会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Sub-lithographic printing method
    • 亚平版印刷法
    • US08421194B2
    • 2013-04-16
    • US13006403
    • 2011-01-13
    • Chung H. LamHemantha K. Wickramasinghe
    • Chung H. LamHemantha K. Wickramasinghe
    • H01L29/06
    • H01L21/0337
    • A trench structure and an integrated circuit comprising sub-lithographic trench structures in a substrate. In one embodiment the trench structure is created by forming sets of trenches with a lithographic mask and filling the sets of trenches with sets of step spacer blocks comprising two alternating spacer materials which are separately removable from each other. In one embodiment, the trench structures formed are one-nth the thickness of the lithographic mask's feature size. The size of the trench structures being dependent on the thickness and number of spacer material layers used to form the set of step spacer blocks. The number of spacer material layers being n/2 and the thickness of each spacer material layer being one-nth of the lithographic mask's feature size.
    • 沟槽结构和集成电路,其包括衬底中的次光刻沟槽结构。 在一个实施例中,沟槽结构是通过用光刻掩膜形成一组沟槽而形成的,并且用一组间隔块块填充该组沟槽,该组间隔块包括彼此分离地可拆卸的两个交替间隔物材料。 在一个实施例中,形成的沟槽结构是光刻掩模的特征尺寸的厚度的十分之一。 沟槽结构的尺寸取决于用于形成一组步进间隔块的间隔材料层的厚度和数量。 间隔材料层的数量为n / 2,每个间隔材料层的厚度为光刻掩模的特征尺寸的十分之一。
    • 2. 发明申请
    • SUB-LITHOGRAPHIC PRINTING METHOD
    • 分层印刷方法
    • US20110108960A1
    • 2011-05-12
    • US13006403
    • 2011-01-13
    • Chung H. LamHemantha K. Wickramasinghe
    • Chung H. LamHemantha K. Wickramasinghe
    • H01L21/02H01L29/06
    • H01L21/0337
    • A trench structure and an integrated circuit comprising sub-lithographic trench structures in a substrate. In one embodiment the trench structure is created by forming sets of trenches with a lithographic mask and filling the sets of trenches with sets of step spacer blocks comprising two alternating spacer materials which are separately removable from each other. In one embodiment, the trench structures formed are one-nth the thickness of the lithographic mask's feature size. The size of the trench structures being dependent on the thickness and number of spacer material layers used to form the set of step spacer blocks. The number of spacer material layers being n/2 and the thickness of each spacer material layer being one-nth of the lithographic mask's feature size.
    • 沟槽结构和集成电路,其包括衬底中的次光刻沟槽结构。 在一个实施例中,沟槽结构是通过用光刻掩膜形成一组沟槽而形成的,并且用一组间隔块块填充该组沟槽,该组间隔块包括彼此分离地可拆卸的两个交替间隔物材料。 在一个实施例中,形成的沟槽结构是光刻掩模的特征尺寸的厚度的十分之一。 沟槽结构的尺寸取决于用于形成一组步进间隔块的间隔材料层的厚度和数量。 间隔材料层的数量为n / 2,每个间隔材料层的厚度为光刻掩模的特征尺寸的十分之一。
    • 6. 发明授权
    • Method and apparatus to separate molecules according to their mobilities
    • 根据其迁移率分离分子的方法和装置
    • US07579149B2
    • 2009-08-25
    • US11047250
    • 2005-01-31
    • Jane E. FrommerKerem UnalHemantha K. Wickramasinghe
    • Jane E. FrommerKerem UnalHemantha K. Wickramasinghe
    • C12Q1/68C12P19/34C12M23/00B01D57/02
    • G01N27/44791B82Y15/00
    • A method and apparatus for separating molecules comprises placing different kinds of molecular species onto a probe; and introducing an electric field between the probe and a surface in proximity with the probe so that the different kinds of molecular species may be separated, wherein the different kinds of molecular species have differing mobilities, and wherein the different kinds of molecular species may be separated according to their differing mobilities, such that molecular species that have different mobilities migrate along the probe at different speeds towards the surface. The molecular species may comprise molecules. Alternatively, the molecular species may comprise molecular assemblies, wherein the molecular assemblies may comprise at least one of cells, bacteria, and viruses.
    • 用于分离分子的方法和装置包括将不同种类的分子物质放置在探针上; 并且在所述探针与所述探针附近的表面之间引入电场,使得可以分离所述不同种类的分子种类,其中所述不同种类的分子种类具有不同的迁移率,并且其中所述不同种类的分子种类可能被分离 根据它们不同的迁移率,使得具有不同迁移率的分子物质沿着探针以不同的速度朝向表面迁移。 分子种类可以包含分子。 或者,分子种类可以包括分子组装,其中分子组装可以包含细胞,细菌和病毒中的至少一种。