专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20140120027A1 CONDUCTIVE FILM FORMATION METHOD, CONDUCTIVE FILM, INSULATION METHOD, AND INSULATION FILM 审中-公开
标题翻译：导电膜形成方法，导电膜，绝缘方法和绝缘膜
公开(公告)号：US20140120027A1
公开(公告)日：2014-05-01
申请号：US14128821
申请日：2012-06-22
申请人： Hirofumi Tanabe , Tomiaki Otake , Hiroshi Matsugi
发明人： Hirofumi Tanabe , Tomiaki Otake , Hiroshi Matsugi
IPC分类号： C01B31/02 , B29D7/01
CPC分类号： B29D7/01 , C01B32/168 , G02F1/13439 , H01L21/76838 , H01L21/76888 , H01L23/53276 , H01L31/022466 , H01L31/1884 , H01L51/0015 , H01L51/0023 , H01L51/444 , H01L51/5206 , H01L2924/0002 , Y02E10/549 , H01L2924/00
摘要： The object of the present invention is to provide a high-resolution conductive pattern. A conductive film formation method for forming a conductive film in a prescribed pattern comprises: a step in which a conductive carbon nanotube layer is formed; and an ultraviolet ray irradiation step in which areas of the conductive carbon nanotube layer formed in the above step, other than parts corresponding to the prescribed pattern, are irradiated with ultraviolet rays. Conductive carbon nanotubes in the ultraviolet ray irradiation areas turn insulating. Conductive carbon nanotubes in ultraviolet ray non-irradiation areas retain their conductive property.
摘要翻译：本发明的目的是提供一种高分辨率导电图案。用于形成规定图案的导电膜的导电膜形成方法包括：形成导电性碳纳米管层的工序; 以及紫外线照射步骤，其中除了对应于规定图案的部分之外，在上述步骤中形成的导电性碳纳米管层的面积被紫外线照射。紫外线照射区域中的导电性碳纳米管变得绝缘。紫外线照射区域中的导电性碳纳米管保持其导电性。

2. 发明申请

US20090252932A1 ACTINIC ENERGY RAY CURABLE RESION COMPOSITION AND USE THEREOF 审中-公开
标题翻译： ACTINIC能量光固化剂组合物及其用途
公开(公告)号：US20090252932A1
公开(公告)日：2009-10-08
申请号：US11721843
申请日：2005-12-15
申请人： Takahiro Kitano , Hiroshi Matsugi , Takashi Imazu , Keiji Kubo , Masayasu Ogushi , Hirokazu Suzuki
发明人： Takahiro Kitano , Hiroshi Matsugi , Takashi Imazu , Keiji Kubo , Masayasu Ogushi , Hirokazu Suzuki
IPC分类号： C08J3/28 , C08J7/04 , B29C35/08 , B32B3/10 , B32B37/14
CPC分类号： G03F7/0758 , C08J3/28 , C08J2343/04 , G03F7/0382 , G03F7/092 , Y10T428/24802
摘要： An active energy ray-curable resin composition is handleable when it is formed into an uncured film. The resin composition cures quickly, is formable, and can be used to make a hard coat layer with a high hardness. Specifically, the active energy ray-curable resin composition of the present invention contains a vinyl polymer having alkoxysilyl groups in its side chain, along with a photoacid generator. In its uncured state, the active energy ray-curable resin composition has a glass transition temperature of 15° C. to 100° C. 90 mass % or more of the Si-containing compound or Si-containing compound unit present in the active energy ray-curable resin composition is represented by the following structural formula 1: (R1)nSi(OR2)4-n (Structural formula 1) wherein R1 is a structural unit of the backbone of the vinyl polymer of the component (a), a residue bound to the backbone, a polymerizable group that can serve as the structural unit or the residues or a substituted or unsubstituted alkyl or aryl group; R2 is an alkyl group having 1 to 5 carbon atoms; and n is an integer of 1 to 3.
摘要翻译：当活性能量射线固化树脂组合物形成未固化的膜时是可操作的。树脂组合物快速固化，可成型，可用于制备硬度高的硬涂层。具体地说，本发明的活性能量射线固化性树脂组合物含有在侧链具有烷氧基甲硅烷基的乙烯基聚合物以及光酸产生剂。在其未固化状态下，活性能量射线固化型树脂组合物的玻璃化转变温度为15℃〜100℃，存在于活性能中的含Si化合物或含Si化合物单元的90质量％以上（R1）nSi（OR2）4-n（结构式1）其中R1是组分（a）的乙烯基聚合物的主链的结构单元，a 与骨架结合的残基，可用作结构单元或残基的可聚合基团或取代或未取代的烷基或芳基; R2为碳原子数1〜5的烷基， n为1〜3的整数。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式