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    • 1. 发明授权
    • Reclining device
    • 斜倚装置
    • US07722121B2
    • 2010-05-25
    • US11664161
    • 2005-10-27
    • Hidehiko FujiokaHiroshi TakayanagiOsamu NaganoHiroyuki Suzuki
    • Hidehiko FujiokaHiroshi TakayanagiOsamu NaganoHiroyuki Suzuki
    • B60N2/235
    • B60N2/236
    • A reclining device capable of controlling angles of a seat back of a vehicle is provided. A ratchet plate is superposed on a base plate such that the ratchet plate is rotatable relative to the base plate. An operation shaft is rotatably disposed on the rotation center axis of the ratchet plate. A circular concavity is formed on a surface of the ratchet plate opposed to the base plate around the operation shaft. Inside teeth are provided on an inner circumferential wall surface of the concavity. Pawls having outside teeth on their front end surfaces are disposed on the concavity, and the outside teeth of the pawls engage with and disengaging from the inside teeth in the radial direction of a teeth end circle. Guide projections provided on the base plate slidingly guide the pawls in the radial direction. A cam disposed in a space on the side of rear end surfaces of the pawls is rotatable with the operation shaft. A release plate disposed between the ratchet plate and the components of the pawls and the cam such that the release plate is rotatable with the cam. Projections engaging with cam grooves are provided at the rotation end of the release plate to release engagement between the inside teeth and the outside teeth.
    • 提供了能够控制车辆的座椅靠背的角度的倾斜装置。 棘轮板重叠在基板上,使得棘轮板相对于基板可旋转。 操作轴可旋转地设置在棘轮盘的旋转中心轴线上。 在操作轴周围的与基板相对的棘轮板的表面上形成圆形凹部。 内齿设置在凹部的内周壁面上。 在其前端面上具有外齿的爪子设置在凹部上,并且棘爪的外齿在齿端圆的径向方向上与内齿啮合并脱离啮合。 设置在基板上的引导突起沿径向方向滑动地引导棘爪。 设置在爪的后端面的一侧的空间中的凸轮可随操作轴旋转。 设置在棘爪板和棘爪和凸轮的部件之间的释放板,使得释放板可与凸轮一起旋转。 在释放板的旋转端设置有与凸轮槽接合的突起,以释放内齿和外齿之间的接合。
    • 2. 发明申请
    • Reclining Device
    • 斜倚装置
    • US20080093903A1
    • 2008-04-24
    • US11664161
    • 2005-10-27
    • Hidehiko FujiokaHiroshi TakayanagiOsamu NaganoHiroyuki Suzuki
    • Hidehiko FujiokaHiroshi TakayanagiOsamu NaganoHiroyuki Suzuki
    • A47C1/025
    • B60N2/236
    • A reclining device capable of controlling angles of a seat back of a vehicle is provided. A ratchet plate is superposed on a base plate such that the ratchet plate is rotatable relative to the base plate. An operation shaft is rotatably disposed on the rotation center axis of the ratchet plate. A circular concave is formed on a surface of the ratchet plate opposed to the base plate around the operation shaft. Inside teeth are provided on an inner circumferential wall surface of the concave. Poles having outside teeth on their front end surfaces are disposed on the concave, and the outside teeth of the poles engage with and disengaging from the inside teeth in the radial direction of a teeth end circle. Guide projections provided on the base plate slidingly guide the poles in the radial direction. A cam disposed in a space on the side of rear end surfaces of the poles is rotatable with the operation shaft. A release plate disposed between the ratchet plate and the components of the poles and the cam such that the release plate is rotatable with the cam. Projections engaging with cam grooves are provided at the rotation end of the release plate to release engagement between the inside teeth and the outside teeth.
    • 提供了能够控制车辆的座椅靠背的角度的倾斜装置。 棘轮板重叠在基板上,使得棘轮板相对于基板可旋转。 操作轴可旋转地设置在棘轮盘的旋转中心轴线上。 在操作轴周围与基板相对的棘轮板的表面上形成圆形凹部。 内齿设置在凹部的内周壁面上。 在其前端表面上具有外齿的极子设置在凹部上,并且极的外齿在齿端圆的径向方向上与内齿啮合并脱离啮合。 设置在基板上的引导突起沿径向方向滑动地引导杆。 设置在杆的后端面侧的空间中的凸轮可随着操作轴旋转。 一个释放板,设置在棘轮板和杆和凸轮的部件之间,使得释放板能够与凸轮一起旋转。 在释放板的旋转端设置有与凸轮槽接合的突起,以释放内齿和外齿之间的接合。
    • 5. 发明申请
    • Charged particle beam lithography system, pattern drawing method, and method of manufacturing semiconductor device
    • 带电粒子束光刻系统,图案绘制方法和制造半导体器件的方法
    • US20050109955A1
    • 2005-05-26
    • US10959508
    • 2004-10-07
    • Osamu NaganoAtsushi Ando
    • Osamu NaganoAtsushi Ando
    • G03F7/20A61N5/00H01J37/147H01J37/305H01J37/317H01L21/027
    • B82Y10/00B82Y40/00H01J37/3174
    • A charged particle beam lithography system includes: a charged particle beam source which generates a charged particle beam and irradiates a substrate therewith; an aperture in which has been formed a pattern of a shape corresponding to an arbitrary pattern to be drawn; an illuminator which adjusts the diameter of the charged particle beam and illuminates the aperture with the charged particle beam; a first deflector which deflects the charged particle beam by an electrical field to cause the charged particle beam to be incident on an arbitrary pattern, allowing the charged particle beam to pass through the aperture and be reflected back along the optical axis; a first demagnification optical projection system which demagnifies the aperture image of the charged particle beam which has passed through the aperture with the use of an electrical field or electromagnetic field; a second demagnification optical projection system which demagnifies the aperture image of the charged particle beam which has been demagnified by the first demagnification projection optical system, with the use of an electrical field or electromagnetic field to form an image on the substrate; and a beam diameter adjuster which adjusts the illuminator in such a manner that the beam diameter at crossovers of the charged particle beam, formed between the aperture and the first demagnification optical projection system and within the second demagnification optical projection system, is greater than the size of the pattern.
    • 带电粒子束光刻系统包括:带电粒子束源,其产生带电粒子束并照射衬底; 已经形成了与要拉制的任意图案相对应的形状的图案的孔; 照明器,其调节带电粒子束的直径并用带电粒子束照射孔径; 第一偏转器,其通过电场使带电粒子束偏转,以使带电粒子束入射到任意图案上,允许带电粒子束通过孔径并沿光轴反射回; 第一缩小光学投影系统,其通过使用电场或电磁场来对通过所述孔径的带电粒子束的孔径图像进行缩小; 第二缩小光学投影系统,其通过使用电场或电磁场在所述基板上形成图像来对由所述第一缩尺投影光学系统进行了缩小的带电粒子束的孔径图像进行缩小; 以及光束直径调节器,其以这样的方式调节照明器,使得形成在孔和第一缩小光学投影系统之间并且在第二缩小光学投影系统内的带电粒子束的交叉处的光束直径大于尺寸 的模式。
    • 7. 发明授权
    • Pulse welding apparatus
    • 脉冲焊接设备
    • US5317116A
    • 1994-05-31
    • US668519
    • 1991-03-27
    • Yoichiro TabataShigeo UeguriYoshihiro UedaMasanori MizunoYoshiaki KatouOsamu Nagano
    • Yoichiro TabataShigeo UeguriYoshihiro UedaMasanori MizunoYoshiaki KatouOsamu Nagano
    • B23K9/073B23K9/09B23K9/095B23K9/10G05F1/08
    • B23K9/1062B23K9/0734B23K9/092B23K9/0953G05F1/08
    • A pulse welding apparatus using a pulse discharge such as a pulse arc welding apparatus and a short-circuit transfer arc welding apparatus. A pulse current waveform control circuit, which controls the pulse arc current so that a desired pulse arc current is supplied to the arc welding power supply for outputting the pulse arc current to the welding load unit, is constructed such that the optimum welding operation may be performed without having to adjust circuit components and modify circuit design. The pulse current waveform control circuit is in the form of a microcomputerized digital circuit which operates under a program to provide a desired pulse arc current. A modification of the program can provide any desired pulse arc currents without changing circuits. The optimum welding current waveform parameters or a target arc length signal is learned in the first welding stage and stored into a memory. An arc length feedback control or a current waveform control is performed under the control of program on the basis of the optimum welding current waveform parameters or the target arc length signal so as to control the faulty separation of globules when magnetic blow occurs and so as to reduce the variation of arc length due to external disturbances occurring at the welding torch so that improved welding quality is ensured under various environments.
    • PCT No.PCT / JP90 / 00246 Sec。 371日期1991年3月27日 102(e)1991年3月27日PCT提交1990年2月27日PCT公布。 公开号WO91 / 01842 日期:1991年2月21日。一种使用脉冲放电的脉冲焊接装置,例如脉冲电弧焊接装置和短路转移电弧焊接装置。 控制脉冲电弧电流的脉冲电流波形控制电路被构造为使得最佳焊接操作可以是最佳焊接操作,该脉冲电流波形控制电路控制脉冲电弧电流,使得向焊接电源提供期望的脉冲电弧电流以向焊接负载单元输出脉冲电弧电流 执行而不必调整电路组件并修改电路设计。 脉冲电流波形控制电路是在程序下操作以提供期望的脉冲电弧电流的微计算机数字电路的形式。 该程序的修改可以提供任何期望的脉冲电弧电流而不改变电路。 在第一焊接阶段学习最佳焊接电流波形参数或目标电弧长度信号,并存储到存储器中。 基于最佳焊接电流波形参数或目标电弧长度信号,在程序控制下执行电弧长度反馈控制或电流波形控制,以便在发生磁场发生时控制球的故障分离,从而 减少由焊枪发生的外部干扰引起的电弧长度的变化,从而确保在各种环境下提高焊接质量。
    • 9. 发明申请
    • Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device
    • 带电束曝光装置,充电束控制方法和半导体装置的制造方法
    • US20060108546A1
    • 2006-05-25
    • US11260251
    • 2005-10-28
    • Osamu Nagano
    • Osamu Nagano
    • G21K5/10
    • H01J37/3174B82Y10/00B82Y40/00H01J37/3175H01J2237/31764
    • A charged beam exposure apparatus includes: a first shaping aperture provided with a plurality of rectangular openings which are different from each other in at least one of area and shape thereof; a second shaping aperture provided with a pattern having a shape corresponding to that of a pattern to be drawn onto a substrate; a charged beam generator which generates a charged beam to apply the charged beam to the first shaping aperture; a projector which projects the charged beam that has passed through an arbitrary opening of the first shaping aperture onto the second shaping aperture; a deflection unit provided between the charged beam generator and the projector to deflect the charged beam; a deflection controller which controls the deflection unit so that the opening of the first shaping aperture is selected which enables adjustments of a drawing time and a resolution conforming to requirements/specifications of the pattern to be drawn; and a demagnification projector which projects the charged beam that has passed through the second shaping aperture onto the substrate in a demagnification form.
    • 带电束曝光装置包括:第一成形孔,其具有在其面积和形状中的至少一个中彼此不同的多个矩形开口; 第二成形孔,其设置有具有与要拉制到基板上的图案相对应的形状的图案; 带电波束发生器,其产生带电波束以将带电波束施加到第一成形孔径; 投影仪,其将已经穿过第一成形孔的任意开口的带电束投影到第二成形孔上; 设置在所述带电束发生器和所述投影仪之间的偏转单元,用于偏转所述带电束; 偏转控制器,其控制偏转单元,使得选择第一成形孔的开口,使得能够调整绘制时间和符合要绘制的图案的要求/规格的分辨率; 以及将已经通过第二成形孔的带电束以缩小形式投影到基板上的缩小投影仪。