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1. 发明授权

US5152219A Screen process printing apparatus using a screen reinforced by strips 失效
标题翻译：丝网印刷装置使用由条带增强的丝网
公开(公告)号：US5152219A
公开(公告)日：1992-10-06
申请号：US827471
申请日：1992-01-29
申请人： Hideki Adachi , Makoto Sawada , Mokuhei Hashimoto , Hirofumi Shimizu , Jiro Ono , Syunsuke Takagi , Takayuki Umaba , Koichi Mukaegaki , Tsuruo Matsumoto , Tetsu Takahashi
发明人： Hideki Adachi , Makoto Sawada , Mokuhei Hashimoto , Hirofumi Shimizu , Jiro Ono , Syunsuke Takagi , Takayuki Umaba , Koichi Mukaegaki , Tsuruo Matsumoto , Tetsu Takahashi
IPC分类号： B41F15/08 , B41F15/36 , B41F15/40 , H05K3/12
CPC分类号： B41F15/36 , H05K3/1225
摘要： A printing apparatus including: a screen having a printing plate portion and reinforcing strips formed on both sides of the printing plate portion; a stretching device for stretching the screen by applying a predetermined tension thereto in a longitudinal direction of the strips; a squeegee for sliding on the screen in the same direction as the longitudinal direction of the strips, thereby transferring ink onto a surface subjected to printing; and a support table for supporting a material subjected to printing. The squeegee has a width larger than the minimum spacing of the strips on both sides of the printing plate portion. When the squeegee slides on the screen, it presses the printing plate portion and the strips on both sides simultaneously. In printing, the portion of the screen in contact with the surface subjected to printing is maintained flat in the transverse direction. A stretching amount of the screen in the moving direction of the squeegee is equal to a stretching amount of each strip. The screen is not damaged by deformation.
摘要翻译：一种打印设备，包括：具有形成在印版部分两侧的印版部分和加强条的屏幕; 拉伸装置，用于通过在条带的纵向方向上施加预定的张力来拉伸筛网; 用于在与所述条的纵向方向相同的方向上在所述屏幕上滑动的刮板，从而将油墨转印到经受打印的表面上; 以及用于支撑经受印刷的材料的支撑台。刮板的宽度大于印版部两侧的条带的最小间距。当刮板在屏幕上滑动时，它同时按压印版部分和两侧的条。在印刷中，与经过印刷的表面接触的屏幕部分在横向保持平坦。刮板移动方向上的筛网的拉伸量等于每个条带的拉伸量。屏幕不会因变形而损坏。

2. 发明申请

US20080263793A1 SUBSTRATE TREATMENT APPARATUS 有权
标题翻译：基板处理设备
公开(公告)号：US20080263793A1
公开(公告)日：2008-10-30
申请号：US12109059
申请日：2008-04-24
申请人： Akiyoshi Nakano , Koichi Mukaegaki , Yoshikazu Kago , Hiroyuki Ueno
发明人： Akiyoshi Nakano , Koichi Mukaegaki , Yoshikazu Kago , Hiroyuki Ueno
IPC分类号： B08B1/04
CPC分类号： B08B1/04 , H01L21/67046
摘要： The present invention provides a substrate treatment apparatus for performing a substrate periphery cleaning process. The substrate treatment apparatus includes substrate holding mechanism which holds a substrate, a brush having a cleaning surface inclined with respect to a longitudinal axis thereof extending perpendicularly to a front surface of the substrate held by the substrate holding mechanism, brush moving mechanism which moves the brush along the longitudinal axis and along a lateral axis orthogonal to the longitudinal axis, load detecting unit which detects a load applied along the longitudinal axis to the brush, and first judging unit which judges, based on an output of the load detecting unit, whether or not the brush is located at a reference position serving as a reference for guiding the brush to a treatment position at which the brush is located in the cleaning process.
摘要翻译：本发明提供一种用于进行基板周边清洁处理的基板处理装置。基板处理装置包括：基板保持机构，其保持基板;刷子，其具有相对于其垂直于由基板保持机构保持的基板的前表面延伸的纵轴倾斜的清洁表面;刷移动机构，其使刷子移动沿着纵轴线并且沿着与纵向轴线正交的横轴，负载检测单元检测沿着纵向轴线施加到电刷的负载;以及第一判断单元，其基于负载检测单元的输出来判断是否或不是刷子位于用于将刷子引导到清洁过程中刷子所在的处理位置的基准位置。

3. 发明授权

US08051522B2 Substrate treatment apparatus 有权
标题翻译：基板处理装置
公开(公告)号：US08051522B2
公开(公告)日：2011-11-08
申请号：US12109059
申请日：2008-04-24
申请人： Akiyoshi Nakano , Koichi Mukaegaki , Yoshikazu Kago , Hiroyuki Ueno
发明人： Akiyoshi Nakano , Koichi Mukaegaki , Yoshikazu Kago , Hiroyuki Ueno
IPC分类号： A47L15/39
CPC分类号： B08B1/04 , H01L21/67046
摘要： The present invention provides a substrate treatment apparatus for performing a substrate periphery cleaning process. The substrate treatment apparatus includes substrate holding mechanism which holds a substrate, a brush having a cleaning surface inclined with respect to a longitudinal axis thereof extending perpendicularly to a front surface of the substrate held by the substrate holding mechanism, brush moving mechanism which moves the brush along the longitudinal axis and along a lateral axis orthogonal to the longitudinal axis, load detecting unit which detects a load applied along the longitudinal axis to the brush, and first judging unit which judges, based on an output of the load detecting unit, whether or not the brush is located at a reference position serving as a reference for guiding the brush to a treatment position at which the brush is located in the cleaning process.
摘要翻译：本发明提供一种用于进行基板周边清洁处理的基板处理装置。基板处理装置包括：基板保持机构，其保持基板;刷子，其具有相对于其垂直于由基板保持机构保持的基板的前表面延伸的纵轴倾斜的清洁表面;刷移动机构，其使刷子移动沿着纵轴线并且沿着与纵向轴线正交的横轴，负载检测单元检测沿着纵向轴线施加到电刷的负载;以及第一判断单元，其基于负载检测单元的输出来判断是否或不是刷子位于用于将刷子引导到清洁过程中刷子所在的处理位置的基准位置。

4. 发明申请

US20070119476A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 审中-公开
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20070119476A1
公开(公告)日：2007-05-31
申请号：US11562773
申请日：2006-11-22
申请人： Takashi Hara , Koichi Mukaegaki
发明人： Takashi Hara , Koichi Mukaegaki
IPC分类号： B08B6/00
CPC分类号： H01L21/6708
摘要： A substrate held by a spin chuck is supplied with a chemical solution by a chemical solution nozzle and a processing of the substrate is performed. At this time, the chemical solution supplied to the substrate scatters around and adheres to members (processing cup and splash guard) residing near the substrate. In the process of the substrate, a first cleaning liquid having the same ingredients as those of the chemical solution is supplied to an outer wall face of the splash guard from the guard cleaning nozzles without being in contact with the substrate. Thus, the outer wall face of the splash guard and the inner wall face of the processing cup are cleaned by the clean first cleaning liquid. The chemical solution supplied to the substrate and the first cleaning liquid supplied to the outer wall face of the splash guard are reused.
摘要翻译：由旋转卡盘保持的基板通过化学溶液喷嘴供给化学溶液，并进行基板的处理。此时，提供给基材的化学溶液分散在附近并附着在靠近基底的构件（加工杯和防溅液）上。在基板的过程中，将具有与化学溶液相同成分的第一清洗液从防护清洁喷嘴供给到防溅罩的外壁面，而不与基板接触。因此，防溅罩的外壁面和处理杯的内壁面被清洁的第一清洗液体清洁。提供给基板的化学溶液和提供给防溅罩的外壁面的第一清洗液被重新使用。

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