会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Method for producing ammonium hexachlororuthenate and ruthenium powder, as well as ammonium hexachlororuthenate
    • 生产六氯钌酸铵和钌粉的方法以及六氯钌酸铵
    • US07601198B2
    • 2009-10-13
    • US12010616
    • 2008-01-28
    • Hifumi NagaiYuji Kawano
    • Hifumi NagaiYuji Kawano
    • C01G55/00C01C1/28B22F9/00
    • C01G55/005B22F9/20C01G55/00C01P2006/82
    • Ammonium hexachlororuthenate is produced by adding ammonium chloride to a hydrochloric acid solution containing ruthenium. The ammonium hexachlororuthenate is baked to obtain the ruthenium powder. When the moisture content of the ammonium hexachlororuthenate is high, the baked product is so hard sintered product that its pulverization is not easy. In accordance with the present invention, the following steps are carried out. Hydrochloric acid solution containing ruthenium is held at a temperature of 80 to 95° C. for three hours or longer. The ammonium chloride is then added to the hydrochloric acid solution which is stirred by a stirring mill at the rotation of 200 revolutions per minute or more. The hydrochloric acid solution is held at a temperature of from 85 to 95° C. for 1 hour while being stirred at 200 rpm. The resultant precipitate of ammonium hexachlororuthenate is filtered. The inventive crystals of precipitated ammonium hexachlororuthenate has 10 mass % or less of moisture content.
    • 通过向含有钌的盐酸溶液中加入氯化铵制备六氯钌酸铵。 将六氯钌酸铵焙烧得到钌粉末。 当六氯钌酸铵的含水量高时,焙烧产物是如此硬的烧结产品,其粉碎不容易。 根据本发明,进行以下步骤。 含有钌的盐酸溶液在80〜95℃的温度下保持3小时以上。 然后将氯化铵加入到盐酸溶液中,通过搅拌磨机以200转/分钟的转速搅拌。 将盐酸溶液在85〜95℃的温度下保持1小时,同时以200rpm搅拌。 过滤所得六氯钌酸铵的沉淀。 本发明的六氯钌酸铵沉淀铵的水分含量为10质量%以下。
    • 4. 发明申请
    • Apparatus for removing ruthenium from solution containing platinum group metal
    • 用于从含有铂族金属的溶液中除去钌的装置
    • US20090008840A1
    • 2009-01-08
    • US11798290
    • 2007-05-11
    • Hifumi Nagai
    • Hifumi Nagai
    • C22B5/00
    • C22B3/02B01D3/10B01D3/343C01G55/005C22B3/44C22B11/04Y02P10/234
    • The invention provides an apparatus for effectively removing ruthenium when ruthenium is removed from a solution containing platinum group metal by oxidation distillation.The invention provides an apparatus for selectively removing ruthenium from a solution containing ruthenium and other platinum group metal by adding an oxidizer to the solution to convert ruthenium into ruthenium tetroxide, wherein air is sucked into a reaction tank by reducing pressure within the reaction tank, and at least one outlet of the air is arranged in the apparatus such that the lowermost part thereof is located at the height of 5-20 m from the bottom of the reaction tank, whereby the solution within the reaction tank can be effectively stirred without ruthenium tetroxide, which has large specific gravity, being concentrated at the bottom of the reaction tank.
    • 本发明提供一种用于通过氧化蒸馏从含有铂族金属的溶液中除去钌时有效除去钌的装置。 本发明提供了一种用于通过向溶液中加入氧化剂以将钌转化成四氧化钌,从含有钌等铂族金属的溶液中选择性除去钌的装置,其中通过减小反应槽内的压力将空气吸入反应槽,以及 空气的至少一个出口设置在设备中,使得其最下部分位于距离反应罐底部5-20m的高度处,从而可以有效地搅拌反应槽内的溶液而不用四氧化钌 ,其比重大,浓缩在反应罐底部。
    • 6. 发明申请
    • Method for producing ammonium hexachlororuthenate and ruthenium powder, as well as ammonium hexachlororuthenate
    • 生产六氯钌酸铵和钌粉的方法以及六氯钌酸铵
    • US20080199386A1
    • 2008-08-21
    • US12010616
    • 2008-01-28
    • Hifumi NagaiYuji Kawano
    • Hifumi NagaiYuji Kawano
    • C01B21/083
    • C01G55/005B22F9/20C01G55/00C01P2006/82
    • Ammonium hexachlororuthenate is produced by adding ammonium chloride to a hydrochloric acid solution containing ruthenium. The ammonium hexachlororuthenate is baked to obtain the ruthenium powder. When the moisture content of the ammonium hexachlororuthenate is high, the baked product is so hard sintered product that its pulverization is not easy. In accordance with the present invention, the following steps are carried out. Hydrochloric acid solution containing ruthenium is held at a temperature of 80 to 95° C. for three hours or longer. The ammonium chloride is then added to the hydrochloric acid solution which is stirred by a stirring mill at the rotation of 200 revolutions per minute or more. The hydrochloric acid solution is held at a temperature of from 85 to 95° C. for 1 hour while being stirred at 200 rpm. The resultant precipitate of ammonium hexachlororuthenate is filtered. The inventive crystals of precipitated ammonium hexachlororuthenate has 10 mass % or less of moisture content.
    • 通过向含有钌的盐酸溶液中加入氯化铵制备六氯钌酸铵。 将六氯钌酸铵焙烧得到钌粉末。 当六氯钌酸铵的含水量高时,焙烧产物是如此硬的烧结产品,其粉碎不容易。 根据本发明,进行以下步骤。 含有钌的盐酸溶液在80〜95℃的温度下保持3小时以上。 然后将氯化铵加入到盐酸溶液中,通过搅拌磨机以200转/分钟的转速搅拌。 将盐酸溶液在85〜95℃的温度下保持1小时,同时以200rpm搅拌。 过滤所得到的六氯钌酸铵沉淀。 本发明的六氯钌酸铵沉淀铵的水分含量为10质量%以下。
    • 7. 发明授权
    • Apparatus for removing ruthenium from solution containing platinum group metal
    • 用于从含有铂族金属的溶液中除去钌的装置
    • US07938880B2
    • 2011-05-10
    • US12700548
    • 2010-02-04
    • Hifumi Nagai
    • Hifumi Nagai
    • C22B60/00
    • C22B3/02B01D3/10B01D3/343C01G55/005C22B3/44C22B11/04Y02P10/234
    • The invention provides an apparatus for effectively removing ruthenium when ruthenium is removed from a solution containing platinum group metal by oxidation distillation. The invention provides an apparatus for selectively removing ruthenium from a solution containing ruthenium and other platinum group metal by adding an oxidizer to the solution to convert ruthenium into ruthenium tetroxide, wherein air is sucked into a reaction tank by reducing pressure within the reaction tank, and at least one outlet of the air is arranged in the apparatus such that the lowermost part thereof is located at the height of 5-20 m from the bottom of the reaction tank, whereby the solution within the reaction tank can be effectively stirred without ruthenium tetroxide, which has large specific gravity, being concentrated at the bottom of the reaction tank.
    • 本发明提供一种用于通过氧化蒸馏从含有铂族金属的溶液中除去钌时有效除去钌的装置。 本发明提供了一种用于通过向溶液中加入氧化剂以将钌转化成四氧化钌,从含有钌等铂族金属的溶液中选择性除去钌的装置,其中通过减小反应槽内的压力将空气吸入反应槽,以及 空气的至少一个出口设置在设备中,使得其最下部分位于距离反应罐底部5-20m的高度处,从而可以有效地搅拌反应槽内的溶液而不用四氧化钌 ,其比重大,浓缩在反应罐底部。
    • 8. 发明授权
    • Copper alloy foil
    • 铜合金箔
    • US06939620B2
    • 2005-09-06
    • US10189043
    • 2002-07-03
    • Hifumi NagaiToshiteru Nonaka
    • Hifumi NagaiToshiteru Nonaka
    • H05K3/38B32B15/08C22C9/06H05K1/00H05K1/09H05K3/28C22F1/08
    • H05K1/09H05K1/0393H05K3/282H05K3/386H05K2201/0355Y10T428/12431Y10T428/12438Y10T428/12993Y10T428/31511Y10T428/31522Y10T428/31678
    • For a three-layer flexible board, there is provided a copper alloy foil that requires no roughening processing, that has good adhesion with an adhesive containing an epoxy resin, that can be laminated to form a copper-clad laminate, that has a low surface roughness, and that has high conductivity and strength. The copper alloy of the foil contains at least one of 0.01-2.0 weight percent Cr and 0.01-1.0 weight percent Zr or contains 1.0-4.8 weight percent Ni and 0.2-1.4 weight percent Si. Good adhesion of the copper alloy foil to a resin substrate with an adhesive containing an epoxy resin is obtained by setting the thickness of the anticorrosive coating to less than 3 nm; the surface roughness of the copper alloy foil is below 2 μm expressed as ten-point average surface roughness (Rz); and, without roughening processing, the 180° C. peel strength, after adhesion of the copper alloy foil to the board film by means of an adhesive containing an epoxy resin, is greater than 8.0 N/cm.
    • 对于三层柔性板,提供了不需要粗糙化处理的铜合金箔,其与含有环氧树脂的粘合剂具有良好的粘合性,可以层压形成覆铜层压板,其具有低表面 粗糙度高,导电性和强度高。 箔的铜合金含有0.01-2.0重量%Cr和0.01-1.0重量%Zr中的至少一种,或含有1.0-4.8重量%的Ni和0.2-1.4重量%的Si。 通过将防腐涂层的厚度设定为小于3nm,可以获得铜合金箔与含有环氧树脂的粘合剂对树脂基板的良好粘合性; 铜合金箔的表面粗糙度低于2μm,表示为十点平均表面粗糙度(Rz); 并且在不进行粗糙化处理的情况下,通过含有环氧树脂的粘合剂将铜合金箔粘合到基板上之后的180℃剥离强度大于8.0N / cm。
    • 9. 发明授权
    • Copper alloy foil
    • 铜合金箔
    • US06808825B2
    • 2004-10-26
    • US10216025
    • 2002-08-09
    • Hifumi Nagai
    • Hifumi Nagai
    • B32B1504
    • C22C9/00C22C9/02C22C9/06H05K1/0346H05K1/09H05K2201/0154H05K2201/0355Y10T428/12507Y10T428/12569Y10T428/12882Y10T428/12896Y10T428/12903Y10T428/26Y10T428/265Y10T428/31678Y10T428/31681Y10T428/31721
    • For a two-layer printed wiring board including a polyimide substrate produced with varnish containing polyamic acid as the raw material for the polyimide and a copper alloy foil laminated with the polyimide substrate, there is provided, for the copper alloy foil, a copper alloy containing, in addition to copper and unavoidable impurities, either (1) 0.02 to 1.0 weight percent Ag and/or 0.01 to 0.5 weight percent In or (2) alloy composition (1) plus a total of 0.005 to 2.5 weight percent of at least one of the additional elements Al, Be, Co, Fe, Mg, Mn, Ni, P, Pb, Si, Ti and Zn, or (3) 0.001 to 0.5 weight percent Sn or (4) alloy composition (3) plus a total of 0.005 to 2.5 weight percent of at least one of the additional elements of alloy composition (2) and each of (1), (2), (3) and (4) preferably having a heat resistance of at least 300° C.
    • 对于包含用聚酰胺酸作为聚酰亚胺原料的清漆制成的聚酰亚胺基板和与聚酰亚胺基板层合的铜合金箔的双层印刷布线板,对于铜合金箔,提供含有 除了铜和不可避免的杂质之外,还有(1)0.02至1.0重量%的Ag和/或0.01至0.5重量百分比的In或(2)合金组合物(1)加上总计为0.005至2.5重量%的至少一种 的附加元素Al,Be,Co,Fe,Mg,Mn,Ni,P,Pb,Si,Ti和Zn,或(3)0.001至0.5重量%的Sn或(4)合金组成(3) 0.005〜2.5重量%的合金组合物(2)的附加元素和(1),(2),(3)和(4)中的至少一种优选具有至少300℃的耐热性。