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    • 1. 发明授权
    • Servo control device
    • 伺服控制装置
    • US08890460B2
    • 2014-11-18
    • US13980984
    • 2012-10-25
    • Hidetoshi IkedaYoshihiro MarushitaKoji MaharaKiyoshi HasegawaHidemasa Ogi
    • Hidetoshi IkedaYoshihiro MarushitaKoji MaharaKiyoshi HasegawaHidemasa Ogi
    • G05B5/01G05B6/02
    • G05B6/02G05B5/01
    • A servo control device includes a follow-up control unit that controls a control target that drives a mechanical system by a motor, a command function unit that has input therein a phase signal θ indicating a phase of a cyclic operation performed by the control target, and that calculates a machine motion command according to the phase signal θ by a preset first function, a second derivative unit that uses a second function obtained by second-order differentiating the first function with respect to the phase signal to calculate a value of the second function according to the phase signal as a second-order differential base signal, a correction-value computation unit that computes a first command correction value for correcting the motor motion command by using a product of a square value of the phase velocity, the second-order differential base signal, and a first constant, and a correction-value addition unit that calculates the motor motion command based on an added value of the first command correction value and the machine motion command.
    • 一种伺服控制装置,包括:跟随控制单元,其控制由马达驱动机械系统的控制对象;命令功能单元,其中输入有相位信号; 指示由控制对象执行的循环操作的相位,并且根据相位信号计算机器运动命令; 通过预设的第一功能,二阶导数单元使用通过相对于相位信号对第一函数进行二阶微分而获得的第二函数,以根据相位信号计算第二函数的值作为二阶差分基极 信号,校正值计算单元,其通过使用相速度,二阶差分基准信号和第一常数的平方值的乘积来计算用于校正马达运动命令的第一命令校正值,以及校正 - 值附加单元,其基于第一命令校正值和机器运动命令的相加值来计算马达运动命令。
    • 2. 发明申请
    • SERVO CONTROL DEVICE
    • 伺服控制装置
    • US20140117919A1
    • 2014-05-01
    • US13980984
    • 2012-10-25
    • Hidetoshi IkedaYoshihiro MarushitaKoji MaharaKiyoshi HasegawaHidemasa Ogi
    • Hidetoshi IkedaYoshihiro MarushitaKoji MaharaKiyoshi HasegawaHidemasa Ogi
    • G05B6/02G05B5/01
    • G05B6/02G05B5/01
    • A servo control device includes a follow-up control unit that controls a control target that drives a mechanical system by a motor, a command function unit that has input therein a phase signal θ indicating a phase of a cyclic operation performed by the control target, and that calculates a machine motion command according to the phase signal θ by a preset first function, a second derivative unit that uses a second function obtained by second-order differentiating the first function with respect to the phase signal to calculate a value of the second function according to the phase signal as a second-order differential base signal, a correction-value computation unit that computes a first command correction value for correcting the motor motion command by using a product of a square value of the phase velocity, the second-order differential base signal, and a first constant, and a correction-value addition unit that calculates the motor motion command based on an added value of the first command correction value and the machine motion command.
    • 一种伺服控制装置,包括:跟随控制单元,其控制由马达驱动机械系统的控制对象;命令功能单元,其中输入有相位信号; 指示由控制对象执行的循环操作的相位,并且根据相位信号计算机器运动命令; 通过预设的第一功能,二阶导数单元使用通过相对于相位信号对第一函数进行二阶微分而获得的第二函数,以根据相位信号计算第二函数的值作为二阶差分基极 信号,校正值计算单元,其通过使用相速度,二阶差分基准信号和第一常数的平方值的乘积来计算用于校正马达运动命令的第一命令校正值,以及校正 - 值附加单元,其基于第一命令校正值和机器运动命令的相加值来计算马达运动命令。
    • 4. 发明申请
    • POSITION DETECTING METHOD
    • 位置检测方法
    • US20120158355A1
    • 2012-06-21
    • US13405766
    • 2012-02-27
    • Toshiyuki MatsumotoTomohide MinamiYuichi DoukiKoji Mahara
    • Toshiyuki MatsumotoTomohide MinamiYuichi DoukiKoji Mahara
    • G06F15/00G01K1/00G01N19/10
    • G01B7/003H01L21/67259
    • A position alignment of a transfer point of a transfer arm is performed by using a position detecting method. The method includes: detecting electrostatic capacitances in relation with a reference object for position alignment by a plurality of electrostatic capacitance detecting electrodes provided on a surface of the substrate body; communicating with each electrostatic capacitance detecting electrode and controlling a detection of each electrostatic capacitance detecting electrode; and calculating coordinates (x, y) of the reference object with respect to the substrate body based on a preset relationship between electrostatic capacitance values of multiple electrostatic capacitance detecting electrodes and a position of the reference object with respect to the substrate body.
    • 通过使用位置检测方法来执行传送臂的传送点的位置对准。 所述方法包括:通过设置在所述基板主体的表面上的多个静电电容检测电极来检测与参考对象相关的静电电容以进行位置对准; 与每个静电电容检测电极连通并控制每个静电电容检测电极的检测; 并且基于多个静电电容检测电极的静电电容值与所述基准对象相对于所述基板主体的位置之间的预设关系来计算所述基准对象相对于所述基板主体的坐标(x,y)。
    • 5. 发明申请
    • JIG FOR DETECTING POSITION
    • 用于检测位置的JIG
    • US20090115422A1
    • 2009-05-07
    • US12254998
    • 2008-10-21
    • Toshiyuki MatsumotoTomohide MinamiKoji MaharaYuichi Douki
    • Toshiyuki MatsumotoTomohide MinamiKoji MaharaYuichi Douki
    • G01R29/12
    • H01L21/67259H01L21/68
    • A transfer point of a transfer arm is detected accurately and stably by using a position detecting wafer having an electrostatic capacitance sensor. A position detecting wafer S is formed in a wafer shape transferable by a transfer arm 20 and includes an electrostatic capacitance sensor 50 for detecting a relative position with respect to a reference object by detecting an electrostatic capacitance in relation with the reference object for a position detection. The electrostatic capacitance sensor 50 includes a detection electrode 52 for forming the electrostatic capacitance in relation with the reference object, and the detection electrode 52 is installed on a rear surface of a main body of the wafer shape. Installed on the main body is a guard electrode 100 covering the detecting electrode 52 when viewed from a front surface thereof, for blocking an electric field oriented toward the detection electrode 52 from the front surface.
    • 通过使用具有静电电容传感器的位置检测晶片,准确稳定地检测转移臂的转印点。 位置检测用晶片S形成为可由传送臂20转印的晶片形状,并且包括静电电容传感器50,用于通过检测与参考对象相关的位置检测的静电电容来检测相对于参考对象的相对位置 。 静电电容传感器50包括用于与参考对象相关地形成静电电容的检测电极52,并且检测电极52安装在晶片形状的主体的后表面上。 安装在主体上的是从其前表面观察时覆盖检测电极52的保护电极100,用于阻挡从前表面朝向检测电极52的电场。
    • 8. 发明授权
    • Jig for detecting position
    • 夹具检测位置
    • US08149005B2
    • 2012-04-03
    • US12182239
    • 2008-07-30
    • Toshiyuki MatsumotoTomohide MinamiYuichi DoukiKoji Mahara
    • Toshiyuki MatsumotoTomohide MinamiYuichi DoukiKoji Mahara
    • G01R31/00G01R31/312
    • G01B7/003H01L21/67259
    • A position alignment of a transfer point of a transfer arm is performed by using a position detecting wafer capable of being loaded into an apparatus having a thin transfer port. The position detecting wafer S includes an electrostatic capacitance detecting sensor 50 for detecting an electrostatic capacitance in relation with a reference object for the position alignment. The electrostatic capacitance detecting sensor 50 includes a plurality of electrostatic capacitance detecting electrodes 52, each forming the electrostatic capacitance in relation with the reference object; and a control circuit 51 for controlling a detection of the electrostatic capacitance by each electrostatic capacitance detecting electrode 52, while communicating with each electrostatic capacitance detecting electrode 52. The electrostatic capacitance detecting electrodes 52 are provided on a rear surface of the position detecting wafer S, and the control circuit 51 is provided on a front surface of the position detecting wafer S.
    • 通过使用能够加载到具有薄的传送端口的设备的位置检测晶片来执行传送臂的传送点的位置对准。 位置检测用晶片S包括:静电电容检测传感器50,用于检测与位置对准的基准对象有关的静电电容。 静电电容检测传感器50包括多个静电电容检测电极52,每个静电电容检测电极形成与参考对象相关的静电电容; 以及控制电路51,用于在与每个静电电容检测电极52通信的同时控制每个静电电容检测电极52的静电电容的检测。静电电容检测电极52设置在位置检测晶片S的后表面上, 并且控制电路51设置在位置检测晶片S的前表面上。
    • 9. 发明授权
    • Jig for detecting position
    • 夹具检测位置
    • US07994793B2
    • 2011-08-09
    • US12254998
    • 2008-10-21
    • Toshiyuki MatsumotoTomohide MinamiKoji MaharaYuichi Douki
    • Toshiyuki MatsumotoTomohide MinamiKoji MaharaYuichi Douki
    • G01R29/12
    • H01L21/67259H01L21/68
    • A transfer point of a transfer arm is detected accurately and stably by using a position detecting wafer having an electrostatic capacitance sensor. A position detecting wafer S is formed in a wafer shape transferable by a transfer arm 20 and includes an electrostatic capacitance sensor 50 for detecting a relative position with respect to a reference object by detecting an electrostatic capacitance in relation with the reference object for a position detection. The electrostatic capacitance sensor 50 includes a detection electrode 52 for forming the electrostatic capacitance in relation with the reference object, and the detection electrode 52 is installed on a rear surface of a main body of the wafer shape. Installed on the main body is a guard electrode 100 covering the detecting electrode 52 when viewed from a front surface thereof, for blocking an electric field oriented toward the detection electrode 52 from the front surface.
    • 通过使用具有静电电容传感器的位置检测晶片,准确稳定地检测转移臂的转印点。 位置检测用晶片S形成为可由传送臂20转印的晶片形状,并且包括静电电容传感器50,用于通过检测与参考对象相关的位置检测的静电电容来检测相对于参考对象的相对位置 。 静电电容传感器50包括用于与参考对象相关地形成静电电容的检测电极52,并且检测电极52安装在晶片形状的主体的后表面上。 安装在主体上的是从其前表面观察时覆盖检测电极52的保护电极100,用于阻挡从前表面朝向检测电极52的电场。