专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4674443A Method and apparatus for vacuum deposition plating 失效
标题翻译：真空沉积电镀方法和装置
公开(公告)号：US4674443A
公开(公告)日：1987-06-23
申请号：US855793
申请日：1986-04-24
申请人： Heizaburo Furukawa , Kanji Wake , Yoshio Shimozato , Kenichi Yanagi , Mitsuo Katoh , Tetsuyoshi Wada , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
发明人： Heizaburo Furukawa , Kanji Wake , Yoshio Shimozato , Kenichi Yanagi , Mitsuo Katoh , Tetsuyoshi Wada , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
IPC分类号： C21D9/56 , C23C14/56 , C23C13/08
CPC分类号： C21D9/561 , C21D9/565 , C23C14/562
摘要： A vacuum deposition plating apparatus having an inlet-side vacuum sealing device provided in front of a vacuum deposition plating chamber, an inlet-side inactive gas replacement chamber provided between the inlet-side vacuum sealing device and an annealing furnace, an outlet-side vacuum sealing device provided in the rear of the vacuum deposition plating chamber, an outlet-side inactive gas replacement chamber provided between the outlet-side vacuum sealing device and the atmosphere, and an inactive gas circulating/purifying device for circulating an inactive gas from vacuum chambers of both the vacuum sealing devices to atmospheric pressure chambers of both the vacuum sealing devices and for removing water, oil and oxygen from the inactive gas; a pressure gauge provided on the annealing furnace; a pressure gauge, a control valve, an automatic valve, a hydrogen concentration detector and a discharge valve provided on the inlet-side inactive gas replacement chamber; a pressure gauge and an automatic valve provided on the outlet-side inactive gas replacement chamber; and an automatic valve connecting to an inactive gas tank for emergency provided on the atmospheric pressure chambers of both the vacuum sealing devices.
摘要翻译：一种真空沉积电镀装置，其具有设置在真空沉积电镀室前面的入口侧真空密封装置，设置在入口侧真空密封装置和退火炉之间的入口侧非活性气体置换室，出口侧真空密封装置，设置在真空沉积电镀室的后部，设置在出口侧真空密封装置和大气之间的出口侧非活性气体置换室，以及用于使来自真空室的惰性气体循环的惰性气体循环/净化装置两个真空密封装置与两个真空密封装置的大气压室和从惰性气体中除去水，油和氧的两个; 设置在退火炉上的压力计; 压力计，控制阀，自动阀，氢浓度检测器和设置在入口侧非活性气体置换室上的排出阀; 设置在出口侧非活性气体置换室上的压力计和自动阀; 以及连接到两个真空密封装置的大气压室上的用于紧急的惰性气体罐的自动阀。

2. 发明授权

US4676999A Method for vacuum deposition plating steel strip 失效
标题翻译：真空沉积电镀钢带的方法
公开(公告)号：US4676999A
公开(公告)日：1987-06-30
申请号：US774818
申请日：1985-09-11
申请人： Heizaburo Furukawa , Kanji Wake , Yoshio Shimozato , Kenichi Yanagi , Mitsuo Katoh , Tetsuyoshi Wada , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
发明人： Heizaburo Furukawa , Kanji Wake , Yoshio Shimozato , Kenichi Yanagi , Mitsuo Katoh , Tetsuyoshi Wada , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
IPC分类号： C21D9/56 , C23C14/56 , C23C16/06
CPC分类号： C21D9/561 , C21D9/565 , C23C14/562
摘要： For vacuum deposition plating steel strip, a vacuum deposition plating apparatus is used including an inlet-side vacuum sealing device provided in front of a vacuum deposition plating chamber, with an inlet-side inactive gas replacement chamber provided between the inlet-side vacuum sealing device and an annealing furnace. An outlet-side vacuum sealing device is provided at the rear of the vacuum deposition plating chamber, with an outlet-side inactive gas replacement chamber provided between the outlet-side vacuum sealing device and the atmosphere. An inactive gas circulating/purifying device circulates an inactive gas from vacuum chambers of both the vacuum sealing devices to atmospheric pressure chambers of both the vacuum sealing devices and removes water, oil and oxygen from the inactive gas. Oxygen and hydrogen in the inactive gas are regulated to provide 60 ppm or less of oxygen and 0.2 to 2.0% of hydrogen, and also to regulate the dew point of the inactive gas to -50.degree. C. or less. Further, a pressure P.sub.1 in the annealing furnace, a pressure P.sub.2 in the inlet-side inactive gas replacement chamber, and a pressure P.sub.3 in the outlet-side inactive gas replacement chamber are maintained at atmospheric pressure or more. A value of P.sub.1 -P.sub.2 can be kept at 0 mmAq or more, and the concentration of hydrogen in the inlet-side inactive gas replacement chamber is held to 2.0.degree. or less.

3. 发明授权

US4655168A Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow 失效
标题翻译：连续真空沉积设备，带有用于调节蒸气流量宽度的控制面板
公开(公告)号：US4655168A
公开(公告)日：1987-04-07
申请号：US774290
申请日：1985-09-10
申请人： Yoshio Shimozato , Tetsuyoshi Wada , Kenichi Yanagi , Mitsuo Kato , Heizaburo Furukawa , Kanji Wake , Arihiko Morita , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
发明人： Yoshio Shimozato , Tetsuyoshi Wada , Kenichi Yanagi , Mitsuo Kato , Heizaburo Furukawa , Kanji Wake , Arihiko Morita , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
IPC分类号： C23C14/04 , C23C14/24 , C23C14/56 , C23C22/24 , C23C13/10
CPC分类号： C23C14/042 , C23C14/24 , C23C14/562
摘要： A continuous vacuum deposition apparatus for coating a metal strip in which a control means for changing the width of the metal vapor channel so that strips of various widths can be deposition-coated with transversally uniform thickness distribution is disclosed.
摘要翻译：公开了一种用于涂覆金属带的连续真空沉积设备，其中用于改变金属蒸汽通道的宽度的控制装置使得可以以横向均匀的厚度分布沉积涂覆各种宽度的条。

4. 发明授权

US4612206A Method of controlling deposition amount distribution in a vacuum deposition plating 失效
标题翻译：控制真空沉积电镀中沉积量分布的方法
公开(公告)号：US4612206A
公开(公告)日：1986-09-16
申请号：US740553
申请日：1985-06-03
申请人： Yoshio Shimozato , Tetsuyoshi Wada , Kenichi Yanagi , Mitsuo Kato , Heizaburo Furukawa , Kanji Wake , Arihiko Morita , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
发明人： Yoshio Shimozato , Tetsuyoshi Wada , Kenichi Yanagi , Mitsuo Kato , Heizaburo Furukawa , Kanji Wake , Arihiko Morita , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
IPC分类号： C23C14/54 , C23C14/24 , C23C14/56 , C23C16/00 , C23C16/06
CPC分类号： C23C14/24 , C23C14/562
摘要： In a continuous vacuum deposition plating of a metal strip, thinner coating at the edges can be prevented by maintaining the pressure of the deposition chamber in which an evaporation chamber is housed at a properly higher level than the pressure of the evaporation chamber.
摘要翻译：在金属条的连续真空沉积电镀中，可以通过将蒸发室所在的沉积室的压力保持在比蒸发室的压力更高的水平来防止边缘处的较薄的涂层。

5. 发明授权

US4587134A Method of rapidly changing deposition amount in a continuous vacuum deposition process 失效
标题翻译：在连续真空沉积工艺中快速改变沉积量的方法
公开(公告)号：US4587134A
公开(公告)日：1986-05-06
申请号：US735442
申请日：1985-05-17
申请人： Yoshio Shimozato , Tetsuyoshi Wada , Kenichi Yanagi , Mitsuo Kato , Heizaburo Furukawa , Kanji Wake , Arihiko Morita , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
发明人： Yoshio Shimozato , Tetsuyoshi Wada , Kenichi Yanagi , Mitsuo Kato , Heizaburo Furukawa , Kanji Wake , Arihiko Morita , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
IPC分类号： C23C14/54 , C23C14/24 , C23C14/26 , C23C14/56
CPC分类号： C23C14/243 , C23C14/24 , C23C14/562
摘要： In the continuous vapor deposition coating of a metal strip, the coating amount can be rapidly changed by keeping the vapor flow at acoustic velocity and changing the cross-sectional area of the vapor path.
摘要翻译：在金属带的连续气相沉积涂层中，通过以蒸气流速保持声速并改变蒸气路径的横截面积，可以快速地改变涂布量。

6. 发明授权

US4643131A Combined continuous plating apparatus for hot-dip plating and vacuum deposition plating 失效
标题翻译：用于热浸镀层和真空沉积电镀的组合连续电镀装置
公开(公告)号：US4643131A
公开(公告)日：1987-02-17
申请号：US778386
申请日：1985-09-20
申请人： Shozo Umeda , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Heizaburo Furukawa , Kanji Wake , Yoshio Shimozato , Kenichi Yanagi , Mitsuo Kato , Tetsuyoshi Wada
发明人： Shozo Umeda , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Heizaburo Furukawa , Kanji Wake , Yoshio Shimozato , Kenichi Yanagi , Mitsuo Kato , Tetsuyoshi Wada
IPC分类号： C23C2/00 , C23C2/40 , C23C14/56 , C23C28/00 , C23C13/08
CPC分类号： C23C2/40 , C23C14/562
摘要： Disclosed is a combined continuous plating apparatus for hot-dip plating and vacuum deposition plating characterized in that the outlet of the gas reduction annealing furnace of a conventional continuous hot-dip plating apparatus and the inlet of the seal roll chamber of a known continuous vacuum deposition plating apparatus are connected through a pressurized chamber in order to prevent invasion of hydrogen-containing reduction gas into the vacuum deposition chamber, whereby is prevented the possibility of the hydrogen-containing gas causing an explosion should air leak into the vacuum deposition chamber.
摘要翻译：公开了一种用于热浸镀层和真空沉积电镀的组合式连续电镀装置，其特征在于，常规连续热浸镀设备的气体还原退火炉的出口和密封辊室的入口具有已知的连续真空沉积电镀装置通过加压室连接，以防止含氢还原气体侵入真空沉积室，从而防止当气体泄漏到真空沉积室中时，含氢气体引起爆炸的可能性。

7. 发明授权

US4649860A Vacuum evaporation coating equipment 失效
标题翻译：真空蒸镀设备
公开(公告)号：US4649860A
公开(公告)日：1987-03-17
申请号：US713743
申请日：1985-03-19
申请人： Heisaburo Furukawa , Kanji Wake , Yoshio Shimozato , Kenichi Yanagi , Mitsuo Kato , Tetsuyoshi Wada , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
发明人： Heisaburo Furukawa , Kanji Wake , Yoshio Shimozato , Kenichi Yanagi , Mitsuo Kato , Tetsuyoshi Wada , Norio Tsukiji , Takuya Aiko , Toshiharu Kittaka , Yasuji Nakanishi
IPC分类号： C23C14/26 , C23C14/56 , C23C13/08
CPC分类号： C23C14/562
摘要： A vacuum evaporation equipment for continuous vacuum evaporation of a metal onto a band or strip of product including at least one vacuum sealing station, provision of ducts that are disposed surrounding the band product and extending from the point of vapor deposition where the band product is subjected to a vacuum evaporation process an a chamber held at a reduced pressure or vacuum state to the extent that substantially no reevaporation of once deposited metal is effectively prevented from occurring. The ducts are adapted to be heated to a temperature substantially higher than the temperature of the steel band product. In addition, there is provided at least one vacuum sealing station with rolls rotatably mounted in the interior of a casing and a complementary sealing bar mounted in a complementary engagement relationship with the rolls having a close gap therebetween. A side panel is mounted self-adjustably in sliding motion in the longitudinal direction along the axes of the rolls on the opposite ends thereof, and heaters are provided to heat the rolls, sealing bar and side panel, respectively.
摘要翻译：一种用于将金属连续真空蒸发到包括至少一个真空密封站的产品带或条带上的真空蒸发设备，提供围绕带产品设置并从带状产品所受到的气相沉积点延伸的管道在真空蒸发过程中，保持在减压或真空状态的室被有效地防止发生一次沉积的金属的基本上不再蒸发。管道适于被加热到显着高于钢带产品的温度的温度。此外，提供了至少一个具有可旋转地安装在壳体内部的辊的真空密封站和与辊之间具有紧密间隙的互补啮合关系安装的互补密封条。侧板在其相对端沿辊的轴线沿纵向方向自由调节地安装，并且分别设置加热器以加热辊，密封条和侧板。

8. 发明授权

US4552092A Vacuum vapor deposition system 失效
标题翻译：真空蒸镀系统
公开(公告)号：US4552092A
公开(公告)日：1985-11-12
申请号：US652676
申请日：1984-09-19
申请人： Kenichi Yanagi , Toshio Taguchi , Tetsuyoshi Wada , Heisaburo Furukawa , Kanji Wake
发明人： Kenichi Yanagi , Toshio Taguchi , Tetsuyoshi Wada , Heisaburo Furukawa , Kanji Wake
IPC分类号： C23C14/56 , C23C14/24
CPC分类号： C23C14/562
摘要： A vacuum vapor deposition system including a high-vacuum vapor deposition chamber provided with a rotary cell around which band steel is wound as it is passed through the chamber. A crucible for molten metal has a hood for guiding vapor of said metal to a vapor deposition port opposed to the rotary cell, and arcuate covers connected to the hood at the entrance and exit positions of the band steel. The vapor deposition port is spaced slightly from the rotary cell so that the covers will not come into contact with the band steel. A heater is provided for heating the surface of the rotary cell up to a temperature equal to or higher than a reevaporation temperature of the metal under a vapor pressure of the vapor of the metal in the proximity of the rotary cell so that the metal will not be deposited onto the opposite end portions of the rotary cell which are not covered by the band steel. A heater is also provided for heating the surfaces of the hood and the covers up to a temperature equal to or higher than such reevaporation temperature of the metal so that metal will not be deposited onto the hood and the covers.
摘要翻译：一种真空蒸镀系统，其特征在于，具有高真空蒸镀室，该真空蒸镀室设置有旋转槽，当所述旋转槽通过所述室时，带钢被卷绕。用于熔融金属的坩埚具有用于将所述金属的蒸气引导到与旋转单元相对的气相沉积端口的罩，以及在带钢的入口和出口位置连接到罩的弓形盖。气相沉积端口与旋转单元稍微间隔开，使得盖不会与带钢接触。提供一种加热器，用于在旋转电池附近的金属蒸汽的蒸汽压力下，将旋转电池的表面加热至等于或高于金属的蒸发温度的温度，使金属不会沉积在不被带钢覆盖的旋转电池的相对端部上。还提供加热器，用于将罩和盖的表面加热到等于或高于金属的这种再蒸发温度的温度，使得金属不会沉积到罩和盖上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式