会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Process for coating plastic substrates
    • 塑料基材涂布工艺
    • US06426144B1
    • 2002-07-30
    • US09482010
    • 2000-01-13
    • Heinrich GrünwaldThomas SchulteKlaus NauenburgWilfried DickenRudolf Beckmann
    • Heinrich GrünwaldThomas SchulteKlaus NauenburgWilfried DickenRudolf Beckmann
    • C23C16453
    • C08J7/123B05D1/62C23C16/0245C23C16/401Y10T428/31507Y10T428/31667
    • A process for coating plastic substrates with a transparent layer compact that is not sensitive to scratches and abrasion and resistant to atmospheric influence with a plasma flame in a vacuum chamber at some distance from the substrate. The process includes the steps of: a cleaning of the substrate with an oxidizing gas in a first procedural step and then a cross linkage with an inert gas in a second procedural step, an oxidizing gas and a silicon-organic compound are used in a third procedural step to produce a first barrier layer, and an oxidizing gas, a silicon-organic compound, and a UV-absorbing compound are used in a fourth procedural step to deposit a sublayer with UV absorbers, an oxidizing gas and a silicon-organic compound are used in a fifth procedural step to deposit a scratch-resistant layer, an inert gas and a silicon-organic compound are used in a sixth procedural step to deposit a smooth layer.
    • 一种涂覆塑料基材的方法,该透明层压片对于在与基板有一定距离的真空室中的等离子体火焰不易受划痕和磨损影响,并且不受大气影响。 该方法包括以下步骤:在第一程序步骤中用氧化气体清洗基底,然后在第二步骤步骤中与惰性气体交联,氧化气体和硅 - 有机化合物用于第三程序 在第四步骤中使用氧化气体,硅 - 有机化合物和UV吸收化合物的步骤以使用UV吸收剂沉积子层,使用氧化气体和硅 - 有机化合物 在第六程序步骤中,在第五步骤中沉积抗划伤层,惰性气体和硅 - 有机化合物被用于沉积光滑层。
    • 4. 发明授权
    • Method and apparatus for applying protective coatings on reflective
layers
    • 在反射层上施加保护涂层的方法和装置
    • US6007875A
    • 1999-12-28
    • US20715
    • 1998-02-09
    • Heinrich GrunwaldMichael JungWilfried DickenStefan KunkelKlaus Nauenburg
    • Heinrich GrunwaldMichael JungWilfried DickenStefan KunkelKlaus Nauenburg
    • C08L83/02B05D7/24C08F2/00C08F2/52C08G77/02C23C14/12C23C14/56F21V7/22G02B1/10C08J7/18
    • B05D1/62C23C14/566C23C14/568F21V7/22G02B1/105
    • A process for applying a protective coating on the reflective layer of projector reflectors by means of plasma polymerization is provided, where a first protective layer which was applied on the reflective layer in a vacuum chamber by plasma polymerization of an organic silicon compound, is provided by means of a plasma in the same processing chamber, under uninterrupted vacuum conditions, with a second, hydrophilic layer substantially composed of a hydrocarbon skeleton and polar functional groups linked thereto, use is made of an apparatus which comprises a plurality of treatment stations (8, 9, 10) held by a fixed, circular cylindrical vacuum chamber wall (16) and a rotatable inner wall cylinder (17) which is enclosed by said vacuum chamber wall (16) and which holds four substrate chambers (12 through 15) and where the wall of the vacuum chamber (16) is provided with four openings (3 through 6) with which the substrate chambers (3 through 6) can be aligned and through which openings the treatment material can act upon the substrates (2, 2', . . . ), with an outer wall (21, 21', . . . ) which encloses the vacuum chamber wall (16) from the outside and extends radially outward from said vacuum chamber wall (16) and joins together the three treatment stations (8, 9, 10) and the loading/unloading station (11), where at least one of the outer chambers (17 through 20) provided between the outer wall, the vacuum chamber wall and the treatment stations (8, 9, 10) is connected on the one hand with the adjoining treatment station and on the other hand with a gas source or an initial substance source (30 through 33).
    • 提供了通过等离子体聚合在投影仪反射体的反射层上施加保护涂层的方法,其中通过有机硅化合物的等离子体聚合在真空室中施加在反射层上的第一保护层由 在不间断的真空条件下,在相同处理室中的等离子体的装置,具有基本上由烃骨架和与其连接的极性官能团的第二亲水层,使用包括多个处理站(8, 9,10)由固定的圆柱形真空室壁(16)和可旋转的内壁圆筒(17)保持,该内壁圆柱体(17)由所述真空室壁(16)包围并保持四个基板室(12至15) 真空室(16)的壁设置有四个开口(3至6),基板室(3至6)可通过该开口对准,通过该开口 处理材料可以作用在基板(2,2',...)上。 。 。 ),其具有从外部包围真空室壁(16)并从所述真空室壁(16)径向向外延伸的外壁(21,21'...),并将三个处理站(8, 9,10)和装卸站(11),其中设置在外壁,真空室壁和处理站(8,9,10)之间的至少一个外室(17至20)连接 一方面与毗邻的处理站,另一方面与气源或初始物质来源(30至33)。