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1. 发明申请

US20110287360A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME 有权
标题翻译：光电组合物及其使用形成图案的方法
公开(公告)号：US20110287360A1
公开(公告)日：2011-11-24
申请号：US13037212
申请日：2011-02-28
申请人： Hi-Kuk LEE , Sang-Hyun YUN , Cha-Dong KIM , Jung-In PARK , Deok-Man KANG , Youn-Suk KIM , Sae-Tae OH
发明人： Hi-Kuk LEE , Sang-Hyun YUN , Cha-Dong KIM , Jung-In PARK , Deok-Man KANG , Youn-Suk KIM , Sae-Tae OH
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/30 , G03F7/022 , G03F7/0236 , H01L27/1288 , H01L29/41733
摘要： A photoresist composition is provided. The photoresist composition includes an alkali-soluble resin; a photosensitizer containing a first compound that contains a diazonaphthoquinone represented by Formula 1 and a second compound that contains a diazonaphthoquinone represented by Formula 2; and a solvent. andR1 is selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 4 carbons, an alkenyl group having 2 to 4 carbons, a cycloalkyl group having 3 to 8 carbons, and an aryl group having 6 to 12 carbons, and R2 is selected from the group consisting of Cl, F, Br, and I.
摘要翻译：提供光致抗蚀剂组合物。光致抗蚀剂组合物包括碱溶性树脂; 含有含有由式1表示的重氮萘醌的第一化合物和含有由式2表示的重氮萘醌的第二化合物的光敏剂; 和溶剂。 R 1选自氢原子，碳原子数1〜4的烷基，碳原子数2〜4的烯基，碳原子数3〜8的环烷基，碳原子数6〜12的芳基，并且R 2选自Cl，F，Br和I.

2. 发明申请

US20100167206A1 PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A DISPLAY SUBSTRATE USING THE PHOTORESIST COMPOSITION 审中-公开
标题翻译：光电组合物和使用光电组合物制造显示基板的方法
公开(公告)号：US20100167206A1
公开(公告)日：2010-07-01
申请号：US12557215
申请日：2009-09-10
申请人： Woo-Seok JEON , Sang-Hyun YUN , Hi-Kuk LEE , Deok-Man KANG , Sae-Tae OH
发明人： Woo-Seok JEON , Sang-Hyun YUN , Hi-Kuk LEE , Deok-Man KANG , Sae-Tae OH
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G02F1/13439 , G03F7/0007 , G03F7/0226 , H01L27/1288
摘要： A photoresist composition includes a novolac resin, a benzophenone photosensitizer and an ethylidyne tris phenol photosensitizer, and an organic solvent. Thus, a micropattern having a higher resolution than the resolution of an exposure apparatus is formed to decrease an amount of exposure and/or exposure time, thereby improving manufacturing reliability and productivity.
摘要翻译：光致抗蚀剂组合物包括酚醛清漆树脂，二苯甲酮光敏剂和乙基三苯酚光敏剂以及有机溶剂。因此，形成具有比曝光装置的分辨率高的分辨率的微图案，以减少曝光量和/或曝光时间，从而提高制造可靠性和生产率。

3. 发明申请

US20090215233A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 有权
标题翻译：光电组合物及使用其制造阵列基板的方法
公开(公告)号：US20090215233A1
公开(公告)日：2009-08-27
申请号：US12327215
申请日：2008-12-03
申请人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
发明人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
IPC分类号： H01L21/336 , G03F7/028
CPC分类号： H01L27/1288 , G03F7/0233 , H01L27/1214
摘要： A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
摘要翻译：光致抗蚀剂组合物包括粘合剂树脂，光酸产生剂，具有四种不同类型的单体的丙烯酸树脂和溶剂。

4. 发明授权

US08808963B2 Photoresist composition and method of manufacturing array substrate using the same 有权
标题翻译：光刻胶组合物及其制造方法
公开(公告)号：US08808963B2
公开(公告)日：2014-08-19
申请号：US13050522
申请日：2011-03-17
申请人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
发明人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
IPC分类号： G03C1/76
CPC分类号： H01L27/1288 , G03F7/0233 , H01L27/1214
摘要： A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
摘要翻译：光致抗蚀剂组合物包括粘合剂树脂，光酸产生剂，具有四种不同类型的单体的丙烯酸树脂和溶剂。

5. 发明申请

US20120052438A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME 审中-公开
标题翻译：光刻胶组合物及其形成图案的方法
公开(公告)号：US20120052438A1
公开(公告)日：2012-03-01
申请号：US13117032
申请日：2011-05-26
申请人： Cha-Dong KIM , Sang-Hyun Yun , Jung-In Park , Hi-Kuk Lee , Deok-Man Kang , Youn-Suk Kim , Sae-Tae Oh
发明人： Cha-Dong KIM , Sang-Hyun Yun , Jung-In Park , Hi-Kuk Lee , Deok-Man Kang , Youn-Suk Kim , Sae-Tae Oh
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/022 , G03F7/0236
摘要： A photoresist composition and method of forming pattern using the same are provided. The photoresist composition contains an alkali-soluble novolac resin, a photosensitizer including a compound of Chemical Formula 1, and a solvent.
摘要翻译：提供光致抗蚀剂组合物和使用其形成图案的方法。光致抗蚀剂组合物含有碱溶性酚醛清漆树脂，包括化学式1的化合物的光敏剂和溶剂。

6. 发明申请

US20100009482A1 PHOTORESIST COMPOSITION, METHOD OF FORMING A METAL PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME 审中-公开
标题翻译：光电组合物，形成金属图案的方法以及使用其制造显示基板的方法
公开(公告)号：US20100009482A1
公开(公告)日：2010-01-14
申请号：US12419764
申请日：2009-04-07
申请人： Jeong-Min PARK , Jung-Soo LEE , Doo-Hee JUNG , Hi-Kuk LEE , Deok-Man KANG , Sae-Tae OH , Sang-Won SON , Young-Jin KIM
发明人： Jeong-Min PARK , Jung-Soo LEE , Doo-Hee JUNG , Hi-Kuk LEE , Deok-Man KANG , Sae-Tae OH , Sang-Won SON , Young-Jin KIM
IPC分类号： H01L21/02 , G03F7/004 , G03F7/20
CPC分类号： H01L27/1288 , G03F7/0226 , G03F7/40 , H01L21/32139 , H01L27/1214
摘要： A photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15 % by weight of a curing agent, and a remainder of an organic solvent. A method of forming a metal pattern includes coating a photoresist composition on a base substrate having a metal layer, and forming a first photoresist film. The photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15% by weight of a curing agent, and a remainder of an organic solvent. The first photoresist film is patterned, and forms a first photo pattern. The base substrate having the first photo pattern is heated, and forms a first baked pattern. The metal layer is patterned using the first baked pattern, and forms a metal pattern.
摘要翻译：光致抗蚀剂组合物包含5重量％至50重量％的碱溶性树脂，0.5重量％至30重量％的醌二叠氮化合物，0.1重量％至15重量％的固化剂，以及剩余的有机溶剂。形成金属图案的方法包括在具有金属层的基底衬底上涂覆光致抗蚀剂组合物，并形成第一光致抗蚀剂膜。光致抗蚀剂组合物包含5重量％至50重量％的碱溶性树脂，0.5重量％至30重量％的醌二叠氮化合物，0.1重量％至15重量％的固化剂，剩余的有机溶剂。对第一光致抗蚀剂膜进行图案化，并形成第一照相图案。具有第一照片图案的基底基板被加热，并形成第一烘烤图案。使用第一烘烤图案对金属层进行图案化，并形成金属图案。

7. 发明申请

US20090258497A1 PHOTORESIST RESIN, AND METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING DISPLAY PANEL USING THE SAME 审中-公开
标题翻译：光电树脂，以及形成图案的方法和使用其制造显示面板的方法
公开(公告)号：US20090258497A1
公开(公告)日：2009-10-15
申请号：US12389296
申请日：2009-02-19
申请人： Jeong-Min Park , Doo-Hee Jung , Jung-Soo Lee , Hi-Kuk Lee , Sae-Tae Oh , Jae-Young Choi , Doek-Man Kang
发明人： Jeong-Min Park , Doo-Hee Jung , Jung-Soo Lee , Hi-Kuk Lee , Sae-Tae Oh , Jae-Young Choi , Doek-Man Kang
IPC分类号： H01L21/311 , G03F7/00
CPC分类号： G03F7/0236 , G03F7/0007
摘要： A photoresist resin composition, a method for forming a pattern and a method for manufacturing a display panel using the photoresist resin composition are disclosed. The photoresist resin composition includes an alkali soluble resin, a photoresist compound, and a solvent, wherein the alkali soluble resin includes a first polymer resin represented by the following Chemical Formula 1, wherein, of R1, R2, R3, R4, R5 and R6, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen, and of R7, R8, R9, R10 and R11, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen.
摘要翻译：公开了光致抗蚀剂树脂组合物，形成图案的方法和使用该光致抗蚀剂树脂组合物的显示面板的制造方法。光致抗蚀剂树脂组合物包括碱溶性树脂，光致抗蚀剂化合物和溶剂，其中碱溶性树脂包括由以下化学式1表示的第一聚合物树脂，其中R1，R2，R3，R4，R5和R6 至少一个是羟基，至少两个是甲基，任何剩余的基团是氢，R7，R8，R9，R10和R11中的至少一个是羟基，至少两个是甲基，任何剩余的基团是氢。

8. 发明授权

US07927897B2 Photoresist composition and method of manufacturing array substrate using the same 有权
标题翻译：光刻胶组合物及其制造方法
公开(公告)号：US07927897B2
公开(公告)日：2011-04-19
申请号：US12327215
申请日：2008-12-03
申请人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
发明人： Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
IPC分类号： H01L21/00
CPC分类号： H01L27/1288 , G03F7/0233 , H01L27/1214
摘要： A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
摘要翻译：光致抗蚀剂组合物包括粘合剂树脂，光酸产生剂，具有四种不同类型的单体的丙烯酸树脂和溶剂。

9. 发明授权

US07172996B2 Cleaning agent composition for a positive or a negative photoresist 有权
标题翻译：用于正性或负性光致抗蚀剂的清洁剂组合物
公开(公告)号：US07172996B2
公开(公告)日：2007-02-06
申请号：US10500752
申请日：2003-01-09
申请人： Sae-Tae Oh , Doek-Man Kang , Kyung-Soo Choi
发明人： Sae-Tae Oh , Doek-Man Kang , Kyung-Soo Choi
IPC分类号： C11D7/50
CPC分类号： C11D7/264 , C11D3/3707 , C11D7/263 , C11D7/3263 , C11D7/3281 , C11D11/0047 , G03F7/168
摘要： The present invention relates to a composition for cleaning a photoresist and is to provide a cleaning composition wherein the residue of the photoresist does not remain on the boundary surface between the cleaned area and the not-cleaned area after a negative photoresist containing pigment is cleaned, soft-baked, exposed and developed. The present invention provides a composition for cleaning a positive or negative photoresist which comprises (a) from 0.1 to 20 wt. % of and alkyl oxide polymer with a molecular weight of from 50 to 2000 and (b) from 80 to 99.9 wt. % of an organic solvent comprising: (b−1) from 1 to 20 parts by weight of dipropylene glycol methyl ether (DPGME), from 10 to 50 parts by weight of N-methyl pyrolidone (NMP) and from 50 to 90 parts by weight of methyl isobutyl ketone (MIBK), or (b−2) from 10 to 90 parts by weight of dimethyl formaldehyde (DMF) or dimethylacetamide (DMAc) and from 10 to 50 parts by weight of n-butyl acetate.
摘要翻译：本发明涉及一种用于清洁光致抗蚀剂的组合物，并且提供一种清洁组合物，其中在清洁含有负性光致抗蚀剂的颜料之后，光致抗蚀剂的残留物不残留在清洁区域和未清洁区域之间的边界表面上，软烤，暴露和发达。本发明提供一种用于清洗正性或负性光致抗蚀剂的组合物，其包含（a）0.1-20wt。％和分子量为50至2000的烷基氧化物聚合物和（b）80至99.9重量％％的有机溶剂含有：（b-1）1〜20重量份二丙二醇甲基醚（DPGME），10〜50重量份N-甲基吡咯烷酮（NMP）和50〜90重量份甲基异丁基酮（MIBK）的重量，或（b-2）10至90重量份的二甲基甲醛（DMF）或二甲基乙酰胺（DMAc）和10至50重量份的乙酸正丁酯。

10. 发明授权

US08652749B2 Photoresist composition and method of forming pattern by using the same 有权
标题翻译：光刻胶组合物及使用其形成图案的方法
公开(公告)号：US08652749B2
公开(公告)日：2014-02-18
申请号：US13037212
申请日：2011-02-28
申请人： Hi-Kuk Lee , Sang-Hyun Yun , Cha-Dong Kim , Jung-In Park , Deok-Man Kang , Youn-Suk Kim , Sae-Tae Oh
发明人： Hi-Kuk Lee , Sang-Hyun Yun , Cha-Dong Kim , Jung-In Park , Deok-Man Kang , Youn-Suk Kim , Sae-Tae Oh
IPC分类号： G03F7/023 , G03F7/30
CPC分类号： G03F7/30 , G03F7/022 , G03F7/0236 , H01L27/1288 , H01L29/41733
摘要： A photoresist composition is provided. The photoresist composition includes an alkali-soluble resin; a photosensitizer containing a first compound that contains a diazonaphthoquinone represented by Formula 1 and a second compound that contains a diazonaphthoquinone represented by Formula 2; and a solvent. and R1 is selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 4 carbons, an alkenyl group having 2 to 4 carbons, a cycloalkyl group having 3 to 8 carbons, and an aryl group having 6 to 12 carbons, and R2 is selected from the group consisting of Cl, F, Br, and I.
摘要翻译：提供光致抗蚀剂组合物。光致抗蚀剂组合物包括碱溶性树脂; 含有含有由式1表示的重氮萘醌的第一化合物和含有由式2表示的重氮萘醌的第二化合物的光敏剂; 和溶剂。 R 1选自氢原子，碳原子数1〜4的烷基，碳原子数2〜4的烯基，碳原子数3〜8的环烷基，碳原子数6〜12的芳基，并且R 2选自Cl，F，Br和I.

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