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1. 发明申请

US20150048261A1 APPARATUS FOR IRRADIATING A SUBSTRATE 有权
标题翻译：辐射基板的装置
公开(公告)号：US20150048261A1
公开(公告)日：2015-02-19
申请号：US14388021
申请日：2013-01-18
申请人： Heraeus Noblelight GmbH
发明人： Sven Linow , Larisa von Riewel
IPC分类号： B01J19/12 , B05D3/06
CPC分类号： B01J19/128 , B05D3/06 , H01L21/67115
摘要： Known apparatuses for irradiating a substrate include a receptacle for the substrate to be irradiated having a circular irradiation surface and a first optical emitter having at least one emitter tube arranged in an illumination plane extending parallel to the irradiation surface. The illumination length of the emitter tube includes a middle section and two end sections, the length of the middle section accounting for at least 50% of the illumination length. The receptacle and the optical emitter are movable relative to each other. An apparatus for thermal treatment of a substrate, enabling homogeneous and/or rotationally symmetrical heating of the substrate and requiring less complexity in its design and control technology, includes a middle section of the emitter tube having a steadily decreasing curvature, provided that the illumination length of the emitter tube extends over an angle of curvature of less than 2π.
摘要翻译：用于照射基板的已知装置包括：具有圆形照射表面的待照射基板的容器和具有布置在平行于照射表面延伸的照明平面中的至少一个发射管的第一光发射器。发射管的照明长度包括中间部分和两个端部部分，中间部分的长度占照明长度的至少50％。插座和光发射器可相对于彼此移动。一种用于对基底进行热处理的设备，使得能够均匀和/或旋转对称地加热基底并且在其设计和控制技术中需要更少的复杂性，包括发射管的中间部分具有稳定降低的曲率，条件是照明长度的发射管延伸超过小于2＆pgr的曲率角。

2. 发明申请

US20150010294A1 DEVICE FOR HEAT TREATMENT 有权
标题翻译：热处理装置
公开(公告)号：US20150010294A1
公开(公告)日：2015-01-08
申请号：US14379127
申请日：2013-01-12
申请人： Heraeus Noblelight GmbH
发明人： Jürgen Weber , Frank Diehl , Sven Linow
IPC分类号： F27D1/00 , H05B6/00 , H05B3/62
CPC分类号： F27D1/00 , F27D1/0006 , H05B3/62 , H05B6/00
摘要： Known devices for heat treatment comprise a process space surrounded by a furnace lining made of quartz glass, a heating facility, and a reflector. In order to provide, on this basis, a device for heat treatment having a furnace lining that can be manufactured easily and in variable shapes and enables rapid heating and cooling of the material to be heated and short process times and is characterised by its long service life, the invention proposes that the furnace lining comprises multiple wall elements having a side facing the process space and a side facing away from the process space, and that at least one of the wall elements comprises multiple quartz glass tubes that are connected to each other by means of an SiO2-containing connecting mass.
摘要翻译：用于热处理的已知装置包括由石英玻璃制成的炉衬围，加热设备和反射器包围的处理空间。为了在此基础上提供一种具有炉衬的热处理装置，其可以容易地制造并且具有可变形状并且能够快速加热和冷却被加热材料并且加工时间短，并且其特征在于其长期使用本发明提出炉膛包括多个壁元件，其具有面向处理空间的侧面和背离处理空间的一侧，并且至少一个壁元件包括彼此连接的多个石英玻璃管通过含SiO 2的连接质量。

3. 发明授权

US10322964B2 Method for producing a reflector on a reflector base made of glass 有权
公开(公告)号：US10322964B2
公开(公告)日：2019-06-18
申请号：US15527495
申请日：2015-11-02
申请人： Heraeus Noblelight GmbH
发明人： Sven Linow , Jürgen Weber , Jörg Bressem
IPC分类号： C03C17/10 , C03C17/00 , B41J3/407
摘要： A method for producing a reflector on a reflector base made of glass is provided. According to the method, a metal-containing coating fluid is deposited on a coating surface and subjected to a burning-in treatment at a temperature below a softening temperature of the glass forming the reflector layer. Deposition of the coating fluid proceeds using a contactless method by inkjet technology. This makes it possible to deposit a reflector layer in a reproducible way and with tight tolerances having a specified layer thickness, as well as to create clean edges without a printing block or similar device. The coating fluid is moved by a print head equipped with a plurality of nozzles and is movable in a movement plane relative to the coating surface. The coating fluid is sprayed onto the coating surface by the print head under pressure and in the form of droplets emerging from the nozzles.

4. 发明授权

US09832817B2 Device for irradiating a substrate 有权
公开(公告)号：US09832817B2
公开(公告)日：2017-11-28
申请号：US14416958
申请日：2013-07-17
申请人： Heraeus Noblelight GmbH
发明人： Larisa Von Riewel , Sven Linow
IPC分类号： F26B3/30 , H05B3/00 , H01L21/67
CPC分类号： H05B3/0047 , H01L21/67115
摘要： Known apparatuses for irradiating a substrate include a housing and, within the housing, a receptacle for the substrate having a circular irradiation surface and a first emitter for generating optical radiation having a first emitter tube arranged in a plane of curvature extending parallel to the irradiation surface and having an emitter tube end, whereby the receptacle and the first emitter can be moved with respect to each other. In these apparatuses, the irradiation surface includes first and second semi-circular surface portions. An improvement of the known apparatuses, which enables the substrate to have a rotationally symmetrical, homogeneous temperature distribution while keeping the complexity of design and control technology minimal, provides a first emitter tube having a curved illumination length section, extending with a mirror symmetrical-oval basic shape in the plane of curvature, wherein the first illumination length section is associated essentially with one of the semicircular surface portions.

5. 发明授权

US09248425B2 Apparatus for irradiating a substrate 有权
标题翻译：用于照射基板的装置
公开(公告)号：US09248425B2
公开(公告)日：2016-02-02
申请号：US14388021
申请日：2013-01-18
申请人： Heraeus Noblelight GmbH
发明人： Sven Linow , Larisa von Riewel
IPC分类号： G21K5/00 , B01J19/12 , H01L21/67 , B05D3/06
CPC分类号： B01J19/128 , B05D3/06 , H01L21/67115
摘要： Known apparatuses for irradiating a substrate include a receptacle for the substrate to be irradiated having a circular irradiation surface and a first optical emitter having at least one emitter tube arranged in an illumination plane extending parallel to the irradiation surface. The illumination length of the emitter tube includes a middle section and two end sections, the length of the middle section accounting for at least 50% of the illumination length. The receptacle and the optical emitter are movable relative to each other. An apparatus for thermal treatment of a substrate, enabling ho-mogeneous and/or rotationally symmetrical heating of the substrate and requiring less complexity in its design and control technology, includes a middle section of the emitter tube having a steadily decreasing curvature, provided that the illumination length of the emitter tube extends over an angle of curvature of less than 2π.
摘要翻译：用于照射基板的已知装置包括：具有圆形照射表面的待照射基板的容器和具有布置在平行于照射表面延伸的照明平面中的至少一个发射管的第一光发射器。发射管的照明长度包括中间部分和两个端部部分，中间部分的长度占照明长度的至少50％。插座和光发射器可相对于彼此移动。一种用于对基底进行热处理的设备，使得能够对基板进行高温和/或旋转对称的加热并且在其设计和控制技术中需要更少的复杂性，包括具有稳定降低的曲率的发射管的中间部分，发射管的照射长度在小于2＆pgr的曲率角上延伸。

6. 发明申请

US20150181651A1 DEVICE FOR IRRADIATING A SUBSTRATE 有权
标题翻译：辐射基板的装置
公开(公告)号：US20150181651A1
公开(公告)日：2015-06-25
申请号：US14416958
申请日：2013-07-17
申请人： Heraeus noblelight GmbH
发明人： Larisa Von Riewel , Sven Linow
IPC分类号： H05B3/00
CPC分类号： H05B3/0047 , H01L21/67115
摘要： Known apparatuses for irradiating a substrate include a housing and, within the housing, a receptacle for the substrate having a circular irradiation surface and a first emitter for generating optical radiation having a first emitter tube arranged in a plane of curvature extending parallel to the irradiation surface and having an emitter tube end, whereby the receptacle and the first emitter can be moved with respect to each other. In these apparatuses, the irradiation surface includes first and second semi-circular surface portions. An improvement of the known apparatuses, which enables the substrate to have a rotationally symmetrical, homogeneous temperature distribution while keeping the complexity of design and control technology minimal, provides a first emitter tube having a curved illumination length section, extending with a mirror symmetrical-oval basic shape in the plane of curvature, wherein the first illumination length section is associated essentially with one of the semicircular surface portions.
摘要翻译：用于照射基板的已知装置包括壳体，并且在壳体内具有用于具有圆形辐射表面的基板的插座和用于产生光辐射的第一发射器，其具有布置在平行于照射表面延伸的曲率平面中的第一发射管并且具有发射器管端，由此可以使插座和第一发射器相对于彼此移动。在这些设备中，照射表面包括第一和第二半圆形表面部分。已知装置的改进使得基板具有旋转对称的均匀的温度分布，同时将设计和控制技术的复杂性保持在最小限度，提供了具有弯曲的照明长度部分的第一发射管，其以镜对称椭圆在曲率平面中的基本形状，其中第一照明长度部分基本上与半圆形表面部分中的一个相关联。

7. 发明授权

US10112237B2 Device for drying and sintering metal-containing ink on a substrate 有权
公开(公告)号：US10112237B2
公开(公告)日：2018-10-30
申请号：US14787718
申请日：2014-04-10
申请人： Heraeus Noblelight GmbH
发明人： Holger Zissing , Jürgen Weber , Sven Linow , Oliver Weiss
IPC分类号： B22F3/10 , B22F7/00 , B22F7/08 , F27B9/06 , F27B9/12 , F27B9/36 , F26B3/30 , H01L21/67 , H05K3/12 , H05K3/22 , H01L21/677 , H05K1/09
摘要： A device for drying and sintering metal-containing ink on a substrate enables homogeneous irradiation of the substrate, has compact construction, and is simple and economical to produce. Optical infrared radiators have a cylindrical radiator tube and a longitudinal axis, and emit radiation having an IR-B radiation component of at least 30% and an IR-C radiation component of at least 5% of total radiator output power. The radiators are arranged in a module with their longitudinal axes running parallel to each other and transverse to the transport direction. They thereby irradiate on the surface of the substrate an irradiation field, which is divided into a drying zone and a sintering zone arranged downstream of the drying zone in the transport direction. The drying zone is exposed to at least 15% less average irradiation density than the sintering zone along a center axis running in the transport direction.

8. 发明授权

US09976807B2 Device for heat treatment 有权
公开(公告)号：US09976807B2
公开(公告)日：2018-05-22
申请号：US14379127
申请日：2013-01-12
申请人： Heraeus Noblelight GmbH
发明人： Jürgen Weber , Frank Diehl , Sven Linow
IPC分类号： A21B2/00 , F27D1/00 , H05B3/62 , H05B6/00
CPC分类号： F27D1/00 , F27D1/0006 , H05B3/62 , H05B6/00
摘要： Known devices for heat treatment comprise a process space surrounded by a furnace lining made of quartz glass, a heating facility, and a reflector. In order to provide, on this basis, a device for heat treatment having a furnace lining that can be manufactured easily and in variable shapes and enables rapid heating and cooling of the material to be heated and short process times and is characterized by its long service life, the invention proposes that the furnace lining comprises multiple wall elements having a side facing the process space and a side facing away from the process space, and that at least one of the wall elements comprises multiple quartz glass tubes that are connected to each other by means of an SiO2-containing connecting mass.

9. 发明授权

US09426947B2 Irradiation device for irradiating plants 有权
标题翻译：照射植物的照射装置
公开(公告)号：US09426947B2
公开(公告)日：2016-08-30
申请号：US14649931
申请日：2013-12-06
申请人： Heraeus Noblelight GmbH
发明人： Oliver Weiss , Sven Linow
IPC分类号： G21K5/04 , A01G7/04
CPC分类号： A01G7/045 , Y02P60/146
摘要： A device is provided which ensures uniform irradiation of plants with infrared radiation along with ultraviolet and/or visible radiation and requires a small number of infrared emitters relative to the cultivation area. The infrared emitters are designed for temperatures of 800° C. to 1800° C. Each has a cylindrical emitter tube having a length of 50 mm to 500 mm. The emitter tubes extend parallel to one another in an emitter zone located above the culture plane. The infrared emitter occupation density relative to the area of the culture plane is between 0.2 m−2 and 1.0 m−2. Irradiation regions of adjacent infrared emitters on the culture plane overlap such that average irradiance on the culture plane is between 10 watt/m2 and 100 watt/m2 with a variation range of a maximum of 50%. A reflector facing a structural space is assigned to a top side of the emitter tube.
摘要翻译：提供一种设备，其确保具有红外辐射以及紫外线和/或可见光辐射的植物的均匀照射，并且相对于培养区域需要少量的红外发射器。红外线发射器设计用于800°C至1800°C的温度。每个都有一个长度为50 mm至500 mm的圆柱形发射管。发射管在位于培养平面上方的发射区中彼此平行延伸。相对于培养平面面积的红外发射器占有密度在0.2m-2和1.0m-2之间。培养平面上的相邻红外发射体的照射区域重叠，使得培养平面上的平均辐照度为10瓦特/平方米至100瓦特/平方米，变化范围最大为50％。面向结构空间的反射器分配给发射管的顶侧。

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