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    • 6. 发明授权
    • Chlorine dioxide treatment for biological tissue
    • 二氧化氯处理生物组织
    • US08703106B2
    • 2014-04-22
    • US13601623
    • 2012-08-31
    • Barry Keven SperonelloLinda HratkoFrank S. CastellanaAndrew Patrick FullMarcos Gomez
    • Barry Keven SperonelloLinda HratkoFrank S. CastellanaAndrew Patrick FullMarcos Gomez
    • A61K33/20A61M37/00A61Q11/00A61P31/00A61K8/20
    • A61K33/20
    • Methods for administration of a substantially non-cytotoxic chlorine dioxide composition to whiten a tooth surface are provided. The method comprises contacting a surface of a tooth with an efficacious amount of a composition comprising chlorine dioxide to provide an efficacious amount of chlorine dioxide to the tooth surface, wherein the contacting step comprises one or more of: i) contacting the tooth surface iteratively with at least two, substantially contiguous applications of a substantially non-cytotoxic composition comprising chlorine dioxide; ii) irrigating the tooth surface using an irrigation device that delivers a substantially non-cytotoxic composition comprising chlorine dioxide, or iii) irrigating the tooth surface using an irrigation device that comprises a chlorine dioxide composition comprising a cytotoxic amount of oxy-chlorine anions; and an oxy-chlorine anion barrier, wherein the irrigation devices delivers a substantially oxy-chlorine anion free chlorine dioxide composition to the tooth surface.
    • 提供了用于施用基本上非细胞毒性的二氧化氯组合物以使牙齿表面变白的方法。 该方法包括使牙齿的表面与有效量的包含二氧化氯的组合物接触以向牙齿表面提供有效量的二氧化氯,其中所述接触步骤包括以下中的一种或多种:i)将牙齿表面与 包含二氧化氯的基本上非细胞毒性组合物的至少两个基本连续的应用; ii)使用提供包含二氧化氯的基本上非细胞毒性组合物的冲洗装置冲洗牙齿表面,或iii)使用包括含有细胞毒性量的氧 - 氯阴离子的二氧化氯组合物的冲洗装置冲洗牙齿表面; 和氧 - 氯阴离子屏障,其中所述冲洗装置将基本上无氯 - 阴离子的二氧化氯组合物递送到所述牙齿表面。
    • 10. 发明授权
    • Patterning crystalline compounds on surfaces
    • 在表面上形成结晶化合物
    • US07795145B2
    • 2010-09-14
    • US11353934
    • 2006-02-15
    • Marcos GomezPeter ErkFrauke RichterZhenan BaoShuhong Liu
    • Marcos GomezPeter ErkFrauke RichterZhenan BaoShuhong Liu
    • H01L21/44
    • H01L51/0003B82Y10/00B82Y30/00B82Y40/00G03F7/0002H01L51/0019H01L51/0068H01L51/0533H01L51/0545
    • A method of patterning the surface of a substrate with at least one organic semiconducting compound including: (a) providing a stamp having a surface including a plurality of indentations formed therein defining an indentation pattern contiguous with a stamping surface and defining a stamping pattern, (b) coating the stamping surface with at least one compound (C1) capable of binding to the surface of the substrate and at least one organic semiconducting compound (S), (c) contacting at least a portion of the surface of a substrate with the stamping surface to allow deposition of the compound (C1) on the substrate, (d) removing the stamping surface to provide a pattern of binding sites on the surface of the substrate, (e) applying a plurality of crystallites of the organic semiconducting compound (S) to the surface of the substrate to bind at least a portion of the applied crystallites to the binding sites on the surface of the substrate.
    • 一种利用至少一种有机半导体化合物对衬底的表面进行图案化的方法,包括:(a)提供具有表面的印模,所述表面包括形成在其中的多个凹口,所述压痕限定与冲压表面邻接的压痕图案并限定冲压图案( b)用至少一种能够结合到基底表面的化合物(C1)和至少一种有机半导体化合物(S)涂覆冲压表面,(c)将基底表面的至少一部分与 冲压表面以允许化合物(C1)沉积在基底上,(d)去除冲压表面以在基底表面上提供结合位点的图案,(e)施加多个有机半导体化合物的微晶( S)到基底的表面以将至少一部分施加的微晶结合到基底表面上的结合位点。