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1. 发明申请

US20080044021A1 Image forming apparatus, image forming method and, computer readable medium and computer signal 有权
标题翻译：图像形成装置，图像形成方法以及计算机可读介质和计算机信号
公开(公告)号：US20080044021A1
公开(公告)日：2008-02-21
申请号：US11723863
申请日：2007-03-22
申请人： Hidefumi Nishigai , Katsuhiko Ono , Masato Tsuji
发明人： Hidefumi Nishigai , Katsuhiko Ono , Masato Tsuji
IPC分类号： H04N1/44
CPC分类号： H04N1/448
摘要： An image forming apparatus comprises: an output part that outputs variable information varying in a time-dependent manner in the image forming apparatus; a first encrypt part that encrypts the variable information outputted from the output part using a first encrypt key read out from a memory; a second encrypt key create part that creates a second encrypt key according to the variable information outputted from the output part; a second encrypt part that encrypts inherent information for specifying the image forming apparatus using the second encrypt key created by the second encrypt key create part; a generate part that generates code data according to the variable information encrypted in the first encrypt part and the inherent information encrypted in the second encrypt part; and an image form part that forms on a recording member a code image based on the code data generated in the generate part.
摘要翻译：一种图像形成装置包括：输出部，输出在图像形成装置中以时间依赖的方式变化的可变信息; 第一加密部分，使用从存储器读出的第一加密密钥加密从输出部分输出的可变信息; 第二加密密钥创建部分，其根据从输出部分输出的可变信息创建第二加密密钥; 第二加密部分，使用由第二加密密钥生成部分创建的第二加密密钥加密用于指定图像形成装置的固有信息; 生成部，其根据在第一加密部中加密的变量信息和在第二加密部中加密的固有信息生成代码数据; 以及基于在生成部中生成的代码数据，在记录部件上形成代码图像的图像形成部。

2. 发明授权

US08331562B2 Image forming apparatus, image forming method and, computer readable medium and computer signal 有权
标题翻译：图像形成装置，图像形成方法以及计算机可读介质和计算机信号
公开(公告)号：US08331562B2
公开(公告)日：2012-12-11
申请号：US11723863
申请日：2007-03-22
申请人： Hidefumi Nishigai , Katsuhiko Ono , Masato Tsuji
发明人： Hidefumi Nishigai , Katsuhiko Ono , Masato Tsuji
IPC分类号： H04N1/44
CPC分类号： H04N1/448
摘要： An image forming apparatus comprises: an output part that outputs variable information varying in a time-dependent manner in the image forming apparatus; a first encrypt part that encrypts the variable information outputted from the output part using a first encrypt key read out from a memory; a second encrypt key create part that creates a second encrypt key according to the variable information outputted from the output part; a second encrypt part that encrypts inherent information for specifying the image forming apparatus using the second encrypt key created by the second encrypt key create part; a generate part that generates code data according to the variable information encrypted in the first encrypt part and the inherent information encrypted in the second encrypt part; and an image form part that forms on a recording member a code image based on the code data generated in the generate part.
摘要翻译：一种图像形成装置包括：输出部，输出在图像形成装置中以时间依赖的方式变化的可变信息; 第一加密部分，使用从存储器读出的第一加密密钥加密从输出部分输出的可变信息; 第二加密密钥创建部分，其根据从输出部分输出的可变信息创建第二加密密钥; 第二加密部分，使用由第二加密密钥生成部分创建的第二加密密钥加密用于指定图像形成装置的固有信息; 生成部，其根据在第一加密部中加密的变量信息和在第二加密部中加密的固有信息生成代码数据; 以及基于在生成部分中生成的代码数据，在记录部件上形成代码图像的图像形成部。

3. 发明授权

US08922332B2 Electronic equipment, and restriction removal method 有权
标题翻译：电子设备和限制去除方法
公开(公告)号：US08922332B2
公开(公告)日：2014-12-30
申请号：US13098704
申请日：2011-05-02
申请人： Keiichi Nakamachi , Katsuhiko Ono , Akira Kimura , Norio Sato , Kimiyuki Nishimura , Hideki Takedomi , Kingo Maeda
发明人： Keiichi Nakamachi , Katsuhiko Ono , Akira Kimura , Norio Sato , Kimiyuki Nishimura , Hideki Takedomi , Kingo Maeda
IPC分类号： G05B23/00 , G05B19/418
CPC分类号： G05B19/4188 , Y02P90/18 , Y02P90/20 , Y02P90/24
摘要： Electronic equipment, including a GPS dongle and a PC, compares an acquired current location position of the electronic equipment with an acquired planned installation position of a machine tool to determine whether or not the current location position is within a predetermined range from the planned installation position. Further, the electronic equipment determines, if it is determined that the current location position is within the predetermined range from the planned installation position, whether or not a predetermined condition has been satisfied. The electronic equipment also performs, if it is determined that the predetermined condition has been satisfied, information input processing on the machine tool to remove activation restriction on the machine tool. In this manner, the electronic equipment can prevent illegal removal of activation restriction on the machine tool.
摘要翻译：包括GPS加密狗和PC的电子设备将所获取的电子设备的当前位置与所获得的机床的计划安装位置进行比较，以确定当前位置位置是否在距预定安装位置的预定范围内。此外，如果确定当前位置位置在从预定安装位置起的预定范围内，则电子设备确定是否已经满足预定条件。如果确定已经满足预定条件，则电子设备还执行对机床的信息输入处理以消除机床上的激活限制。以这种方式，电子设备可以防止非法移除机床上的激活限制。

4. 发明授权

US08838265B2 Machine tool, machining method, program and NC data generation device 有权
标题翻译：机床，加工方法，程序和NC数据生成装置
公开(公告)号：US08838265B2
公开(公告)日：2014-09-16
申请号：US13332267
申请日：2011-12-20
申请人： Akira Kimura , Katsuhiko Ono
发明人： Akira Kimura , Katsuhiko Ono
IPC分类号： G06F19/00 , G05B13/00 , B25J9/16 , G05B19/18 , G05B19/25 , G05B19/23
CPC分类号： G05B19/184 , G05B2219/35128 , G05B2219/50353 , G05B2219/50355
摘要： A work having a non-circular cross-section is machined by relative movement between the work and a tool, as the relative position and angle between the work and tool are changed at least within a plane including the cross-section of the work. In machining along a preset tool path, the difference between the relative angle at a point on the preset tool path which machining is started and that point on the preset tool path at which machining is finished is calculated. Time needed in machining along the preset tool path is equally divided by a preset number at equal time divisions, and positions on the tool path corresponding to equal time divisions are set as tool path points. When the tool moves through each point, the relative angle is continuously changed an angle corresponding to division of the difference of the relative angles by the preset number of equal time divisions.
摘要翻译：具有非圆形横截面的工件通过工件和工具之间的相对运动来加工，因为工件和工具之间的相对位置和角度至少在包括工件的横截面的平面内改变。在沿着预设刀具路径进行加工时，计算加工开始的预设刀具路径上的点处的相对角度与加工完成的预设刀具路径上的点之间的差。沿着预设刀具路径加工所需的时间，以相等的时间间隔除以预设的数字，刀具路径上相当于时间分割的位置设置为刀具路径点。当工具移动通过每个点时，相对角度连续地改变与相对角度差的除法相等预定数量的相等时间分割的角度。

5. 发明申请

US20050101137A1 Plasma etching method 有权
标题翻译：等离子蚀刻法
公开(公告)号：US20050101137A1
公开(公告)日：2005-05-12
申请号：US10935103
申请日：2004-09-08
申请人： Kazuya Kato , Katsuhiko Ono , Hideki Mizuno , Masahiro Ogasawara , Akinori Kitamura , Noriyuki Kobayashi , Yasushi Inata , Shin Okamoto
发明人： Kazuya Kato , Katsuhiko Ono , Hideki Mizuno , Masahiro Ogasawara , Akinori Kitamura , Noriyuki Kobayashi , Yasushi Inata , Shin Okamoto
IPC分类号： H01L21/28 , H01L21/3065 , H01L21/311 , H01L21/768 , H01L21/302 , H01L21/461
CPC分类号： H01J37/32082 , H01L21/31116 , H01L21/31138
摘要： A plasma etching is performed on a substrate having a pattern wherein an interval between neighboring openings formed on a resist mask is equal to or less than 200 nm, wherein the etching is performed by converting a processing gas comprising an active species generating gas which includes a compound having carbon and fluorine, and a nonreactive gas which includes xenon gas into a plasma. The nonreactive gas further includes argon gas.
摘要翻译：在具有图案的基板上进行等离子体蚀刻，其中形成在抗蚀剂掩模上的相邻开口之间的间隔等于或小于200nm，其中通过将包括活性物质产生气体的处理气体转化为包括具有碳和氟的化合物，以及包含氙气进入等离子体的非反应性气体。非反应性气体还包括氩气。

6. 发明授权

US5622593A Plasma processing apparatus and method 失效
标题翻译：等离子体处理装置及方法
公开(公告)号：US5622593A
公开(公告)日：1997-04-22
申请号：US658557
申请日：1996-06-05
申请人： Masashi Arasawa , Katsuhiko Ono , Hiroshi Nishikawa , Kazuo Tsuchiya
发明人： Masashi Arasawa , Katsuhiko Ono , Hiroshi Nishikawa , Kazuo Tsuchiya
IPC分类号： H01L21/302 , C23C16/458 , H01J37/32 , H01L21/205 , H01L21/3065 , H01L21/00
CPC分类号： C23C16/466 , C23C16/4586 , H01J37/32431 , H01J2237/2001
摘要： A plasma processing apparatus comprises a first passage opened in a top of suscepter at a peripheral area thereof, a first gas supply source for supplying heat exchange gas into a small clearance between the suscepter and a wafer through the first passage, a first vacuum pump for exhausting the clearance through the first passage, a second passage opened in the top of the suscepter at a center area thereof, a second gas supply source for supplying heat exchange gas into the clearance through the second passage, a second vacuum pump for exhausting the clearance through the second passage, and a controller for controlling the first and second gas supply sources and the first and second vacuum pumps independently of the others in such a way that backpressure caused in the second passage by the second gas supply source and vacuum pump can become lower than backpressure caused in the first passage by the first gas supply source and vacuum pump.
摘要翻译：一种等离子体处理装置，包括：在其周边区域的开口的顶部开口的第一通路;第一气体供给源，其通过第一通路将热交换气体供给到所述容器和晶片之间的小间隙;第一真空泵，通过第一通道排出间隙，第二通道在其中心区域处在容器的顶部开口，第二气体供应源，用于通过第二通道将热交换气体供应到间隙中;第二真空泵，用于排出间隙通过第二通道，以及用于独立于其他方式控制第一和第二气体供给源以及第一和第二真空泵的控制器，使得由第二气体供应源和真空泵在第二通道中产生的背压可以变成低于由第一气体供应源和真空泵在第一通道中引起的背压。

7. 发明申请

US20120197424A1 MACHINE TOOL, MACHINING METHOD, PROGRAM AND NC DATA GENERATION DEVICE 有权
标题翻译：机床，加工方法，程序和NC数据生成装置
公开(公告)号：US20120197424A1
公开(公告)日：2012-08-02
申请号：US13332267
申请日：2011-12-20
申请人： Akira Kimura , Katsuhiko Ono
发明人： Akira Kimura , Katsuhiko Ono
IPC分类号： G05B19/19
CPC分类号： G05B19/184 , G05B2219/35128 , G05B2219/50353 , G05B2219/50355
摘要： A work having a non-circular cross-section is machined by relative movement between the work and a tool, as the relative position and angle between the work and tool are changed at least within a plane including the cross-section of the work. In machining along a preset tool path, the difference between the relative angle at a point on the preset tool path which machining is started and that point on the preset tool path at which machining is finished is calculated. Time needed in machining along the preset tool path is equally divided by a preset number at equal time divisions, and positions on the tool path corresponding to equal time divisions are set as tool path points. When the tool moves through each point, the relative angle is continuously changed an angle corresponding to division of the difference of the relative angles by the preset number of equal time divisions (FIG. 3).
摘要翻译：具有非圆形横截面的工件通过工件和工具之间的相对运动来加工，因为工件和工具之间的相对位置和角度至少在包括工件的横截面的平面内改变。在沿着预设刀具路径进行加工时，计算加工开始的预设刀具路径上的点处的相对角度与加工完成的预设刀具路径上的点之间的差。沿着预设刀具路径加工所需的时间，以相等的时间间隔除以预设的数字，刀具路径上相当于时间分割的位置设置为刀具路径点。当工具移动通过每个点时，相对角度连续地改变一个对应于相对角度差除以相等时间间隔的预定数量的角度（图3）。

8. 发明授权

US07471096B2 Contactor for electronic parts and a contact method 有权
标题翻译：电子零件接触器和接触方式
公开(公告)号：US07471096B2
公开(公告)日：2008-12-30
申请号：US11339836
申请日：2006-01-26
申请人： Naohito Kohashi , Shigeyuki Maruyama , Yoshikazu Arisaka , Hiroyuki Murotani , Katsuhiko Ono
发明人： Naohito Kohashi , Shigeyuki Maruyama , Yoshikazu Arisaka , Hiroyuki Murotani , Katsuhiko Ono
IPC分类号： G01R31/02
CPC分类号： G01R1/0466 , G01R1/0483
摘要： A contactor for electronic parts can provide an appropriate and uniform contact with respect to a plurality of electrode terminals in an electronic part such as an IC. Each of a plurality of contact members has a first contact portion on one end thereof and a second contact portion on the other end thereof, the first contract portion having a recessed portion that receives one of the electrode terminals of the electronic part. A base accommodates and supports the plurality of the contact members. The first contact portion is movable in a horizontal direction.
摘要翻译：用于电子部件的接触器可以提供相对于诸如IC的电子部件中的多个电极端子的适当且均匀的接触。多个接触构件中的每一个在其一端具有第一接触部分和另一端的第二接触部分，第一接合部分具有容纳电子部件的电极端子之一的凹部。基座容纳并支撑多个接触构件。第一接触部分可沿水平方向移动。

9. 发明申请

US20080098914A1 Rotary body protecting apparatus 审中-公开
标题翻译：旋转体保护装置
公开(公告)号：US20080098914A1
公开(公告)日：2008-05-01
申请号：US11975238
申请日：2007-10-17
申请人： Hiroyuki Sugiyama , Katsuhiko Ono
发明人： Hiroyuki Sugiyama , Katsuhiko Ono
IPC分类号： B41F33/14
CPC分类号： B41F13/42 , B41F33/0018 , B41F33/14 , B41P2233/20 , B65H2402/441 , B65H2407/10 , F16P3/08 , F16P3/125 , F16P3/144
摘要： A rotary body protecting apparatus includes first and second rotary bodies, a cover, a cover detection unit, an optical detector, and a control device. The second rotary body is arranged in the same axial direction as that of the first rotary body and rotates while opposing the first rotary body. The cover opens/closes an opposing position of the first second rotary bodies. The cover detection unit detects a closed state of the cover. The optical detector is close to the opposing position of the first and second rotary bodies and arranged in the vicinity of the ends of the first and second rotary bodies. The optical detector includes a light-projecting portion which projects light in the axial directions of the first and second rotary bodies, and a light-receiving portion which receives the light from the light-projecting portion. The control device stops rotation of the first and second rotary bodies when the optical detector detects that the light-receiving portion does not receive the light from the light-projecting portion. The control device performs one of control of disabling the optical detector and control of invalidating a detection output of the optical detector when the cover detection means detects the closed state of the cover.
摘要翻译：旋转体保护装置包括第一和第二旋转体，盖，盖检测单元，光检测器和控制装置。第二旋转体与第一旋转体相同的轴向配置，与第一旋转体相对旋转。盖打开/关闭第一第二旋转体的相对位置。盖检测单元检测盖的关闭状态。光学检测器靠近第一和第二旋转体的相对位置，并布置在第一和第二旋转体的端部附近。光检测器包括在第一和第二旋转体的轴向上突出的光的投光部和从该光投射部接受的光的受光部。当光检测器检测到光接收部分没有接收到来自光投射部分的光时，控制装置停止第一和第二旋转体的旋转。当盖检测装置检测到盖的关闭状态时，控制装置执行禁用光学检测器的控制和使光检测器的检测输出无效的控制。

10. 发明授权

US07300881B2 Plasma etching method 有权
标题翻译：等离子蚀刻法
公开(公告)号：US07300881B2
公开(公告)日：2007-11-27
申请号：US10935103
申请日：2004-09-08
申请人： Kazuya Kato , Katsuhiko Ono , Hideki Mizuno , Masahiro Ogasawara , Akinori Kitamura , Noriyuki Kobayashi , Yasushi Inata , Shin Okamoto
发明人： Kazuya Kato , Katsuhiko Ono , Hideki Mizuno , Masahiro Ogasawara , Akinori Kitamura , Noriyuki Kobayashi , Yasushi Inata , Shin Okamoto
IPC分类号： H01L21/302 , H01L21/3065
CPC分类号： H01J37/32082 , H01L21/31116 , H01L21/31138
摘要： A plasma etching is performed on a substrate having a pattern wherein an interval between neighboring openings formed on a resist mask is equal to or less than 200 nm, wherein the etching is performed by converting a processing gas comprising an active species generating gas which includes a compound having carbon and fluorine, and a nonreactive gas which includes xenon gas into a plasma. The nonreactive gas further includes argon gas.
摘要翻译：在具有图案的基板上进行等离子体蚀刻，其中形成在抗蚀剂掩模上的相邻开口之间的间隔等于或小于200nm，其中通过将包括活性物质产生气体的处理气体转化为包括具有碳和氟的化合物，以及包含氙气进入等离子体的非反应性气体。非反应性气体还包括氩气。

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