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1. 发明授权

US07955784B2 Photoresist composition and method of manufacturing a thin-film transistor substrate using the same 有权
标题翻译：光刻胶组合物及使用其制造薄膜晶体管基板的方法
公开(公告)号：US07955784B2
公开(公告)日：2011-06-07
申请号：US11554194
申请日：2006-10-30
申请人： Hi-Kuk Lee , Woo-Seok Jeon , Doo-Hee Jung , Jeong-Min Park , Deok-Man Kang , Si-Young Jung , Jae-Young Choi
发明人： Hi-Kuk Lee , Woo-Seok Jeon , Doo-Hee Jung , Jeong-Min Park , Deok-Man Kang , Si-Young Jung , Jae-Young Choi
IPC分类号： G03F7/30
CPC分类号： H01L27/1288 , G03F7/0233 , G03F7/0236 , H01L27/1214
摘要： A photoresist composition includes about 100 parts by weight of resin mixture including novolak resin and acryl resin and about 10 parts to about 50 parts by weight of naphthoquinone diazosulfonic acid ester. A weight-average molecular weight of the novolak resin is no less than about 30,000. A weight-average molecular weight of the acryl resin is no less than about 20,000. The acryl resin makes up about 1% to about 15% of the total weight of the resin mixture. When a photoresist film formed using the photoresist composition is heated, a profile variation of the photoresist composition is relatively small. Therefore, a residual photoresist film has a uniform thickness, and a short circuit and/or an open defect in a TFT substrate may be reduced.
摘要翻译：光致抗蚀剂组合物包括约100重量份的包括酚醛清漆树脂和丙烯酸树脂的树脂混合物和约10重量份至约50重量份的萘醌重氮磺酸酯。酚醛清漆树脂的重均分子量不小于约30,000。丙烯酸树脂的重均分子量不小于约20,000。丙烯酸树脂占树脂混合物总重量的约1％至约15％。当使用光致抗蚀剂组合物形成的光致抗蚀剂膜被加热时，光致抗蚀剂组合物的轮廓变化相对较小。因此，残留的光致抗蚀剂膜具有均匀的厚度，并且可能减小TFT基板中的短路和/或开路缺陷。

2. 发明申请

US20090258497A1 PHOTORESIST RESIN, AND METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING DISPLAY PANEL USING THE SAME 审中-公开
标题翻译：光电树脂，以及形成图案的方法和使用其制造显示面板的方法
公开(公告)号：US20090258497A1
公开(公告)日：2009-10-15
申请号：US12389296
申请日：2009-02-19
申请人： Jeong-Min Park , Doo-Hee Jung , Jung-Soo Lee , Hi-Kuk Lee , Sae-Tae Oh , Jae-Young Choi , Doek-Man Kang
发明人： Jeong-Min Park , Doo-Hee Jung , Jung-Soo Lee , Hi-Kuk Lee , Sae-Tae Oh , Jae-Young Choi , Doek-Man Kang
IPC分类号： H01L21/311 , G03F7/00
CPC分类号： G03F7/0236 , G03F7/0007
摘要： A photoresist resin composition, a method for forming a pattern and a method for manufacturing a display panel using the photoresist resin composition are disclosed. The photoresist resin composition includes an alkali soluble resin, a photoresist compound, and a solvent, wherein the alkali soluble resin includes a first polymer resin represented by the following Chemical Formula 1, wherein, of R1, R2, R3, R4, R5 and R6, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen, and of R7, R8, R9, R10 and R11, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen.
摘要翻译：公开了光致抗蚀剂树脂组合物，形成图案的方法和使用该光致抗蚀剂树脂组合物的显示面板的制造方法。光致抗蚀剂树脂组合物包括碱溶性树脂，光致抗蚀剂化合物和溶剂，其中碱溶性树脂包括由以下化学式1表示的第一聚合物树脂，其中R1，R2，R3，R4，R5和R6 至少一个是羟基，至少两个是甲基，任何剩余的基团是氢，R7，R8，R9，R10和R11中的至少一个是羟基，至少两个是甲基，任何剩余的基团是氢。

3. 发明申请

US20090215233A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 有权
标题翻译：光电组合物及使用其制造阵列基板的方法
公开(公告)号：US20090215233A1
公开(公告)日：2009-08-27
申请号：US12327215
申请日：2008-12-03
申请人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
发明人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
IPC分类号： H01L21/336 , G03F7/028
CPC分类号： H01L27/1288 , G03F7/0233 , H01L27/1214
摘要： A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
摘要翻译：光致抗蚀剂组合物包括粘合剂树脂，光酸产生剂，具有四种不同类型的单体的丙烯酸树脂和溶剂。

4. 发明授权

US07927897B2 Photoresist composition and method of manufacturing array substrate using the same 有权
标题翻译：光刻胶组合物及其制造方法
公开(公告)号：US07927897B2
公开(公告)日：2011-04-19
申请号：US12327215
申请日：2008-12-03
申请人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
发明人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
IPC分类号： H01L21/00
CPC分类号： H01L27/1288 , G03F7/0233 , H01L27/1214
摘要： A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
摘要翻译：光致抗蚀剂组合物包括粘合剂树脂，光酸产生剂，具有四种不同类型的单体的丙烯酸树脂和溶剂。

5. 发明授权

US08808963B2 Photoresist composition and method of manufacturing array substrate using the same 有权
标题翻译：光刻胶组合物及其制造方法
公开(公告)号：US08808963B2
公开(公告)日：2014-08-19
申请号：US13050522
申请日：2011-03-17
申请人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
发明人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
IPC分类号： G03C1/76
CPC分类号： H01L27/1288 , G03F7/0233 , H01L27/1214
摘要： A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
摘要翻译：光致抗蚀剂组合物包括粘合剂树脂，光酸产生剂，具有四种不同类型的单体的丙烯酸树脂和溶剂。

6. 发明授权

US08723024B2 Transparent electrode comprising graphene sheet, and display and solar cell including the electrode 有权
标题翻译：包括石墨烯片的透明电极以及包括该电极的显示器和太阳能电池
公开(公告)号：US08723024B2
公开(公告)日：2014-05-13
申请号：US12105738
申请日：2008-04-18
申请人： Jae-Young Choi , Hyeon-Jin Shin , Seon-mi Yoon , Young-hee Lee
发明人： Jae-Young Choi , Hyeon-Jin Shin , Seon-mi Yoon , Young-hee Lee
IPC分类号： H01L31/00 , G11B11/105
CPC分类号： H01L31/022466 , B82Y20/00 , G02F1/133305 , G02F1/13439 , G02F2202/36 , H01L31/1884 , H01L51/0037 , H01L51/0081 , H01L51/442 , H01L51/444 , H01L51/5206 , H05B33/28 , Y02E10/542 , Y02E10/549
摘要： Provided is a transparent electrode including a graphene sheet. A transparent electrode having high conductivity, low sheet resistance, and low surface roughness can be prepared by employing the graphene sheet.
摘要翻译：提供了包括石墨烯片的透明电极。可以通过使用石墨烯片来制备具有高导电性，低薄层电阻和低表面粗糙度的透明电极。

7. 发明授权

US08468645B2 Cleaning robot having exhaust air feedback function 失效
标题翻译：具有排气反馈功能的清洁机器人
公开(公告)号：US08468645B2
公开(公告)日：2013-06-25
申请号：US12527360
申请日：2007-08-30
申请人： Byung-Soo Kim , Jae-Young Choi , Se-Won Lee , Sang-Hee Kim
发明人： Byung-Soo Kim , Jae-Young Choi , Se-Won Lee , Sang-Hee Kim
IPC分类号： A47L9/28
CPC分类号： A47L5/14 , A47L2201/00
摘要： A cleaning robot having an exhaust air feedback function can utilize the vacuum suction force generated by a suction motor as well as spray exhaust air onto the surface to be cleaned by circulating the air using the suction motor, thereby improving foreign material removal efficiency. The cleaning robot includes a suction unit, a suction motor for drawing in foreign materials from the surface to be cleaned, along with air, through the suction unit, a dust collector for capturing the foreign materials, so that the air is exhausted through the suction motor, and an exhaust air feedback unit for feeding the air. The cleaning robot also includes a spray nozzle unit inserted into the suction unit and placed on the leading end of the suction unit, the spray nozzle unit spraying the air fed by the exhaust air feedback unit, to the surface to be cleaned.
摘要翻译：具有排气反馈功能的清洁机器人可以利用由抽吸马达产生的真空吸力，并且通过使用抽吸马达循环空气将排气喷射到待清洁的表面上，从而提高异物去除效率。清洁机器人包括抽吸单元，用于从待清洁表面吸入异物的抽吸马达以及空气通过抽吸单元，用于捕获异物的集尘器，从而通过抽吸排出空气马达和用于供给空气的排气反馈单元。清洁机器人还包括插入抽吸单元中的喷嘴单元并且放置在抽吸单元的前端，喷嘴单元将由排气反馈单元供给的空气喷射到待清洁的表面。

8. 发明授权

US08378698B2 Integrated circuit testing apparatus and method 有权
标题翻译：集成电路测试仪器及方法
公开(公告)号：US08378698B2
公开(公告)日：2013-02-19
申请号：US12798605
申请日：2010-04-07
申请人： Jae-Young Choi , Chang-Hyun Cho
发明人： Jae-Young Choi , Chang-Hyun Cho
IPC分类号： G01R31/20
CPC分类号： G01R31/318511
摘要： A testing apparatus includes a test controller configured to output a plurality of chip selection signals for selecting chips to be tested from among a plurality of chips, a plurality of first control signals for controlling supply of a power supply voltage to the chips selected by the chip selection signals, and a plurality of second control signals for controlling receiving of test voltages output from the chips supplied with the power supply voltage, and a probe card including one or more test blocks each having a plurality of signal transmitters configured to respectively transfer the power supply voltage to the corresponding chips in response to the different first control signals and respectively apply the test voltages output from the corresponding chips to the test controller in response to the different second control signals.
摘要翻译：测试装置包括：测试控制器，被配置为从多个芯片中输出用于选择要测试的芯片的多个芯片选择信号;多个第一控制信号，用于控制向由芯片选择的芯片提供的电源电压选择信号和多个第二控制信号，用于控制从提供有电源电压的芯片输出的测试电压的接收;以及探针卡，其包括一个或多个测试块，每个测试块具有多个信号发射机，其被配置为分别传输功率响应于不同的第一控制信号向相应的芯片提供电压，并且响应于不同的第二控制信号分别将从相应芯片输出的测试电压施加到测试控制器。

9. 发明申请

US20090117837A1 CMP PAD AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译： CMP PAD及其制造方法
公开(公告)号：US20090117837A1
公开(公告)日：2009-05-07
申请号：US12265853
申请日：2008-11-06
申请人： Jae-Young Choi
发明人： Jae-Young Choi
IPC分类号： B24D3/28 , B24D11/00 , B24D18/00 , B24D3/34 , B29C43/04 , B29C35/08
CPC分类号： B24D3/346 , B24B37/26 , B24D18/00 , B29C35/02 , B29C35/0805 , B29C43/222 , B29C2043/023 , B29C2043/463 , B29K2105/0002
摘要： Embodiments relate to a chemical mechanical polishing (CMP) pad. According to embodiments, a CMP pad may include a pad body having a series of concave and convex patterns and a chemical reactant formed on and/or over the pad body. The CMP pad may uniformly perform a CMP process without using abrasive grains. Accordingly, scratches on a surface of a wafer may be prevented.
摘要翻译：实施例涉及化学机械抛光（CMP）垫。根据实施例，CMP垫可以包括具有一系列凹凸图案和形成在垫体上和/或上方的化学反应物的垫体。 CMP垫可以均匀地进行CMP工艺而不使用磨粒。因此，可以防止晶片表面上的划痕。

10. 发明申请

US20080088215A1 EXTERNAL LIGHT-SHIELDING LAYER, FILTER FOR DISPLAY DEVICE INCLUDING THE EXTERNAL LIGHT-SHIELDING LAYER AND DISPLAY DEVICE INCLUDING THE FILTER 失效
标题翻译：外部遮光层，包括外部遮光层的显示装置的过滤器和包括过滤器的显示装置
公开(公告)号：US20080088215A1
公开(公告)日：2008-04-17
申请号：US11966758
申请日：2007-12-28
申请人： DAE CHUL PARK , Jae-Young Choi , Tae-soon Park , Sang-Cheol Jung , Jin-Woo Yeo , Jin Seo
发明人： DAE CHUL PARK , Jae-Young Choi , Tae-soon Park , Sang-Cheol Jung , Jin-Woo Yeo , Jin Seo
IPC分类号： H01J61/40 , G06F1/16
CPC分类号： G02B3/0056 , G02B3/005 , G02B5/045 , G02F1/133502 , G02F1/133509 , H01J11/12 , H01J11/44 , H01J29/89 , H01J2211/444 , H01J2329/892
摘要： An external light-shielding layer capable of enhancing a visible light transmittance and a contrast ratio and preventing Moiré fringe and Newton ring phenomena, a display filter including the external light-shielding layer, and a display device including the display filter. The external light-shielding layer includes a transparent resin matrix, and a plurality of light-shielding patterns formed on the transparent resin matrix and spaced apart from each other in a predetermined interval, wherein a bias angle (α) formed between a traveling direction of the light-shielding patterns and the longer side of the matrix is in a range of about 5 to 80 degrees.
摘要翻译：能够增强可见光透射率和对比度并防止莫尔条纹和牛顿环现象的外部遮光层，包括外部遮光层的显示滤光器和包括显示滤光片的显示装置。外部遮光层包括透明树脂基体和形成在透明树脂基体上并以预定间隔彼此间隔开的多个遮光图案，其中形成在偏振角（α）的行进方向光屏蔽图案和矩阵的长边在约5-80度的范围内。

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