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1. 发明授权

US08244399B2 Transport method and transport apparatus 有权
标题翻译：运输方式和运输设备
公开(公告)号：US08244399B2
公开(公告)日：2012-08-14
申请号：US12644615
申请日：2009-12-22
申请人： Hidehiro Maeda , Kazuya Okamoto , Yasuaki Tanaka
发明人： Hidehiro Maeda , Kazuya Okamoto , Yasuaki Tanaka
IPC分类号： G06F7/00 , G06F19/00 , H01L21/68 , H01L23/544 , B29C65/00 , G01B11/00
CPC分类号： H01L21/677 , H01L21/67092 , H01L21/67259 , H01L21/68 , H01L24/34 , H01L2924/00014 , Y10T156/10 , H01L2224/37099 , H01L2224/84
摘要： Provided is a transport method comprising judging whether there is a possibility that misalignment greater than or equal to a threshold value occurs between substrates to be layered that are held by a pair of substrate holders aligned and stacked by an aligning section, the misalignment occurring when the pair of substrate holders is transported from the aligning section to a pressure applying section; and if the judgment indicates that there is the possibility of misalignment, transporting the pair of substrate holders to a region other than the pressure applying section. Whether there is the possibility of misalignment may be judged based on acceleration of the substrate holders. Whether there is the possibility of misalignment may be judged based on acceleration of a transporting section that transports the substrate holders. Whether there is the possibility of misalignment may be judged based on relative positions of the substrate holders. Whether there is the possibility of misalignment may be judged based on relative positions of (i) a transporting section that transports the pair of substrate holders and (ii) one of the pair of substrate holders.
摘要翻译：提供了一种传送方法，包括判断是否存在由被对准部对准和堆叠的一对基板保持器保持的要分层的基板之间的大于或等于阈值的偏移的可能性，一对基板支架从对准部分输送到压力施加部分; 并且如果判断表示存在不对准的可能性，则将一对基板保持器传送到除压力施加部以外的区域。可以基于基板保持器的加速度判断是否存在未对准的可能性。可以基于输送基板保持器的输送部的加速度判断是否存在未对准的可能性。可以基于基板保持器的相对位置来判断是否存在未对准的可能性。可以基于（i）输送一对基板保持器的输送部和（ii）一对基板保持件中的一个的相对位置来判断是否存在未对准的可能性。

2. 发明申请

US20100168908A1 TRANSPORT METHOD AND TRANSPORT APPARATUS 有权
标题翻译：运输方式和运输工具
公开(公告)号：US20100168908A1
公开(公告)日：2010-07-01
申请号：US12644615
申请日：2009-12-22
申请人： Hidehiro MAEDA , Kazuya Okamoto , Yasuaki Tanaka
发明人： Hidehiro MAEDA , Kazuya Okamoto , Yasuaki Tanaka
IPC分类号： H01L21/677 , G06F7/00
CPC分类号： H01L21/677 , H01L21/67092 , H01L21/67259 , H01L21/68 , H01L24/34 , H01L2924/00014 , Y10T156/10 , H01L2224/37099 , H01L2224/84
摘要： Provided is a transport method comprising judging whether there is a possibility that misalignment greater than or equal to a threshold value occurs between substrates to be layered that are held by a pair of substrate holders aligned and stacked by an aligning section, the misalignment occurring when the pair of substrate holders is transported from the aligning section to a pressure applying section; and if the judgment indicates that there is the possibility of misalignment, transporting the pair of substrate holders to a region other than the pressure applying section. Whether there is the possibility of misalignment may be judged based on acceleration of the substrate holders. Whether there is the possibility of misalignment may be judged based on acceleration of a transporting section that transports the substrate holders. Whether there is the possibility of misalignment may be judged based on relative positions of the substrate holders. Whether there is the possibility of misalignment may be judged based on relative positions of (i) a transporting section that transports the pair of substrate holders and (ii) one of the pair of substrate holders.
摘要翻译：提供了一种传送方法，包括判断是否存在由被对准部对准和堆叠的一对基板保持器保持的要分层的基板之间的大于或等于阈值的偏移的可能性，一对基板支架从对准部分输送到压力施加部分; 并且如果判断表示存在不对准的可能性，则将一对基板保持器传送到除压力施加部以外的区域。可以基于基板保持器的加速度判断是否存在未对准的可能性。可以基于输送基板保持器的输送部的加速度判断是否存在未对准的可能性。可以基于基板保持器的相对位置来判断是否存在未对准的可能性。可以基于（i）输送一对基板保持器的输送部和（ii）一对基板保持件中的一个的相对位置来判断是否存在未对准的可能性。

3. 发明申请

US20130274915A1 Transport Method and Transport Apparatus 审中-公开
标题翻译：运输方式和运输设备
公开(公告)号：US20130274915A1
公开(公告)日：2013-10-17
申请号：US13916149
申请日：2013-06-12
申请人： Hidehiro Maeda , Kazuya Okamoto , Yasuaki Tanaka
发明人： Hidehiro Maeda , Kazuya Okamoto , Yasuaki Tanaka
IPC分类号： H01L21/677
CPC分类号： H01L21/677 , H01L21/67092 , H01L21/67259 , H01L21/68 , H01L24/34 , H01L2924/00014 , Y10T156/10 , H01L2224/37099 , H01L2224/84
摘要： Provided is a transport method comprising judging whether there is a possibility that misalignment greater than or equal to a threshold value occurs between substrates to be layered that are held by a pair of substrate holders aligned and stacked by an aligning section, the misalignment occurring when the pair of substrate holders is transported from the aligning section to a pressure applying section; and if the judgment indicates that there is the possibility of misalignment, transporting the pair of substrate holders to a region other than the pressure applying section. Whether there is the possibility of misalignment may be judged based on acceleration of the substrate holders. Whether there is the possibility of misalignment may be judged based on acceleration of a transporting section that transports the substrate holders. Whether there is the possibility of misalignment may be judged based on relative positions of the substrate holders. Whether there is the possibility of misalignment may be judged based on relative positions of (i) a transporting section that transports the pair of substrate holders and (ii) one of the pair of substrate holders.
摘要翻译：提供了一种传送方法，包括判断是否存在由被对准部对准和堆叠的一对基板保持器保持的要分层的基板之间的大于或等于阈值的偏移的可能性，一对基板支架从对准部分输送到压力施加部分; 并且如果判断表示存在不对准的可能性，则将一对基板保持器传送到除压力施加部以外的区域。可以基于基板保持器的加速度判断是否存在未对准的可能性。可以基于输送基板保持器的输送部的加速度判断是否存在未对准的可能性。可以基于基板保持器的相对位置来判断是否存在未对准的可能性。可以基于（i）输送一对基板保持器的输送部和（ii）一对基板保持件中的一个的相对位置来判断是否存在未对准的可能性。

4. 发明授权

US08489227B2 Transport method and transport apparatus 有权
标题翻译：运输方式和运输设备
公开(公告)号：US08489227B2
公开(公告)日：2013-07-16
申请号：US13548287
申请日：2012-07-13
申请人： Hidehiro Maeda , Kazuya Okamoto , Yasuaki Tanaka
发明人： Hidehiro Maeda , Kazuya Okamoto , Yasuaki Tanaka
IPC分类号： G06F7/00 , G06F19/00 , H01L21/68 , H01L23/544 , B29C65/00 , G01B11/00
CPC分类号： H01L21/677 , H01L21/67092 , H01L21/67259 , H01L21/68 , H01L24/34 , H01L2924/00014 , Y10T156/10 , H01L2224/37099 , H01L2224/84
摘要： Provided is a transport method comprising judging whether there is a possibility that misalignment greater than or equal to a threshold value occurs between substrates to be layered that are held by a pair of substrate holders aligned and stacked by an aligning section, the misalignment occurring when the pair of substrate holders is transported from the aligning section to a pressure applying section; and if the judgment indicates that there is the possibility of misalignment, transporting the pair of substrate holders to a region other than the pressure applying section. Whether there is the possibility of misalignment may be judged based on at least one of an acceleration of the substrate holders, an acceleration of a transporting section that transports the substrate holders, relative positions of the substrate holders, or relative positions of the transporting section and one of the pair of substrate holders.
摘要翻译：提供了一种传送方法，包括判断是否存在由被对准部对准和堆叠的一对基板保持器保持的要分层的基板之间的大于或等于阈值的偏移的可能性，一对基板支架从对准部分输送到压力施加部分; 并且如果判断表示存在不对准的可能性，则将一对基板保持器传送到除压力施加部以外的区域。是否存在未对准的可能性可以基于基板保持器的加速度，输送基板保持器的输送部分的加速度，基板保持器的相对位置或输送部分的相对位置和一对基板支架之一。

5. 发明授权

US09091920B2 Photosensitive siloxane resin composition 有权
标题翻译：感光硅氧烷树脂组合物
公开(公告)号：US09091920B2
公开(公告)日：2015-07-28
申请号：US14117449
申请日：2012-05-17
申请人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuki Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
发明人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuki Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
IPC分类号： G03F7/075 , H01L21/02 , H01L21/311 , G03F7/20
CPC分类号： G03F7/0757 , C08G77/045 , C08G77/18 , C08G77/80 , C09D183/04 , G03F7/023 , G03F7/20 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/311 , C08K5/159
摘要： [Object]To provide a photosensitive siloxane resin composition excellent in alkali-solubility and in sensitivity, and also to provide a pattern-formation method employing that.[Means]The present invention provides a photosensitive siloxane resin composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, a crown ether, a photosensitive material, and an organic solvent. This photosensitive composition is cast on a substrate, subjected to imagewise exposure, treated with an alkali aqueous solution, and cured to form a pattern.
摘要翻译：本发明提供碱溶性和灵敏度优异的感光性硅氧烷树脂组合物，并提供使用该感光性硅氧烷树脂组合物的图案形成方法。本发明提供一种光敏性硅氧烷树脂组合物，其包含：具有硅烷醇基或烷氧基甲硅烷基的硅氧烷树脂，冠醚，感光材料和有机溶剂。将该感光性组合物浇铸在基材上，进行成像曝光，用碱水溶液处理，固化形成图案。

6. 发明授权

US08906993B2 Coating composition containing siloxane resin 有权
标题翻译：含硅氧烷树脂的涂料组合物
公开(公告)号：US08906993B2
公开(公告)日：2014-12-09
申请号：US14110322
申请日：2012-04-11
申请人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
发明人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
IPC分类号： C08K5/06 , C08K5/053 , C09D183/06 , G02B1/10 , G02B1/11 , C09D7/00 , C09D7/12 , C09D183/04 , C08G77/04
CPC分类号： C09D183/06 , C08G77/045 , C08G77/16 , C09D7/20 , C09D7/65 , C09D183/04 , G02B1/105 , G02B1/111 , G02B1/14 , C08K5/053
摘要： [Object]To provide a coating composition excellent in coatability and free from viscosity increase caused by degradation over time, and also to provide a hardened film-formation method employing that.[Means]The present invention provides a coating composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, and a polyol having hydroxyl groups at both ends of a straight 2 to 5 carbon atom hydrocarbon chain. This coating composition enables to form a hardened film of high transparency, of high insulation and of low dielectricity.
摘要翻译：本发明提供一种涂布性优异且不随着时间的劣化而引起的粘度增加的涂料组合物，并提供使用该涂料组合物的硬化成膜方法。本发明提供一种涂料组合物，其包含：具有硅烷醇基或烷氧基甲硅烷基的硅氧烷树脂，以及在直链2〜5个碳原子的烃链的两端具有羟基的多元醇。该涂料组合物能够形成高透明度，高绝缘性和低介电性的硬化膜。

7. 发明授权

US06471781B1 Method of depositing titanium nitride thin film and CVD deposition apparatus 有权
公开(公告)号：US06471781B1
公开(公告)日：2002-10-29
申请号：US09343702
申请日：1999-06-30
申请人： Ryoki Tobe , Yasuaki Tanaka , Atsushi Sekiguchi , Hitoshi Jimba , So Won Kim
发明人： Ryoki Tobe , Yasuaki Tanaka , Atsushi Sekiguchi , Hitoshi Jimba , So Won Kim
IPC分类号： C23C1600
CPC分类号： C23C16/45565 , C23C16/34 , C23C16/45502 , C23C16/45561 , C23C16/45576 , H01L21/28568
摘要： A CVD apparatus for fabricating a titanium nitride thin film is provided. The apparatus comprises an evacuatable reaction vessel having an interior, a pumping apparatus capable of exhausting the reaction vessel and maintaining the interior of the reaction vessel at a prescribed pressure, a gas feeder for introducing a mixed gas into the reaction vessel, a substrate holder in the reaction vessel for holding a substrate to be coated with a titanium nitride thin film, and a heater for heating the substrate. The gas feeder is equipped with the following components: (a) a vaporizer for vaporizing tetrakis(dialkylamino)titanium (TDAAT) from a liquid source material, (b) a first flow controller capable of setting a flow rate of the vaporized TDAAT to any level within a range of 0.004-02 g/min, (c) a second flow controller capable of setting a flow rate of a first carrier gas mixed with the TDAAT to any level within a range of 100-1000 sccm, (d) a third flow controller capable of setting a flow rate of an added gas reactable with the TDAAT to any level within a range of 10-100 sccm, (e) a fourth flow controller capable of setting a flow rate of a second carrier gas being mixed with the added gas to any level within a range of 10-500 sccm, (f) a first supply conduit for mixing the TDAAT and the first carrier gas to create a first mixed gas and guiding the resulting first mixed gas into the reaction vessel, (g) a second supply conduit for mixing the added gas and the second carrier gas to create a second mixed gas and guiding the resulting second mixed gas into the reaction vessel, and (h) a shower head which is provided with a plurality of first nozzles connected to the first supply conduit, and a plurality of second nozzles connected to the second supply conduit, and which is configured such that the first and second mixed gases are fed into the reaction vessel through the nozzles.

8. 发明授权

US5461237A Surface-position setting apparatus 失效
标题翻译：表面位置设定装置
公开(公告)号：US5461237A
公开(公告)日：1995-10-24
申请号：US280535
申请日：1994-07-26
申请人： Shinji Wakamoto , Yuji Imai , Yasuaki Tanaka
发明人： Shinji Wakamoto , Yuji Imai , Yasuaki Tanaka
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , G01N21/86
CPC分类号： G03F9/7026 , G03F7/707 , G03F7/70716 , G03F9/7003 , G03F9/7011 , G03F9/7034
摘要： In an apparatus which positions an average plane thereof parallel to a best focus plane of a projection optical system even if there is unevenness on a wafer, a leveling stage is tilted on the basis of detection signal from an auto-leveling system and a surface of a shot area on a wafer is positioned in a predetermined tilt position relative to a focus plane of the projection optical system. While such a position being kept unchanged, a deviation between the focus plane of the projection optical system and the surface of the shot area is detected at each of multi-points. Within the shot area, by the use of auto-focus system, an amount of relative tilt between an average plane of the shot area obtained from plural deviations and the focus plane of the projection optical system is calculated, and by the use of thus calculated amount of tilt and the detection signal of auto-leveling system, the focus plane of the projection optical system is positioned in parallel with the average plane of the shot area.
摘要翻译：即使在晶片上存在不均匀性的情况下，平均平面平行于投影光学系统的最佳聚焦平面的装置中，也可以根据来自自动调平系统的检测信号和晶片上的照射区域相对于投影光学系统的聚焦平面定位在预定的倾斜位置。当这样的位置保持不变时，在多点处检测出投影光学系统的聚焦平面与拍摄区域的表面之间的偏差。在拍摄区域内，通过使用自动对焦系统，计算从多个偏差获得的拍摄区域的平均平面与投影光学系统的对焦面之间的相对倾斜量，并且通过使用这样计算自动调平系统的倾斜量和检测信号，投影光学系统的聚焦平面与拍摄区域的平均平面平行。

9. 发明授权

US10174392B2 Method for producing cold-rolled steel sheet 有权
公开(公告)号：US10174392B2
公开(公告)日：2019-01-08
申请号：US14130568
申请日：2012-07-02
申请人： Jun Haga , Takuya Nishio , Masayuki Wakita , Yasuaki Tanaka , Norio Imai , Toshiro Tomida , Mitsuru Yoshida , Kengo Hata
发明人： Jun Haga , Takuya Nishio , Masayuki Wakita , Yasuaki Tanaka , Norio Imai , Toshiro Tomida , Mitsuru Yoshida , Kengo Hata
IPC分类号： C21D8/02 , C22C38/00 , C22C38/02 , C22C38/04 , C22C38/06 , C22C38/12 , C21D8/12
摘要： A method for producing a high-tensile cold-rolled steel sheet includes subjecting a slab having a composition containing C: more than 0.020% and less than 0.30%, Si: more than 0.10% and 3.00% or less, and Mn: more than 1.00% and 3.50% or less to hot rolling wherein the roll draft of the final one pass is higher than 15%, and rolling is finished in the temperature region of Ar3 point or higher, optionally annealing wherein the hot-rolled steel sheet is heated to 300° C. or higher after being cooled to 780° C. or lower, coiling higher than 400° C. or lower than 400° C., cold rolling the hot-rolled steel sheet or the annealed steel sheet, and annealing wherein the cold-rolled steel sheet is soaked in the temperature region of (Ac3 point−40° C.) or higher, cooling to 500° C. or lower and 300° C. or higher, and holding in that temperature region for 30 seconds or longer.

10. 发明授权

US09970073B2 Hot-rolled, cold rolled, and plated steel sheet having improved uniform and local ductility at a high strain rate 有权
公开(公告)号：US09970073B2
公开(公告)日：2018-05-15
申请号：US13879074
申请日：2010-10-18
申请人： Kaori Kawano , Yasuaki Tanaka , Toshiro Tomida
发明人： Kaori Kawano , Yasuaki Tanaka , Toshiro Tomida
IPC分类号： C21D8/02 , C21D8/04 , C21D9/46 , C21D9/48 , C22C38/00 , C22C38/02 , C22C38/06 , C22C38/38 , C23C2/02 , C23C2/28 , C22C38/24 , C22C38/26 , C22C38/28
CPC分类号： C21D8/0221 , C21D8/04 , C21D8/0426 , C21D8/0436 , C21D8/0463 , C21D9/46 , C21D9/48 , C21D2211/001 , C21D2211/002 , C21D2211/005 , C21D2211/008 , C22C38/001 , C22C38/02 , C22C38/06 , C22C38/24 , C22C38/26 , C22C38/28 , C22C38/38 , C23C2/02 , C23C2/28
摘要： A multi-phase hot-rolled steel sheet has a metallurgical structure having a main phase of ferrite with an average grain diameter of at most 3.0 μm and a second phase including at least one of martensite, bainite, and austenite. In the surface layer, the average grain diameter of the second phase is at most 2.0 μm, the difference (ΔnHav) between the average nanohardness of the main phase (nHαav) and the average nanohardness of the second phase (nH2nd av) is 6.0-10.0 GPa, the difference (ΔσnH) of the standard deviation of the nanohardness of the second phase from the standard deviation of the nanohardness of the main phase is at most 1.5 GPa, and in the central portion, the difference (ΔnHav) between the average nanohardnesses is at least 3.5 GPa to at most 6.0 GPa and the difference (ΔσnH) between the standard deviations of the nanohardnesses is at least 1.5 GPa.

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