26 , C08F220/38 , C08F228/00 , G03F7/2041
摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.
摘要翻译：用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物，和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000，其中R 1〜 R 2是具有1〜4个碳原子的氟代烷基，式（2）中的R 3表示碳原子数1〜20的氟代烷基。

7. 发明授权

US08247165B2 Upper layer film forming composition for liquid immersion and method of forming photoresist pattern 有权
标题翻译：用于液浸的上层成膜组合物和形成光致抗蚀剂图案的方法
公开(公告)号：US08247165B2
公开(公告)日：2012-08-21
申请号：US10586187
申请日：2005-01-14
申请人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
发明人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
IPC分类号： G03C1/00 , G03F7/00 , C08F18/20
CPC分类号： G03F7/2041 , C08F214/182 , C08F214/186 , C08F216/10 , C08F220/18 , C08F220/24 , G03F7/11 , C08F220/06 , C08F2222/1013
摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.
摘要翻译：提供了对于曝光波长248nm（KrF）和193nm（ArF）显示足够的透明度的浸没上层膜组合物，可以在光致抗蚀剂膜上形成保护膜而不与光致抗蚀剂膜混合，不会被洗脱到水中在浸渍曝光期间使用以保持稳定的膜，并且可以容易地溶解在碱性显影剂中。当使用通过设置在透镜和光致抗蚀剂膜之间的水照射的浸没曝光装置时，该组合物涂覆在光致抗蚀剂膜上，该组合物包含在照射期间形成水稳定膜并溶解在随后的显影剂中的树脂，和含有6个以下碳原子的一元醇的溶剂，该树脂含有至少在α-位的碳原子上的侧链上含有氟烷基的具有醇羟基的树脂成分。

8. 发明申请

US20070269734A1 Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern 有权
标题翻译：用于液体浸渍的Uper层成膜组合物和形成光刻胶图案的方法
公开(公告)号：US20070269734A1
公开(公告)日：2007-11-22
申请号：US10586187
申请日：2005-01-14
申请人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
发明人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
IPC分类号： G03F7/20 , G03F7/11 , H01L21/027
CPC分类号： G03F7/2041 , C08F214/182 , C08F214/186 , C08F216/10 , C08F220/18 , C08F220/24 , G03F7/11 , C08F220/06 , C08F2222/1013
摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.
摘要翻译：提供了对于曝光波长248nm（KrF）和193nm（ArF）显示足够的透明度的浸没上层膜组合物，可以在光致抗蚀剂膜上形成保护膜而不与光致抗蚀剂膜混合，不会被洗脱到水中在浸渍曝光期间使用以保持稳定的膜，并且可以容易地溶解在碱性显影剂中。当使用通过设置在透镜和光致抗蚀剂膜之间的水照射的浸没曝光装置时，该组合物涂覆在光致抗蚀剂膜上，该组合物包含在照射期间形成水稳定膜并溶解在随后的显影剂中的树脂，和含有6个以下碳原子的一元醇的溶剂，该树脂含有至少在α-位的碳原子上在侧链上含有氟烷基的具有醇羟基的树脂成分。

9. 发明授权

US09182674B2 Immersion upper layer film forming composition and method of forming photoresist pattern 有权
标题翻译：浸渍上层成膜组合物和形成光致抗蚀剂图案的方法
公开(公告)号：US09182674B2
公开(公告)日：2015-11-10
申请号：US13550733
申请日：2012-07-17
申请人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
发明人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
IPC分类号： G03F7/11 , G03F7/20 , C08F214/18 , C08F216/10 , C08F220/18 , C08F220/24
CPC分类号： G03F7/2041 , C08F214/182 , C08F214/186 , C08F216/10 , C08F220/18 , C08F220/24 , G03F7/11 , C08F220/06 , C08F2222/1013
摘要： An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.
摘要翻译：浸渍上层膜组合物包括树脂和溶剂。树脂在照射期间形成水稳定膜并溶解在随后的显影剂中。溶剂含有具有6个或更少碳原子的一价醇。在浸渍曝光工艺中，应用该组合物在光致抗蚀剂膜上形成涂层，其中光致抗蚀剂膜通过设置在透镜和光致抗蚀剂膜之间的水进行照射。

10. 发明授权

US11168411B2 Impurity control during formation of aluminum nitride crystals and thermal treatment of aluminum nitride crystals 有权
公开(公告)号：US11168411B2
公开(公告)日：2021-11-09
申请号：US16444148
申请日：2019-06-18
申请人： Robert T. Bondokov , James R. Grandusky , Jianfeng Chen , Shichao Wang , Toru Kimura , Thomas Miebach , Keisuke Yamaoka , Leo J. Schowalter
发明人： Robert T. Bondokov , James R. Grandusky , Jianfeng Chen , Shichao Wang , Toru Kimura , Thomas Miebach , Keisuke Yamaoka , Leo J. Schowalter
IPC分类号： C30B33/02 , C30B29/40 , H01L33/32 , C30B23/06 , C01B21/072
摘要： In various embodiments, single-crystal aluminum nitride boules and substrates are formed from the vapor phase with controlled levels of impurities such as carbon. Single-crystal aluminum nitride may be heat treated via quasi-isothermal annealing and controlled cooling to improve its ultraviolet absorption coefficient and/or Urbach energy.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式