会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Positive-working photosensitive recording materials
    • 正性感光记录材料
    • US4579806A
    • 1986-04-01
    • US645768
    • 1984-08-30
    • Hans SchuppAlbert ElzerKlaus-Peter JaeckelReinhold J. Leyrer
    • Hans SchuppAlbert ElzerKlaus-Peter JaeckelReinhold J. Leyrer
    • G03C1/72G03F7/004G03F7/039G03F7/38G03C1/495G03C5/16
    • G03F7/38G03F7/0045G03F7/039
    • A curable photosensitive mixture which is suitable as a positive-working recording material contains (a) one or more polymers which have a molecular weight of >500, contain not less than 5% by weight, based on the molecular weight of the polymer, of aromatic and/or heteroaromatic o-nitrocarbinol ester groups and also contain two or more further reactive functional groups which are available for reaction with a thermal crosslinking agent, (b) one or more compounds which effect crosslinking and are capable of reacting with the further reactive functional groups of the polymer (a) under the action of heat, at temperatures substantially above room temperature, and (c) a filler, with or without (d) other conventional additives and/or assistants. The photosensitive mixture is particularly useful as a positive-working recording material for optical information fixing, principally for the production of thermally stable relief images or resist images and, particularly advantageously, of soldering masks.
    • 适合作为正性记录材料的可固化光敏混合物包含(a)一种或多种分子量为> 500的聚合物,基于聚合物的分子量不少于5重量% 芳族和/或杂芳族邻硝基甲醇酯基团,并且还含有两个或更多个可用于与热交联剂反应的反应性官能团,(b)一种或多种影响交联并且能够与另外的反应性反应的化合物 聚合物(a)的官能团在高温作用下,在高于室温的温度下,和(c)填料,有或没有(d)其它常规添加剂和/或助剂。 感光性混合物特别可用作用于光学信息固定的正性记录材料,主要用于制造热稳定浮雕图像或抗蚀剂图像,特别有利地是制造焊接掩模。
    • 5. 发明授权
    • Photosensitive element for producing printing plates or resist images
    • 用于生产印版或抗蚀剂图像的感光元件
    • US4842987A
    • 1989-06-27
    • US62162
    • 1987-06-15
    • Albert ElzerAxel SannerHans SchuppErich Beck
    • Albert ElzerAxel SannerHans SchuppErich Beck
    • C08F2/48G03F7/033
    • G03F7/033Y10S430/117
    • A photosensitive recording element which is suitable for the production of printing plates or resist images possesses a photopolymerizable recording layer which is applied to a dimensionally stable base, can be developed in an aqueous alkaline medium and contains, as a polymeric binder, one or more film-forming copolymers which are insoluble in water but soluble or dispersible in aqueous alkaline solutions and consist of from 10 to 50% by weight of one or more N-vinylamides, preferably N-vinylcaprolactam and/or N-vinylpyrrolidone, from 5 to 30% by weight of acrylic acid and/or methacrylic acid, from 30 to 80% by weight of one or more comonomers from the group consisting of the vinyl aromatics and (meth)acrylates of monoalkanols and from 0.2 to 5% by weight of an olefinically unsaturated compound which contains basic nitrogen atoms and has a pK.sub.a >4.
    • 适用于制造印版或抗蚀剂图像的光敏记录元件具有应用于尺寸稳定的基底的可光聚合记录层,可以在碱性介质水溶液中显影,并且作为聚合物粘合剂含有一个或多个膜 不溶于水但可溶于或分散于碱性水溶液中的共混物,其组成为10至50重量%的一种或多种N-乙烯基酰胺,优选N-乙烯基己内酰胺和/或N-乙烯基吡咯烷酮,5-30% 的丙烯酸和/或甲基丙烯酸,30至80重量%的一种或多种共聚单体,其由乙烯基芳族化合物和单链烷醇的(甲基)丙烯酸酯和0.2-5重量%的烯属不饱和 含有碱性氮原子并具有pKa> 4的化合物。
    • 6. 发明授权
    • Dry film resist and production of resist images
    • 干膜抗蚀剂和抗蚀剂图像的生产
    • US4725524A
    • 1988-02-16
    • US810168
    • 1985-12-18
    • Albert ElzerGunnar SchornickAxel Sanner
    • Albert ElzerGunnar SchornickAxel Sanner
    • G03C1/00G03F7/004G03F7/027G03C11/12G03C1/68
    • G03F7/027Y10S430/111
    • In dry film resists possessing a solid photopolymerizable resist layer, which is applied on a temporary base and can be developed with aqueous, in particular aqueous alkaline, media, and, if required, a cover sheet on the resist layer, the said resist layer is built from a homogeneous mixture of (a) not less than 40% by weight of one or more oligomers which contain free carboxyl groups and more than two acryloyl and/or methacryloyl groups and are soluble or dispersible in aqueous alkaline solutions, (b) from 1 to 35% by weight of one or more film-forming compatible polymers which are soluble in aqueous media, (c) from 1 to 30% by weight of one or more compatible photopolymerizable monomers, (d) from 0.001 to 10% by weight of one or more photoinitiators and (e) from 0 to 30% by weight of further additives and/or assistants. Resist images are produced on a substrate by a process employing photopolymerizable resist layers of the type stated above.
    • 在具有固体可光聚合抗蚀剂层的干膜抗蚀剂中,其施加在临时基底上,并且可以用水性,特别是碱性碱性介质显影,并且如果需要,可以在抗蚀剂层上展开覆盖片,所述抗蚀剂层是 由(a)不少于40重量%的一种或多种含有游离羧基和多于两个丙烯酰基和/或甲基丙烯酰基并且可溶于或分散于碱性水溶液中的低聚物的均匀混合物制备,(b) 1至35重量%的一种或多种可溶于水性介质的成膜相容聚合物,(c)1至30重量%的一种或多种相容的可光聚合单体,(d)0.001至10重量% 的一种或多种光引发剂和(e)0至30重量%的其它添加剂和/或助剂。 通过使用上述类型的可光聚合抗蚀剂层的方法在基材上产生抗蚀图像。