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1. 发明申请

US20070098904A1 Device and method for the reduction of particles in the thermal treatment of rotating substrates 审中-公开
标题翻译：用于在旋转基板的热处理中减少颗粒的装置和方法
公开(公告)号：US20070098904A1
公开(公告)日：2007-05-03
申请号：US11440796
申请日：2006-05-25
申请人： Helmut Aschner , Patrick Schmid , Thomas Theiler , Ottmar Heudorfer , Karsten Weber , Conor O'Carroll
发明人： Helmut Aschner , Patrick Schmid , Thomas Theiler , Ottmar Heudorfer , Karsten Weber , Conor O'Carroll
IPC分类号： B05D3/02 , H01L21/00
CPC分类号： H01L21/67115 , F27B5/04 , F27B17/0025 , F27D5/0037 , H01L21/324 , H01L21/6719 , H01L21/68792
摘要： A device and a method for reducing particle exposure to substrates during thermal treatment are disclosed. Semiconductor wafers may be rotated on a device within a process chamber divided into two partial chambers such that a first partial chamber contains the substrate to be thermally treated and a second partial chamber contains at least parts of the rotation device. Between the partial chambers, a flow of gas is set such that gas from the second partial chamber is substantially prevented from passing into the first partial chamber. In this way, particles which are produced by rotation abrasion in the second partial chamber are largely prevented from passing onto the substrate to be thermally treated. This device and this method are particularly advantageous if the rotation is realized by means of a gas drive, wherein the gas used for the rotation can be introduced directly into the second partial chamber.
摘要翻译：公开了一种用于在热处理期间减少颗粒暴露于基板的装置和方法。半导体晶片可以在分成两个部分室的处理室内的装置上旋转，使得第一部分室包含待热处理的基板，并且第二部分室至少包含旋转装置的一部分。在部分室之间，设置气流，使得基本上防止来自第二部分室的气体进入第一部分室。以这种方式，通过第二部分室中的旋转磨损产生的颗粒被大大地防止被传递到待热处理的基板上。如果通过气体驱动实现旋转，则该装置和该方法是特别有利的，其中用于旋转的气体可以直接引入第二部分室。

2. 发明授权

US07704898B2 Method for the thermal treatment of disk-shaped substrates 有权
标题翻译：盘状基板的热处理方法
公开(公告)号：US07704898B2
公开(公告)日：2010-04-27
申请号：US11659587
申请日：2004-10-28
申请人： Zsolt Nenyei , Steffen Frigge , Patrick Schmid , Thorsten Hülsmann , Thomas Theiler
发明人： Zsolt Nenyei , Steffen Frigge , Patrick Schmid , Thorsten Hülsmann , Thomas Theiler
IPC分类号： H01L21/00
CPC分类号： H01L21/324 , F27B5/04 , F27B17/0025 , H01L21/67115
摘要： Disclosed is an apparatus and a method for reducing flash in an injection mold (532 or 542,543) which molds a molded article between a first mold surface and a second mold surface. The apparatus includes an active material actuator (530 or 533a and 533b or 561a and 561b) configured to, in response to application or removal of an electrical actuation signal thereto, change dimension and urge the first mold surface relative to the second mold surface to reduce flash therebetween. The apparatus also includes a transmission structure (533) configured to provide in use, the electrical actuation signal to said active material actuator (530 or 533a and 533b or 561a and 561b) includes a set of active material actuators stacked one against the other to provide a varying sealing force to urge the first mold surface relative to the second mold surface.
摘要翻译：公开了一种用于减少在第一模具表面和第二模具表面之间模制模制品的注模（532或542,543）中的闪光的装置和方法。该装置包括被配置为响应于施加或去除电致动信号而改变尺寸并且相对于第二模具表面推动第一模具表面以减少第一模具表面的活性材料致动器（530或533a和533b或561a和561b）闪烁。该设备还包括被配置为在使用中提供到所述活性材料致动器（530或533a和533b或561a和561b）的电致动信号的传输结构（533）包括一组彼此堆叠的活性材料致动器，以提供不同的密封力以相对于第二模具表面推动第一模具表面。

3. 发明申请

US20080311761A1 Method for the Thermal Treatment of Disk-Shaped Substrates 有权
标题翻译：盘形基板的热处理方法
公开(公告)号：US20080311761A1
公开(公告)日：2008-12-18
申请号：US11659587
申请日：2004-10-28
申请人： Zsolt Nenyei , Steffen Frigge , Patrick Schmid , Thorsten Hulsmann , Thomas Theiler
发明人： Zsolt Nenyei , Steffen Frigge , Patrick Schmid , Thorsten Hulsmann , Thomas Theiler
IPC分类号： H01L21/00
CPC分类号： H01L21/324 , F27B5/04 , F27B17/0025 , H01L21/67115
摘要： Disclosed is an apparatus and a method for reducing flash in an injection mold (532 or 542, 543) which molds a molded article between a first mold surface and a second mold surface. The apparatus includes an active material actuator (530 or 533a and 533b or 561a and 561b) configured to, in response to application or removal of an electrical actuation signal thereto, change dimension and urge the first mold surface relative to the second mold surface to reduce flash therebetween. The apparatus also includes a transmission structure (533) configured to provide in use, the electrical acutation signal to said active material actuator (530 or 533a and 533b or 561a and 561b) includes a set of active material actuators stacked one against the other to provide a varying sealing force to urge the first mold surface relative to the second mold surface.
摘要翻译：公开了一种用于减少在第一模具表面和第二模具表面之间模制模制品的注塑模具中的闪光的装置和方法（532或542,543）。该装置包括被配置为响应于施加或去除电致动信号而改变尺寸并且相对于第二模具表面推动第一模具表面以减少第一模具表面的活性材料致动器（530或533a和533b或561a和561b）闪烁。所述装置还包括被配置为在使用中提供到所述活性材料致动器（530或533a和533b或561a和561b）的电响应信号的传输结构（533）包括一组彼此堆叠的一组活性材料致动器，以提供不同的密封力以相对于第二模具表面推动第一模具表面。

4. 发明授权

US08716153B2 Device and method for producing dielectric layers in microwave plasma 有权
标题翻译：用于在微波等离子体中制造电介质层的装置和方法
公开(公告)号：US08716153B2
公开(公告)日：2014-05-06
申请号：US13057841
申请日：2009-08-04
申请人： Wilfried Lerch , Zsolt Nenyel , Thomas Theiler
发明人： Wilfried Lerch , Zsolt Nenyel , Thomas Theiler
IPC分类号： H01L21/31
CPC分类号： H01J37/32211 , C23C8/36 , H01J37/32192 , H01J2237/2001
摘要： A device for producing a microwave plasma, and a device and a method for treating semiconductor substrates with a microwave plasma, the microwave plasma device comprising at least one electrode (21, 22, 23), an electrode (21, 22, 23) comprising a coaxial inner conductor (21) made of electrically conductive material and a coaxial outer conductor (22) made of electrically conductive material and surrounding the inner conductor at least partially and being disposed at a distance thereto, and a plasma ignition device (23) that is connected to the coaxial inner conductor (21), characterized in that the coaxial outer conductor (22) comprises at least one first partial region (31) in which it completely surrounds the coaxial inner conductor (21) along the longitudinal axis thereof and comprises at least one further partial region (32) in which it surrounds the coaxial inner conductor (21) partially such that microwave radiation generated by the microwave generator (20) can exit in the at least one further partial region (32) substantially perpendicular to the longitudinal axis of the coaxial inner conductor (21).
摘要翻译：一种微波等离子体的制造装置，以及利用微波等离子体处理半导体基板的装置和方法，所述微波等离子体装置包括至少一个电极（21,22,23），电极（21,22,23），包括由导电材料制成的同轴内部导体（21）和由导电材料制成并且至少部分地围绕内部导体并且远离其设置的同轴外部导体（22），以及等离子体点火装置（23），其中连接到所述同轴内导体（21），其特征在于，所述同轴外导体（22）包括至少一个第一部分区域（31），其中所述第一部分区域沿着其纵向轴线完全围绕所述同轴内导体（21），并且包括至少一个另外的部分区域（32），其中它部分地围绕同轴内部导体（21），使得由微波发生器（20）产生的微波辐射可以在同一出口基本上垂直于同轴内导体（21）的纵向轴线的另一部分区域（32）。

5. 发明申请

US20110217849A1 DEVICE AND METHOD FOR PRODUCING DIELECTRIC LAYERS IN MICROWAVE PLASMA 有权
标题翻译：微波等离子体生产介质层的装置和方法
公开(公告)号：US20110217849A1
公开(公告)日：2011-09-08
申请号：US13057841
申请日：2009-08-04
申请人： Wilfried Lerch , Zsolt Nenyel , Thomas Theiler
发明人： Wilfried Lerch , Zsolt Nenyel , Thomas Theiler
IPC分类号： H01L21/02 , H01J37/32 , C23C16/458 , C23C16/46
CPC分类号： H01J37/32211 , C23C8/36 , H01J37/32192 , H01J2237/2001
摘要： A device for producing a microwave plasma, and a device and a method for treating semiconductor substrates with a microwave plasma, the microwave plasma device comprising at least one electrode (21, 22, 23), an electrode (21, 22, 23) comprising a coaxial inner conductor (21) made of electrically conductive material and a coaxial outer conductor (22) made of electrically conductive material and surrounding the inner conductor at least partially and being disposed at a distance thereto, and a plasma ignition device (23) that is connected to the coaxial inner conductor (21), characterized in that the coaxial outer conductor (22) comprises at least one first partial region (31) in which it completely surrounds the coaxial inner conductor (21) along the longitudinal axis thereof and comprises at least one further partial region (32) in which it surrounds the coaxial inner conductor (21) partially such that microwave radiation generated by the microwave generator (20) can exit in the at least one further partial region (32) substantially perpendicular to the longitudinal axis of the coaxial inner conductor (21).
摘要翻译：一种微波等离子体的制造装置，以及利用微波等离子体处理半导体基板的装置和方法，所述微波等离子体装置包括至少一个电极（21,22,23），电极（21,22,23），包括由导电材料制成的同轴内部导体（21）和由导电材料制成并且至少部分地围绕内部导体并且远离其设置的同轴外部导体（22），以及等离子体点火装置（23），其中连接到所述同轴内导体（21），其特征在于，所述同轴外导体（22）包括至少一个第一部分区域（31），其中所述第一部分区域沿着其纵向轴线完全围绕所述同轴内导体（21），并且包括至少一个另外的部分区域（32），其中它部分地围绕同轴内部导体（21），使得由微波发生器（20）产生的微波辐射可以在同一出口基本上垂直于同轴内导体（21）的纵向轴线的另一部分区域（32）。

6. 发明授权

US5965047A Rapid thermal processing (RTP) system with rotating substrate 失效
标题翻译：具有旋转衬底的快速热处理（RTP）系统
公开(公告)号：US5965047A
公开(公告)日：1999-10-12
申请号：US960150
申请日：1997-10-24
申请人： Werner Blersch , Peter Gruenwald , Michael Maurer , Helmut Merkle , Thomas Theiler , Heinrich Walk
发明人： Werner Blersch , Peter Gruenwald , Michael Maurer , Helmut Merkle , Thomas Theiler , Heinrich Walk
IPC分类号： H01L21/26 , H01L21/00 , C23C16/00
CPC分类号： H01L21/67115
摘要： A rapid thermal processing (RTP) chamber, wherein one wall of the chamber supporting a substrate rotates with respect to the rest of the chamber so that the substrate being treated in the RTP chamber is relatively rotated with respect to the lamps heating the substrate.
摘要翻译：快速热处理（RTP）室，其中支撑衬底的室的一个壁相对于室的其余部分旋转，使得在RTP室中被处理的衬底相对于加热衬底的灯相对旋转。

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