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1. 发明授权

US06866982B2 Resist composition and patterning process 失效
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US06866982B2
公开(公告)日：2005-03-15
申请号：US10329456
申请日：2002-12-27
申请人： Hideto Kato , Yoshinori Hirano , Toshihiko Fujii , Hiromasa Yamaguchi
发明人： Hideto Kato , Yoshinori Hirano , Toshihiko Fujii , Hiromasa Yamaguchi
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039 , G03F7/075 , G03F7/30
CPC分类号： G03F7/0048 , G03F7/0046 , G03F7/0392 , G03F7/0755 , G03F7/0757
摘要： A resist composition comprising (A) a substantially alkali-insoluble polymer having acidic functional groups protected with acid labile groups, which becomes alkali soluble upon elimination of the acid labile groups, (B) a photoacid generator, and (C) a nonionic fluorinated organosiloxane compound consisting of perfluoroalkyl-containing siloxane bonds and polyoxyethylene type polyether bonds is exposed to UV having a wavelength of at least 150 nm and developed with an alkaline solution to form a pattern without leaving scum.
摘要翻译：一种抗蚀剂组合物，其包含（A）具有由酸不稳定基团保护的酸性官能团的基本上不溶于碱的聚合物，其在消除酸不稳定基团时变得碱溶性，（B）光酸产生剂，和（C）非离子氟化有机硅氧烷由包含全氟烷基的硅氧烷键和聚氧乙烯型聚醚键组成的化合物暴露于波长为至少150nm的UV并用碱性溶液显影以形成图案而不留下浮渣。

2. 发明授权

US07378215B2 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US07378215B2
公开(公告)日：2008-05-27
申请号：US11637103
申请日：2006-12-12
申请人： Hiromasa Yamaguchi , Hideto Kato
发明人： Hiromasa Yamaguchi , Hideto Kato
IPC分类号： G03F7/023
CPC分类号： G03F7/0752 , G03F7/0046 , G03F7/0048 , G03F7/0226
摘要： A positive photoresist composition comprising an alkali-soluble resin, a 1,2-quinonediazide compound, an organic solvent, and a fluorinated organosilicon compound of formula (1) serving as a surfactant can be effectively coated to uniformity over large areas and is improved in resist pattern profile. Rf is a C5-C30 perfluoroalkyl group containing at least one ether bond, Q is a polyether group consisting of an ethylene glycol and/or propylene glycol polymer chain, R is H or C1-C4 alkyl, X is a divalent linking group exclusive of oxygen, Y is a divalent linking group, p is an integer of at least 3, and 0
摘要翻译：包含碱溶性树脂，1,2-醌二叠氮化合物，有机溶剂和用作表面活性剂的式（1）的氟化有机硅化合物的正型光致抗蚀剂组合物可以有效地涂覆在大面积上的均匀性，并且改善了抗蚀图案轮廓。 Rf是含有至少一个醚键的C 5 -C 30全氟烷基，Q是由乙二醇和/或丙二醇聚合物链组成的聚醚基团，R 是H或C 1 -C 4烷基，X是不包括氧的二价连接基团，Y是二价连接基团，p是至少3的整数，和0

3. 发明申请

US20070134591A1 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US20070134591A1
公开(公告)日：2007-06-14
申请号：US11637103
申请日：2006-12-12
申请人： Hiromasa Yamaguchi , Hideto Kato
发明人： Hiromasa Yamaguchi , Hideto Kato
IPC分类号： G03C1/00
CPC分类号： G03F7/0752 , G03F7/0046 , G03F7/0048 , G03F7/0226
摘要： A positive photoresist composition comprising an alkali-soluble resin, a 1,2-quinonediazide compound, an organic solvent, and a fluorinated organosilicon compound of formula (1) serving as a surfactant can be effectively coated to uniformity over large areas and is improved in resist pattern profile. Rf is a C5-C30 perfluoroalkyl group containing at least one ether bond, Q is a polyether group consisting of an ethylene glycol and/or propylene glycol polymer chain, R is H or C1-C4 alkyl, X is a divalent linking group exclusive of oxygen, Y is a divalent linking group, p is an integer of at least 3, and 0
摘要翻译：包含碱溶性树脂，1,2-醌二叠氮化合物，有机溶剂和用作表面活性剂的式（1）的氟化有机硅化合物的正型光致抗蚀剂组合物可以有效地涂覆在大面积上的均匀性，并且改善了抗蚀图案轮廓。 Rf是含有至少一个醚键的C 5 -C 30全氟烷基，Q是由乙二醇和/或丙二醇聚合物链组成的聚醚基团，R 是H或C 1 -C 4烷基，X是不包括氧的二价连接基团，Y是二价连接基团，p是至少3的整数，和0

4. 发明授权

US06437058B2 Polymers and positive resist compositions 有权
标题翻译：聚合物和正性抗蚀剂组合物
公开(公告)号：US06437058B2
公开(公告)日：2002-08-20
申请号：US09777903
申请日：2001-02-07
申请人： Tomoyoshi Furihata , Hideto Kato , Yoshinori Hirano
发明人： Tomoyoshi Furihata , Hideto Kato , Yoshinori Hirano
IPC分类号： C08G830
CPC分类号： C08G8/30 , C08G8/28 , C08L61/06 , C08L61/14
摘要： A polymer in the form of a novolac resin is provided wherein the novolac resin has a weight average molecular weight of 1,000-30,000, some of the hydrogen atoms of hydroxyl groups are replaced by 1,2-naphthoquinonediazidosulfonyl ester groups, and some of the hydrogen atoms of the remaining hydroxyl groups are replaced by substituted acetal groups and/or crosslinked within a molecule or between molecules with crosslinking groups having C—O—C linkages. The polymer is formulated into a positive resist composition having improved uniformity, sensitivity, resolution and pattern profile as well as improved heat resistance, film retention, substrate adhesion and storage stability.
摘要翻译：提供酚醛清漆树脂形式的聚合物，其中酚醛清漆树脂的重均分子量为1,000-3,000，羟基的一些氢原子被1,2-萘醌二叠氮磺酰酯基代替，一些氢剩余羟基的原子被取代的缩醛基团取代和/或在分子内或具有具有COC键的交联基团的分子之间交联。将聚合物配制成具有改进的均匀性，灵敏度，分辨率和图案轮廓以及改善的耐热性，膜保留性，底物粘合性和储存稳定性的正性抗蚀剂组合物。

5. 发明授权

US08785114B2 Method for manufacturing micro-structure 有权
标题翻译：微结构制造方法
公开(公告)号：US08785114B2
公开(公告)日：2014-07-22
申请号：US13157460
申请日：2011-06-10
申请人： Hideto Kato , Hiroshi Kanbara , Tomoyoshi Furihata , Yoshinori Hirano
发明人： Hideto Kato , Hiroshi Kanbara , Tomoyoshi Furihata , Yoshinori Hirano
IPC分类号： G03F7/30 , G03F7/40 , G03F7/038 , G03F7/023 , G03F7/20
CPC分类号： C09D163/04 , B81C1/00619 , B81C2201/0108 , G03F7/0226 , G03F7/0236 , G03F7/30 , G03F7/40 , G03F7/70466
摘要： A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.
摘要翻译：通过图案化牺牲膜来制造微结构，在图案上形成无机材料膜，为无机材料膜提供孔，并通过孔蚀刻掉牺牲膜图案，以限定具有图案轮廓的空间。图案化阶段包括以下步骤：（A）使用包含甲酚酚醛清漆树脂和交联剂的组合物形成牺牲膜，（B）将膜图案化为第一高能辐射，（C）显影，和（D）曝光牺牲膜图案到第二高能量辐射和热处理，从而在甲酚酚醛清漆树脂内形成交联。

6. 发明授权

US08048611B2 Polyorganosiloxane, resin composition, and patterning process 失效
标题翻译：聚有机硅氧烷，树脂组合物和图案化工艺
公开(公告)号：US08048611B2
公开(公告)日：2011-11-01
申请号：US12429282
申请日：2009-04-24
申请人： Hideto Kato , Tomoyoshi Furihata , Masahiro Furuya , Yoshinori Hirano
发明人： Hideto Kato , Tomoyoshi Furihata , Masahiro Furuya , Yoshinori Hirano
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： C08G77/38 , C08G77/14 , C08G77/50 , C08L83/10 , C08L83/14 , G03F7/0392 , G03F7/0757 , G03F7/40 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122 , H01L27/1248 , Y10S430/114 , C08L2666/28
摘要： A polyorganosiloxane compound is modified such that some silicon-bonded hydroxyl groups are substituted with acid labile groups and/or intermolecular or intramolecular crosslinks form with a crosslinking group having a C—O—C linkage. Cured films of a composition comprising the polyorganosiloxane are useful as interlayer dielectric films on TFT substrates.
摘要翻译：改性聚有机硅氧烷化合物，使得一些硅键合的羟基被酸不稳定基团取代，和/或分子间或分子内的交联与具有C-O-C键的交联基团形成。包含聚有机硅氧烷的组合物的固化膜可用作TFT基板上的层间绝缘膜。

7. 发明授权

US06635400B2 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US06635400B2
公开(公告)日：2003-10-21
申请号：US09835375
申请日：2001-04-17
申请人： Hideto Kato , Kazuhiro Nishikawa , Yoshinori Hirano , Katsuya Takemura
发明人： Hideto Kato , Kazuhiro Nishikawa , Yoshinori Hirano , Katsuya Takemura
IPC分类号： G03F7023
CPC分类号： G03F7/168 , G03F7/0233 , G03F7/0392
摘要： A resist composition comprising (A) an alkali-insoluble or substantially insoluble polymer having acidic functional groups protected with acid labile groups, which polymer becomes alkali-soluble upon elimination of the acid labile groups, (B) a photoacid generator, and (C) a 1,2-naphthoquinonediazidosulfonyl group-bearing compound has a high resolution and sensitivity, and provides resist patterns of excellent plating resistance when used in UV lithography at an exposure light wavelength of at least 300 nm.
摘要翻译：一种抗蚀剂组合物，其包含（A）具有由酸不稳定基团保护的酸性官能团的碱不溶性或基本上不溶的聚合物，该聚合物在消除酸不稳定基团时变得碱溶性，（B）光酸产生剂，和（C）具有1,2-萘醌二叠氮基磺酰基的化合物具有高分辨率和灵敏度，并且当在至少300nm的曝光光波长下用于UV光刻时，提供具有优异电镀电阻的抗蚀剂图案。

8. 发明授权

US06899991B2 Photo-curable resin composition, patterning process, and substrate protecting film 有权
标题翻译：光固化树脂组合物，图案化工艺和基材保护膜
公开(公告)号：US06899991B2
公开(公告)日：2005-05-31
申请号：US10266566
申请日：2002-10-09
申请人： Hideto Kato , Kazumi Noda , Toshihiko Fujii , Kazuhiro Arai , Satoshi Asai
发明人： Hideto Kato , Kazumi Noda , Toshihiko Fujii , Kazuhiro Arai , Satoshi Asai
IPC分类号： B05D7/24 , C08F2/46 , C08G59/62 , C08J5/18 , C08K5/13 , C08K5/5415 , C08L83/04 , C08L83/14 , C09D183/14 , G03F7/004 , G03F7/038 , G03F7/075 , G03F7/40 , H01L21/027
CPC分类号： G03F7/0757 , C09D183/14 , G03F7/0382 , Y10S430/128 , C08L2666/14
摘要： A photo-curable resin composition comprising (A) an organosiloxane-bearing polymer comprising recurring units of formula (1): wherein R1 to R4 are monovalent C1-C8 hydrocarbon, n is an integer of 1-1,000, and X is and having a Mw of 500-200,000, (B) a formalin-modified or formalin-alcohol-modified amino condensate, a phenol compound having on the average at least two methylol or alkoxymethylol radicals, or an epoxy compound having on the average at least two epoxy radicals, (C) a photoacid generator, and (D) a silicon compound of the formula: (R11)mSi(OR12)4−m wherein R11 is monovalent C1-C9 hydrocarbon, R12 is C1-C4 alkyl, m is 0-2, forms cured pattern films having dry etch resistance and improved adhesion to substrates.
摘要翻译：一种光固化树脂组合物，其包含（A）含有机硅氧烷的聚合物，其包含式（1）的重复单元：其中R 1至R 4为单价C 1〜8个碳原子，n为1-1000的整数，X为Mw为500-200,000，（B）福尔马林改性或福尔马林醇 - 改性氨基缩合物，平均具有至少两个羟甲基或烷氧基羟甲基的苯酚化合物或平均具有至少两个环氧基的环氧化合物，（C）光酸产生剂，和（D）式（R 11）其中R 11是（OR 12）其中R 11是（OR 12） SUP>是一价C 1 -C 9烃，R 12是C 1 -C 4烃基烷基，m为0-2，形成具有耐干蚀刻性和改善对基材的粘合性的固化图案膜。

9. 发明授权

US06867325B2 Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate-protecting coat 失效
标题翻译：有机硅氧烷聚合物，光固化树脂组合物，图案化工艺和底物保护涂层
公开(公告)号：US06867325B2
公开(公告)日：2005-03-15
申请号：US10212253
申请日：2002-08-06
申请人： Hideto Kato , Satoshi Asai , Toshihiko Fujii
发明人： Hideto Kato , Satoshi Asai , Toshihiko Fujii
IPC分类号： G03F7/075 , B05D3/06 , C07F7/02 , C07F7/08 , C07F7/10 , C08F230/08 , C08G77/04 , C08G77/14 , C08G77/52 , H01L21/027 , H01L21/312
CPC分类号： C09D183/04
摘要： An organosiloxane polymer comprising recurring units of the general formula (1) and having a weight average molecular weight of 1,000-500,000 is novel. R1 to R4 are monovalent hydrocarbon groups, n is an integer of 1-2,000, X has a structure of the formula: and R5 is an acrylic functional organic group of the formula: wherein R′ is H or methyl and R″ is a divalent hydrocarbon group. A photo-curable resin composition comprising the organosiloxane polymer and a sensitizer can be cured with a wide wavelength range of light.
摘要翻译：包含通式（1）的重复单元并且具有1,000-500,000重均分子量的有机硅氧烷聚合物是新颖的.R 1至R 4是一价烃基，n是1-2,000的整数， X具有下式的结构：R 5是具有下式的丙烯酸官能的有机基团：其中R'是H或甲基，R“是二价烃基。包含有机硅氧烷聚合物和敏化剂的光固化树脂组合物可以在宽的波长范围的光下固化。

10. 发明授权

US06440646B1 Positive resist composition suitable for lift-off technique and pattern forming method 有权
公开(公告)号：US06440646B1
公开(公告)日：2002-08-27
申请号：US09782189
申请日：2001-02-14
申请人： Takafumi Ueda , Hideto Kato , Toshihiko Fujii , Miki Kobayashi
发明人： Takafumi Ueda , Hideto Kato , Toshihiko Fujii , Miki Kobayashi
IPC分类号： G03F730
摘要： A positive resist composition contains (A) a novolak resin having a weight average molecular weight calculated as polystyrene of 2,000-20,000 wherein 2.5-27 mol % of the hydrogen atom of a hydroxyl group is replaced by a 1,2-naphthoquinonediazidosulfonyl group and (B) a low molecular aromatic compound having phenolic hydroxyl groups and 2-20 benzene rings wherein the ratio of the number of phenolic hydroxyl groups to the number of benzene rings is between 0.5 and 2.5. By forming a resist layer on a substrate from the positive resist composition and baking the resist layer at 90-130° C., followed by exposure and development, there is formed a resist pattern having an undercut of desired configuration. Owing to high resolution and improved dimensional control, heat resistance and film retention, the resist pattern lends itself to a lift-off technique.

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