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1. 发明授权

US08136479B2 Plasma treatment apparatus and plasma treatment method 失效
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US08136479B2
公开(公告)日：2012-03-20
申请号：US11081528
申请日：2005-03-17
申请人： Hideo Sugai , Tetsuya Ide , Atsushi Sasaki , Kazufumi Azuma , Yukihiko Nakata
发明人： Hideo Sugai , Tetsuya Ide , Atsushi Sasaki , Kazufumi Azuma , Yukihiko Nakata
IPC分类号： C23C16/511 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： H01J37/32192
摘要： A plasma treatment apparatus generates a plasma in a treatment vessel by an electromagnetic wave radiated from an electromagnetic wave radiation portion into the treatment vessel to perform plasma treatment by the plasma. At least a part of a wall constituting the treatment vessel includes at least a part of an electromagnetic wave transmission path which transmits the electromagnetic wave.
摘要翻译：等离子体处理装置通过从电磁波辐射部分辐射到处理容器中的电磁波在处理容器中产生等离子体，以通过等离子体进行等离子体处理。构成处理容器的壁的至少一部分包括透过电磁波的电磁波传输路径的至少一部分。

2. 发明申请

US20050205016A1 Plasma treatment apparatus and plasma treatment method 失效
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US20050205016A1
公开(公告)日：2005-09-22
申请号：US11081528
申请日：2005-03-17
申请人： Hideo Sugai , Tetsuya Ide , Atsushi Sasaki , Kazufumi Azuma , Yukihiko Nakata
发明人： Hideo Sugai , Tetsuya Ide , Atsushi Sasaki , Kazufumi Azuma , Yukihiko Nakata
IPC分类号： C23C16/00 , H01J37/32 , H01L21/00 , H01L21/3065 , H05H1/46
CPC分类号： H01J37/32192
摘要： A plasma treatment apparatus generates a plasma in a treatment vessel by an electromagnetic wave radiated from an electromagnetic wave radiation portion into the treatment vessel to perform plasma treatment by the plasma. At least a part of a wall constituting the treatment vessel includes at least a part of an electromagnetic wave transmission path which transmits the electromagnetic wave.
摘要翻译：等离子体处理装置通过从电磁波辐射部分辐射到处理容器中的电磁波在处理容器中产生等离子体，以通过等离子体进行等离子体处理。构成处理容器的壁的至少一部分包括透过电磁波的电磁波传输路径的至少一部分。

3. 发明授权

US07728251B2 Plasma processing apparatus with dielectric plates and fixing member wavelength dependent spacing 失效
标题翻译：等离子体处理装置具有电介质板和固定部件波长相关的间距
公开(公告)号：US07728251B2
公开(公告)日：2010-06-01
申请号：US11259190
申请日：2005-10-27
申请人： Tetsuya Ide , Atsushi Sasaki , Kazufumi Azuma , Yukihiko Nakata
发明人： Tetsuya Ide , Atsushi Sasaki , Kazufumi Azuma , Yukihiko Nakata
IPC分类号： B23K10/00
CPC分类号： H01J37/32238 , H01J37/32192
摘要： In a plasma processing apparatus, electromagnetic waves are radiated from slots of waveguides into a processing chamber via dielectric windows that are supported on beams, thereby generating a plasma. A substrate, which is an object of processing, is processed by the generated plasma. Dielectric plates are attached to those surfaces of the beams, which are opposed to the processing chamber. The thickness of each dielectric plate is set at ½ or more of the intra-dielectric wavelength of the electromagnetic waves. Using the plasma processing apparatus, a large-area processing can uniformly be performed.
摘要翻译：在等离子体处理装置中，电磁波通过波导管的电介质窗从波导槽从辐射到处理室中，从而产生等离子体。作为处理对象的基板由所生成的等离子体进行处理。电介质板连接到与处理室相对的梁的那些表面。每个电介质板的厚度被设定为电磁波的介电质内波长的1/2以上。使用等离子体处理装置可以均匀地进行大面积的处理。

4. 发明申请

US20080099447A1 Plasma processing apparatus and plasma processing method 审中-公开
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US20080099447A1
公开(公告)日：2008-05-01
申请号：US11544051
申请日：2006-10-06
申请人： Makoto Ando , Takuichi Hirano , Yukihiko Nakata , Kazufumi Azuma , Masashi Goto , Atsushi Sasaki , Tetsuya Ide , Tetsuya Okamoto
发明人： Makoto Ando , Takuichi Hirano , Yukihiko Nakata , Kazufumi Azuma , Masashi Goto , Atsushi Sasaki , Tetsuya Ide , Tetsuya Okamoto
IPC分类号： B23K9/00
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/32229
摘要： A plurality of electromagnetic wave radiation waveguides are formed to branch from an electromagnetic wave distribution waveguide. A plurality of slots are provided to each electromagnetic wave radiation waveguide. A width of the electromagnetic wave radiation waveguide, a height of the electromagnetic wave radiation waveguide and an electromagnetic wave radiation waveguide cycle p are set to satisfy a relationship of λ0>p>a2>b2 and p=(λg1/2)+±α (where α is 5% or below of λg1), where λ0 is a free space wavelength of an electromagnetic wave, al is a width of the electromagnetic wave distribution waveguide, εr1 is a specific inductive capacity of a dielectric material in the electromagnetic wave distribution waveguide, and λg1 is a wavelength of the electromagnetic wave output from the electromagnetic wave source in the electromagnetic wave distribution waveguide.
摘要翻译：多个电磁波辐射波导形成为从电磁波分布波导分支。向每个电磁波辐射波导提供多个槽。电磁波辐射波导的宽度，电磁波辐射波导的高度和电磁波辐射波导周期p被设定为满足λ<2> / SUB >> b 2和p =（λ1g1 / 2）+±α（其中α为λ1的5％或更低）），其中λ<0>是电磁波的自由空间波长，a1是电磁波分布波导的宽度，ε是电介质的介电常数电磁波分布波导中的材料，λ1g1是从电磁波分布波导中的电磁波源输出的电磁波的波长。

5. 发明申请

US20050205015A1 Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatus 审中-公开
标题翻译：绝缘膜形成方法，绝缘膜形成装置和等离子体成膜装置
公开(公告)号：US20050205015A1
公开(公告)日：2005-09-22
申请号：US11081035
申请日：2005-03-16
申请人： Atsushi Sasaki , Kazufumi Azuma , Tetsuya Ide , Yukihiko Nakata
发明人： Atsushi Sasaki , Kazufumi Azuma , Tetsuya Ide , Yukihiko Nakata
IPC分类号： C23C16/455 , C23C16/511 , C23F1/00 , G02F1/136 , H01J37/32 , H01L21/02 , H01L21/31
CPC分类号： H01J37/32192 , C23C16/45565 , C23C16/4557 , C23C16/45574 , C23C16/45578 , C23C16/511 , H01J37/3244
摘要： An insulating film is formed with a plasma film forming apparatus which includes a vacuum vessel with an electromagnetic wave incident face F, first gas injection holes made in the vacuum vessel, and second gas injection holes made in the vacuum vessel farther away from the electromagnetic wave incident face F than the first gas injection holes. For example, a first gas is introduced from a position whose distance from the electromagnetic wave incident face F is less than 10 mm into the vacuum vessel. A second gas including an organic silicon compound is introduced from a position whose distance from the electromagnetic wave incident face is 10 mm or more into the vacuum vessel.
摘要翻译：绝缘膜由等离子体膜形成装置形成，该等离子体膜形成装置包括具有电磁波入射面F的真空容器，在该真空容器中形成的第一气体注入孔以及在远离电磁波的真空容器中制造的第二气体注入孔入射面F比第一个气体注入孔。例如，从距离电磁波入射面F的距离小于10mm的位置引入第一气体到真空容器中。从与电磁波入射面的距离为10mm以上的位置向真空容器引入包含有机硅化合物的第二气体。

6. 发明申请

US20060090704A1 Plasma processing apparatus 失效
标题翻译：等离子体处理装置
公开(公告)号：US20060090704A1
公开(公告)日：2006-05-04
申请号：US11259190
申请日：2005-10-27
申请人： Tetsuya Ide , Atsushi Sasaki , Kazufumi Azuma , Yukihiko Nakata
发明人： Tetsuya Ide , Atsushi Sasaki , Kazufumi Azuma , Yukihiko Nakata
IPC分类号： C23C16/00
CPC分类号： H01J37/32238 , H01J37/32192
摘要： In a plasma processing apparatus, electromagnetic waves are radiated from slots of waveguides into a processing chamber via dielectric windows that are supported on beams, thereby generating a plasma. A substrate, which is an object of processing, is processed by the generated plasma. Dielectric plates are attached to those surfaces of the beams, which are opposed to the processing chamber. The thickness of each dielectric plate is set at ½ or more of the intra-dielectric wavelength of the electromagnetic waves. Using the plasma processing apparatus, a large-area processing can uniformly be performed.
摘要翻译：在等离子体处理装置中，电磁波通过波导管的电介质窗从波导槽从辐射到处理室中，从而产生等离子体。作为处理对象的基板由所生成的等离子体进行处理。电介质板连接到与处理室相对的梁的那些表面。每个电介质板的厚度被设定为电磁波的介电质内波长的1/2以上。使用等离子体处理装置可以均匀地进行大面积的处理。

7. 发明申请

US20080105650A1 PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD 审中-公开
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US20080105650A1
公开(公告)日：2008-05-08
申请号：US11969500
申请日：2008-01-04
申请人： Hideo SUGAI , Tetsuya Ide , Atsushi Sasaki , Kazufumi Azuma
发明人： Hideo SUGAI , Tetsuya Ide , Atsushi Sasaki , Kazufumi Azuma
IPC分类号： B44C1/22 , C23F1/00 , H05H1/24 , C23C16/00
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/32834
摘要： A plasma processing device reduces the pressure inside a vacuum waveguide which propagates microwave to a vacuum of a high degree, thereby preventing abnormal discharge in the vacuum waveguide and around a slot plate, and reduces the difference in pressure between the processing chamber and the vacuum waveguide, thereby lowering the stress applied on the slot plate and a dielectric member for generating surface plasma, thus carrying out high-quality plasma processing.
摘要翻译：等离子体处理装置降低真空波导内的压力，将真空波导传播到高真空度，从而防止真空波导和槽板周围的异常放电，并且减小处理室和真空波导之间的压力差从而降低施加在槽板上的应力和用于产生表面等离子体的电介质构件，从而进行高质量的等离子体处理。

8. 发明授权

US08987041B2 Method for manufacturing solid-state imaging device 有权
标题翻译：固态成像装置的制造方法
公开(公告)号：US08987041B2
公开(公告)日：2015-03-24
申请号：US13417567
申请日：2012-03-12
申请人： Ken Tomita , Atsushi Sasaki
发明人： Ken Tomita , Atsushi Sasaki
IPC分类号： H01L21/00 , H01L27/148 , H01L27/146 , H01L31/0352 , H01L31/103
CPC分类号： H01L27/14812 , H01L27/14603 , H01L27/14609 , H01L27/1463 , H01L27/14643 , H01L27/14689 , H01L31/03529 , H01L31/103 , Y02E10/50
摘要： Certain embodiments provide method for manufacturing a solid-state imaging device, including forming an electrode and forming a second impurity layer. The electrode is formed on a semiconductor substrate including a first impurity layer of a first conductivity type on a surface. The second impurity layer is a second conductivity type and is formed by implanting an impurity of a second conductivity type into the first impurity layer in an oblique direction with respect to the surface of the semiconductor substrate on the condition that the impurity penetrates an end portion of the electrode, based on a position of the electrode. The second impurity layer is bonded to the first impurity layer to constitute a photodiode, and a portion of the second impurity layer is disposed under the electrode.
摘要翻译：某些实施例提供了制造固态成像装置的方法，包括形成电极和形成第二杂质层。电极形成在包括表面上的第一导电类型的第一杂质层的半导体衬底上。第二杂质层是第二导电类型，并且是通过在杂质贯穿半导体衬底的端部的条件下相对于半导体衬底的表面在倾斜方向上将第二导电类型的杂质注入第一杂质层而形成的电极，基于电极的位置。第二杂质层被结合到第一杂质层以构成光电二极管，并且第二杂质层的一部分设置在电极下方。

9. 发明申请

US20140136029A1 FLIGHT CONTROL DEVICE, SPACECRAFT, AND REFERENCE TRAJECTORY CORRECTING METHOD 有权
标题翻译：飞行控制装置，空间和参考轨迹校正方法
公开(公告)号：US20140136029A1
公开(公告)日：2014-05-15
申请号：US14131502
申请日：2012-07-11
申请人： Tetsuya Nagase , Atsushi Sasaki
发明人： Tetsuya Nagase , Atsushi Sasaki
IPC分类号： B64G1/24
CPC分类号： B64G1/242 , B64G1/24 , B64G1/62
摘要： A flight control method and device for correcting a reference trajectory based on a distance from a current position to a target position in a spacecraft in flight. A CPU included in the spacecraft generates a reference trajectory which is a trajectory for allowing the spacecraft in flight to arrive at the target position on a celestial body with the atmosphere, and which is identified based on velocity or energy of the spacecraft and on drag acceleration of the spacecraft. The CPU calculates a ratio between the range that is a distance from the current position based on the reference trajectory to the target position, and the real range that is a real distance from a current position to the target position, and corrects the reference trajectory by calculating the drag acceleration in the reference trajectory using the calculated ratio.
摘要翻译：一种飞行控制方法和装置，用于基于从飞行中的航天器中的当前位置到目标位置的距离来校正参考轨迹。包括在航天器中的CPU产生参考轨迹，该轨迹是允许飞行中的航天器到达具有大气的天体上的目标位置的轨迹，并且基于航天器的速度或能量以及拖曳加速度来识别的航天器。 CPU根据基准轨迹计算与当前位置距离的距离与目标位置之间的距离，以及作为从当前位置到目标位置的实际距离的实际范围，并将基准轨迹修正为使用计算的比率计算参考轨迹中的拖动加速度。

10. 发明授权

US08643918B2 Image reading device and image reading method used therein 有权
标题翻译：其中使用的图像读取装置和图像读取方法
公开(公告)号：US08643918B2
公开(公告)日：2014-02-04
申请号：US12365384
申请日：2009-02-04
申请人： Atsushi Sasaki
发明人： Atsushi Sasaki
IPC分类号： H04N1/04
CPC分类号： H04N1/031 , H04N1/0402 , H04N1/0408 , H04N1/0455 , H04N1/193 , H04N1/1934 , H04N1/1938
摘要： An image reading device, which has an image sensor having a plurality of sensor chips therein and being capable of outputting data in parallel through a plurality of output channels, includes an image reading section configured to perform reading of images in either of two outputting modes, one being a parallel outputting mode in which start signals are simultaneously inputted to the plurality of sensor chips so that pieces of data in the plurality of the sensor chips are outputted in parallel through the plurality of output channels, respectively, the other one being an interval outputting mode in which start signals are sequentially inputted to the plurality of sensor chips at intervals of time between any two successive inputs of the start signals, respectively, so that respective pieces of data in the plurality of sensor chips are sequentially outputted through any one of the plurality of output channels, and a mode selection section configured to select either of the two outputting modes in accordance with a set resolution.
摘要翻译：一种具有图像传感器的图像读取装置，其中具有多个传感器芯片，并且能够通过多个输出通道并行地输出数据，所述图像读取装置包括：图像读取部，被配置为以两种输出模式中的任一种进行图像的读取; 一个是并行输出模式，其中开始信号被同时输入到多个传感器芯片，使得多个传感器芯片中的数据分别通过多个输出通道并行输出，另一个是间隔输出模式，其中开始信号分别以起始信号的任意两个连续输入之间的时间间隔依次输入到多个传感器芯片，使得多个传感器芯片中的各个数据通过以下任何一个依次输出：所述多个输出通道，以及被配置为选择所述两个输出信号中的任一个的模式选择部 g模式根据设定的分辨率。

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