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1. 发明申请

US20080263793A1 SUBSTRATE TREATMENT APPARATUS 有权
标题翻译：基板处理设备
公开(公告)号：US20080263793A1
公开(公告)日：2008-10-30
申请号：US12109059
申请日：2008-04-24
申请人： Akiyoshi Nakano , Koichi Mukaegaki , Yoshikazu Kago , Hiroyuki Ueno
发明人： Akiyoshi Nakano , Koichi Mukaegaki , Yoshikazu Kago , Hiroyuki Ueno
IPC分类号： B08B1/04
CPC分类号： B08B1/04 , H01L21/67046
摘要： The present invention provides a substrate treatment apparatus for performing a substrate periphery cleaning process. The substrate treatment apparatus includes substrate holding mechanism which holds a substrate, a brush having a cleaning surface inclined with respect to a longitudinal axis thereof extending perpendicularly to a front surface of the substrate held by the substrate holding mechanism, brush moving mechanism which moves the brush along the longitudinal axis and along a lateral axis orthogonal to the longitudinal axis, load detecting unit which detects a load applied along the longitudinal axis to the brush, and first judging unit which judges, based on an output of the load detecting unit, whether or not the brush is located at a reference position serving as a reference for guiding the brush to a treatment position at which the brush is located in the cleaning process.
摘要翻译：本发明提供一种用于进行基板周边清洁处理的基板处理装置。基板处理装置包括：基板保持机构，其保持基板;刷子，其具有相对于其垂直于由基板保持机构保持的基板的前表面延伸的纵轴倾斜的清洁表面;刷移动机构，其使刷子移动沿着纵轴线并且沿着与纵向轴线正交的横轴，负载检测单元检测沿着纵向轴线施加到电刷的负载;以及第一判断单元，其基于负载检测单元的输出来判断是否或不是刷子位于用于将刷子引导到清洁过程中刷子所在的处理位置的基准位置。

2. 发明授权

US08051522B2 Substrate treatment apparatus 有权
标题翻译：基板处理装置
公开(公告)号：US08051522B2
公开(公告)日：2011-11-08
申请号：US12109059
申请日：2008-04-24
申请人： Akiyoshi Nakano , Koichi Mukaegaki , Yoshikazu Kago , Hiroyuki Ueno
发明人： Akiyoshi Nakano , Koichi Mukaegaki , Yoshikazu Kago , Hiroyuki Ueno
IPC分类号： A47L15/39
CPC分类号： B08B1/04 , H01L21/67046
摘要： The present invention provides a substrate treatment apparatus for performing a substrate periphery cleaning process. The substrate treatment apparatus includes substrate holding mechanism which holds a substrate, a brush having a cleaning surface inclined with respect to a longitudinal axis thereof extending perpendicularly to a front surface of the substrate held by the substrate holding mechanism, brush moving mechanism which moves the brush along the longitudinal axis and along a lateral axis orthogonal to the longitudinal axis, load detecting unit which detects a load applied along the longitudinal axis to the brush, and first judging unit which judges, based on an output of the load detecting unit, whether or not the brush is located at a reference position serving as a reference for guiding the brush to a treatment position at which the brush is located in the cleaning process.
摘要翻译：本发明提供一种用于进行基板周边清洁处理的基板处理装置。基板处理装置包括：基板保持机构，其保持基板;刷子，其具有相对于其垂直于由基板保持机构保持的基板的前表面延伸的纵轴倾斜的清洁表面;刷移动机构，其使刷子移动沿着纵轴线并且沿着与纵向轴线正交的横轴，负载检测单元检测沿着纵向轴线施加到电刷的负载;以及第一判断单元，其基于负载检测单元的输出来判断是否或不是刷子位于用于将刷子引导到清洁过程中刷子所在的处理位置的基准位置。

3. 发明授权

US4951228A Method of generating raster data useful in reproducing a multitone image 失效
标题翻译：产生用于再现多媒体图像的栅格数据的方法
公开(公告)号：US4951228A
公开(公告)日：1990-08-21
申请号：US337572
申请日：1989-04-13
申请人： Takahide Hirawa , Hitoshi Matsuda , Akira Hikita , Yoshikazu Kago
发明人： Takahide Hirawa , Hitoshi Matsuda , Akira Hikita , Yoshikazu Kago
IPC分类号： H04N1/387 , G06K15/02 , G06T1/00 , G06T11/20
CPC分类号： G06K15/02 , G06K2215/0045 , G06K2215/0051
摘要： A priority grade is provided to each of several graphic figures. Respective contour lines of the graphic figures are classified into two groups according to respective locations. Respective contour lines in the two groups are serially selected in a descending order of main scanning coordinate values, and are compared with each other to specify a cross point having the largest coordinate value within a selected pair of cross points. A component of the raster data is generated on the basis of the selected cross point when a priority grade of the selected cross point satisfies a predetermined condition in connection with respective priority grades of the other cross points.

4. 发明申请

US20090199869A1 APPARATUS FOR AND METHOD OF CLEANING SUBSTRATE 审中-公开
标题翻译：装置和清洁基板的方法
公开(公告)号：US20090199869A1
公开(公告)日：2009-08-13
申请号：US12427606
申请日：2009-04-21
申请人： Yoshikazu Kago , Masaki Iwami , Masahiro Nonomura
发明人： Yoshikazu Kago , Masaki Iwami , Masahiro Nonomura
IPC分类号： B08B7/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A substrate cleaning apparatus includes two cleaning brushes driven independently of each other. A first cleaning brush makes a cycling movement including an outward movement progressing in a horizontal direction from a position in contact with the center of the rotation of a substrate to the outside of an edge of the substrate, an upward movement progressing in a vertically upward direction from an end position of the outward movement, an inward movement progressing in a horizontal direction from an end position of the upward movement to a position immediately over the center of the rotation of the substrate, and a downward movement progressing in a vertically downward direction from an end position of the inward movement to a start position of the outward movement. A second cleaning brush makes a similar cycling movement. The first and second cleaning brushes are adapted so that the speed of the inward movement thereof is higher than that of the outward movement thereof and so that the speed of the upward movement is higher than that of the downward movement thereof.
摘要翻译：基板清洗装置包括彼此独立地驱动的两个清洁刷。第一清洁刷进行循环运动，包括从与基板的旋转中心接触的位置到基板的边缘的外侧在水平方向上向外运动的向外运动，向上运动沿垂直向上的方向从向外移动的结束位置向内移动，从向上移动的结束位置向垂直于基板的旋转中心的位置在水平方向上进行向内运动，并且沿垂直向下的方向从向下移动向内移动的结束位置到向外移动的开始位置。第二个清洁刷子进行类似的循环运动。第一和第二清洁刷适于使其向内移动的速度高于其向外移动的速度，并且使得向上移动的速度高于向下移动的速度。

5. 发明申请

US20050183754A1 Apparatus for and method of cleaning substrate 审中-公开
标题翻译：清洗基板的方法及方法
公开(公告)号：US20050183754A1
公开(公告)日：2005-08-25
申请号：US11057003
申请日：2005-02-11
申请人： Yoshikazu Kago , Masaki Iwami , Masahiro Nonomura
发明人： Yoshikazu Kago , Masaki Iwami , Masahiro Nonomura
IPC分类号： H01L21/304 , B08B1/04 , H01L21/00 , B08B3/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A substrate cleaning apparatus includes two cleaning brushes driven independently of each other. A first cleaning brush makes a cycling movement including an outward movement progressing in a horizontal direction from a position in contact with the center of the rotation of a substrate to the outside of an edge of the substrate, an upward movement progressing in a vertically upward direction from an end position of the outward movement, an inward movement progressing in a horizontal direction from an end position of the upward movement to a position immediately over the center of the rotation of the substrate, and a downward movement progressing in a vertically downward direction from an end position of the inward movement to a start position of the outward movement. A second cleaning brush makes a similar cycling movement. The first and second cleaning brushes are adapted so that the speed of the inward movement thereof is higher than that of the outward movement thereof and so that the speed of the upward movement is higher than that of the downward movement thereof.
摘要翻译：基板清洗装置包括彼此独立地驱动的两个清洁刷。第一清洁刷进行循环运动，包括从与基板的旋转中心接触的位置到基板的边缘的外侧在水平方向上向外运动的向外运动，向上运动沿垂直向上的方向从向外移动的结束位置向内移动，从向上移动的结束位置向垂直于基板的旋转中心的位置在水平方向上进行向内运动，并且沿垂直向下的方向从向下移动向内移动的结束位置到向外移动的开始位置。第二个清洁刷子进行类似的循环运动。第一和第二清洁刷适于使其向内移动的速度高于其向外移动的速度，并且使得向上移动的速度高于向下移动的速度。

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