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1. 发明授权

US06186632B1 Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography 有权
标题翻译：环形深紫外和极紫外光刻的冷凝器
公开(公告)号：US06186632B1
公开(公告)日：2001-02-13
申请号：US09224934
申请日：1998-12-31
申请人： Henry N. Chapman , Keith A. Nugent
发明人： Henry N. Chapman , Keith A. Nugent
IPC分类号： G02B508
CPC分类号： G03F7/70075 , G03F7/702
摘要： A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated beam at grazing incidence. The ripple plate comprises a plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.
摘要翻译：一种用于环形深紫外或极紫外光刻系统的冷凝器。聚光器包括波纹板反射镜，其在掠射入射下被准直光束照射。波纹板包括平板反射镜，其中沿着反射镜的轴线形成有一系列通道，以产生呈波状图案的一系列凹面。沿镜子通道的光线反射到一系列锥体上。波纹板上的斜率分布导致入射光束的反射角分布。这种分布具有弧形的形式，电弧的极值由波纹板中最大的斜率给出。成像镜将该分布聚焦在掩模平面上的环形场弧。

2. 发明授权

US06398374B1 Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography 有权
标题翻译：用于环形深紫外线和极紫外光刻的冷凝器
公开(公告)号：US06398374B1
公开(公告)日：2002-06-04
申请号：US09525623
申请日：2000-03-14
申请人： Henry N. Chapman , Keith A. Nugent
发明人： Henry N. Chapman , Keith A. Nugent
IPC分类号： G02B508
CPC分类号： G03F7/702 , G03F7/70075 , G21K1/06
摘要： A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.
摘要翻译：一种用于环形深紫外或极紫外光刻系统的冷凝器。聚光器包括波纹板反射镜，其在放射入射时被准直或会聚的光束照射。波纹板包括平面或弯曲的平板反射镜，沿着反射镜的轴线形成有一系列通道，以产生呈波状图案的一系列凹面。沿镜子通道的光线反射到一系列锥体上。波纹板上的斜率分布导致入射光束的反射角分布。这种分布具有弧形的形式，电弧的极值由波纹板中最大的斜率给出。成像镜将该分布聚焦在掩模平面上的环形场弧。

3. 发明授权

US06967168B2 Method to repair localized amplitude defects in a EUV lithography mask blank 有权
标题翻译：在EUV光刻掩模板中修复局部幅度缺陷的方法
公开(公告)号：US06967168B2
公开(公告)日：2005-11-22
申请号：US09896722
申请日：2001-06-29
申请人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi , Henry N. Chapman
发明人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi , Henry N. Chapman
IPC分类号： G21K1/06 , G01Q60/00 , G02B5/08 , G02B5/28 , G03F1/24 , G03F1/74 , H01L21/027 , H01L21/20
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G02B5/0891 , G02B5/285 , G03F1/74
摘要： A method and apparatus are provided for the repair of an amplitude defect in a multilayer coating. A significant number of layers underneath the amplitude defect are undamaged. The repair technique restores the local reflectivity of the coating by physically removing the defect and leaving a wide, shallow crater that exposes the underlying intact layers. The particle, pit or scratch is first removed the remaining damaged region is etched away without disturbing the intact underlying layers.
摘要翻译：提供了一种用于修复多层涂层中的振幅缺陷的方法和装置。振幅缺陷下方的相当数量的层没有损坏。修复技术通过物理去除缺陷并留下暴露下面完整层的宽而浅的凹坑来恢复涂层的局部反射率。首先去除颗粒，凹坑或划痕，剩余的损伤区域被蚀刻掉，而不会干扰完整的下层。

4. 发明申请

US20090116619A1 Area x-ray or UV camera system for high-intensity beams 失效
标题翻译：用于高强度光束的区域X射线或UV摄像系统
公开(公告)号：US20090116619A1
公开(公告)日：2009-05-07
申请号：US12121177
申请日：2008-05-15
申请人： Henry N. Chapman , Sasa Bajt , Eberhard A. Spiller , Stefan Hau-Riege , Stefano Marchesini
发明人： Henry N. Chapman , Sasa Bajt , Eberhard A. Spiller , Stefan Hau-Riege , Stefano Marchesini
IPC分类号： G21K1/00 , G01J1/42 , G01J1/44
CPC分类号： G01J1/429 , G01J1/04 , G01J1/0414 , G01J1/0455 , G01J1/4228 , G01N21/4788 , G21K2207/00
摘要： A system in one embodiment includes a source for directing a beam of radiation at a sample; a multilayer mirror having a face oriented at an angle of less than 90 degrees from an axis of the beam from the source, the mirror reflecting at least a portion of the radiation after the beam encounters a sample; and a pixellated detector for detecting radiation reflected by the mirror. A method in a further embodiment includes directing a beam of radiation at a sample; reflecting at least some of the radiation diffracted by the sample; not reflecting at least a majority of the radiation that is not diffracted by the sample; and detecting at least some of the reflected radiation. A method in yet another embodiment includes directing a beam of radiation at a sample; reflecting at least some of the radiation diffracted by the sample using a multilayer mirror; and detecting at least some of the reflected radiation.
摘要翻译：一个实施例中的系统包括用于在样本处引导辐射束的源; 多层反射镜，其具有朝向与源的光束的轴线成小于90度的角度定向的面，反射镜在光束遇到样本之后反射至少一部分辐射; 以及用于检测由反射镜反射的辐射的像素化检测器。另一实施例中的方法包括将样品的辐射束引导; 反映由样品衍射的至少一些辐射; 不反映不被样品衍射的辐射的至少大部分; 以及检测所述反射辐射中的至少一些。另一实施例中的方法包括将样品的辐射束引导; 使用多层反射镜反射由样品衍射的至少一些辐射; 以及检测所述反射辐射中的至少一些。

5. 发明授权

US06875543B2 Etched-multilayer phase shifting masks for EUV lithography 有权
标题翻译：用于EUV光刻的蚀刻多层相移掩模
公开(公告)号：US06875543B2
公开(公告)日：2005-04-05
申请号：US10256377
申请日：2002-09-27
申请人： Henry N. Chapman , John S. Taylor
发明人： Henry N. Chapman , John S. Taylor
IPC分类号： G03F1/24 , G03F1/34 , G03F9/00
CPC分类号： G03F1/34 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： A method is disclosed for the implementation of phase shifting masks for EUV lithography. The method involves directly etching material away from the multilayer coating of the mask, to cause a refractive phase shift in the mask. By etching into the multilayer (for example, by reactive ion etching), rather than depositing extra material on the top of the multilayer, there will be minimal absorption loss associated with the phase shift.
摘要翻译：公开了一种用于实施用于EUV光刻的相移掩模的方法。该方法包括直接将掩模材料远离掩模的多层涂层，以在掩模中引起折射相移。通过蚀刻到多层（例如，通过反应离子蚀刻），而不是在多层的顶部上沉积额外的材料，将存在与相移相关联的最小吸收损失。

6. 发明授权

US07672430B2 Area X-ray or UV camera system for high-intensity beams 失效
标题翻译：用于高强度光束的区域X射线或UV摄像系统
公开(公告)号：US07672430B2
公开(公告)日：2010-03-02
申请号：US12121177
申请日：2008-05-15
申请人： Henry N. Chapman , Sasa Bajt , Eberhard A. Spiller , Stefan Hau-Riege , Stefano Marchesini
发明人： Henry N. Chapman , Sasa Bajt , Eberhard A. Spiller , Stefan Hau-Riege , Stefano Marchesini
IPC分类号： G01N23/20
CPC分类号： G01J1/429 , G01J1/04 , G01J1/0414 , G01J1/0455 , G01J1/4228 , G01N21/4788 , G21K2207/00
摘要： A system in one embodiment includes a source for directing a beam of radiation at a sample; a multilayer mirror having a face oriented at an angle of less than 90 degrees from an axis of the beam from the source, the mirror reflecting at least a portion of the radiation after the beam encounters a sample; and a pixellated detector for detecting radiation reflected by the mirror. A method in a further embodiment includes directing a beam of radiation at a sample; reflecting at least some of the radiation diffracted by the sample; not reflecting at least a majority of the radiation that is not diffracted by the sample; and detecting at least some of the reflected radiation. A method in yet another embodiment includes directing a beam of radiation at a sample; reflecting at least some of the radiation diffracted by the sample using a multilayer mirror; and detecting at least some of the reflected radiation.
摘要翻译：一个实施例中的系统包括用于在样本处引导辐射束的源; 多层反射镜，其具有朝向与源的光束的轴线成小于90度的角度定向的面，反射镜在光束遇到样本之后反射至少一部分辐射; 以及用于检测由反射镜反射的辐射的像素化检测器。另一实施例中的方法包括将样品的辐射束引导; 反映由样品衍射的至少一些辐射; 不反映不被样品衍射的辐射的至少大部分; 以及检测所述反射辐射中的至少一些。另一实施例中的方法包括将样品的辐射束引导; 使用多层反射镜反射由样品衍射的至少一些辐射; 以及检测所述反射辐射中的至少一些。

7. 发明授权

US07662263B2 Figure correction of multilayer coated optics 有权
标题翻译：多层涂层光学元件的图校正
公开(公告)号：US07662263B2
公开(公告)日：2010-02-16
申请号：US10256317
申请日：2002-09-27
申请人： Henry N. Chapman , John S. Taylor
发明人： Henry N. Chapman , John S. Taylor
IPC分类号： C23C14/34 , G03F1/00
CPC分类号： G03F7/70958 , G01B11/0616 , G01B11/306
摘要： A process is provided for producing near-perfect optical surfaces, for EUV and soft-x-ray optics. The method involves polishing or otherwise figuring the multilayer coating that has been deposited on an optical substrate, in order to correct for errors in the figure of the substrate and coating. A method such as ion-beam milling is used to remove material from the multilayer coating by an amount that varies in a specified way across the substrate. The phase of the EUV light that is reflected from the multilayer will be affected by the amount of multilayer material removed, but this effect will be reduced by a factor of 1−n as compared with height variations of the substrate, where n is the average refractive index of the multilayer.
摘要翻译：提供了一种用于产生近乎完美的光学表面的方法，用于EUV和软X射线光学器件。该方法涉及抛光或以其它方式绘制已经沉积在光学基底上的多层涂层，以便校正基底和涂层的图中的误差。使用诸如离子束研磨的方法从多层涂层去除材料，其量以指定的方式跨越衬底变化。从多层反射的EUV光的相位将受去除的多层材料的量的影响，但与衬底的高度变化相比，该效应将降低1-n因子，其中n是平均值多层的折射率。

8. 发明授权

US07236565B2 Tamper to delay motion and decrease ionization of a sample during short pulse x-ray imaging 失效
标题翻译：篡改在短脉冲X射线成像期间延迟运动并减少样品的电离
公开(公告)号：US07236565B2
公开(公告)日：2007-06-26
申请号：US11134207
申请日：2005-05-17
申请人： Richard A. London , Abraham Szoke , Stefan P. Hau-Riege , Henry N. Chapman
发明人： Richard A. London , Abraham Szoke , Stefan P. Hau-Riege , Henry N. Chapman
IPC分类号： G01N23/04
CPC分类号： G01N23/10
摘要： A system for x-ray imaging of a small sample comprising positioning a tamper so that it is operatively connected to the sample, directing short intense x-ray pulses onto the tamper and the sample, and detecting an image from the sample. The tamper delays the explosive motion of the sample during irradiation by the short intense x-ray pulses, thereby extending the time to obtain an x-ray image of the original structure of the sample.
摘要翻译：一种用于小样品的x射线成像的系统，包括定位捣固器，使得其可操作地连接到样品，将短的强烈X射线脉冲引导到篡改和样品上，并且检测来自样品的图像。篡改在短时间强烈的X射线脉冲照射期间延迟了样品的爆炸运动，从而延长了获得样品原始结构的X射线图像的时间。

9. 发明授权

US07050237B2 High-efficiency spectral purity filter for EUV lithography 失效
标题翻译：用于EUV光刻的高效光谱纯度滤光片
公开(公告)号：US07050237B2
公开(公告)日：2006-05-23
申请号：US10862127
申请日：2004-06-02
申请人： Henry N. Chapman
发明人： Henry N. Chapman
IPC分类号： G02B5/18
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70575 , G21K1/062
摘要： An asymmetric-cut multilayer diffracts EUV light. A multilayer cut at an angle has the same properties as a blazed grating, and has been demonstrated to have near-perfect performance. Instead of having to nano-fabricate a grating structure with imperfections no greater than several tens of nanometers, a thick multilayer is grown on a substrate and then cut at an inclined angle using coarse and inexpensive methods. Effective grating periods can be produced this way that are 10 to 100 times smaller than those produced today, and the diffraction efficiency of these asymmetric multilayers is higher than conventional gratings. Besides their ease of manufacture, the use of an asymmetric multilayer as a spectral purity filter does not require that the design of an EUV optical system be modified in any way, unlike the proposed use of blazed gratings for such systems.
摘要翻译：不对称切割多层衍射EUV光。一个角度的多层切割具有与闪耀的光栅相同的性质，并且已被证明具有接近完美的性能。不需要纳米制造不超过几十纳米的缺陷的光栅结构，在基板上生长厚的多层，然后使用粗略和便宜的方法以倾斜角切割。有效的光栅周期可以以这样的方式产生，比现在产生的小10至100倍，这些不对称多层的衍射效率高于常规光栅。除了易于制造之外，使用不对称多层作为光谱纯度滤光片不需要以任何方式修改EUV光学系统的设计，这与用于这种系统的闪耀光栅的建议使用不同。

10. 发明授权

US5986795A Deformable mirror for short wavelength applications 失效
标题翻译：适用于短波长应用的变形镜
公开(公告)号：US5986795A
公开(公告)日：1999-11-16
申请号：US98024
申请日：1998-06-15
申请人： Henry N. Chapman , Donald W. Sweeney
发明人： Henry N. Chapman , Donald W. Sweeney
IPC分类号： G02B26/06 , G03F7/20 , G02B26/08
CPC分类号： G03F7/70233 , G02B26/06 , G03F7/70266
摘要： A deformable mirror compatible with short wavelength (extreme ultraviolet) radiation that can be precisely controlled to nanometer and subnanometer accuracy is described. Actuators are coupled between a reaction plate and a face plate which has a reflective coating. A control system adjusts the voltage supplied to the actuators; by coordinating the voltages supplied to the actuators, the reflective surface of the mirror can be deformed to correct for dimensional errors in the mirror or to produce a desired contour.
摘要翻译：描述了可以精确控制到纳米和亚纳米计精度的短波长（极紫外）辐射兼容的可变形反射镜。致动器耦合在具有反射涂层的反应板和面板之间。控制系统调节供应给致动器的电压; 通过协调提供给致动器的电压，反射镜的反射表面可以变形以校正反射镜中的尺寸误差或产生期望的轮廓。

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